Pub Date : 2011-07-08DOI: 10.1109/STYSW.2011.6155856
K. Rola, I. Zubel
Fabrication of micromirrors inclined at 45° towards substrate is studied in this paper. The micromirrors are fabricated by anisotropic etching of monocrystalline silicon in KOH aqueous solutions saturated with different alcohols. The micromirror is formed by {110} sidewall inclined at 45° towards {100} substrate. The influence of propyl and butyl alcohols on etching anisotropy and surface morphology of micromirror structures is investigated. The impact of KOH concentration on micromirrors' parameters is also examined. The results show that the best etching anisotropy is achieved in the solutions with isopropanol and tert-butanol, and at the low concentration of KOH. Although the {110} mirror planes are patterned with stripes in the case of all considered etching solutions, the surface morphology of the {100} substrate is different for different alcohol additives. Contrary to propyl alcohols, the {100} surfaces etched in the solutions with butyl alcohols are densely covered with pyramidal structures (called hillocks). The angle of the micromirror inclination towards the substrate is evaluated by microscopic measurements and compared with the results reported in the literature.
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Pub Date : 2011-07-08DOI: 10.1109/STYSW.2011.6155861
P. Winiarski, A. Dziedzic
Long-term stability of embedded passives is very important issue. To determine this matter an aging process can be used, where test samples are exposed to environmental conditions. Objective of this research was analyzing reliability of thin-film resistors based on Ohmega-Ply® technology. Resistive material was a nickel-phosphorus (Ni-P) alloy (with sheet resistance 25 ¿/sq or 100 ¿/sq) on FR-4 substrate. A number of variables were considered in this study (sheet resistance, geometry of resistor, type of cladding, laser trimming, pulse stress and environmental conditions). Two different accelerated ageing processes ¿ Ex-Situ (samples exposed to elevated temperature and/or relative humidity but resistance measurements made at room temperature) and In-Situ (resistance of test samples performed directly at the ageing conditions) were carried out to perform long-term behavior analysis. The results revealed a significant influence of thickness of resistor, type of cladding and temperature on stability of investigated structures. Signification of other factors was negligible.
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Pub Date : 2011-07-08DOI: 10.1109/STYSW.2011.6155839
J. Gryglewicz, W. Oleszkiewicz, R. Paszkiewicz
In this study, we discuss a scope of different gas mixtures intended for reactive ion etching of AlxGa1¿xN/GaN heterostructures in relation to percentage composition of aluminum. The results of etching process are strongly dependent on the process parameters and gas mixture applied. The selected mixture of BCl3/Cl2/Ar provides a good stability of plasma and quality of etched heterostructure mesas. The test structures of AlGaN/GaN for the RIE process were grown on a c-plane sapphire in a vertical flow LP-MOVPE (low pressure Metalorganic Vapour Phase Epitaxy) system. The surface morphology and topography of mesa structures were studied using atomic force microscope working in tapping mode and scanning electron microscope. The results of etching process for intended process parameters as well as the correlation between the gas mixture, parameters and obtained mesa structures are discussed in this article.
{"title":"The selection of gas chemistry in reactive ion etching of AlGaN/GaN heterostructures","authors":"J. Gryglewicz, W. Oleszkiewicz, R. Paszkiewicz","doi":"10.1109/STYSW.2011.6155839","DOIUrl":"https://doi.org/10.1109/STYSW.2011.6155839","url":null,"abstract":"In this study, we discuss a scope of different gas mixtures intended for reactive ion etching of AlxGa1¿xN/GaN heterostructures in relation to percentage composition of aluminum. The results of etching process are strongly dependent on the process parameters and gas mixture applied. The selected mixture of BCl3/Cl2/Ar provides a good stability of plasma and quality of etched heterostructure mesas. The test structures of AlGaN/GaN for the RIE process were grown on a c-plane sapphire in a vertical flow LP-MOVPE (low pressure Metalorganic Vapour Phase Epitaxy) system. The surface morphology and topography of mesa structures were studied using atomic force microscope working in tapping mode and scanning electron microscope. The results of etching process for intended process parameters as well as the correlation between the gas mixture, parameters and obtained mesa structures are discussed in this article.","PeriodicalId":261643,"journal":{"name":"2011 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2011-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116598651","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1109/haptics.2016.7463139
Kelcy Allwein
Kelcy Allwein, Defense Intelligence Agency, Kelcy.Allwein@dia.mil Elisabeth Andre, University of Augsburg, andre@informatik.uni-augsburg.de Thom Blum, Muscle Fish, a division of Audible Magic thom@musclefish.com Shih-Fu Chang, Columbia University, sfchang@ee.columbia.edu Bruce Croft, University of Massachusetts, croft@cs.umass.edu Alex Hauptmann, Carnegie Mellon University, alex+@cs.cmu.edu Mark Maybury (chair) The MITRE Corporation, maybury@mitre.org Andy Merlino, Pixel Forensics, amerlino@pixelforensics.com Ram Nevatia, University of Southern California, nevatia@iris.usc.edu Prem Natarajan, BBN, prem@bbn.com Kirby Plessas, Open Source Works, kirbyp@open-source-works.org David Palmer, Virage, dpalmer@virage.com Mubarak Shah, University of Central Florida, shah@cs.ucf.edu Rohini K. Shrihari, SUNY Buffalo, rohini@cedar.buffalo.edu Oliviero Stock, Istituto per la Ricerca Scientifica e Tecnologica, stock@fbk.eu John Smith, IBM T. J. Watson Research Center, jsmith@us.ibm.com Rick Steinheiser, DNI/Open Source Center, RickS@rccb.osis.gov Sharon Walter (co-chair) AFRL, Rome NY, Sharon.Walter@rl.af.mil
Kelcy Allwein，国防情报局，Kelcy.Allwein@dia.mil Elisabeth Andre，奥格斯堡大学，andre@informatik.uni-augsburg.de Thom Blum, Muscle Fish, Audible Magic的一个部门thom@musclefish.com哥伦比亚大学，sfchang@ee.columbia.edu Bruce Croft，马萨诸塞大学，croft@cs.umass.edu Alex Hauptmann，卡内基梅隆大学，Alex +@cs.cmu.edu Mark Maybury(主席)MITRE Corporation, maybury@mitre.org Andy Merlino, Pixel Forensics，amerlino@pixelforensics.com Ram Nevatia，南加州大学，nevatia@iris.usc.edu Prem Natarajan, BBN, prem@bbn.com Kirby Plessas，开源作品，kirbyp@open-source-works.org David Palmer, Virage, dpalmer@virage.com Mubarak Shah，中佛罗里达大学，shah@cs.ucf.edu Rohini K. Shrihari，纽约州立大学布法罗分校，rohini@cedar.buffalo.edu Oliviero Stock，墨西哥科学技术研究所，stock@fbk.eu John Smith, IBM t.j. Watson研究中心，jsmith@us.ibm.com Rick Steinheiser, DNI/开源中心，RickS@rccb.osis.gov Sharon Walter(联合主席)AFRL, Rome NY, Sharon.Walter@rl.af.mil
{"title":"Organizing committee","authors":"Kelcy Allwein","doi":"10.1109/haptics.2016.7463139","DOIUrl":"https://doi.org/10.1109/haptics.2016.7463139","url":null,"abstract":"Kelcy Allwein, Defense Intelligence Agency, Kelcy.Allwein@dia.mil Elisabeth Andre, University of Augsburg, andre@informatik.uni-augsburg.de Thom Blum, Muscle Fish, a division of Audible Magic thom@musclefish.com Shih-Fu Chang, Columbia University, sfchang@ee.columbia.edu Bruce Croft, University of Massachusetts, croft@cs.umass.edu Alex Hauptmann, Carnegie Mellon University, alex+@cs.cmu.edu Mark Maybury (chair) The MITRE Corporation, maybury@mitre.org Andy Merlino, Pixel Forensics, amerlino@pixelforensics.com Ram Nevatia, University of Southern California, nevatia@iris.usc.edu Prem Natarajan, BBN, prem@bbn.com Kirby Plessas, Open Source Works, kirbyp@open-source-works.org David Palmer, Virage, dpalmer@virage.com Mubarak Shah, University of Central Florida, shah@cs.ucf.edu Rohini K. Shrihari, SUNY Buffalo, rohini@cedar.buffalo.edu Oliviero Stock, Istituto per la Ricerca Scientifica e Tecnologica, stock@fbk.eu John Smith, IBM T. J. Watson Research Center, jsmith@us.ibm.com Rick Steinheiser, DNI/Open Source Center, RickS@rccb.osis.gov Sharon Walter (co-chair) AFRL, Rome NY, Sharon.Walter@rl.af.mil","PeriodicalId":261643,"journal":{"name":"2011 International Students and Young Scientists Workshop \"Photonics and Microsystems\"","volume":"61 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127104522","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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