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2017 Argentine Conference of Micro-Nanoelectronics, Technology and Applications (CAMTA)最新文献

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Setup and calibration of a particle detector based on charge coupled devices 基于电荷耦合装置的粒子探测器的建立与标定
Elodie Tiouchichine, M. S. Haro, X. Bertou, Horacio Amaldi, M. G. Berisso, J. Blostein, J. Tiffenberg, M. Pérez, Sergio Suárez, G. F. Moroni
Thick Charge Couple Devices have proven to be interesting particle detectors. The DAMIC and CONNIE collaborations are using this technology to search for the elastic scattering of a dark matter particle or a neutrino with a silicon nucleus, producing a nuclear recoil. The experiments reach unprecedented sensitivity at low energies (below 100 eV) by taking advantage of the low readout noise achieved by these devices. The present document describes an experimental setup at the Centra Atomico Bariloche, its noise treatment and its calibration.
厚电荷耦合器件已被证明是有趣的粒子探测器。DAMIC和CONNIE的合作项目正在使用这项技术来寻找暗物质粒子或带有硅核的中微子的弹性散射,从而产生核反冲。利用这些器件实现的低读出噪声,实验在低能量(低于100 eV)下达到前所未有的灵敏度。本文描述了巴里洛切原子中心的一个实验装置,它的噪声处理和校准。
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引用次数: 1
Charge trapping effects on Metal-Gate/High-k/III-V MOS devices assessed through C-V hysteresis 通过C-V迟滞评价金属栅/高k/III-V MOS器件的电荷俘获效应
S. Pazos, F. Aguirre, F. Palumbo
In this work, the differences in the trap-ping/detrapping characteristics of Metal-Gate/High-k/III-V MOS stacks is experimentally studied by means of the C-V Hysteresis and dynamic stress. Samples under study include the combination of n-InP and n-InGaAs substrates with HfO2 or Al2O3 dielectrics as gate oxides. This allows to assess the impact of both the substrate and the dielectric on the quality of the complete structure. Results show that Al2O3-based stacks exhibit lower overall trapped charge during hysteresis cycles than their HfO2 counterparts. Additionally, InP-based samples introduce a larger amount of defects above the fermi-level when compared to InGaAs samples for positive stress, but with negligible trapping effects when stressing towards inversion, which is a positive indicator in terms of reliability.
本文采用C-V迟滞和动应力的方法,实验研究了金属栅/高k/III-V MOS堆叠的陷阱/去陷特性的差异。所研究的样品包括n-InP和n-InGaAs衬底与HfO2或Al2O3介电体作为栅氧化物的组合。这样可以评估衬底和电介质对整个结构质量的影响。结果表明,与HfO2相比,al2o3基堆在迟滞循环中表现出更低的总捕获电荷。此外,与InGaAs样品相比,inp基样品在正应力下引入了更多的费米能级以上缺陷,但当应力向反转时,捕获效应可以忽略不计,这在可靠性方面是一个积极的指标。
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引用次数: 1
Programmable PLL-based frequency synthesizer: Modeling and design considerations 基于可编程锁相环的频率合成器:建模和设计考虑
R. S. Raphael, M. P. Agord, Leandro Tiago Manera, C. M. Chagas, S. Finco
This work summarizes the set of building and operating features for a third-order Charge Pump Phase-Locked Loop CP-PLL-based Frequency Synthesizer for clock generation. For implementation purpose, a derived architectural solution for N integer frequency division is proposed considering the particular design requirements in the PLL programmability. Additionally, from the set of reference design equations, a derived set of models are proposed for Low Pass Filter LPF design, considering the voltage controlled oscillator VCO input capacitance effects. From the PLL settings at simulation environment, circuit level results indicate a settling time TS < 2 μs, considering the divide ratio N variation (8–16).
本工作总结了用于时钟生成的三阶电荷泵锁相环基于cp - pll的频率合成器的构建和操作特征。为实现目的,考虑到锁相环可编程性的特殊设计要求,提出了N整数分频的派生体系结构解决方案。此外,在参考设计方程的基础上,考虑压控振荡器VCO输入电容的影响,提出了低通滤波器LPF设计的推导模型。从仿真环境下的锁相环设置来看,考虑分频比N的变化(8 ~ 16),电路电平的稳定时间TS < 2 μs。
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引用次数: 0
Design and characterization of a CMOS two-stage miller amplifier for ionizing radiation dosimetry 用于电离辐射剂量测定的CMOS两级米勒放大器的设计与表征
G. Salaya, M. Garcia-Inza, S. Carbonetto, A. Faigón
The offset of a Miller amplifier is mainly due to an imperfect matching between its inputs. When the input transistors are MOSFETs, the exposure to ionizing radiation affect the threshold voltage of both transistors. With proper polarization, the shift in the threshold voltage impoverishes the matching in the input, increasing the offset. Hence, measuring the change in the offset during irradiation, one can estimate the absorbed radiation dose. In this work, a theoretical analysis is presented in order to establish the effect of ionizing radiation on the different blocks of the Miller amplifier. The design of a Miller amplifier and its fabrication on an integrated circuit for testing is described. The design and assembly of a dedicated hardware and software for data acquisition is also described. First results on the fabricated dosimeter in a 0.6μm commercial CMOS technology show a sensitivity of 60 mV/Gy and a resolution of 4 cGy.
米勒放大器的失调主要是由于输入端不完全匹配造成的。当输入晶体管为mosfet时,电离辐射会影响两个晶体管的阈值电压。在适当的极化情况下,阈值电压的偏移会使输入中的匹配变得贫瘠,从而增加偏移量。因此,测量辐照期间偏移量的变化,就可以估计吸收的辐射剂量。本文从理论上分析了电离辐射对米勒放大器各模块的影响。介绍了一种米勒放大器的设计及其在测试用集成电路上的制作。还描述了用于数据采集的专用硬件和软件的设计和组装。该剂量计的灵敏度为60 mV/Gy,分辨率为4 cGy。
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引用次数: 3
Automatic ASET sensitivity evaluation of a custom-designed 180nm CMOS technology operational amplifier 定制设计的180nm CMOS技术运算放大器的自动ASET灵敏度评估
A. Fontana, S. Pazos, F. Aguirre, F. Palumbo
This work presents a SPICE-based automatic SET sensitivity evaluation of a 180nm CMOS full-custom Operational Amplifier. The set-up uses the well known double exponential current law to inject SET into every sensitive node in the circuit hierarchy. The pulse parameters are obtained according to a previously generated population of particles with randomly assigned energies and species, the node bias condition at the instant of the strike and an empirical model obtained through TCAD simulations. The circuit is evaluated transistor-wise for each ion of the generated database and the output waveforms are processed in time and frequency domain to obtain figures of merit of the hardness of the proposed design on a given radioactive environment. Results allow to identify the most sensitive devices and the expected error rate for the projected application, allowing to conduct hardening techniques during early design stages.
本文提出了一种基于spice的180nm CMOS全定制运算放大器的自动SET灵敏度评估方法。该装置采用了众所周知的双指数电流定律,将SET注入到电路层次中的每个敏感节点中。脉冲参数是根据预先生成的具有随机分配能量和种类的粒子群、撞击瞬间的节点偏置条件和通过TCAD模拟得到的经验模型得到的。对所生成的数据库中的每个离子进行晶体管评估,并对输出波形进行时域和频域处理,以在给定的放射性环境中获得所提出设计的硬度的优点数字。结果可以确定最敏感的设备和预期的错误率,允许在早期设计阶段进行强化技术。
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引用次数: 2
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2017 Argentine Conference of Micro-Nanoelectronics, Technology and Applications (CAMTA)
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