Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c0174310.1021/acs.chemmater.4c01743
Paulina Bolek*, Thomas van Swieten, Justyna Zeler, Andries Meijerink and Eugeniusz Zych,
Luminescence thermometry is a highly promising technique for remotely measuring temperature. Nowadays, this method is unrivaled, considering its methodology and high potential for application. However, expanding the operating range of luminescent thermometers is still a challenge. We have successfully demonstrated that by introducing just one dopant, Pr3+, to garnet hosts, we can create a luminescence thermometer that operates in an impressive range of 13–1025 K. Our paper also presents a thorough analysis of the Pr3+ location in Sr3Y2Ge3O12 and Sr3Sc2Ge3O12 garnet hosts, revealing three Pr sites in the former and two in the latter, which has not been previously reported in these phosphors. By using 5d → 4f luminescence below room temperature, we obtained relative thermal sensitivities reaching ∼6%/K. By using the luminescence intensity ratio of the 4f → 4f transitions, we achieved an operating range of 13–1025 K with relative thermal sensitivity ranging from 0.1 to 0.8%/K. Finally, the small and uniform size of the particles, about 150 nm in diameter, is attractive for high spatial resolution applications.
{"title":"Luminescence Thermometry of Pr3+-Doped Sr3Y2Ge3O12 and Sr3Sc2Ge3O12 Submicron Garnets Spanning the 13–1025 K Range and New Insight to Their Spectroscopy","authors":"Paulina Bolek*, Thomas van Swieten, Justyna Zeler, Andries Meijerink and Eugeniusz Zych, ","doi":"10.1021/acs.chemmater.4c0174310.1021/acs.chemmater.4c01743","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01743https://doi.org/10.1021/acs.chemmater.4c01743","url":null,"abstract":"<p >Luminescence thermometry is a highly promising technique for remotely measuring temperature. Nowadays, this method is unrivaled, considering its methodology and high potential for application. However, expanding the operating range of luminescent thermometers is still a challenge. We have successfully demonstrated that by introducing just one dopant, Pr<sup>3+</sup>, to garnet hosts, we can create a luminescence thermometer that operates in an impressive range of 13–1025 K. Our paper also presents a thorough analysis of the Pr<sup>3+</sup> location in Sr<sub>3</sub>Y<sub>2</sub>Ge<sub>3</sub>O<sub>12</sub> and Sr<sub>3</sub>Sc<sub>2</sub>Ge<sub>3</sub>O<sub>12</sub> garnet hosts, revealing three Pr sites in the former and two in the latter, which has not been previously reported in these phosphors. By using 5d → 4f luminescence below room temperature, we obtained relative thermal sensitivities reaching ∼6%/K. By using the luminescence intensity ratio of the 4f → 4f transitions, we achieved an operating range of 13–1025 K with relative thermal sensitivity ranging from 0.1 to 0.8%/K. Finally, the small and uniform size of the particles, about 150 nm in diameter, is attractive for high spatial resolution applications.</p>","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":7.2,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/epdf/10.1021/acs.chemmater.4c01743","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142309877","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c01743
Paulina Bolek, Thomas van Swieten, Justyna Zeler, Andries Meijerink, Eugeniusz Zych
Luminescence thermometry is a highly promising technique for remotely measuring temperature. Nowadays, this method is unrivaled, considering its methodology and high potential for application. However, expanding the operating range of luminescent thermometers is still a challenge. We have successfully demonstrated that by introducing just one dopant, Pr3+, to garnet hosts, we can create a luminescence thermometer that operates in an impressive range of 13–1025 K. Our paper also presents a thorough analysis of the Pr3+ location in Sr3Y2Ge3O12 and Sr3Sc2Ge3O12 garnet hosts, revealing three Pr sites in the former and two in the latter, which has not been previously reported in these phosphors. By using 5d → 4f luminescence below room temperature, we obtained relative thermal sensitivities reaching ∼6%/K. By using the luminescence intensity ratio of the 4f → 4f transitions, we achieved an operating range of 13–1025 K with relative thermal sensitivity ranging from 0.1 to 0.8%/K. Finally, the small and uniform size of the particles, about 150 nm in diameter, is attractive for high spatial resolution applications.
{"title":"Luminescence Thermometry of Pr3+-Doped Sr3Y2Ge3O12 and Sr3Sc2Ge3O12 Submicron Garnets Spanning the 13–1025 K Range and New Insight to Their Spectroscopy","authors":"Paulina Bolek, Thomas van Swieten, Justyna Zeler, Andries Meijerink, Eugeniusz Zych","doi":"10.1021/acs.chemmater.4c01743","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01743","url":null,"abstract":"Luminescence thermometry is a highly promising technique for remotely measuring temperature. Nowadays, this method is unrivaled, considering its methodology and high potential for application. However, expanding the operating range of luminescent thermometers is still a challenge. We have successfully demonstrated that by introducing just one dopant, Pr<sup>3+</sup>, to garnet hosts, we can create a luminescence thermometer that operates in an impressive range of 13–1025 K. Our paper also presents a thorough analysis of the Pr<sup>3+</sup> location in Sr<sub>3</sub>Y<sub>2</sub>Ge<sub>3</sub>O<sub>12</sub> and Sr<sub>3</sub>Sc<sub>2</sub>Ge<sub>3</sub>O<sub>12</sub> garnet hosts, revealing three Pr sites in the former and two in the latter, which has not been previously reported in these phosphors. By using 5d → 4f luminescence below room temperature, we obtained relative thermal sensitivities reaching ∼6%/K. By using the luminescence intensity ratio of the 4f → 4f transitions, we achieved an operating range of 13–1025 K with relative thermal sensitivity ranging from 0.1 to 0.8%/K. Finally, the small and uniform size of the particles, about 150 nm in diameter, is attractive for high spatial resolution applications.","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":8.6,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142198094","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c01329
Jessica C. Jones, Ethan P. Kamphaus, Lei Cheng, Cong Liu, Alex B. F. Martinson, Adam S. Hock
While atomic layer deposition (ALD) processes from across the periodic table have been designed to deposit conformal thin films, an atomistic view of disparate substrate sites reveals the possibility of even greater synthetic control and precision. An understanding of the mechanism by which a particular ALD precursor reacts (or does not react) at myriad surface sites remains in its infancy. In this Perspective, we summarize site-specific chemical reaction strategies that utilize ALD precursors and tailored surface chemistry to discriminate among potential deposition sites as well as describe techniques and tools that can be used to investigate site-selective ALD (SS-ALD). The Perspective is focused on the science of site-selective vapor-phase surface reactions but inevitably reveals the potential utility of such surface synthetic precision.
{"title":"Mechanistically Informed Strategies for Site-Selective Atomic Layer Deposition","authors":"Jessica C. Jones, Ethan P. Kamphaus, Lei Cheng, Cong Liu, Alex B. F. Martinson, Adam S. Hock","doi":"10.1021/acs.chemmater.4c01329","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01329","url":null,"abstract":"While atomic layer deposition (ALD) processes from across the periodic table have been designed to deposit conformal thin films, an atomistic view of disparate substrate sites reveals the possibility of even greater synthetic control and precision. An understanding of the mechanism by which a particular ALD precursor reacts (or does not react) at myriad surface sites remains in its infancy. In this Perspective, we summarize site-specific chemical reaction strategies that utilize ALD precursors and tailored surface chemistry to discriminate among potential deposition sites as well as describe techniques and tools that can be used to investigate site-selective ALD (SS-ALD). The Perspective is focused on the science of site-selective vapor-phase surface reactions but inevitably reveals the potential utility of such surface synthetic precision.","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":8.6,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142198092","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c01133
Eun-Hyoung Cho, Dabin Kong, Iaan Cho, Youngchul Leem, Young Min Lee, Miso Kim, Chi Thang Nguyen, Jeong Yub Lee, Bonggeun Shong, Han-Bo-Ram Lee
Achieving atomic-scale precise control over material layering is critical for the development of future semiconductor technology. Area-selective deposition (ASD) has emerged as an indispensable tool for crafting semiconductor components and structures via bottom-up pattern transfer. Ruthenium has attracted significant interest as a low-resistivity conducting material for next-generation interconnect technology. However, the oxidative counter-reactants such as O2 often used for atomic layer deposition (ALD) of metallic Ru films result in a considerable increase in contact resistance because of substrate oxidation, limiting the applications of both ALD and ASD of Ru. In this study, Ru ASD is demonstrated using two-step ALD with the sequential use of H2 and O2 as counter-reactants and dimethylamino-trimethylsilane (DMATMS) as a precursor inhibitor. Both theoretical and experimental results demonstrate that in the two-step Ru ALD, the oxide layer can be eliminated via the reduction of the oxidized substrate metal surface by the H2 counter-reactant. This mechanism simultaneously facilitates the adsorption of the Ru precursor (tricarbonyl-(trimethylenemethane)-ruthenium) and removal of the surface oxide layer. Consequently, Ru growth is suppressed on the DMATMS-inhibited SiO2 surface during ASD, enabling exclusive deposition of Ru on the Mo surface. The currently proposed Ru ASD scheme using two-step ALD is highly promising for driving advancements in interconnect technology for commercial applications.
{"title":"Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation","authors":"Eun-Hyoung Cho, Dabin Kong, Iaan Cho, Youngchul Leem, Young Min Lee, Miso Kim, Chi Thang Nguyen, Jeong Yub Lee, Bonggeun Shong, Han-Bo-Ram Lee","doi":"10.1021/acs.chemmater.4c01133","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01133","url":null,"abstract":"Achieving atomic-scale precise control over material layering is critical for the development of future semiconductor technology. Area-selective deposition (ASD) has emerged as an indispensable tool for crafting semiconductor components and structures via bottom-up pattern transfer. Ruthenium has attracted significant interest as a low-resistivity conducting material for next-generation interconnect technology. However, the oxidative counter-reactants such as O<sub>2</sub> often used for atomic layer deposition (ALD) of metallic Ru films result in a considerable increase in contact resistance because of substrate oxidation, limiting the applications of both ALD and ASD of Ru. In this study, Ru ASD is demonstrated using two-step ALD with the sequential use of H<sub>2</sub> and O<sub>2</sub> as counter-reactants and dimethylamino-trimethylsilane (DMATMS) as a precursor inhibitor. Both theoretical and experimental results demonstrate that in the two-step Ru ALD, the oxide layer can be eliminated via the reduction of the oxidized substrate metal surface by the H<sub>2</sub> counter-reactant. This mechanism simultaneously facilitates the adsorption of the Ru precursor (tricarbonyl-(trimethylenemethane)-ruthenium) and removal of the surface oxide layer. Consequently, Ru growth is suppressed on the DMATMS-inhibited SiO<sub>2</sub> surface during ASD, enabling exclusive deposition of Ru on the Mo surface. The currently proposed Ru ASD scheme using two-step ALD is highly promising for driving advancements in interconnect technology for commercial applications.","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":8.6,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142231793","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c0159410.1021/acs.chemmater.4c01594
Guo-Feng Liu, Shu Zhang, Chun-Jun Chen, Shu-Ming Xing, Xiao-Yi Zhang, Yue-Jiao Zhang, De-Yin Wu, Jian-Feng Li, Bin Ren and Jia-Jia Chen*,
Introducing polyoxometalates (POMs) as redox mediators can decouple direct electrochemical reactions into surface-homogeneous conversion steps. And the formed redox catalysis is beneficial to achieve more efficient hydrogenation of nitrobenzene (Ph-NO2) to aniline (Ph-NH2) at low overpotentials. Notably, the redox potentials of POMs can adjust the energy barrier of the hydrogenation reaction, thus improving conversion efficiency. In particular, by using phosphotungstic acid ({PW12}) as the redox mediator, the potential of the hydrogenation of Ph-NO2 to Ph-NH2 was improved to 0.04 V vs RHE with a very high kapp of 0.0339 min–1. This indicates its superior kinetic performance over that of most previously reported electrocatalysts. In addition, through comparative mechanistic studies of electrocatalysis and redox mediator catalysis, EC-SERS revealed the preferential adsorption of mediator molecules and their direct interactions with intermediates. This work is significant to a deep understanding of the mechanistic behaviors and potential tuning effects of redox mediators, which will help to develop more efficient mediators for the hydrogenation of Ph-NO2.
{"title":"Electrochemical Hydrogenation of Nitrobenzene: From Electrocatalysis to Redox Mediator Catalysis","authors":"Guo-Feng Liu, Shu Zhang, Chun-Jun Chen, Shu-Ming Xing, Xiao-Yi Zhang, Yue-Jiao Zhang, De-Yin Wu, Jian-Feng Li, Bin Ren and Jia-Jia Chen*, ","doi":"10.1021/acs.chemmater.4c0159410.1021/acs.chemmater.4c01594","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01594https://doi.org/10.1021/acs.chemmater.4c01594","url":null,"abstract":"<p >Introducing polyoxometalates (POMs) as redox mediators can decouple direct electrochemical reactions into surface-homogeneous conversion steps. And the formed redox catalysis is beneficial to achieve more efficient hydrogenation of nitrobenzene (Ph-NO<sub>2</sub>) to aniline (Ph-NH<sub>2</sub>) at low overpotentials. Notably, the redox potentials of POMs can adjust the energy barrier of the hydrogenation reaction, thus improving conversion efficiency. In particular, by using phosphotungstic acid ({PW<sub>12</sub>}) as the redox mediator, the potential of the hydrogenation of Ph-NO<sub>2</sub> to Ph-NH<sub>2</sub> was improved to 0.04 V vs RHE with a very high <i>k</i><sub>app</sub> of 0.0339 min<sup>–1</sup>. This indicates its superior kinetic performance over that of most previously reported electrocatalysts. In addition, through comparative mechanistic studies of electrocatalysis and redox mediator catalysis, EC-SERS revealed the preferential adsorption of mediator molecules and their direct interactions with intermediates. This work is significant to a deep understanding of the mechanistic behaviors and potential tuning effects of redox mediators, which will help to develop more efficient mediators for the hydrogenation of Ph-NO<sub>2</sub>.</p>","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":7.2,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142309852","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c0113310.1021/acs.chemmater.4c01133
Eun-Hyoung Cho, Dabin Kong, Iaan Cho, Youngchul Leem, Young Min Lee, Miso Kim, Chi Thang Nguyen, Jeong Yub Lee, Bonggeun Shong* and Han-Bo-Ram Lee*,
Achieving atomic-scale precise control over material layering is critical for the development of future semiconductor technology. Area-selective deposition (ASD) has emerged as an indispensable tool for crafting semiconductor components and structures via bottom-up pattern transfer. Ruthenium has attracted significant interest as a low-resistivity conducting material for next-generation interconnect technology. However, the oxidative counter-reactants such as O2 often used for atomic layer deposition (ALD) of metallic Ru films result in a considerable increase in contact resistance because of substrate oxidation, limiting the applications of both ALD and ASD of Ru. In this study, Ru ASD is demonstrated using two-step ALD with the sequential use of H2 and O2 as counter-reactants and dimethylamino-trimethylsilane (DMATMS) as a precursor inhibitor. Both theoretical and experimental results demonstrate that in the two-step Ru ALD, the oxide layer can be eliminated via the reduction of the oxidized substrate metal surface by the H2 counter-reactant. This mechanism simultaneously facilitates the adsorption of the Ru precursor (tricarbonyl-(trimethylenemethane)-ruthenium) and removal of the surface oxide layer. Consequently, Ru growth is suppressed on the DMATMS-inhibited SiO2 surface during ASD, enabling exclusive deposition of Ru on the Mo surface. The currently proposed Ru ASD scheme using two-step ALD is highly promising for driving advancements in interconnect technology for commercial applications.
{"title":"Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation","authors":"Eun-Hyoung Cho, Dabin Kong, Iaan Cho, Youngchul Leem, Young Min Lee, Miso Kim, Chi Thang Nguyen, Jeong Yub Lee, Bonggeun Shong* and Han-Bo-Ram Lee*, ","doi":"10.1021/acs.chemmater.4c0113310.1021/acs.chemmater.4c01133","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01133https://doi.org/10.1021/acs.chemmater.4c01133","url":null,"abstract":"<p >Achieving atomic-scale precise control over material layering is critical for the development of future semiconductor technology. Area-selective deposition (ASD) has emerged as an indispensable tool for crafting semiconductor components and structures via bottom-up pattern transfer. Ruthenium has attracted significant interest as a low-resistivity conducting material for next-generation interconnect technology. However, the oxidative counter-reactants such as O<sub>2</sub> often used for atomic layer deposition (ALD) of metallic Ru films result in a considerable increase in contact resistance because of substrate oxidation, limiting the applications of both ALD and ASD of Ru. In this study, Ru ASD is demonstrated using two-step ALD with the sequential use of H<sub>2</sub> and O<sub>2</sub> as counter-reactants and dimethylamino-trimethylsilane (DMATMS) as a precursor inhibitor. Both theoretical and experimental results demonstrate that in the two-step Ru ALD, the oxide layer can be eliminated via the reduction of the oxidized substrate metal surface by the H<sub>2</sub> counter-reactant. This mechanism simultaneously facilitates the adsorption of the Ru precursor (tricarbonyl-(trimethylenemethane)-ruthenium) and removal of the surface oxide layer. Consequently, Ru growth is suppressed on the DMATMS-inhibited SiO<sub>2</sub> surface during ASD, enabling exclusive deposition of Ru on the Mo surface. The currently proposed Ru ASD scheme using two-step ALD is highly promising for driving advancements in interconnect technology for commercial applications.</p>","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":7.2,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142309862","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c0144310.1021/acs.chemmater.4c01443
Daniel García-Lojo, Sergio Rodal-Cedeira, Sara Núñez-Sánchez, Daniel Arenas-Esteban, Lakshminarayana Polavarapu, Sara Bals, Jorge Pérez-Juste* and Isabel Pastoriza-Santos*,
Noble metal nanoparticles, particularly gold and silver nanoparticles, have garnered significant attention due to their ability to manipulate light at the nanoscale through their localized surface plasmon resonance (LSPR). While their LSPRs below 1100 nm were extensively exploited in a wide range of applications, their potential in the near-infrared (NIR) region, crucial for optical communication and sensing, remains relatively underexplored. One primary reason is likely the limited strategies available to obtain highly stable plasmonic nanoparticles with tailored optical properties in the NIR region. Herein, we synthesized AuAg nanorattles (NRTs) with tailored and narrow plasmonic responses ranging from 1000 to 3000 nm. Additionally, we performed comprehensive characterization, employing advanced electron microscopy and various spectroscopic techniques, coupled with finite difference time domain (FDTD) simulations, to elucidate their optical properties. Notably, we unveiled the main external and internal LSPR modes by combining electron energy-loss spectroscopy (EELS) with surface-enhanced Raman scattering (SERS). Furthermore, we demonstrated through surface-enhanced infrared absorption spectroscopy (SEIRA) that the NRTs can significantly enhance the infrared signals of a model molecule. This study not only reports the synthesis of plasmonic NRTs with tunable LSPRs over the entire NIR range but also demonstrates their potential for NIR sensing and optical communication.
{"title":"Pentatwinned AuAg Nanorattles with Tailored Plasmonic Properties for Near-Infrared Applications","authors":"Daniel García-Lojo, Sergio Rodal-Cedeira, Sara Núñez-Sánchez, Daniel Arenas-Esteban, Lakshminarayana Polavarapu, Sara Bals, Jorge Pérez-Juste* and Isabel Pastoriza-Santos*, ","doi":"10.1021/acs.chemmater.4c0144310.1021/acs.chemmater.4c01443","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01443https://doi.org/10.1021/acs.chemmater.4c01443","url":null,"abstract":"<p >Noble metal nanoparticles, particularly gold and silver nanoparticles, have garnered significant attention due to their ability to manipulate light at the nanoscale through their localized surface plasmon resonance (LSPR). While their LSPRs below 1100 nm were extensively exploited in a wide range of applications, their potential in the near-infrared (NIR) region, crucial for optical communication and sensing, remains relatively underexplored. One primary reason is likely the limited strategies available to obtain highly stable plasmonic nanoparticles with tailored optical properties in the NIR region. Herein, we synthesized AuAg nanorattles (NRTs) with tailored and narrow plasmonic responses ranging from 1000 to 3000 nm. Additionally, we performed comprehensive characterization, employing advanced electron microscopy and various spectroscopic techniques, coupled with finite difference time domain (FDTD) simulations, to elucidate their optical properties. Notably, we unveiled the main external and internal LSPR modes by combining electron energy-loss spectroscopy (EELS) with surface-enhanced Raman scattering (SERS). Furthermore, we demonstrated through surface-enhanced infrared absorption spectroscopy (SEIRA) that the NRTs can significantly enhance the infrared signals of a model molecule. This study not only reports the synthesis of plasmonic NRTs with tunable LSPRs over the entire NIR range but also demonstrates their potential for NIR sensing and optical communication.</p>","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":7.2,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/epdf/10.1021/acs.chemmater.4c01443","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142309823","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c01594
Guo-Feng Liu, Shu Zhang, Chun-Jun Chen, Shu-Ming Xing, Xiao-Yi Zhang, Yue-Jiao Zhang, De-Yin Wu, Jian-Feng Li, Bin Ren, Jia-Jia Chen
Introducing polyoxometalates (POMs) as redox mediators can decouple direct electrochemical reactions into surface-homogeneous conversion steps. And the formed redox catalysis is beneficial to achieve more efficient hydrogenation of nitrobenzene (Ph-NO2) to aniline (Ph-NH2) at low overpotentials. Notably, the redox potentials of POMs can adjust the energy barrier of the hydrogenation reaction, thus improving conversion efficiency. In particular, by using phosphotungstic acid ({PW12}) as the redox mediator, the potential of the hydrogenation of Ph-NO2 to Ph-NH2 was improved to 0.04 V vs RHE with a very high kapp of 0.0339 min–1. This indicates its superior kinetic performance over that of most previously reported electrocatalysts. In addition, through comparative mechanistic studies of electrocatalysis and redox mediator catalysis, EC-SERS revealed the preferential adsorption of mediator molecules and their direct interactions with intermediates. This work is significant to a deep understanding of the mechanistic behaviors and potential tuning effects of redox mediators, which will help to develop more efficient mediators for the hydrogenation of Ph-NO2.
{"title":"Electrochemical Hydrogenation of Nitrobenzene: From Electrocatalysis to Redox Mediator Catalysis","authors":"Guo-Feng Liu, Shu Zhang, Chun-Jun Chen, Shu-Ming Xing, Xiao-Yi Zhang, Yue-Jiao Zhang, De-Yin Wu, Jian-Feng Li, Bin Ren, Jia-Jia Chen","doi":"10.1021/acs.chemmater.4c01594","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01594","url":null,"abstract":"Introducing polyoxometalates (POMs) as redox mediators can decouple direct electrochemical reactions into surface-homogeneous conversion steps. And the formed redox catalysis is beneficial to achieve more efficient hydrogenation of nitrobenzene (Ph-NO<sub>2</sub>) to aniline (Ph-NH<sub>2</sub>) at low overpotentials. Notably, the redox potentials of POMs can adjust the energy barrier of the hydrogenation reaction, thus improving conversion efficiency. In particular, by using phosphotungstic acid ({PW<sub>12</sub>}) as the redox mediator, the potential of the hydrogenation of Ph-NO<sub>2</sub> to Ph-NH<sub>2</sub> was improved to 0.04 V vs RHE with a very high <i>k</i><sub>app</sub> of 0.0339 min<sup>–1</sup>. This indicates its superior kinetic performance over that of most previously reported electrocatalysts. In addition, through comparative mechanistic studies of electrocatalysis and redox mediator catalysis, EC-SERS revealed the preferential adsorption of mediator molecules and their direct interactions with intermediates. This work is significant to a deep understanding of the mechanistic behaviors and potential tuning effects of redox mediators, which will help to develop more efficient mediators for the hydrogenation of Ph-NO<sub>2</sub>.","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":8.6,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142198093","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-09-13DOI: 10.1021/acs.chemmater.4c01443
Daniel García-Lojo, Sergio Rodal-Cedeira, Sara Núñez-Sánchez, Daniel Arenas-Esteban, Lakshminarayana Polavarapu, Sara Bals, Jorge Pérez-Juste, Isabel Pastoriza-Santos
Noble metal nanoparticles, particularly gold and silver nanoparticles, have garnered significant attention due to their ability to manipulate light at the nanoscale through their localized surface plasmon resonance (LSPR). While their LSPRs below 1100 nm were extensively exploited in a wide range of applications, their potential in the near-infrared (NIR) region, crucial for optical communication and sensing, remains relatively underexplored. One primary reason is likely the limited strategies available to obtain highly stable plasmonic nanoparticles with tailored optical properties in the NIR region. Herein, we synthesized AuAg nanorattles (NRTs) with tailored and narrow plasmonic responses ranging from 1000 to 3000 nm. Additionally, we performed comprehensive characterization, employing advanced electron microscopy and various spectroscopic techniques, coupled with finite difference time domain (FDTD) simulations, to elucidate their optical properties. Notably, we unveiled the main external and internal LSPR modes by combining electron energy-loss spectroscopy (EELS) with surface-enhanced Raman scattering (SERS). Furthermore, we demonstrated through surface-enhanced infrared absorption spectroscopy (SEIRA) that the NRTs can significantly enhance the infrared signals of a model molecule. This study not only reports the synthesis of plasmonic NRTs with tunable LSPRs over the entire NIR range but also demonstrates their potential for NIR sensing and optical communication.
{"title":"Pentatwinned AuAg Nanorattles with Tailored Plasmonic Properties for Near-Infrared Applications","authors":"Daniel García-Lojo, Sergio Rodal-Cedeira, Sara Núñez-Sánchez, Daniel Arenas-Esteban, Lakshminarayana Polavarapu, Sara Bals, Jorge Pérez-Juste, Isabel Pastoriza-Santos","doi":"10.1021/acs.chemmater.4c01443","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01443","url":null,"abstract":"Noble metal nanoparticles, particularly gold and silver nanoparticles, have garnered significant attention due to their ability to manipulate light at the nanoscale through their localized surface plasmon resonance (LSPR). While their LSPRs below 1100 nm were extensively exploited in a wide range of applications, their potential in the near-infrared (NIR) region, crucial for optical communication and sensing, remains relatively underexplored. One primary reason is likely the limited strategies available to obtain highly stable plasmonic nanoparticles with tailored optical properties in the NIR region. Herein, we synthesized AuAg nanorattles (NRTs) with tailored and narrow plasmonic responses ranging from 1000 to 3000 nm. Additionally, we performed comprehensive characterization, employing advanced electron microscopy and various spectroscopic techniques, coupled with finite difference time domain (FDTD) simulations, to elucidate their optical properties. Notably, we unveiled the main external and internal LSPR modes by combining electron energy-loss spectroscopy (EELS) with surface-enhanced Raman scattering (SERS). Furthermore, we demonstrated through surface-enhanced infrared absorption spectroscopy (SEIRA) that the NRTs can significantly enhance the infrared signals of a model molecule. This study not only reports the synthesis of plasmonic NRTs with tunable LSPRs over the entire NIR range but also demonstrates their potential for NIR sensing and optical communication.","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":8.6,"publicationDate":"2024-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142198105","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Lithium-ion batteries are now successfully developed with higher energy densities than classical aqueous-based battery technologies and are used as power sources for electric vehicles and other electric storage applications. Sodium-ion batteries are another emerging battery technology, but their energy density is not high compared to that of their Li counterparts. Anionic redox reactions have attracted attention due to their potential to enhance the reversible capacity and operating voltage of positive electrode materials in Na/Li batteries. To understand the influence of Al substitution on the activation mechanism of anionic redox reactions in Na-/Li-containing Mn-based layered oxides, the P2-type Al-substituted Na2/3Al0.1Mn0.9O2 is designed to explore the difference in the anionic redox behavior. LiyAl0.1Mn0.9O2 is also prepared by electrochemical ion exchange, and the anionic redox behavior was compared for both samples. The Al-substituted Na2/3Al0.1Mn0.9O2 provides better cycling performance with partial activation of anionic redox, which is not observed for P′2-type Na2/3MnO2. Good reversibility for Na2/3Al0.1Mn0.9O2 and LiyAl0.1Mn0.9O2 with anionic redox is achieved, and this improvement originates from the nonexcessive use of anionic redox in electrode materials. This finding opens the possibility to develop high-energy sodium/lithium insertion materials with reversible anionic redox.
{"title":"Influence of Aluminum Substitution on Anionic Redox Activation and Stabilization in P′2-Type Na2/3MnO2 for Na/Li Battery Applications","authors":"Jiaxuan Yin, Yanjia Zhang, Tomohiro Kuriyama, Yongcheng Jin, Naoaki Yabuuchi","doi":"10.1021/acs.chemmater.4c01181","DOIUrl":"https://doi.org/10.1021/acs.chemmater.4c01181","url":null,"abstract":"Lithium-ion batteries are now successfully developed with higher energy densities than classical aqueous-based battery technologies and are used as power sources for electric vehicles and other electric storage applications. Sodium-ion batteries are another emerging battery technology, but their energy density is not high compared to that of their Li counterparts. Anionic redox reactions have attracted attention due to their potential to enhance the reversible capacity and operating voltage of positive electrode materials in Na/Li batteries. To understand the influence of Al substitution on the activation mechanism of anionic redox reactions in Na-/Li-containing Mn-based layered oxides, the P2-type Al-substituted Na<sub>2/3</sub>Al<sub>0.1</sub>Mn<sub>0.9</sub>O<sub>2</sub> is designed to explore the difference in the anionic redox behavior. Li<sub><i>y</i></sub>Al<sub>0.1</sub>Mn<sub>0.9</sub>O<sub>2</sub> is also prepared by electrochemical ion exchange, and the anionic redox behavior was compared for both samples. The Al-substituted Na<sub>2/3</sub>Al<sub>0.1</sub>Mn<sub>0.9</sub>O<sub>2</sub> provides better cycling performance with partial activation of anionic redox, which is not observed for P′2-type Na<sub>2/3</sub>MnO<sub>2</sub>. Good reversibility for Na<sub>2/3</sub>Al<sub>0.1</sub>Mn<sub>0.9</sub>O<sub>2</sub> and Li<sub><i>y</i></sub>Al<sub>0.1</sub>Mn<sub>0.9</sub>O<sub>2</sub> with anionic redox is achieved, and this improvement originates from the nonexcessive use of anionic redox in electrode materials. This finding opens the possibility to develop high-energy sodium/lithium insertion materials with reversible anionic redox.","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":null,"pages":null},"PeriodicalIF":8.6,"publicationDate":"2024-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142171233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}