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Photomask Technology 2022最新文献

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Front Matter: Volume 12293 封面:第12293卷
Photomask Technology 2022
Pub Date : 2022-12-09 DOI: 10.1117/12.2667057
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引用次数: 0
EUV extension through materials engineering 通过材料工程扩展EUV
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2652966
U. Mitra
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引用次数: 0
Intel technology engine fueling the semiconductor growth 英特尔技术引擎助推半导体增长
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2642290
Ryan J. Russell
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引用次数: 1
Design and manufacturing of freeform metasurfaces 自由曲面的设计与制造
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2643331
Jonathan A. Fan
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引用次数: 0
Photomask blanks past, present, and future: the road to EUV 光掩模空白的过去，现在和未来:通往EUV的道路
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2640136
Geoffrey M. Akiki
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引用次数: 0
Applicability Fastmicro product scanner as particle detection metrology tool Fastmicro产品扫描仪作为颗粒检测计量工具的适用性
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2641788
Hendrik Ketelaars
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引用次数: 0
Production of AR/VR waveguides with displacement Talbot lithography 用位移塔尔博特光刻技术生产AR/VR波导
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2643318
H. Solak
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引用次数: 0
Environmental sustainability applied to lithography and photomasks 环境可持续性应用于光刻和光罩
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2643305
E. Gallagher
{"title":"Environmental sustainability applied to lithography and photomasks","authors":"E. Gallagher","doi":"10.1117/12.2643305","DOIUrl":"https://doi.org/10.1117/12.2643305","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"127 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127208192","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Challenges and opportunities for near-eye displays in AR/VR AR/VR中近眼显示的挑战和机遇
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2644549
N. Mohanty
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引用次数: 0
Optimum OPC methodology and visualization technique for photomask compensation in flat panel display lithography 平板显示光刻中掩模补偿的最佳OPC方法和可视化技术
Photomask Technology 2022
Pub Date : 2022-11-16 DOI: 10.1117/12.2644331
Y. Ham, T. Pistor, C. Progler
{"title":"Optimum OPC methodology and visualization technique for photomask compensation in flat panel display lithography","authors":"Y. Ham, T. Pistor, C. Progler","doi":"10.1117/12.2644331","DOIUrl":"https://doi.org/10.1117/12.2644331","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"110 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127981180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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