Two-dimensional (2D) layered semiconductors are emerging as promising materials for next-generation electronics, but their development is hampered by typically low intrinsic carrier mobility. Herein, we have systematically investigated the carrier transport in monolayer arsenene by integrating first-principles calculations with the ab initio Boltzmann transport theory. The predicted hole mobility of 768 cm2V−1s−1 at room temperature is clearly larger than that in common 2D semiconductors. A mode-by-mode analysis of scattering rates reveals that the hole transport is primarily limited by out-of-plane optical (ZO) phonons. We further demonstrate that the carrier transport in arsenene could be significantly enhanced through applying biaxial tensile strain. When applied strain exceeds 3 %, the optimal transport performance has been achieved. The obtained electron mobility of ∼1500 cm2V−1s−1 renders arsenene more appealing in practical application. Strain-induced indirect-to-direct bandgap transition is identified as the primary mechanism for the enhanced electron transport. In particular, the resultant isotropic and parabolic band structure with exceptionally small effective masses emerges as the crucial factor, which not only ensures high band velocity but also confers a low density of states (DOS) that severely limits available phase space for electron scattering. These findings advance the understanding of carrier transport in monolayer arsenene. The superior electron transport and bandgap characteristics under strain render arsenene highly promising for future electronic devices.
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