To address the challenge of achieving surface uniformity in microcrystalline glass magnetorheological polishing (MRP), this study proposes a method for predicting and evaluating surface uniformity based on the motion trajectories of abrasive particles. First, a mathematical model of abrasive particle trajectories was established based on kinematic principles. COMSOL magnetic field simulations defined the physical boundaries of the effective polishing zone under Halbach ring arrays. The coefficient of variation (Cv) of particle trajectory density was innovatively introduced as a new metric for quantifying trajectory uniformity. Second, the numerical simulation system reveals the influence mechanisms of three key process parameters-workpiece speed, polishing disc speed, and eccentricity-on surface uniformity: increasing workpiece speed extends the abrasive particle trajectory path but tends to cause trajectories to cluster toward the workpiece center; polishing disc speed significantly affects trajectory overlap rate and distribution range; reducing eccentricity promotes dense abrasive particle distribution in the workpiece center region, thereby enhancing overall uniformity. Through systematic optimization, the study identified the optimal parameter combination: workpiece speed of 700 r/min, polishing disc speed of 60 r/min, and eccentricity of 28.6 mm. At these settings, the simulated Cv value was minimized, and the abrasive particle trajectory distribution was most uniform. Experimental validation demonstrated that under different process parameters, the trends in the coefficient of variation (Cv) of workpiece surface roughness and surface light transmittance closely matched the simulated Cv trends, confirming the validity of the established model and simulation experiments.
扫码关注我们
求助内容:
应助结果提醒方式:
