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2014 International Workshop on Computational Electronics (IWCE)最新文献

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Valley splitting and spin lifetime enhancement in strained thin silicon films 应变硅薄膜的谷分裂和自旋寿命增强
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865824
D. Osintsev, V. Sverdlov, N. Neophytou, S. Selberherr
Spintronics attracts much attention because of the potential to build novel spin-based devices which are superior to nowadays charge-based microelectronic devices. Silicon, the main element of microelectronics, is promising for spin-driven applications. We investigate the surface roughness and electron-phonon limited spin relaxation in silicon films taking into account the coupling between the relevant valleys through the Γ-point. We demonstrate that applying uniaxial stress along the [110] direction considerably suppresses the spin relaxation.
自旋电子学由于有可能制造出优于目前基于电荷的微电子器件的新型自旋器件而受到广泛关注。硅,微电子学的主要元素,在自旋驱动应用方面很有前景。考虑到相关山谷之间通过Γ-point的耦合,我们研究了硅薄膜的表面粗糙度和电子-声子有限自旋弛豫。我们证明沿[110]方向施加单轴应力可显著抑制自旋弛豫。
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引用次数: 5
Plasmon excitation of coherent interface phonons in Si-SiO2 systems Si-SiO2体系中相干界面声子的等离子激元激发
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865856
M. Choi, N. Zhang, M. Dutta, M. Stroscio, Carlos O. Aspetti, R. Agarwal
Coherent interface phonon generation by surface plasmon in silver-SiO2-silicon system is analyzed, based on the impulsive stimulated scattering theory model. The surface plasmon is first analyzed, and applied to semiclassical stimulated Raman scattering theory. Our calculatation shows that the photon-induced surface plasmons store about 20-30% of the total incoming energy, and it is considered in the analysis. Phonon potential of the generated phonons is also calculated.
基于脉冲受激散射理论模型,分析了银- sio2 -硅体系中表面等离子体产生的相干界面声子。首先分析了表面等离子体,并将其应用于半经典受激拉曼散射理论。我们的计算表明,光子诱导的表面等离子体存储了大约20-30%的总入射能量,并在分析中考虑了这一点。并计算了所产生声子的声子势。
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引用次数: 1
Band-to-band tunneling in 3D devices 三维设备中的带对带隧道
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865810
Lidija Filipović, O. Baumgartner, Z. Stanojević, H. Kosina
This work focuses on studying band-to-band tunneling in 3D devices, while considering variations in material properties (mass, doping), applied bias, or geometry. A simulation study of cylindrical nanowires, tapered structures and doping concentration variation demonstrates the importance of 3D effects in band-to-band tunneling current computation.
这项工作的重点是研究3D器件中的带对带隧道,同时考虑材料性质(质量,掺杂),应用偏压或几何形状的变化。通过对圆柱形纳米线、锥形结构和掺杂浓度变化的模拟研究,证明了三维效应在带间隧道电流计算中的重要性。
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引用次数: 0
Vertical diodes response to optical and electrical THz excitations 垂直二极管对光学和电太赫兹激励的响应
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865858
S. Karishy, J. Ajaka, C. Palermo, L. Varani
We use a hydrodynamic model self-consistently coupled to a 1D Poisson solver to simulate the excitation by optical beating as well as by electrical perturbation of plasma waves in n+nn+ InGaAs diodes at room temperature. We calculate the electric field response and the velocity response of the carriers in the middle of the diode regions. Our results show clearly the presence of three-dimensional plasma resonances in the terahertz frequency domain for the two region types (n and n+). The investigation is completed by calculating the local differential mobility.
我们使用自一致耦合一维泊松求解器的流体动力学模型来模拟室温下n+nn+ InGaAs二极管中等离子体波的光加热和电扰动的激发。我们计算了二极管区域中间载流子的电场响应和速度响应。我们的结果清楚地显示了两种区域类型(n和n+)在太赫兹频率域中三维等离子体共振的存在。通过计算局部微分迁移率完成了研究。
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引用次数: 1
Noise features in InP crystals operating under static, periodic or fluctuating electric fields 在静态、周期或波动电场下工作的InP晶体的噪声特征
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865872
D. P. Adorno, P. Alaimo, N. Pizzolato, B. Spagnolo
The results of a study concerning the intrinsic noise in low-doped n-type InP crystals operating under static, periodic or fluctuating electric fields are shown. To simulate the dynamics of electrons in the bulk, we employ a Monte Carlo approach, by taking into account the main details of band structure, scattering processes, as well as heating effects. The noise features are investigated by computing the velocity fluctuations correlation function, its spectral density and the total noise power, for different values of amplitude and frequency of the driving field. We show how the noise spectra are affected by the electric field frequency and compare their peculiarities with those exhibited in the static field case. Preliminary findings obtained in InP crystals driven by an electric field fluctuating for the superimposition of a correlated noise source are discussed and compared with those previously obtained in GaAs bulks. Our results confirm that the diffusion noise in low-doped semiconductors can be reduced by the addition of a fluctuating component to the driving electric field and that this effect critically depends on the characteristic times of the external noise.
本文给出了在静态、周期或波动电场下工作的低掺杂n型InP晶体的本征噪声的研究结果。为了模拟体中电子的动力学,我们采用蒙特卡罗方法,考虑了能带结构、散射过程以及加热效应的主要细节。通过计算速度波动相关函数、谱密度和总噪声功率,研究了驱动场在不同幅值和频率下的噪声特征。我们展示了噪声谱如何受到电场频率的影响,并将它们的特性与静态场情况下的特性进行了比较。讨论了在电场波动驱动下叠加相关噪声源的InP晶体中获得的初步结果,并与先前在GaAs体中获得的结果进行了比较。我们的研究结果证实,低掺杂半导体中的扩散噪声可以通过在驱动电场中添加波动分量来降低,并且这种效果严重依赖于外部噪声的特征时间。
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引用次数: 0
Ab initio study of dipole-induced threshold voltage shift in HfO2/Al2O3/(100)Si HfO2/Al2O3/(100)Si中偶极感应阈值电压偏移的从头算研究
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865828
E. Chen, Yen-Tien Tung, Z. Xiao, T. Shen, Jeff Wu, Carlos H. Díaz
The ab initio work quantitatively explains the physical mechanism of threshold voltage shifts in n-type and p-type metal-oxide-semiconductor field-effect transistors with HfO2/Al2O3 gate stack. In the study, the θ phase alumina has been chosen for better lattice matching of the (100) HfO2 and (100) Si substrate. Using dipole correction method, the dominant dipole moment responsible for the threshold voltage shift has been identified at the interface of HfO2/Al2O3. Our HfO2/Al2O3 atomic model shows the dipole moment decreases almost linearly as the alumina thickness decreases from four monolayers (13 Å) to one monolayer (3 Å). On account of the effects of capacitance and the dipole moment, our ab initio calculation quantitatively explains the trend and sensitivity of experimental threshold voltage shifts on n- and p-MOSFET's.
从头算定量地解释了HfO2/Al2O3栅极叠加的n型和p型金属氧化物半导体场效应晶体管阈值电压漂移的物理机制。在研究中,选择θ相氧化铝可以更好地实现(100)HfO2和(100)Si衬底的晶格匹配。利用偶极修正法,确定了HfO2/Al2O3界面上引起阈值电压偏移的主导偶极矩。我们的HfO2/Al2O3原子模型显示,随着氧化铝厚度从4层单层(13 Å)减少到1层单层(3 Å),偶极矩几乎呈线性减少。考虑到电容和偶极矩的影响,我们的从头计算定量地解释了实验阈值电压漂移对n-和p-MOSFET的趋势和灵敏度。
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引用次数: 2
Enhanced signal-to-noise in photodetectors due to interface phonon-assisted transitions 由于界面声子辅助跃迁而增强的光电探测器的信噪比
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865857
Yi Lan, N. Zhang, J. Shi, M. Dutta, M. Stroscio
Herein, we consider examine the possibility of photodetectors with reduced signal-to-noise based on a three quantum well structure with one single well and one double well. This structure facilitates photon detection through the following sequence of events: photon absorption, phonon emission, and then photon absorb of a photon having the same wavelength as the first one. Even though this design two photons a phonon-assisted transition, it is demonstrated that greatly enhance signal-to-noise is obtained.
在此,我们考虑研究基于一个单井和一个双井的三量子阱结构的光电探测器的降低信噪比的可能性。这种结构通过以下一系列事件促进光子探测:光子吸收,声子发射,然后光子吸收与第一个波长相同的光子。尽管这种设计使两个光子进行声子辅助跃迁,但证明大大提高了信噪比。
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引用次数: 2
A 5th-order method for 1D-device solution 一维器件解的五阶方法
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865849
F. Buscemi, M. Rudan, E. Piccinini, R. Brunetti
The so-called Numerov process provides a three-point interpolation with an ~η5 accuracy in grid's size η, much better than the standard finite-difference scheme that keeps the ~η2 terms. Such a substantial improvement is achieved with a negligible increase in computational cost. As the method is applicable to second-order differential equations in one dimension, it is an ideal tool for solving, e.g., the Poisson and Schrödinger equations in ballistic electron devices, where the longitudinal (that is, along the channel) problem is typically separated from the lateral one and solved over a uniform grid. Despite its advantage, the Numerov process has found limited applications, due to the difficulty of keeping the same precision in the boundary conditions. A method to work out the boundary conditions consistently with the rest of the scheme is presented, and applications are shown.
所谓的Numerov过程提供了一个在网格尺寸η上具有~η5精度的三点插值,比保持~η2项的标准有限差分格式要好得多。这种实质性的改进是在计算成本几乎可以忽略不计的情况下实现的。由于该方法适用于一维的二阶微分方程,因此它是求解泊松方程和Schrödinger方程等弹道电子器件中的理想工具,其中纵向(即沿通道)问题通常与横向问题分开,并在均匀网格上求解。尽管有其优点,但由于难以在边界条件下保持相同的精度,Numerov过程的应用受到限制。给出了一种计算边界条件与方案其余部分一致的方法,并给出了应用实例。
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引用次数: 2
Classical and quantum spreading of a charge pulse 电荷脉冲的经典和量子扩散
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865808
B. Gaury, J. Weston, C. Groth, X. Waintal
With the technical progress of radio-frequency setups, high frequency quantum transport experiments have moved from theory to the lab. So far the standard theoretical approach used to treat such problems numerically - known as Keldysh or NEGF (Non Equilibrium Green's Functions) formalism - has not been very successful mainly because of a prohibitive computational cost. We propose a reformulation of the non-equilibrium Green's function technique in terms of the electronic wave functions of the system in an energy-time representation. The numerical algorithm we obtain scales now linearly with the simulated time and the volume of the system, and makes simulation of systems with 105-106 atoms/sites feasible. We illustrate our method with the propagation and spreading of a charge pulse in the quantum Hall regime. We identify a classical and a quantum regime for the spreading, depending on the number of particles contained in the pulse. This numerical experiment is the condensed matter analogue to the spreading of a Gaussian wavepacket discussed in quantum mechanics textbooks.
随着射频装置的技术进步,高频量子输运实验已经从理论走向了实验室。到目前为止,用于处理这类问题的标准理论方法——被称为Keldysh或NEGF(非平衡格林函数)形式主义——并不是很成功,主要是因为计算成本过高。我们提出了非平衡格林函数技术在系统的能量-时间表示的电子波函数方面的一个重新表述。我们得到的数值算法现在与模拟时间和系统体积成线性关系,使模拟105-106个原子/位的系统成为可能。我们用电荷脉冲在量子霍尔域中的传播和扩散来说明我们的方法。根据脉冲中包含的粒子数量,我们确定了扩散的经典和量子状态。这个数值实验是量子力学教科书中讨论的高斯波包扩散的凝聚态模拟。
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引用次数: 0
Phonon-induced quantum diffusion in semiconductors 半导体声子诱导的量子扩散
Pub Date : 2014-06-03 DOI: 10.1109/IWCE.2014.6865847
R. Rosati, F. Rossi
Starting from a density-matrix treatment of carrier-phonon interaction based on a recent reformulation of the Markov limit, we provide a detailed investigation of phonon-induced quantum diffusion in semiconductor nanostructures. In particular, as for the case of carrier-carrier relaxation in photoex-cited semiconductors, our analysis shows the failure of simplified dephasing models in describing phonon-induced scattering non-locality, pointing out that such limitation is particularly severe for the case of quasielastic dissipation processes.
从基于最近马尔科夫极限的载流子-声子相互作用的密度-矩阵处理开始,我们提供了半导体纳米结构中声子诱导量子扩散的详细研究。特别是,对于光激半导体中的载流子-载流子弛豫,我们的分析表明,简化的消相模型在描述声子诱导的非局域散射时是失败的,并指出这种限制对于准弹性耗散过程尤其严重。
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引用次数: 2
期刊
2014 International Workshop on Computational Electronics (IWCE)
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