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Observation of the Weak Antilocalization and Linear Magnetoresistance in Topological Insulator Thin Film Hall Bar Device 拓扑绝缘体薄膜霍尔棒器件弱反局域化和线性磁阻的观察
Pub Date : 2018-07-25 DOI: 10.5772/INTECHOPEN.76900
S. Pradhan, R. Barik
In this research work, without using any resist and lithography techniques, we report clean, surface protected and high quality Topological Insulator (TI) thin film Hall Bar device of millimeter size long. In the magnetotransport measurements, the pronounced effect of weak antilocalization (WAL) behavior has been observed at low temperatures over the range T = 4–10 K and in the low field regions and the WAL cusp disappears as we go from 10 K onwards to higher temperatures, also we find that the high-field mage-netoresistance (MR) is linear in field. With respect to magnetic field (B), the MR behavior seems to be symmetric. We also analyze the thickness dependent weak antilocalization (WAL) behavior, which has been observed in Topological Insulator Bi 2 Te 3 thin film Hall Bar device. For varying thickness, our systematic magnetotransport measurements reveal WAL signals obtain in thicker films whereas below the critical thickness of ~4 nm, a sudden diminishment of the surface transport has been observed by suppression of WAL behavior. The analyzed and pronounced behavior of this effect is also greatly dependent on the temperatures, where the WAL cusps are observed in the low-field regions and at low temperatures.
在本研究工作中,我们在不使用任何抗蚀剂和光刻技术的情况下,报告了清洁,表面保护和高质量的毫米尺寸长的拓扑绝缘体(TI)薄膜霍尔棒器件。在磁输运测量中,弱反局域化(WAL)行为在T = 4-10 K范围内的低温和低场区域中观察到明显的影响,并且从10 K到更高的温度,WAL尖峰消失,并且我们发现高场磁网电阻(MR)在场中是线性的。相对于磁场(B),磁流变行为似乎是对称的。我们还分析了在拓扑绝缘子bi2ti3薄膜霍尔棒器件中观察到的厚度相关的弱反局域化(WAL)行为。对于不同的厚度,我们的系统磁输运测量揭示了在较厚的薄膜中获得的WAL信号,而在临界厚度~4 nm以下,通过抑制WAL行为可以观察到表面输运的突然减少。这种效应的分析和明显的行为也很大程度上取决于温度,在低场区域和低温下观察到WAL尖峰。
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引用次数: 0
Photoionization Cross Section in Low-Dimensional Systems 低维系统的光电离截面
Pub Date : 2018-07-25 DOI: 10.5772/INTECHOPEN.75736
M. Tshipa, M. Masale
A theoretical investigation of the effects of the parabolic, shifted parabolic, hill-like, and cup-like parabolic confining electric potentials on photoionization cross section (PCS) in a spherical quantum dot is presented. Each of the parabolic potentials is superimposed on an infinite spherical square quantum well (ISSQW) potential. The parabolic potential blueshifts the peaks of the PCS, while the shifted parabolic potential causes a redshift. As the so-called strength of cup-like parabolic potential is increased, the peak of the PCS becomes redshifted for the s ! p transition, but blueshifted for the p ! d , d ! f (and so forth) transitions. On the contrary, an increase in the strength of the hill-like parabolic potential blueshifts peaks of the PCS for s ! p transitions, while it redshifts those of transitions between higher states.
本文从理论上研究了抛物型、移位抛物型、丘型和杯型抛物型约束电位对球形量子点光离截面(PCS)的影响。每个抛物势叠加在一个无限球面平方量子阱(ISSQW)势上。抛物势使PCS峰发生蓝移,而抛物势的位移引起红移。随着所谓的杯状抛物势强度的增加,PCS的峰值在s !P跃迁,但是P的蓝移!D, D !F(等等)转换。相反,山状抛物势蓝移强度的增加使PCS峰的蓝移值增加了5倍。P跃迁,而高态之间的跃迁红移。
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引用次数: 0
Quantum Wells and Ultrathin Metallic Films 量子阱与超薄金属薄膜
Pub Date : 2018-07-25 DOI: 10.5772/INTECHOPEN.74150
V. Barsan
The chapter illustrates how simple quantum mechanics can sometimes provide quite precise description of nanophysics phenomena. From this perspective, both exact and approximate solutions for the bound-state energy of an electron in a square well are exposed. These results are used to improve the calculation of quantum size effects (QSEs) in ultrathin metallic films, obtained by several authors with simpler models of quantum wells. We show that, for a small (less than 5) number of monolayers, the differences between the predictions of these simpler models, and our approach, are important. Methods to improve the accuracy in the evaluation of various quantum size effects are shortly discussed. Using quantum mechanical-electromagnetic analogies, our results can be used in the study of light propagation in dielectric wave guides.
本章说明了简单的量子力学有时如何提供纳米物理现象的相当精确的描述。从这个角度出发,揭示了电子在方形阱中的束缚态能的精确解和近似解。这些结果用于改进超薄金属薄膜中量子尺寸效应(qse)的计算,这些计算是由一些作者用更简单的量子阱模型得到的。我们表明,对于一小部分(少于5个)单层,这些简单模型的预测与我们的方法之间的差异是重要的。简要讨论了提高各种量子尺寸效应评价准确度的方法。利用量子力学-电磁类比,我们的结果可用于光在介质波导中的传播研究。
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引用次数: 0
Analysis of Topological Material Surfaces 拓扑材料表面分析
Pub Date : 2018-03-23 DOI: 10.5772/INTECHOPEN.74934
Taro Kimura
We provide a systematic analysis of the boundary condition for the edge state, which is a ubiquitous feature in topological phases of matter. We show how to characterize the boundary condition, and how the edge state spectrum depends on it, with several examples, including 2d topological insulator and 3d Weyl semimetal. We also demonstrate the edge-of-edge state localized at the intersection of boundaries.
我们系统地分析了边缘态的边界条件,这是物质拓扑相中普遍存在的特征。我们展示了如何表征边界条件,以及边缘状态谱如何依赖于它,有几个例子,包括二维拓扑绝缘体和三维Weyl半金属。我们还演示了边界交点处的边-边状态。
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引用次数: 1
Spin-Helical Dirac Fermions in 3D Topological Insulator Quantum Wires 三维拓扑绝缘体量子线中的自旋螺旋狄拉克费米子
Pub Date : 2018-03-08 DOI: 10.5772/INTECHOPEN.76152
R. Giraud, J. Dufouleur, L. Veyrat, E. Xypakis, J. Bardarson, S. Hampel, B. Buechner
The next generation of electronic devices based on 3D topological insulators will be developed from advanced functional nanostructures and heterostructures. Toward this goal, single-crystalline nanowires offer interesting opportunities for new developments due to the strong quantum confinement of spin-helical surface Dirac fermions and to the possibility to realize core-shell lateral nanostructures adapted to the control of the elec- tro-chemical potential at the interface with a topological insulator. Here, we review the specific transport properties of 3D topological insulator quantum wires and the influence of disorder. Having a large energy quantization, weakly-coupled Dirac surface modes are prone to quasi-ballistic transport, with some analogies to carbon nanotubes but with spin-textured quantum states weakly coupled by non-magnetic disorder. Due to a small interaction with their environment, these surface modes are good candidates to realize novel quantum spintronic devices, spanning from ballistic spin conductors to localized spin filters. A specific topological mode also holds promises to control chiral edge states and Majorana bound states in truly 1D quantum wires, being tunable with a magnetic field or an electrical gate. Challenges toward these goals are briefly discussed, as well as the need for novel functional heterostructures.
基于三维拓扑绝缘体的下一代电子器件将从先进的功能纳米结构和异质结构发展。为了实现这一目标,单晶纳米线为新的发展提供了有趣的机会,因为自旋螺旋表面狄拉克费米子具有很强的量子约束,并且有可能实现适应于控制拓扑绝缘体界面上的电化学势的核壳横向纳米结构。本文综述了三维拓扑绝缘体量子线的特定输运性质以及无序对其的影响。弱耦合的狄拉克表面模式具有较大的能量量子化,容易发生准弹道输运,与碳纳米管有一些相似之处,但具有非磁性无序弱耦合的自旋织构量子态。由于与环境的相互作用很小,这些表面模式是实现新型量子自旋电子器件的良好候选者,从弹道自旋导体到局域自旋滤波器。在真正的一维量子线中,一种特定的拓扑模式也有望控制手性边缘态和马约拉纳束缚态,可以通过磁场或电门进行调节。本文简要讨论了实现这些目标所面临的挑战,以及对新型功能异质结构的需求。
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引用次数: 0
Growth Mode and Characterization of Si/SiC Heterostructure of Large Lattice-Mismatch 大晶格错配Si/SiC异质结构的生长方式与表征
Pub Date : 2018-03-06 DOI: 10.5772/INTECHOPEN.74935
Lianbi Li
The Si/6H-SiC heterostructure of large lattice mismatch follows domain epitaxy mode, which release most of the lattice-mismatch strain, and the coherent Si epilayers can be grown on 6H-SiC. An interfacial misfit dislocation array is present at the interface that determines the domain ’ s size. In this chapter, transmission electron microscopy (TEM) and high resolution X-ray diffraction (HRXRD) were employed to reveal in-plane orienta- tion, interface structure and growth mode of the Si/SiC heterostructure. Based on the characterizations, residual lattice mismatch and edge misfit dislocation density at the hetero-interface can be precisely controlled. And these characterization methods are applicable for the heterostructures of large-lattice mismatch, except for the heterostructures with different crystal symmetry on the film and the substrate. which releases most of the lattice-mismatch strain, and the coherent Si epilayers can be grown on 6H-SiC. Si(111)/6H-SiC(0001) heterostructure obtained at 900 (cid:3) C has an in-plane orientation relationship of (111)[1-10] Si //(0001)[1-210] 6H-SiC . The Si(111)/6H-SiC(0001) interface has the 4:5 Si-to-SiC matching mode with a residual lattice-mismatch of 0.26% along both the Si[11-2] and Si[1-10] orientations. As the growth temperature increases to 1050 (cid:3) C, the preferential orientation of the Si film transitions to [110]. SAED patterns show that the in-plane orientation relationship is (110)[001] Si //(0001)[10-10] 6H-SiC . Along Si[-110] orientation, the Si-to-SiC matching is still 4:5; along the vertical orientation Si[001], the matching mode is approximate 1:2 and the residual mismatch is 1.84% correspondingly. The atom quantity in one DM period decreases with increasing residual mismatch and vice versa. The Si film epitaxially grows but with MDs at the Si/6H-SiC interface. The MD density of the Si(111)/6H-SiC(0001) and Si(110)/ 6H-SiC(0001) obtained by experimental observations is as low as 0.487 and 1.217 (cid:4) 10 14 cm (cid:2) 2 , respectively, which is much smaller than the theoretical value.
大晶格错配的Si/6H-SiC异质结构遵循域外延模式,释放了大部分晶格错配应变,可以在6H-SiC上生长出相干Si薄膜。界面错配位错阵列决定了畴的大小。本章采用透射电镜(TEM)和高分辨率x射线衍射(HRXRD)分析了Si/SiC异质结构的面内取向、界面结构和生长方式。基于这些表征,可以精确控制异质界面处的残余晶格失配和边缘失配位错密度。这些表征方法适用于大晶格失配的异质结构,除了薄膜和衬底上具有不同晶体对称性的异质结构。释放了大部分的晶格失配应变,并且可以在6H-SiC上生长出相干Si薄膜。在900 (cid:3) C下得到的Si(111)/6H-SiC(0001)异质结构的面内取向关系为(111)[1-10]Si //(0001)[1-210] 6H-SiC。Si(111)/6H-SiC(0001)界面具有4:5的Si- sic匹配模式,Si[11-2]和Si[1-10]取向的残余晶格失配均为0.26%。当生长温度升高到1050 (cid:3) C时,Si薄膜的择优取向转变为[110]。SAED图显示,面内取向关系为(110)[001]Si //(0001)[10-10] 6H-SiC。沿Si[-110]取向,Si与sic的匹配仍为4:5;沿垂直方向Si[001],匹配模式近似为1:2,相应的残差失配为1.84%。一个DM周期内的原子数量随着残差的增加而减少,反之亦然。Si膜外延生长,但在Si/6H-SiC界面处有MDs。实验观测得到的Si(111)/6H-SiC(0001)和Si(110)/ 6H-SiC(0001)的MD密度分别低至0.487和1.217 (cid:4) 10 - 14 cm (cid:2) 2,远小于理论值。
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引用次数: 3
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