Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.166216
J. Wang, T. Boehly, B. Yaakobi, D. Shvarts, R. Epstein, D. Meyerhofer, M. Richardson, M. Russotto, J. Soures
Multiple-foil collisional excitation X-ray laser targets have been studies spectroscopically. Using spatially resolved 3d-2p X-ray spectra, the temperatures and densities obtained in single- and double-foil geometries have been compared. The ratio of the dipole transitions to the electric quadrupole transitions in the neonlike species has been used as a density diagnostic. An average-ion atomic physics model has been used to describe the ionization process, and a relativistic atomic physics code has been used for calculation of the level energies, populations, and gain calculations. The results confirm that the double-foils provide higher densities and in some cases concave density profiles. The extreme ultraviolet spectra in the range of 20-300 AA show the effect of target geometry and incident laser intensity on the laser lines and the ionization balance.<>
{"title":"Analysis of multiple-foil XRL targets using X-ray spectroscopy","authors":"J. Wang, T. Boehly, B. Yaakobi, D. Shvarts, R. Epstein, D. Meyerhofer, M. Richardson, M. Russotto, J. Soures","doi":"10.1109/PLASMA.1989.166216","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166216","url":null,"abstract":"Multiple-foil collisional excitation X-ray laser targets have been studies spectroscopically. Using spatially resolved 3d-2p X-ray spectra, the temperatures and densities obtained in single- and double-foil geometries have been compared. The ratio of the dipole transitions to the electric quadrupole transitions in the neonlike species has been used as a density diagnostic. An average-ion atomic physics model has been used to describe the ionization process, and a relativistic atomic physics code has been used for calculation of the level energies, populations, and gain calculations. The results confirm that the double-foils provide higher densities and in some cases concave density profiles. The extreme ultraviolet spectra in the range of 20-300 AA show the effect of target geometry and incident laser intensity on the laser lines and the ionization balance.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133583083","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.166201
M. Lieberman
Low-pressure RF discharges are widely used for materials processing. Typical parameters are pressure of 1-100 mtorr, frequency of 13.56 MHz, and RF voltage of 50-1000 V. A reasonably complete picture of the dynamics of these sheaths has been developed. Some typical results for a high-voltage sheath driven by a sinusoidal current source, under the assumptions of time-independent, collisionless ion motion and inertialess electrons, are: (1) the ion sheath thickness s/sub m/ is square root 50/27 larger than a Child's law sheath for the same DC voltage and ion current density; (2) the sheath capacitance per unit area for the fundamental voltage harmonic is 1.226 epsilon /sub 0//s/sub m/, where epsilon /sub 0/ is the free space permittivity; (3) the ratio of the DC to the peak value of the oscillating voltage is 54/125; (4) the second and third voltage harmonics are, respectively, 12.3% and 4.2% of the fundamental; and (5) the conductance per unit area for stochastic heating by the oscillating sheath is 2.98 ( lambda /sub D//s/sub m/)/sup 2/3/ ( epsilon /sup 2/n/sub 0//mu/sub e/), where n/sub 0/ is the ion density, lambda /sub D/ is the Debye length at the plasma-sheath edge, and u/sub e/=(8eT/sub e// pi m)/sup 1/2/ is the mean electron speed.<>
{"title":"Dynamics of sheaths in low pressure RF discharges","authors":"M. Lieberman","doi":"10.1109/PLASMA.1989.166201","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166201","url":null,"abstract":"Low-pressure RF discharges are widely used for materials processing. Typical parameters are pressure of 1-100 mtorr, frequency of 13.56 MHz, and RF voltage of 50-1000 V. A reasonably complete picture of the dynamics of these sheaths has been developed. Some typical results for a high-voltage sheath driven by a sinusoidal current source, under the assumptions of time-independent, collisionless ion motion and inertialess electrons, are: (1) the ion sheath thickness s/sub m/ is square root 50/27 larger than a Child's law sheath for the same DC voltage and ion current density; (2) the sheath capacitance per unit area for the fundamental voltage harmonic is 1.226 epsilon /sub 0//s/sub m/, where epsilon /sub 0/ is the free space permittivity; (3) the ratio of the DC to the peak value of the oscillating voltage is 54/125; (4) the second and third voltage harmonics are, respectively, 12.3% and 4.2% of the fundamental; and (5) the conductance per unit area for stochastic heating by the oscillating sheath is 2.98 ( lambda /sub D//s/sub m/)/sup 2/3/ ( epsilon /sup 2/n/sub 0//mu/sub e/), where n/sub 0/ is the ion density, lambda /sub D/ is the Debye length at the plasma-sheath edge, and u/sub e/=(8eT/sub e// pi m)/sup 1/2/ is the mean electron speed.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131444621","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.165976
H. Akiyama, N. Shimomura, S. Maeda
Summary form only. A compact pulsed power generator based on an inductive energy storage system has been constructed and tested. The generator, which has been named ASO-1, is about 210 cm high. Parallel fuses and plasma erosion opening switches are used as two-stage opening switches. The operation of the generator is described. It has been confirmed by experiment that the parallel fuses vaporize simultaneously. Pulsed power of about 250 kV and several tens of kiloamperes is obtained with a risetime <150 ns.<>
{"title":"Compact pulsed power generator using fuses and plasma erosion opening switches","authors":"H. Akiyama, N. Shimomura, S. Maeda","doi":"10.1109/PLASMA.1989.165976","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.165976","url":null,"abstract":"Summary form only. A compact pulsed power generator based on an inductive energy storage system has been constructed and tested. The generator, which has been named ASO-1, is about 210 cm high. Parallel fuses and plasma erosion opening switches are used as two-stage opening switches. The operation of the generator is described. It has been confirmed by experiment that the parallel fuses vaporize simultaneously. Pulsed power of about 250 kV and several tens of kiloamperes is obtained with a risetime <150 ns.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131875315","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.166263
S. Kawata, Yuichi Masubuchi
A two-dimensional hydrodynamic code HALLEY2D has been developed for analysis of a spherical plasma shell. A polar coordinate (r, theta , phi ) is used, and homogeneity in the phi coordinate is assumed, so that only part of the sphere need to be simulated. Conservation equations for mass, momentum, and energy are solved using a control volume method with an equation of state. A simulation result is presented for an imploding plasma shell irradiated by proton beams with a nonuniformity of 6% of the beam intensity.<>
{"title":"Development of 2-D hydrodynamic code for spherical plasma shell","authors":"S. Kawata, Yuichi Masubuchi","doi":"10.1109/PLASMA.1989.166263","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166263","url":null,"abstract":"A two-dimensional hydrodynamic code HALLEY2D has been developed for analysis of a spherical plasma shell. A polar coordinate (r, theta , phi ) is used, and homogeneity in the phi coordinate is assumed, so that only part of the sphere need to be simulated. Conservation equations for mass, momentum, and energy are solved using a control volume method with an equation of state. A simulation result is presented for an imploding plasma shell irradiated by proton beams with a nonuniformity of 6% of the beam intensity.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115204092","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.165994
A. Hirose
It has been recently pointed out that a certain function F of the plasma density, n(r), and the electron temperature gradient relative to the density gradient, eta /sub e/(r), reproduces well the radial profiles of chi /sub e/ (electron thermal diffusivity) in several tokamaks with various heating modes. Plots are shown of F with n=10/sup 19//m/sup 3/ and the experimentally deduced chi /sub e/ (m/sup 2//s) in three different modes in JET: ohmic, ohmic+ICRH, and ohmic+NBI. The F and chi /sub e/ profiles agree rather well. The factor 1+ eta /sub e/, which appears in the numerator of F, is proportional to the pressure gradient, which may provide a source for drift-type instability. The electron temperature gradient, which appears in the denominator, is possibly due to the nonlinear stabilization of drift-type modes by temperature gradient.<>
{"title":"A model for anomalous thermal diffusivity in tokamaks","authors":"A. Hirose","doi":"10.1109/PLASMA.1989.165994","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.165994","url":null,"abstract":"It has been recently pointed out that a certain function F of the plasma density, n(r), and the electron temperature gradient relative to the density gradient, eta /sub e/(r), reproduces well the radial profiles of chi /sub e/ (electron thermal diffusivity) in several tokamaks with various heating modes. Plots are shown of F with n=10/sup 19//m/sup 3/ and the experimentally deduced chi /sub e/ (m/sup 2//s) in three different modes in JET: ohmic, ohmic+ICRH, and ohmic+NBI. The F and chi /sub e/ profiles agree rather well. The factor 1+ eta /sub e/, which appears in the numerator of F, is proportional to the pressure gradient, which may provide a source for drift-type instability. The electron temperature gradient, which appears in the denominator, is possibly due to the nonlinear stabilization of drift-type modes by temperature gradient.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115552233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.165993
K. Boulais, J. Choe, W. Namkung, V. Ayres
Critical parameters were measured for the axis-encircling electron beam of a cusptron, a high-power microwave tube for several different magnetic field profiles. The tube utilizes the negative mass instability (NMI) of the beam either in a circular or multivane circuit. Thus, microwave radiation can be produced at the fundamental or high harmonics of the electron cyclotron frequency. If the beam orbit does not coincide with the peak wave amplitude, the NMI is damped. The off-centering stems mainly from a nonideal magnetic field. A series of experiments was set up to measure the beam envelope radius and velocity ratio as a function of axial distance for several unique magnetic field profiles. Each field profile maximized one of the off-centering sources from which measurements were taken. Thus, insight to the magnitude of off-centering and spread in axial velocity for each source led to a final field profile set up to reduce the undesirable effects of off-centering.<>
{"title":"Experimental study of cusp injected electron beam","authors":"K. Boulais, J. Choe, W. Namkung, V. Ayres","doi":"10.1109/PLASMA.1989.165993","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.165993","url":null,"abstract":"Critical parameters were measured for the axis-encircling electron beam of a cusptron, a high-power microwave tube for several different magnetic field profiles. The tube utilizes the negative mass instability (NMI) of the beam either in a circular or multivane circuit. Thus, microwave radiation can be produced at the fundamental or high harmonics of the electron cyclotron frequency. If the beam orbit does not coincide with the peak wave amplitude, the NMI is damped. The off-centering stems mainly from a nonideal magnetic field. A series of experiments was set up to measure the beam envelope radius and velocity ratio as a function of axial distance for several unique magnetic field profiles. Each field profile maximized one of the off-centering sources from which measurements were taken. Thus, insight to the magnitude of off-centering and spread in axial velocity for each source led to a final field profile set up to reduce the undesirable effects of off-centering.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115565795","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.166148
J. Hopwood, R. Wagner, D. Reinhard, J. Asmusen
A microwave-cavity plasma applicator with multicusp electron cyclotron resonance (ECR) used as an ion beam source and for oxidation and etching of semiconductor materials has been characterized over its range of operating conditions. Single and double Langmuir probe measurements of electron density, ion density, and electron energy distribution functions have been made in the downstream region and as a function of power (120-250 W) and pressure (0.5-15.5 mtorr) in argon and oxygen. In addition, Faraday cup measurements of ion energies and optical emission data have been made. The plasma applicator is a 17.8 cm-diameter, 2.45 GHz cylindrical resonator with one end terminated by a sliding short and the other end by an overdense disk-shaped plasma. Processing of materials or ion extraction occurs at the field-free lower face of the plasma disk. Ion densities are typically 10/sup 11/-10/sup 12/ cm/sup -3/ at this point and decrease exponentially with distance downstream from the discharge. The electron energy distribution functions are Maxwellian and below 3 mtorr more closely follow a Druyvesteyn distribution with average energies of 5-8.5 eV. Ion energies to a grounded substrate are typically 10-25 eV with few, if any high-energy (>25 eV) ions.<>
{"title":"Characterization of a multipolar electron cyclotron resonance microwave plasma source","authors":"J. Hopwood, R. Wagner, D. Reinhard, J. Asmusen","doi":"10.1109/PLASMA.1989.166148","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166148","url":null,"abstract":"A microwave-cavity plasma applicator with multicusp electron cyclotron resonance (ECR) used as an ion beam source and for oxidation and etching of semiconductor materials has been characterized over its range of operating conditions. Single and double Langmuir probe measurements of electron density, ion density, and electron energy distribution functions have been made in the downstream region and as a function of power (120-250 W) and pressure (0.5-15.5 mtorr) in argon and oxygen. In addition, Faraday cup measurements of ion energies and optical emission data have been made. The plasma applicator is a 17.8 cm-diameter, 2.45 GHz cylindrical resonator with one end terminated by a sliding short and the other end by an overdense disk-shaped plasma. Processing of materials or ion extraction occurs at the field-free lower face of the plasma disk. Ion densities are typically 10/sup 11/-10/sup 12/ cm/sup -3/ at this point and decrease exponentially with distance downstream from the discharge. The electron energy distribution functions are Maxwellian and below 3 mtorr more closely follow a Druyvesteyn distribution with average energies of 5-8.5 eV. Ion energies to a grounded substrate are typically 10-25 eV with few, if any high-energy (>25 eV) ions.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"411 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115923254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.166234
L. M. Miner, D. Voss, P. R. Perea
A description is given of the system architecture, digitizing hardware, data capture and archiving software, and networking of a system for transient signal capture and analysis. This system is suitable for use with the multihertz repetition rated pulsed power supplies used for high-power microwave source development and effects testing. The system is automated using a high-speed GPIF interface through a VAX 3500/3600 workstation. Each of the data acquisition stations is controlled by one of two VAX 8650 mainframes over the local area VAX cluster. Shot data are stored using the Ingres database. Data analysis is done at any of the 25 PCs acting as DECNET nodes using DADiSP analysis software. The system archives as many as two dozen channels at repetition rates of approximately 2 Hz.<>
{"title":"High repetition rate, wide bandpass, data acquisition system for high power microwave applications","authors":"L. M. Miner, D. Voss, P. R. Perea","doi":"10.1109/PLASMA.1989.166234","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166234","url":null,"abstract":"A description is given of the system architecture, digitizing hardware, data capture and archiving software, and networking of a system for transient signal capture and analysis. This system is suitable for use with the multihertz repetition rated pulsed power supplies used for high-power microwave source development and effects testing. The system is automated using a high-speed GPIF interface through a VAX 3500/3600 workstation. Each of the data acquisition stations is controlled by one of two VAX 8650 mainframes over the local area VAX cluster. Shot data are stored using the Ingres database. Data analysis is done at any of the 25 PCs acting as DECNET nodes using DADiSP analysis software. The system archives as many as two dozen channels at repetition rates of approximately 2 Hz.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"89 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124152405","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.166255
S. Dhali, I. Sardja
Experimental results on the removal of SO/sub 2/ from a synthetic flue gas using a dielectric-barrier discharge have been obtained. The dielectric-barrier discharge, also known as silent discharge or partial discharge, is intermittent, and the current exhibits a large number of spikes during that part of the voltage period when the discharge is burning. The discharge electrode configuration is coaxial. The inner electrode is either exposed metal or is covered with glass, and the outer electrode is quartz coated with a conducting surface. The removal of SO/sub 2/ has been studied for several different gas mixtures, flows and pressures. A typical measurement shows a 44% reduction in SO/sub 2/ concentration for a sample gas of 32 parts per million of SO/sub 2/ in air in a 15-kV, 60-Hz, and 0.75-mA silent discharge.<>
{"title":"Dielectric-barrier discharge for the removal of SO/sub 2/ from flue gas","authors":"S. Dhali, I. Sardja","doi":"10.1109/PLASMA.1989.166255","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166255","url":null,"abstract":"Experimental results on the removal of SO/sub 2/ from a synthetic flue gas using a dielectric-barrier discharge have been obtained. The dielectric-barrier discharge, also known as silent discharge or partial discharge, is intermittent, and the current exhibits a large number of spikes during that part of the voltage period when the discharge is burning. The discharge electrode configuration is coaxial. The inner electrode is either exposed metal or is covered with glass, and the outer electrode is quartz coated with a conducting surface. The removal of SO/sub 2/ has been studied for several different gas mixtures, flows and pressures. A typical measurement shows a 44% reduction in SO/sub 2/ concentration for a sample gas of 32 parts per million of SO/sub 2/ in air in a 15-kV, 60-Hz, and 0.75-mA silent discharge.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114546268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1989-05-22DOI: 10.1109/PLASMA.1989.166095
V. Bystritskii, S. Volkov, Y. Krasik, I. Lisitsyn, N. Polkovnikova
High-power ion beam (HPIB) generation and plasma formation processes in a magnetically insulated diode (MID) installed at a 3*10/sup 10/-W nanosecond accelerator are reported. The possibility of efficient HPIB ballistic focusing using the performed plasma in the HPIB transport region has been demonstrated. Several new diagnostics (spring pendulum and acoustic probe) were used to measure the plasma ablation pressure during the impact of the HPIB with the target. The plasma formation and its behavior in the diode gap were studied by a high-voltage probe, array of collimated Faraday cups, and streak image converter. The electron losses at the anode played the dominant role in the MID impedance behavior. The application of the active plasma source provided control of the HPIB characteristics and MID impedance behavior. The highest degree of HPIB focusing attained during the experiments with spherical-geometry diode electrodes was equal to 60. The ablation average pressures measured by spring pendulum gave several kilobars for 8-10 kA/cm/sup 2/ of HPIB density. The peak pressures attained tens of kilobars for respective HPIB current amplitudes.<>
{"title":"Generation and focusing of high power ion beam in magnetically insulated diode with applied B-field","authors":"V. Bystritskii, S. Volkov, Y. Krasik, I. Lisitsyn, N. Polkovnikova","doi":"10.1109/PLASMA.1989.166095","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166095","url":null,"abstract":"High-power ion beam (HPIB) generation and plasma formation processes in a magnetically insulated diode (MID) installed at a 3*10/sup 10/-W nanosecond accelerator are reported. The possibility of efficient HPIB ballistic focusing using the performed plasma in the HPIB transport region has been demonstrated. Several new diagnostics (spring pendulum and acoustic probe) were used to measure the plasma ablation pressure during the impact of the HPIB with the target. The plasma formation and its behavior in the diode gap were studied by a high-voltage probe, array of collimated Faraday cups, and streak image converter. The electron losses at the anode played the dominant role in the MID impedance behavior. The application of the active plasma source provided control of the HPIB characteristics and MID impedance behavior. The highest degree of HPIB focusing attained during the experiments with spherical-geometry diode electrodes was equal to 60. The ablation average pressures measured by spring pendulum gave several kilobars for 8-10 kA/cm/sup 2/ of HPIB density. The peak pressures attained tens of kilobars for respective HPIB current amplitudes.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117191275","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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