This work demonstrates a fluorine-based molecular modification strategy to achieve dual-tone photoresist behavior from antimony oxo clusters. Fluorinated ligands enable high-sensitivity positive-tone patterning, while non-fluorinated counterparts result in conventional negative-tone patterning. The approach provides an effective method to manipulate photoresist polarity and sensitivity at the molecular level for advanced EUV lithography. More details are discussed in the article by Qi et al. on pages 3365–3372.