Pub Date : 1983-01-01DOI: 10.1016/0026-2714(83)90437-7
J. Buono, A. Wisniewski, W. S. Andrus
{"title":"Surface science analysis techniques","authors":"J. Buono, A. Wisniewski, W. S. Andrus","doi":"10.1016/0026-2714(83)90437-7","DOIUrl":"https://doi.org/10.1016/0026-2714(83)90437-7","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"25 1","pages":"95-101"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(83)90437-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53718833","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(83)91482-8
C. Ting, A. Neureuther
{"title":"Applications of profile simulation for thin film deposition and etching processes","authors":"C. Ting, A. Neureuther","doi":"10.1016/0026-2714(83)91482-8","DOIUrl":"https://doi.org/10.1016/0026-2714(83)91482-8","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"25 1","pages":"115-123"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(83)91482-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53719396","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90834-5
W. Beinvogl, B. Hasler
{"title":"Reactive ion etching of polysilicon and tantalum silicide.","authors":"W. Beinvogl, B. Hasler","doi":"10.1016/0026-2714(84)90834-5","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90834-5","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"26 1","pages":"125-130"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90834-5","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53721615","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90362-7
M. Nicolet, I. Suni, M. Finetti
{"title":"Amorphous metallic alloys in semiconductor contact metallizations","authors":"M. Nicolet, I. Suni, M. Finetti","doi":"10.1016/0026-2714(84)90362-7","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90362-7","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"26 1","pages":"129-133"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90362-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53720295","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90332-9
D. Summers
{"title":"A process for two-layer gold IC metallization","authors":"D. Summers","doi":"10.1016/0026-2714(84)90332-9","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90332-9","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"26 1","pages":"137-141"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90332-9","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53720566","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90434-7
A. Nagy
{"title":"High-speed reactive ion etching of silicon by the application of a confined DC bias","authors":"A. Nagy","doi":"10.1016/0026-2714(84)90434-7","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90434-7","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"26 1","pages":"173-178"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90434-7","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53720815","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90438-4
G. Eggermont, R. Falster, S. Hahn
{"title":"Laser induced backside damage gettering","authors":"G. Eggermont, R. Falster, S. Hahn","doi":"10.1016/0026-2714(84)90438-4","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90438-4","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"46 1","pages":"171-178"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90438-4","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53720947","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90439-6
J. Cheng, G. Tripp
{"title":"A new ion dose uniformity measurement technique","authors":"J. Cheng, G. Tripp","doi":"10.1016/0026-2714(84)90439-6","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90439-6","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"26 1","pages":"143-152"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90439-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53721005","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90563-8
K. Harris, P. Sandland, R. M. Singleton
{"title":"Wafer inspection automation: current and future needs","authors":"K. Harris, P. Sandland, R. M. Singleton","doi":"10.1016/0026-2714(84)90563-8","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90563-8","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"26 1","pages":"199-205"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90563-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53721106","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1983-01-01DOI: 10.1016/0026-2714(84)90603-6
P. Stallhofer, D. Huber
{"title":"Oxygen and carbon measurements on silicon slices by the IR method","authors":"P. Stallhofer, D. Huber","doi":"10.1016/0026-2714(84)90603-6","DOIUrl":"https://doi.org/10.1016/0026-2714(84)90603-6","url":null,"abstract":"","PeriodicalId":21779,"journal":{"name":"Solid State Technology","volume":"26 1","pages":"233-237"},"PeriodicalIF":0.0,"publicationDate":"1983-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0026-2714(84)90603-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"53721496","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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