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A Simulation study of 6.5kV Gate Controlled Diode 6.5kV门控二极管的仿真研究
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.009
Gurunath Vishwamitra Yoganath, Quang Tien Tran, Hans Ecke
Gate Controlled Diode (GCD) with micro-pattern trench structure, allows charge carrier modulation at the anode region by gate control. This is utilized to operate the diode at low saturation mode and desaturate the diode before IGBT turn-on, to achieve a better trade-off. The paper demonstrates the concept of a silicon bi-polar power diode with micro-pattern trench gate, for 6.5 kV applications. Thereby, a detailed study of switching behaviour and the switching pattern were conducted, so as to reduce the overall switching loss and improve the efficiency. The efficiency also depends on the robustness of the diode, several issues concerning the reverse recovery robustness of the Gate controlled diode were investigated.
栅极控制二极管(GCD)具有微模式沟槽结构,可以通过栅极控制在阳极区域进行电荷载流子调制。这用于在低饱和模式下操作二极管,并在IGBT导通之前使二极管去饱和,以实现更好的权衡。本文介绍了一种用于6.5 kV应用的硅双极微图样沟槽栅极功率二极管的概念。因此,对开关行为和开关模式进行了详细的研究,从而降低了整体开关损耗,提高了效率。效率的提高还取决于二极管的鲁棒性,本文研究了有关门控二极管反向恢复鲁棒性的几个问题。
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引用次数: 0
Experimental Comparison of a New SAG-IGBT and Conventional DAG-IGBT Structures with LTO Design in terms of Turn-on Performance 基于LTO设计的新型SAG-IGBT和传统DAG-IGBT结构在导通性能方面的实验比较
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.005
S. T. Kong, L. Ngwendson
In this paper, we compare a new Single Active Gate Trench IGBT(SAG-IGBT) with the conventional Double Active Trench Gate IGBT (DAG-IGBT) structures with the LTO (LOCOS Trench Oxide) technology. Both structures have been fabricated with the same design rules and process platform and test chips compared in terms of their Eon performance. The new proposed SAG-IGBT is created by connected one of the active trench to emitter potential which effectively halves the gate capacitance C GE and C GD . It is also shown that the proposed SAG-IGBT can achieve a further 50% reduction in Q GC than the conventional device due to only one trench being used for MOS channel conduction per unit cell. In addition it is shown that the SAG design can improve turn-on energy loss, E ON, by up to 25% for identical Vce(on), with no degradation in the SCSOA.
在本文中,我们比较了一种新的单有源栅极IGBT(SAG-IGBT)和传统的双有源栅极IGBT(DAG-IGBT)结构与LTO (LOCOS沟槽氧化物)技术。这两种结构都采用相同的设计规则、工艺平台和测试芯片,比较了它们的Eon性能。新提出的sagg - igbt是通过将一个有源沟槽连接到发射极电位而产生的,有效地将栅极电容cge和cgd减半。研究还表明,由于每个单元电池只使用一个沟槽进行MOS通道传导,因此所提出的SAG-IGBT可以比传统器件进一步减少50%的Q GC。此外,研究表明,对于相同的Vce(ON), SAG设计可以将开启能量损失(E ON)提高25%,而在SCSOA中没有下降。
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引用次数: 0
Power device solutions for highly efficient power supplies 用于高效电源的电源器件解决方案
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.008
R. Siemieniec, René Mente, M. Kutschak, F. Pulsinelli
Switched mode power supplies (SMPS) for target applications covering a wide range from telecom rectifiers through servers to solar inverters or electric vehicle chargers share the need for high efficiencies in order to minimize the overall energy consumption and the total cost of ownership. With the appearance of wide bandgap semiconductors designers cannot only choose between different devices but also may benefit from using advanced topologies. This work compares important properties of a CoolSiC ™ Silicon-Carbide MOSFET, a CoolGaN ™ E-mode GaN power transistor, a TRENCHSTOP 5 ™ IGBT accompanied by a SiC Schottky diode and a CoolMOS ™ Superjunction (SJ) device, and discusses an approach to avoid the limitations of SJ devices with respect to hard commutation of the body diode and evaluates the achievable efficiency in the AC-DC conversion stage of a power supply.
切换模式电源(SMPS)的目标应用范围广泛,从电信整流器到服务器,再到太阳能逆变器或电动汽车充电器,都需要高效率,以最大限度地降低总体能耗和总拥有成本。随着宽禁带半导体的出现,设计人员不仅可以在不同的器件之间进行选择,而且可以从使用先进的拓扑结构中受益。本研究比较了CoolSiC™碳化硅MOSFET、CoolGaN™E-mode GaN功率晶体管、TRENCHSTOP 5™IGBT(含SiC肖特基二极管)和CoolMOS™Superjunction (SJ)器件的重要特性,并讨论了避免SJ器件在体二极管硬换流方面的限制的方法,并评估了电源AC-DC转换阶段可实现的效率。
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引用次数: 0
Measuring Transient I/V Turn-On Behavior of a Power MOSFET without a Current Sensor 测量无电流传感器功率MOSFET的瞬态I/V导通行为
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.020
Dennis Helmut, G. Groos, G. Wachutka, G. Schrag
Double pulse test (DPT) is usually used to characterize and verify turn-on/turn-off operation of power switches. Yet, new high frequency switching devices based on SiC and GaN technologies require much more elaborate DPT circuitry and sensing nodes compared to the established Si devices. Especially, suitable current sensors are challenging to realize and always limit the bandwidth. We propose a Transmission Line Pulsing (TLP)-based technique, which we call sensor gap TLP (sgTLP) and which is capable to monitor the transient currents and voltages during the turn-on sequence of a power MOSFET, without the need of a current sensor. The proposed sgTLP approach is compared to established TLP methods in two applications: the passive switching of a fast transient voltage suppression diode and the active switching of a Si power MOSFET. The novel sgTLP shows the same or better characteristics than both of the standard methods, but needs only one measurement, where standard TLP would need two separate methods. Especially, sgTLP detected rise times of 54 ps of a current and 52 ps of a voltage signal using a pulse duration of 100 ns. The measured characteristics of the MOSFET turnon reveals several inductive and capacitive coupling mechanisms that are not analyzable by the established TLP methods but become visible applying sgTLP.
双脉冲测试(DPT)通常用于表征和验证电源开关的开/关断操作。然而,与现有的Si器件相比,基于SiC和GaN技术的新型高频开关器件需要更复杂的DPT电路和传感节点。特别是合适的电流传感器的实现具有挑战性,并且总是限制带宽。我们提出了一种基于传输线脉冲(TLP)的技术,我们称之为传感器间隙TLP (sgTLP),它能够监测功率MOSFET导通序列期间的瞬态电流和电压,而不需要电流传感器。在快速瞬态电压抑制二极管的无源开关和硅功率MOSFET的有源开关两种应用中,将所提出的sgTLP方法与已有的TLP方法进行了比较。新型的sgTLP与两种标准方法具有相同或更好的特性,但只需要一次测量,而标准TLP需要两个单独的方法。特别是,sgTLP在脉冲持续时间为100 ns的情况下检测到54 ps的电流上升时间和52 ps的电压信号。MOSFET开关的测量特性揭示了几种电感和电容耦合机制,这些机制无法通过现有的TLP方法分析,但可以通过sgTLP看到。
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引用次数: 0
Key criteria for the short-circuit capability of IGBTs igbt短路能力的关键标准
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.001
V. V. Treek, H. Schulze, R. Baburske, F. Hille, F. Niedernostheide, F. Pfirsch
Short-circuit behavior and capability are investigated and optimized during IGBT development. Thereby, knowledge about destruction and high-frequency short-circuit oscillation mechanisms is needed. For the thermal destruction mechanism, filaments are formed shortly before destruction during the thermal runaway itself, whereas for the electrical destruction mechanism strong current filaments are formed by an electrical mechanism, before the self-heating in the filaments leads to a thermal runaway. At low collector-emitter voltages, weak non-destructive filaments exist for a large current range. For both the filament formation and short-circuit oscillations (SCOs), an electric-field peak in the field-stop layer and a quasi-plasma layer beneath the MOS cells are mandatory. For SCOs, which are caused by a periodic storage and release of charge carriers inside the device, additionally, a weak electrical field at the beginning of the drift zone is necessary. Weak, non-destructive filaments and SCOs are likely to occur simultaneously. An increase of the bipolar current gain reduces the operating area with SCOs and increases the electrical short-circuit capability. A simultaneous reduction of the thermal short-circuit robustness can be avoided by advanced p-emitter concepts or (over-)compensated by an improved thermal setup.
在IGBT开发过程中,对短路行为和短路性能进行了研究和优化。因此,需要了解破坏和高频短路振荡机制。对于热破坏机制,在热失控过程中,在破坏前不久形成细丝,而对于电破坏机制,在细丝自热导致热失控之前,由电机制形成强电流细丝。在低集电极-发射极电压下,在大电流范围内存在弱的非破坏性细丝。对于灯丝的形成和短路振荡(SCOs),在MOS电池下的场停止层和准等离子体层的电场峰值是必需的。另外,对于由器件内部电荷载流子的周期性存储和释放引起的SCOs,在漂移区开始处需要一个弱电场。弱的、非破坏性的细丝和sco可能同时发生。双极电流增益的增加减少了sco的工作面积,并增加了电气短路能力。热短路鲁棒性的同时降低可以通过先进的p-发射极概念来避免,或者通过改进的热设置来(过度)补偿。
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引用次数: 0
Fast Short Circuit Type I Detection Method based on VGE-Monitoring 基于vge监测的快速短路I型检测方法
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.018
C. Herrmann, X. Liu, J. Lutz, T. Basler
In this paper, a Short Circuit type I detection method based on the monitoring of the gate voltage is investigated. The proposed detection principle relies on an existing method, which was realized as an integrated solution before. A modified discrete circuit solution is introduced, developed and tested. Moreover, measurements and investigations on different packaging concepts and test conditions are performed. The overview of the functionality, reliability, and restraints of this method, as well as aspects of a supposed dynamic self-adaption feature, are discussed.
本文研究了一种基于栅极电压监测的I型短路检测方法。本文提出的检测原理依赖于一种现有的方法,该方法以前是作为一个集成的解决方案实现的。介绍、开发并测试了一种改进的离散电路解决方案。此外,对不同的包装概念和测试条件进行了测量和调查。概述了该方法的功能、可靠性和限制,以及假想的动态自适应特征。
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引用次数: 0
Structure-Aware Compact Thermal Models of Power LEDs 结构敏感型功率led紧凑型热模型
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.022
K. Kuzniak, K. Szymanska, Ł. Starzak, M. Janicki
This paper based on the example of white power LEDs illustrates the methodology for the generation of device compact thermal models, whose element values can be assigned physical meaning. The diode thermal behaviour was studied both with the forced water cooling and with the natural convection air cooling. Moreover, owing to the fact that the investigated devices had an electrically isolated thermal pad, the measurements were carried out with the thermal pad properly soldered and with the pad left unconnected, what facilitated the identification of particular sections in the heat flow path. All the measurements of device heating or cooling curves were taken according to the JEDEC standards. The determination of the optical power allowed the computation of the real heating power, which was used then as the input quantity for thermal computations and analyses presented in this paper. Based on the measurement results, thermal structure functions and time constant spectra were computed using the Network Identification by Deconvolution method. The compact thermal models of the investigated LEDs were derived based on the time constant spectra. Owing to the proposed methodology, it was possible to attribute physical meaning to model element values. The accuracy of generated compact models was validated by comparing the simulated heating curves with the measured ones. Although the compact models for the investigated cases consisted only of four RC stages, they provided excellent simulation accuracy with errors below 4% of the maximum temperature rise value.
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引用次数: 0
High-Voltage IGBT turn-off at transition from overcurrent to desaturation 从过流到去饱和过渡时的高压IGBT关断
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.006
Weinan Chen, Chaozheng Qin, J. Lutz, T. Basler
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引用次数: 0
Degradation of Power SiC MOSFET under Repetitive UIS and Short Circuit Stress 功率SiC MOSFET在重复UIS和短路应力下的退化
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.010
J. Marek, J. Kozarik, A. Chvála, M. Minárik, L. Stuchlíková
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引用次数: 0
The influence of electrical stress on the distribution of electrically active defects in IGBT 电应力对IGBT中电活性缺陷分布的影响
Pub Date : 1900-01-01 DOI: 10.14311/isps.2021.013
J. Drobný, J. Marek, A. Chvála, J. Faraga, J. Jagelka, L. Stuchlíková
This paper highlights electrically active defects investigation of the sixth generation 1200 V trench stop silicon-based Insulated Gate Bipolar Transistors by Deep Level Transient Fourier Spectroscopy. The focus is on the impact of electrical stress on defects distribution in the studied structures. Five electronlike deep energy levels ET1 (0.126 eV), ET2 (0.188 eV), ET3 (0.322 eV), ET4 (0.405 eV), and ET5 (0.514 eV), and nine hole-like deep energy levels HT1 (0.187 eV), HT2 (0.231 eV), HT3 (0.246 eV), HT4 (0.301 eV), HT5 (0.319 eV), HT6 (0.327 eV), HT7 (0.529 eV), HT8 (0.534 eV), and HT9 (0.750 eV) were identified. The presence of unintentional impurities like zinc, platinum, gold, etc. and emissions from structural imperfections was confirmed. A significant increase of the defect concentration after electrical stress in the temperature range of 120 to 225 K has been detected. Electrical stress did not affect the defect concentration above temperature 300 K.
利用深能级瞬态傅立叶光谱研究了第六代1200v沟槽硅基绝缘栅双极晶体管的电活性缺陷。重点研究了电应力对所研究结构中缺陷分布的影响。鉴定出5个类电子深能级ET1 (0.126 eV)、ET2 (0.188 eV)、ET3 (0.322 eV)、ET4 (0.405 eV)和ET5 (0.514 eV),以及9个类空穴深能级HT1 (0.187 eV)、HT2 (0.231 eV)、HT3 (0.246 eV)、HT4 (0.301 eV)、HT5 (0.319 eV)、HT6 (0.327 eV)、HT7 (0.529 eV)、HT8 (0.534 eV)和HT9 (0.750 eV)。锌、铂、金等非故意杂质的存在以及结构缺陷的排放得到了证实。在120 ~ 225 K的温度范围内进行应力处理后,缺陷浓度显著增加。在300 K以上,应力对缺陷浓度没有影响。
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引用次数: 0
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ISPS'21 Proceedings
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