{"title":"Optimum OPC methodology and visualization technique for photomask compensation in flat panel display lithography","authors":"Y. Ham, T. Pistor, C. Progler","doi":"10.1117/12.2644331","DOIUrl":"https://doi.org/10.1117/12.2644331","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"110 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127981180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Accelerated discovery of materials for a sustainable future of computing","authors":"D. Sanders","doi":"10.1117/12.2652970","DOIUrl":"https://doi.org/10.1117/12.2652970","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"91 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127048872","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Luo, W. Conley, James Bonefede, Natallia S. Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar M. Rao, M. Sells, J. Thornes
{"title":"Holistic imaging for yield improvements enabled by high-availability, and low-environmental impact Cymer ArFi lightsource","authors":"S. Luo, W. Conley, James Bonefede, Natallia S. Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar M. Rao, M. Sells, J. Thornes","doi":"10.1117/12.2648306","DOIUrl":"https://doi.org/10.1117/12.2648306","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127415645","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Critical dimension performance and defect control on multi-etching","authors":"C. C. Han","doi":"10.1117/12.2641684","DOIUrl":"https://doi.org/10.1117/12.2641684","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129195003","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
R. Capelli, N. Wilcox, S. Krannich, Dinumol Devasia, G. Kersteen, A. Sundaramurthy, Chang Ju Choi, S. Hoffmann, Zachary Rice, Patrick J. Straney, K. Gwosch, M. Koch, Tim Helbig
{"title":"Enabling process optimization for EUV phase shift masks using AIMS(R) EUV phase metrology","authors":"R. Capelli, N. Wilcox, S. Krannich, Dinumol Devasia, G. Kersteen, A. Sundaramurthy, Chang Ju Choi, S. Hoffmann, Zachary Rice, Patrick J. Straney, K. Gwosch, M. Koch, Tim Helbig","doi":"10.1117/12.2645004","DOIUrl":"https://doi.org/10.1117/12.2645004","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"1993 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125541695","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
R. Eklund, M. Wahlsten, M. Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, Youngjin Park
{"title":"DUV mask writer addressable to 90nm nodes with a sustainability profile","authors":"R. Eklund, M. Wahlsten, M. Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, Youngjin Park","doi":"10.1117/12.2641791","DOIUrl":"https://doi.org/10.1117/12.2641791","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115427380","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Feasibility study of alternative multilayer for EUV mask","authors":"T. Umezawa, Y. Ikebe, Naoki Hayase, T. Onoue","doi":"10.1117/12.2644225","DOIUrl":"https://doi.org/10.1117/12.2644225","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"19 12","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"113935162","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Reticle qualification and re-qualification for EUV production today and in the future","authors":"Ming-Wu Li, Amo Chen, Vidyasagar Anantha, Ray Shi","doi":"10.1117/12.2650339","DOIUrl":"https://doi.org/10.1117/12.2650339","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125495432","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Christof Zillner, J. Jeřábek, A. Moqanaki, Harald Höller-Lugmayr, E. Platzgummer
{"title":"Progress of multi-beam curvilinear mask writing","authors":"Christof Zillner, J. Jeřábek, A. Moqanaki, Harald Höller-Lugmayr, E. Platzgummer","doi":"10.1117/12.2643253","DOIUrl":"https://doi.org/10.1117/12.2643253","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123065318","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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