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2016 IEEE 62nd Holm Conference on Electrical Contacts (Holm)最新文献

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Electrical and structural mapping of friction induced defects in graphene layers 石墨烯层中摩擦缺陷的电学和结构映射
Pub Date : 2016-10-09 DOI: 10.1109/HOLM.2016.7780010
P. Chrétien, S. Noël, A. Jaffré, F. Houzé, D. Brunei, J. Njeim
Developing low friction and high conduction layers for electrical contacts has been a challenge for many years. Graphene is known to display outstanding friction and electrical behaviors; lately much work has been conducted both in the applied and fundamental fields of friction in order to understand the mechanisms involved. In the past years we have done experimental work on the tribological behavior of galvanic gold surfaces coated with various types of graphene-like coatings deposited by spraying liquid phase exfoliated graphite. The results showed that the unevenly distributed graphene-like flakes on the surface could bring strong friction reduction. However such coatings are difficult to control and a more controllable deposition technique such as CVD is considered here. The aim of this work is to start investigating the effect of friction on the properties of graphene layers at a microscopic scale and at a macroscopic scale. The first aspect is presented here. In order to assess the effect of friction and wear on graphene films, an atomic force microscope (AFM) is used. The effects of friction of the cantilever tip on the graphene coated plane are investigated. Topographic and electrical properties of the wear scars are recorded as well as the structure of the coating, thanks to a new customized system consisting of a Conducting Probe-AFM (CP-AFM) fitted confocal Raman microscope. Simultaneous topographic maps, electrical maps and Raman maps can be recorded on the friction tracks produced on the graphene coated surfaces. Electrical maps are built from the local values of tip/surface resistance while structure maps are built from the intensity of chosen representative peaks of the Raman spectra. Preliminary results were acquired on CVD graphene transferred to a silicon substrate. This involves a special technique that can induce defects in the graphene film and leave some insulating contamination on the surface. Friction behavior is investigated for different numbers of cycles and for different normal loads. Both parameters seem to govern the behavior of the graphene film. The quantity of defects in the film structure and its wear off are correlated. From the understanding of the mechanisms involved in controlled samples such as CVD graphene on silicon, we aim at bringing insight in the behavior of graphene coatings deposited on gold for an electrical contact application. Such knowledge is necessary to assess the durability of the coatings in various situations such as wear and atmospheric ageing.
多年来,开发用于电触点的低摩擦高传导层一直是一个挑战。众所周知,石墨烯具有出色的摩擦和电学性能;近年来,人们在摩擦的应用和基础领域进行了大量的工作,以了解所涉及的机制。在过去的几年中,我们对镀有不同类型的类石墨烯涂层的电镀金表面进行了摩擦摩擦学行为的实验研究。结果表明,表面不均匀分布的类石墨烯薄片能显著降低摩擦。然而,这种涂层很难控制,因此本文考虑了一种更可控的沉积技术,如CVD。这项工作的目的是开始在微观尺度和宏观尺度上研究摩擦对石墨烯层性能的影响。这里介绍第一个方面。为了评估摩擦和磨损对石墨烯薄膜的影响,使用了原子力显微镜(AFM)。研究了悬臂端摩擦对石墨烯涂层表面的影响。由于采用了一种新的定制系统,包括导电探针- afm (CP-AFM)共聚焦拉曼显微镜,磨损痕的形貌和电学特性以及涂层的结构都被记录下来。同时地形图、电图和拉曼图可以记录在石墨烯涂层表面产生的摩擦轨迹上。电图是根据尖端/表面电阻的局部值构建的,而结构图是根据拉曼光谱中选定的代表性峰的强度构建的。将CVD石墨烯转移到硅衬底上获得了初步结果。这涉及到一种特殊的技术,可以在石墨烯薄膜中引起缺陷,并在表面留下一些绝缘污染。研究了不同循环次数和不同法向载荷下的摩擦行为。这两个参数似乎都控制着石墨烯薄膜的行为。薄膜结构中缺陷的数量与其磨损量是相关的。通过对控制样品(如硅上CVD石墨烯)的机制的理解,我们的目标是深入了解沉积在金上的石墨烯涂层的行为,用于电接触应用。这些知识对于评估涂层在各种情况下(如磨损和大气老化)的耐久性是必要的。
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引用次数: 2
Influence of systematic coefficient of thermal expansion (CTE) variations on Sn whiskering 系统热膨胀系数(CTE)变化对锡晶须的影响
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780033
E. K. Snipes, G. Flowers, M. Bozack
Large variations in the coefficient of thermal expansion (CTE) between Sn and growth substrates provide a highly reliable and fast method to grow whiskers. The CTE effect can be enhanced by thermal cycling during whisker incubation, which is able to reverse reductions in whiskering due to small amounts of dopant atoms in the Sn (e.g., Pb). Investigated substrates with CTE close in value to Sn (0 < %ΔCTE < 25) were Al, Ag, and brass; intermediate in value to Sn (25 < %ΔCTE < 75) were Zn, Ni, and Ta; and far in value to Sn (75 < %ΔCTE < 100) were semiconductors Si, GaAs, and InP. A thickness of 0.5 micron of sputtered Sn was deposited on each coupon. The thermal cycling range was −40°C to 125°C, with 2 hour ramps and 4 hour dwells, for a total of 12 hours per cycle. A second, comparative set of specimens underwent isothermal annealing at 100°C ± 5°C. All samples were incubated for 37 days (74 cycles) before observation. Samples with a %ΔCTE > 75% resulted in drastically higher whisker densities (when cycled) compared with those with %ΔCTE < 75%. There appears to be a critical activation (or nucleation) threshold CTE mismatch which “turns on” fast whisker growth when using semiconductors as substrates.
锡和生长衬底之间的热膨胀系数(CTE)的巨大变化为生长晶须提供了一种高度可靠和快速的方法。CTE效应可以通过晶须培养期间的热循环来增强,这能够逆转由于Sn中少量掺杂原子(例如Pb)而导致的晶须减少。CTE值接近Sn (0 < %ΔCTE < 25)的衬底有Al、Ag和黄铜;Sn的中间值(25 < %ΔCTE < 75)是Zn、Ni和Ta;与Sn (75 < %ΔCTE < 100)相比,半导体Si、GaAs和InP的价值更大。镀锡层厚度为0.5微米。热循环范围为- 40°C至125°C,斜坡2小时,静置4小时,每个循环共12小时。第二组比较样品在100°C±5°C进行等温退火。所有样品孵育37天(74个周期)后观察。与%ΔCTE < 75%的样品相比,%ΔCTE > 75%的样品的晶须密度(当循环时)显着更高。当使用半导体作为衬底时,似乎存在一个临界激活(或成核)阈值CTE错配,该错配“开启”了快速晶须生长。
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引用次数: 1
Temperature distribution in ablation controlled switching arcs using optical emission spectroscopy 利用发射光谱分析烧蚀控制开关电弧的温度分布
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780004
J. Mannekutla, R. Bianchetti, Andreas Friberg, T. Delachaux, P. Sutterlin
Ablation from polymeric casing materials has a pivotal role in switching devices. The ablated gases influence the arc properties and assist the arc movement during current interruption. In this study, spatially resolved optical emission spectroscopy is used to determine the temperature distribution across a switching arc. A simplified setup is built to mimic the conditions found in low voltage switching devices. The quantification of the temperature variations due to the interactions between an arc and ablated vapors from the polymeric walls are aimed in this work. As a marker for temperature, atomic and ionic lines of copper are used. The copper spectral radiance is simulated using ad-hoc temperature profiles. The temperature profiles used to simulate the spectra are adapted until the simulated spectra match with the ones obtained experimentally. This method works well in the copper dominated core region of the arcs. In proximity of polymeric walls, it is of limited use due to the low temperatures and concentration of copper. In addition, C2 molecular emission close to the walls overlaps with the copper lines. The inferred temperatures are then employed to assess the cooling effect of different polymeric materials in function of current and geometry.
聚合物外壳材料的烧蚀在开关器件中起着关键作用。烧蚀气体影响电弧特性,并在电流中断时促进电弧运动。在这项研究中,空间分辨光学发射光谱被用来确定温度分布在一个开关电弧。建立了一个简化的设置来模拟在低压开关器件中发现的条件。由于电弧和来自聚合物壁的烧蚀蒸汽之间的相互作用,温度变化的量化是在这项工作的目的。用铜的原子线和离子线作为温度的标记。铜的光谱辐射是用临时温度曲线模拟的。对用于模拟光谱的温度分布进行调整,直到模拟光谱与实验得到的光谱相匹配。该方法在铜为主的弧芯区效果良好。在靠近聚合物壁的地方,由于低温和铜的浓度,它的使用是有限的。此外,靠近壁面的C2分子发射与铜线重叠。然后使用推断的温度来评估不同聚合物材料在电流和几何结构中的冷却效果。
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引用次数: 1
Investigations on the make-welding behavior of high power contactors for AC and DC applications up to 3kV 3kV以下交流和直流大功率接触器的焊接性能研究
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780037
Jens Jebramcik, F. Berger
Contrary to other test setups, a virtually unmodified contactor actuator has been integrated into a model switch to reproduce contact bouncing of make operations. This allows for a less complex machine than an electro mechanical or pneumatic replica of the original actuator. Furthermore optical and mechanical access to the contacts is significantly improved compared to a standard contactor. Scattered failure of the contact system has been traced down to contact welding during make operations instead of welding by over-currents in the on-state. Investigations of the welded contact have been rather limited without completely destroying the contactor housing for extraction. The model setup facilitates series switching with recording of electrical parameters as well as contact closing and separation forces and contact bridge displacement. Welded contacts can be teared open by an additional actuator to detect welding forces in place or can be simply disassembled for further analysis without damaging the weld spot. The authors present first results from their test sequences and reveal the significance of pre-impact arcing for the total energy dissipation in make operations.
与其他测试设置不同的是,将一个几乎未经修改的接触器执行器集成到模型开关中,以重现make操作时的触点弹跳。这允许一个不太复杂的机器比原来的致动器的电子机械或气动复制品。此外,与标准接触器相比,触点的光学和机械访问得到了显着改善。接触系统的分散故障可以追溯到在闭合状态下的接触焊接,而不是在导通状态下的过电流焊接。对焊接接触的研究相当有限,没有完全破坏接触器外壳进行提取。通过记录电气参数、触点闭合力和分离力以及触点桥位移,模型设置便于串联开关。焊接触点可以通过额外的执行器撕开以检测焊接力,或者可以简单地拆卸以进行进一步分析,而不会损坏焊点。作者给出了他们的试验序列的初步结果,并揭示了预冲击弧对制造操作中总能量耗散的意义。
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引用次数: 2
Various characteristics of electromagnetic contactor when arc discharge are generated only make arc 电磁接触器在产生电弧放电时的各种特性只产生电弧
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780035
Kiyoshi Yoshida, Shu Shimotsuma, K. Sawa, Kenji Suzuki, K. Takaya
Experiments are carried out to clarify the influence on the current and voltage for various characteristics. A small electromagnetic contactor that has two contacts is used. The arc discharge with only a make arc is generated and various characteristics are measured. Source voltage is set to 100V or 3V DC, closed contacts currents are changed from 10A 20A and 30A. From the waveforms, the arc duration time and the bounce time are read out. Arc energy is calculated from the arc voltage and arc current. The contact resistance is calculated from the voltage drops. In DC100V, the arc duration time and the bounce time were not influenced by a closed contact current. The arc energy was increased by a closed contact current. The contact resistance was slightly decreased with current increases. The mass change of electrodes, the anode was decreased and the cathode was increased. Further the electrode mass change per unit arc energy vs. closed current was relatively constant. But, in DC3V make arc duration is very short and electrode mass change is very small.
通过实验阐明了各种特性对电流和电压的影响。使用两个触点的小型电磁接触器。仅产生一个电弧的电弧放电,并测量了各种特性。源电压设置为100V或3V DC,闭合触点电流从10A、20A和30A变化。从波形中读出电弧持续时间和弹跳时间。电弧能量由电弧电压和电弧电流计算得到。接触电阻由电压降计算。在DC100V环境下,触点闭合电流不影响电弧持续时间和弹跳时间。闭合触点电流增加了电弧能量。随着电流的增大,接触电阻略有减小。电极质量变化,阳极质量减小,阴极质量增大。此外,每单位电弧能量与闭合电流的电极质量变化相对恒定。但是,在DC3V中,电弧持续时间很短,电极质量变化很小。
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引用次数: 4
Study on thermal characteristics of RF coaxial switch based on finite element method 基于有限元法的射频同轴开关热特性研究
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780028
Le Xu, S. Ling, Rao Fu, G. Zhai
RF (Radio Frequency) coaxial switches have the advantages of high transmission frequency and high power capacity, and are widely used in aerospace, communications, military, science and medical fields. In this paper, a three-dimensional finite element model of a RF coaxial switch was first proposed. The power loss in the contact system when the switch transmits high frequency and power signals was divided into the conductor loss and the dielectric loss which were calculated separately. It was noted that conductor loss was the main part of power loss. Then, the power loss in the contact system was considered as the heat source and the steady state temperature field of the whole switch was calculated with Ansoft HFSS and Workbench. The temperature rise in a RF coaxial switch was calculated and verified by experimental testing. Finally, the influence of transmission power was examined and it was concluded that the RF performance would downgrade with increasing transmission power and steady state temperature because of the thermal deformation occurring in the contact system caused by the heat stress. The analysis methods and conclusions presented in this study have important theoretical significance and practical value for improving the performance and reliability of RF coaxial switch products.
RF (Radio Frequency)同轴开关具有传输频率高、功率容量大等优点,广泛应用于航空航天、通信、军事、科学、医疗等领域。本文首次建立了射频同轴开关的三维有限元模型。将开关传输高频功率信号时触点系统的功率损耗分为导体损耗和介质损耗,分别计算。指出导体损耗是功率损耗的主要部分。然后,以触点系统的功率损耗为热源,利用Ansoft HFSS和Workbench计算了整个开关的稳态温度场。对射频同轴开关的温升进行了计算,并通过实验测试进行了验证。最后,研究了发射功率对射频性能的影响,得出由于热应力引起的接触系统热变形,射频性能会随着发射功率和稳态温度的增加而下降的结论。本研究提出的分析方法和结论对提高射频同轴开关产品的性能和可靠性具有重要的理论意义和实用价值。
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引用次数: 1
A hybrid DC circuit breaker with vacuum contact and SiC-MOSFET for arcless commutation 一种具有真空触点和SiC-MOSFET的混合式直流断路器,用于无弧整流
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780005
K. Yasuoka, Tsuboi Yoshiki, Tatsuya Hayakawa, Tamanosuke Oide, N. Takeuchi
DC circuit breakers (DCCBs) have been intensively studied because of increasing demand for DC power transmission. A hybrid DC circuit breaker that consists of mechanical switches, semiconductor devices, and metal-oxide varistor (MOV) elements is a promising device to provide low contact resistance and a fast interruption. The semiconductor devices are turned on by the sustaining voltage of arc discharge generated between the metal contacts of the mechanical switch. Though arc duration time in the hybrid DCCB is shorter than that in classical mechanical CBs, the arc causes contact erosion. In this report, an arcless commutation is described that uses the molten metal-bridge voltage at the opening stage of the contacts. The magnitude of the molten-bridge voltage is just enough to turn on SiC-MOSFET devices under specific conditions. Arcless commutation of DC current was observed with a Ag-W vacuum contact and SiC-MOSFETs at current values of 78∼140 A.
随着直流输电需求的不断增加,直流断路器(DCCBs)得到了广泛的研究。由机械开关、半导体器件和金属氧化物压敏电阻(MOV)元件组成的混合式直流断路器是一种具有低接触电阻和快速中断特性的有前途的器件。半导体器件通过机械开关的金属触点之间产生的电弧放电的持续电压接通。混合电弧断路器的电弧持续时间比传统机械电弧断路器短,但电弧会引起接触侵蚀。在本报告中,描述了在触点打开阶段使用熔融金属桥电压的无弧整流。熔桥电压的大小刚好足以在特定条件下开启SiC-MOSFET器件。在78 ~ 140 a的电流值下,用Ag-W真空触点和sic - mosfet观察到了直流电流的无弧换流。
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引用次数: 10
Model switch experiments for determining the evolution of contact resistance of electrical contacts in contactors 确定接触器中电触点接触电阻演变的模型开关实验
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780020
D. Gonzalez, F. Berger, M. Hopfeld, P. Schaaf
As a first step in a long-term planned cooperation between the TU Ilmenau and several industry partners a model switch was developed and constructed in order to investigate the influence of different aspects affecting the evolution of contact resistance during the lifetime of electrical contacts in low voltage contactors. The device permits, besides the variation of different geometrical and kinetic parameters, the determination of the contact resistance by different contact closing forces. Several material analysis methods, such as laser surface profilometry, light microscopy, scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS) and X-ray diffraction (XRD) were applied to Ag/Ni10 contacts before and after experimental series with breaking AC-arcs according to IEC 60947. Important information regarding surface structure, chemical composition and formed crystalline phases of the surface contact materials and ambient materials were obtained. The main characteristics of the model switch and some results of the first experiments are presented in this paper.
作为伊尔曼瑙工业大学与几个行业合作伙伴长期计划合作的第一步,为了研究在低压接触器的电触点寿命期间影响触点电阻演变的不同方面的影响,开发并构建了一个模型开关。该装置除了可以改变不同的几何和动力学参数外,还可以通过不同的触点闭合力来确定接触阻力。采用激光表面轮廓法、光学显微镜、扫描电镜(SEM)、能量色散x射线能谱(EDS)和x射线衍射(XRD)等多种材料分析方法,根据IEC 60947的要求,对Ag/Ni10触点在断弧实验前后进行了分析。获得了表面接触材料和环境材料的表面结构、化学成分和形成的晶相等重要信息。本文介绍了模型开关的主要特性和初步实验结果。
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引用次数: 7
Capacitance build-up in electrical connectors due to vibration induce fretting corrosion 由于振动引起的微动腐蚀,电连接器中的电容积聚
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780024
Haoyue Yang, Y. Tong, G. Flowers, Zhongyang Cheng
Fretting degradation is generally recognized as one of the major failure mechanisms for electrical connector systems. The major driver of fretting damage is relative motion at the contact interface, producing material displacement and transfer. For non-precious metal plated contact interfaces, this fretting damage serves to repeatedly expose fresh metal to atmospheric oxidation. The result is a substantial and rapid increase in contact resistance due to a localized buildup of an insulating layer. Relative motion at the contact interface can be induced by thermal expansion/contraction, vibration, or by a combination of the two mechanisms. There has been considerable recent work on this topic, including experimental investigations and model development work. Much of this previous work on fretting degradation has focused on the increase in electrical resistance resulting from the buildup of corrosion products (the insulating layer) in the interface between the blade and the receptacle. However, the physical separation of the blade and receptacle by the corrosion products also produces a capacitance effect that has not been previously explored in detail. The present study seeks to explore this phenomenon and develop an understanding of its significance. An experimental study was performed to investigate the fashion of the capacitance build-up subjected to vibration induced fretting motion. A simple model is also developed which relates the capacitance behavior to connector characteristic, vibration profile and resistance behavior. A series of experiments and simulation studies have been performed to explore the physical behavior of such systems and study the capacitance effects of the insulating layer. Of particular interest is the effect on signal phase and frequency response across the connector interface and how these effects might be employed to monitor the health of connector systems used for communication signals.
微动退化是电连接器系统的主要失效机制之一。微动损伤的主要驱动因素是接触界面的相对运动,产生材料位移和传递。对于非贵金属电镀的接触界面,这种微动损伤会使新鲜金属反复暴露在大气氧化中。结果是由于绝缘层的局部堆积,接触电阻大量而迅速地增加。接触界面上的相对运动可以由热膨胀/收缩、振动或两种机制的结合引起。最近有相当多的关于这一主题的工作,包括实验调查和模型开发工作。先前关于微动退化的大部分工作都集中在叶片和插座之间的界面中腐蚀产物(绝缘层)的积累导致的电阻增加上。然而,腐蚀产物对叶片和容器的物理分离也会产生电容效应,这在以前没有被详细探讨过。本研究旨在探讨这一现象,并对其意义有所了解。实验研究了受振动诱导的微动运动影响下电容的形成方式。建立了电容特性与连接器特性、振动曲线和电阻特性之间的简单关系模型。通过一系列的实验和仿真研究,探索了这种系统的物理行为,并研究了绝缘层的电容效应。特别令人感兴趣的是对连接器接口上信号相位和频率响应的影响,以及如何利用这些影响来监测用于通信信号的连接器系统的健康状况。
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引用次数: 8
The investigation of the electrical contact resistance through thin oxide layer on a nanometer scale 纳米尺度下薄氧化层接触电阻的研究
Pub Date : 2016-10-01 DOI: 10.1109/HOLM.2016.7780008
T. Yudate, J. Toyoizumi, M. Onuma, T. Kondo, T. Shimizu, S. Kawabata, N. Watanabe, K. Mori
Electrical connectors plated with tin are widely used in automobiles. Therefore, it is important to understand electrical conduction mechanism and contact structure of tin plating which is coated with thin oxide layer in order to realize small electrical connectors which are able to operate under low load force condition. Then we constructed nano-manipulator to be able to observe the mechanical contact, measure the load force and electrical resistance simultaneously in a scanning electron microscope. As a result, we found that the electrical resistance drastically reduces as the load force increases, and could observe that the tin penetrates into cracks in oxide layer and finally reaches on the surface. These results are the same as those of tin oxide layer fabricated by sputtering. Therefore, it is confirmed that the tin appearance on the contact surface is very important for electrical conduction even in the case of tin with natural oxide. For size miniaturization and load force reduction of tin plating connectors in near future, it is necessary to focus on the oxide layer fracturing and control the tin appearance on the contact interface.
镀锡电连接器广泛应用于汽车上。因此,了解涂有薄氧化层的镀锡的导电机理和接触结构,对于实现能够在低负载力条件下工作的小型电连接器具有重要意义。在此基础上,构建了能够在扫描电子显微镜下同时观察机械接触、载荷力和电阻的纳米机械臂。结果,我们发现电阻随着载荷力的增加而急剧减小,并且可以观察到锡渗透到氧化层的裂纹中,最终到达表面。这些结果与溅射法制备氧化锡层的结果一致。因此,证实了接触表面锡的外观对于导电是非常重要的,即使是在天然氧化锡的情况下。为了在不久的将来实现镀锡连接器的尺寸小型化和载荷力降低,有必要重点关注氧化层的破裂和控制接触界面上的锡外观。
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引用次数: 1
期刊
2016 IEEE 62nd Holm Conference on Electrical Contacts (Holm)
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