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2011 International Students and Young Scientists Workshop "Photonics and Microsystems"最新文献

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Stability of thin-film resistors embedded in printed circuit boards 嵌入印刷电路板的薄膜电阻器的稳定性
P. Winiarski, A. Dziedzic
Long-term stability of embedded passives is very important issue. To determine this matter an aging process can be used, where test samples are exposed to environmental conditions. Objective of this research was analyzing reliability of thin-film resistors based on Ohmega-Ply® technology. Resistive material was a nickel-phosphorus (Ni-P) alloy (with sheet resistance 25 ¿/sq or 100 ¿/sq) on FR-4 substrate. A number of variables were considered in this study (sheet resistance, geometry of resistor, type of cladding, laser trimming, pulse stress and environmental conditions). Two different accelerated ageing processes ¿ Ex-Situ (samples exposed to elevated temperature and/or relative humidity but resistance measurements made at room temperature) and In-Situ (resistance of test samples performed directly at the ageing conditions) were carried out to perform long-term behavior analysis. The results revealed a significant influence of thickness of resistor, type of cladding and temperature on stability of investigated structures. Signification of other factors was negligible.
嵌入式被动器件的长期稳定性是一个非常重要的问题。为了确定这个问题,可以使用老化过程,将测试样品暴露在环境条件下。本研究的目的是分析基于Ohmega-Ply®技术的薄膜电阻器的可靠性。电阻材料是在FR-4衬底上的镍磷(Ni-P)合金(片电阻为25¿/sq或100¿/sq)。本研究考虑了许多变量(薄片电阻、电阻几何形状、包层类型、激光切边、脉冲应力和环境条件)。两种不同的加速老化过程:非原位(样品暴露在高温和/或相对湿度下,但在室温下进行电阻测量)和原位(在老化条件下直接进行测试样品的电阻)进行长期行为分析。结果表明,电阻厚度、包层类型和温度对结构稳定性有显著影响。其他因素的影响可以忽略不计。
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引用次数: 6
Optimization of 2D slab photonic crystal geometry for gas sensing 用于气体传感的二维平板光子晶体几何结构优化
A. Zakrzewski, M. Wielichowski, S. Patela
The two-dimensional (2D) slab photonic crystal (PhC) geometry is optimized for the application of the PhC as a near-infrared spectroscopic gas sensor's active element. Sensor operation in the slow-light regime is assumed. The 2D theoretical model is based on the finite-difference time-domain (FDTD) propagation of the electromagnetic field. Linear-defect 2D photonic crystal structures are considered. Optimization is performed according to the following criteria: maximum light coupling efficiency, maximum light extraction efficiency, and maximum light-gas overlap. In the simulations, output signal collection is performed by means of either an output strip waveguide. Antireflection sections suited for individual PhC geometry types, are applied to prevent excessive reflections resulting from the high group velocity of light propagating in the slow-light regime within the PhC. Configurations with and without antireflection sections are compared. Triangular-lattice 2D PhC types are: line-defect crystals and line-defect crystals featuring an additional row of holes that improve the light-gas overlap.
优化了二维平板光子晶体(PhC)的几何结构,使其成为近红外光谱气体传感器的有源元件。假定传感器在慢光状态下工作。二维理论模型基于电磁场时域有限差分(FDTD)传播。考虑了线性缺陷的二维光子晶体结构。根据以下标准进行优化:最大光耦合效率、最大光提取效率和最大光气重叠。在模拟中,输出信号采集是通过输出条形波导来完成的。抗反射部分适用于单个PhC几何类型,用于防止在PhC内的慢光状态下传播的高群光速度造成的过度反射。将带和不带抗反射截面的配置进行比较。三角形晶格二维PhC类型是:线缺陷晶体和线缺陷晶体,具有额外的一排孔,改善光气重叠。
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引用次数: 2
The selection of gas chemistry in reactive ion etching of AlGaN/GaN heterostructures 反应离子蚀刻AlGaN/GaN异质结构时气体化学的选择
J. Gryglewicz, W. Oleszkiewicz, R. Paszkiewicz
In this study, we discuss a scope of different gas mixtures intended for reactive ion etching of AlxGa1¿xN/GaN heterostructures in relation to percentage composition of aluminum. The results of etching process are strongly dependent on the process parameters and gas mixture applied. The selected mixture of BCl3/Cl2/Ar provides a good stability of plasma and quality of etched heterostructure mesas. The test structures of AlGaN/GaN for the RIE process were grown on a c-plane sapphire in a vertical flow LP-MOVPE (low pressure Metalorganic Vapour Phase Epitaxy) system. The surface morphology and topography of mesa structures were studied using atomic force microscope working in tapping mode and scanning electron microscope. The results of etching process for intended process parameters as well as the correlation between the gas mixture, parameters and obtained mesa structures are discussed in this article.
在这项研究中,我们讨论了用于反应离子蚀刻AlxGa1¿xN/GaN异质结构的不同气体混合物的范围与铝的百分比组成。蚀刻过程的结果很大程度上取决于所使用的工艺参数和气体混合物。所选择的BCl3/Cl2/Ar混合物具有良好的等离子体稳定性和蚀刻异质结构台面的质量。在垂直流动LP-MOVPE(低压金属有机气相外延)体系中,在c面蓝宝石上生长了用于RIE工艺的AlGaN/GaN测试结构。利用原子力显微镜和扫描电镜对表面形貌和形貌进行了研究。本文讨论了蚀刻工艺对预期工艺参数的影响,以及气体混合物、参数与得到的台面结构之间的关系。
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引用次数: 1
Organizing committee 组织委员会
Pub Date : 1900-01-01 DOI: 10.1109/haptics.2016.7463139
Kelcy Allwein
Kelcy Allwein, Defense Intelligence Agency, Kelcy.Allwein@dia.mil Elisabeth Andre, University of Augsburg, andre@informatik.uni-augsburg.de Thom Blum, Muscle Fish, a division of Audible Magic thom@musclefish.com Shih-Fu Chang, Columbia University, sfchang@ee.columbia.edu Bruce Croft, University of Massachusetts, croft@cs.umass.edu Alex Hauptmann, Carnegie Mellon University, alex+@cs.cmu.edu Mark Maybury (chair) The MITRE Corporation, maybury@mitre.org Andy Merlino, Pixel Forensics, amerlino@pixelforensics.com Ram Nevatia, University of Southern California, nevatia@iris.usc.edu Prem Natarajan, BBN, prem@bbn.com Kirby Plessas, Open Source Works, kirbyp@open-source-works.org David Palmer, Virage, dpalmer@virage.com Mubarak Shah, University of Central Florida, shah@cs.ucf.edu Rohini K. Shrihari, SUNY Buffalo, rohini@cedar.buffalo.edu Oliviero Stock, Istituto per la Ricerca Scientifica e Tecnologica, stock@fbk.eu John Smith, IBM T. J. Watson Research Center, jsmith@us.ibm.com Rick Steinheiser, DNI/Open Source Center, RickS@rccb.osis.gov Sharon Walter (co-chair) AFRL, Rome NY, Sharon.Walter@rl.af.mil
Kelcy Allwein,国防情报局,Kelcy.Allwein@dia.mil Elisabeth Andre,奥格斯堡大学,andre@informatik.uni-augsburg.de Thom Blum, Muscle Fish, Audible Magic的一个部门thom@musclefish.com哥伦比亚大学,sfchang@ee.columbia.edu Bruce Croft,马萨诸塞大学,croft@cs.umass.edu Alex Hauptmann,卡内基梅隆大学,Alex +@cs.cmu.edu Mark Maybury(主席)MITRE Corporation, maybury@mitre.org Andy Merlino, Pixel Forensics,amerlino@pixelforensics.com Ram Nevatia,南加州大学,nevatia@iris.usc.edu Prem Natarajan, BBN, prem@bbn.com Kirby Plessas,开源作品,kirbyp@open-source-works.org David Palmer, Virage, dpalmer@virage.com Mubarak Shah,中佛罗里达大学,shah@cs.ucf.edu Rohini K. Shrihari,纽约州立大学布法罗分校,rohini@cedar.buffalo.edu Oliviero Stock,墨西哥科学技术研究所,stock@fbk.eu John Smith, IBM t.j. Watson研究中心,jsmith@us.ibm.com Rick Steinheiser, DNI/开源中心,RickS@rccb.osis.gov Sharon Walter(联合主席)AFRL, Rome NY, Sharon.Walter@rl.af.mil
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引用次数: 0
期刊
2011 International Students and Young Scientists Workshop "Photonics and Microsystems"
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