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Progress in Crystal Growth and Characterization最新文献

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A numerical description of the CdHgTe phase diagram Cd的数值描述HgTe相图
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90025-0
J.C. Brice

A set of preferred numerical relations describing the cadmium-mercury-tellurium phase diagram is presented in the form of equations and tabulated data.

以方程和数据表的形式给出了一组描述镉-汞-碲相图的优选数值关系。
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引用次数: 33
Crystal growth processes 晶体生长过程
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90021-3
Brian Pamplin
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引用次数: 0
A report on the eighth international conference on crystal growth 第八届晶体生长国际会议报告
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90027-4
Wang Hong, B.R. Pamplin
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引用次数: 0
Implanted silicon epitaxy by thermal and laser processing 热和激光加工植入硅外延
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90007-9
Salvatore Ugo Campisano
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引用次数: 0
Characterization and kinetics of AlxGa1−xAs by organometallic-CVD AlxGa1−xAs的有机金属- cvd表征及动力学
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90010-9
Hari Prakash

AlxGa1−xAs is an important III–V semiconductor for device applications in the optoelectronics field. Growth aspects, characterization and kinetics of AlxGa1−xAs by organometallic - CVD are reviewed. The review primarily covers the effect of growth parameters on material preparation and material quality, doping, electronic and optical properties, and applications to devices and associated problems with their performance. Current problems of PPC centers, D.X centers, and deep level characterization in relation to the basic chemistry of the material and implications on device performance are dealt with. Growth and characterizations of exotic multilayer structures (superlattices, cascades, multiple quantum well structures, etc.) are reported in terms of current specific problems. The future of crystal growth methods employing the organometallics is assessed in relation to the current and future technologies.

AlxGa1−xAs是光电子领域重要的III-V半导体器件。综述了有机金属气相沉积法制备AlxGa1−xAs的生长、表征和动力学。综述主要包括生长参数对材料制备和材料质量的影响,掺杂,电子和光学性质,以及在器件中的应用及其性能相关问题。目前PPC中心,D.X中心的问题,以及与材料的基本化学和设备性能的影响有关的深层次表征。根据当前的具体问题,报道了奇异多层结构(超晶格、级联、多量子阱结构等)的生长和表征。结合当前和未来的技术,对采用有机金属材料的晶体生长方法的未来进行了评估。
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引用次数: 1
X-ray topographic studies in the peoples Republic of China 中华人民共和国的x射线地形学研究
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90026-2
S.S. Hsu, B.K. Tanner

X-ray topographic studies of crystal perfection over the past two decades in the People's Republic of China are outlined. Those papers published in Chinese Journals and in the Chinese language are reviewed and a summary of instrumentation and research groups presently active is presented.

概述了过去二十年来中国晶体完美的x射线地形学研究。对发表在中文期刊和中文期刊上的论文进行了回顾,并对目前活跃的仪器和研究小组进行了总结。
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引用次数: 0
Magnetic properties of layer AB2X4 compounds AB2X4层化合物的磁性能
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90032-8
S. Viticoli

The magnetic properties of layer AB2X4 compounds, having a ZnIn2S4-type structure, are discussed considering them as possible models for two-dimensional magnetic systems. MnAL2S4, MnAL2Se4 and FeGa2S4 do not appear to be good model systems because the magnetic ions are distributed among tetrahedral as well as octahedral sites of the structure. Their magnetic properties are better understood in terms of short-range magnetic order arising from the presence of isolated clusters. The magnetic behaviour of Co .46Zn .54In2S4, crystallizing in space group R3m, can be explained in the same way.

Only in CrGa1.67S4 do the magnetic Cr3+ ions lie in a triangular planar lattice and, therefore, the magnetic properties are interpreted in terms of a 2-d magnetic system in the temperature range 80 ⩽ T ⩽ 300K.

讨论了具有znin2s4型结构的AB2X4层化合物的磁性能,认为它们可能是二维磁性体系的模型。MnAL2S4, MnAL2Se4和FeGa2S4似乎不是很好的模型体系,因为磁性离子分布在结构的四面体和八面体位点上。它们的磁性可以更好地理解为由于孤立团簇的存在而产生的短程磁序。在R3m空间群中结晶的Co .46 zn .54 in2s4的磁性行为可以用同样的方法来解释。只有在CrGa1.67S4中,磁性Cr3+离子位于三角形平面晶格中,因此,在温度范围80≤T≤300K时,磁性可以用二维磁性体系来解释。
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引用次数: 9
Gas source molecular beam epitaxy of InP, GaInAs and GaInAsP InP、GaInAs和GaInAsP的气源分子束外延
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90004-3
M.B. Panish
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引用次数: 29
Silicon molecular beam epitaxy 硅分子束外延
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90006-7
Yasuhiro Shiraki

Work on silicon molecular beam epitaxy (Si-MBE) is now growing on a worldwide scale and various aspects of this work are here reviewed. Basic studies on surface cleaning and defect evaluation have been conducted to improve epitaxy and homoepitaxy and doping have been certified to be comparable or exceed those of conventional CVB epitaxial layers. Formation of doping superlattices is a prime example demonstrating the potential of Si-MBE over conventional growth techniques. Heteroepitaxy including combinations such as silicon/insulator and silicon/metal (silicide) has become an active and growing field for both basic research and device development.

硅分子束外延(Si-MBE)的研究正在世界范围内蓬勃发展,本文综述了硅分子束外延研究的各个方面。为了提高外延性能,已经进行了表面清洗和缺陷评价的基础研究,并且已经证明同外延和掺杂可以与传统的CVB外延层相媲美或超过。掺杂超晶格的形成是证明Si-MBE优于传统生长技术的潜力的一个主要例子。包括硅/绝缘体和硅/金属(硅化物)组合在内的异质外延已经成为基础研究和器件开发的一个活跃和不断发展的领域。
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引用次数: 0
MOCVD AlxGa1−xAs solar cells MOCVD AlxGa1−xAs太阳能电池
Pub Date : 1986-01-01 DOI: 10.1016/0146-3535(86)90011-0
Hari Prakash

MOCVD AlxGa1−xAs solar cells are reviewed. A summary status report of the past three year's research is presented. Status of the MOCVD crystal growth technology in relation to the optimization of the AlxGa1−xAs solar cells is assessed. Device characteristics, their structural and material parameters and problems are given. Directions for future research for improving the conversion efficiencies of these solar cells in terms of the material quality improvement and the structural innovation are given.

本文综述了MOCVD AlxGa1−xAs太阳能电池。对近三年的研究现状作了总结报告。评价了MOCVD晶体生长技术在优化AlxGa1−xAs太阳能电池中的应用现状。给出了器件的特点、结构参数和材料参数以及存在的问题。从材料质量改进和结构创新两方面提出了今后提高太阳能电池转换效率的研究方向。
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引用次数: 1
期刊
Progress in Crystal Growth and Characterization
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