NZF ferrite thin films grown on Si (111) single crystal substrate were prepared using magnetron sputtering radio frequency at room temperature with a target of nominal composition Ni0.5Zn0.5Fe2O4. An examination of structural and Magnetic characteristics by annealing temperature was carried out through experiments at temperatures ranging from 700 to 900 °C on the deposited ferrite films. XRD as well as AFM and FE-SEM and VSM performed specific analyses to determine phase composition and surface topography along with the magnetic properties of NZF ferrite thin films. All synthesized Ni–Zn ferrite thin films established on Si substrates presented crystallite sizes within the range of 15–27 nm while maintaining a spinel structure. The films' crystallite size increased with elevated annealing temperature values. The atomic force microscopy assessment of annealed thin films occurred at a particular deposition height of 200 nm according to profilometry tests. Based on FE-SEM analysis the average grain sizes of NZF/Si nanoferrite thin films stood at 32.57 nm for 700 °C and were 35.92 nm at 800 °C and 40.46 nm at 900 °C. Room temperature magnetism evaluation of (NZF/Si) films indicated a positive correlation between the Ni–Zn film Ms values and grain dimensions. Annealed thin films with increasing grain sizes from 700 to 900 °C resulted in Ms values elevating from 42 to 58 and Hc values decreasing from 98 to 50 Oe. NZF-900 shows the best combination of high saturation ratio with narrow hysteresis loop, which confirms its superiority for high-frequency soft magnetic applications.
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