Solar concentrators using wedge prism with diffractive grating or sawtooth profile mirror are proposed and studied. The concentrator length-to-thickness ratio can exceed 7 and the maximum concentration ratios exceed 3.5 for these designs.
{"title":"A study of thin profile solar concentrators using wedge prism with diffractive grating","authors":"T. Waritanant, S. Boonruang, T. Chung","doi":"10.1117/12.868921","DOIUrl":"https://doi.org/10.1117/12.868921","url":null,"abstract":"Solar concentrators using wedge prism with diffractive grating or sawtooth profile mirror are proposed and studied. The concentrator length-to-thickness ratio can exceed 7 and the maximum concentration ratios exceed 3.5 for these designs.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125318877","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Ozan Cakmakci, I. Kaya, G. Fasshauer, K. Thompson, J. Rolland
This paper presents the use of radial basis functions (RBF) for describing freeform optical surfaces. The RBF approximation framework along with preliminary optical design experiences will be summarized.
本文提出了用径向基函数(RBF)描述自由曲面的方法。总结了RBF近似框架以及初步的光学设计经验。
{"title":"Application of radial basis functions to represent optical freeform surfaces","authors":"Ozan Cakmakci, I. Kaya, G. Fasshauer, K. Thompson, J. Rolland","doi":"10.1117/12.871820","DOIUrl":"https://doi.org/10.1117/12.871820","url":null,"abstract":"This paper presents the use of radial basis functions (RBF) for describing freeform optical surfaces. The RBF approximation framework along with preliminary optical design experiences will be summarized.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127506264","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Light is not just for vision anymore! Illumination design should consider the needs of the visual and non-visual systems. Discussed are the lighting characteristics impacting these systems and the implications for designing light for architecture.
{"title":"Non-visual effects of light: implications for design","authors":"M. Figueiro","doi":"10.1117/12.868870","DOIUrl":"https://doi.org/10.1117/12.868870","url":null,"abstract":"Light is not just for vision anymore! Illumination design should consider the needs of the visual and non-visual systems. Discussed are the lighting characteristics impacting these systems and the implications for designing light for architecture.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"93 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130631845","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This paper provides a derivation of two key formulas for wavefront propagation and stop shifting to sixthorder of approximation.
本文给出了波前传播和停止移至六阶近似的两个关键公式的推导。
{"title":"Sixth-order wavefront deformations: the coefficients and insights into wavefront propagation in optical systems","authors":"J. Sasián","doi":"10.1117/12.867746","DOIUrl":"https://doi.org/10.1117/12.867746","url":null,"abstract":"This paper provides a derivation of two key formulas for wavefront propagation and stop shifting to sixthorder of approximation.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130697584","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. Muschaweck, P. Brick, S. Grötsch, S. Schwalenberg
Good primary optics for LEDs are crucial for applications that work technically and economically. But what is "good"? For various optical design patterns, we look at the complex interplay between optics, manufacturing, tolerancing, lifetime and cost.
{"title":"Primary optics for LEDs: state of the art of optical architectures","authors":"J. Muschaweck, P. Brick, S. Grötsch, S. Schwalenberg","doi":"10.1117/12.868632","DOIUrl":"https://doi.org/10.1117/12.868632","url":null,"abstract":"Good primary optics for LEDs are crucial for applications that work technically and economically. But what is \"good\"? For various optical design patterns, we look at the complex interplay between optics, manufacturing, tolerancing, lifetime and cost.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130827732","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Tolerancing has long been identified as a crucial part in the development of optical systems. It aims at finding the best balance between quality and cost as tolerances closely tie together manufacturing expenses and performance. Tolerance effects have been included into the optimization function (merit function) by some lens designers to find insensitive designs1-5 and frequently compensators are employed to further improve the performance of assembled lenses. Compensators are limited to a small number of system parameters, but selective assembly of components can extend the number of parameters available for compensation. It can be employed to reduce tolerance effects of disturbed parameters by finding the best matches out of a set of components. In this work we discuss how desensitization and selective assembly can be combined to loosen tolerances and increase as-built performance. The investigations concentrate on tolerance insensitive design forms under the presence of selective assembly compensators. In contrast to desensitizing a given lens or introducing new design means we focus on introducing new assembly strategies into the design procedure and investigate how using selective assembly as a compensator while desensitizing the remaining design parameters can lead to even less sensitive designs.
{"title":"The effect of selective assembly on tolerance desensitization","authors":"M. Funck, P. Loosen","doi":"10.1117/12.868922","DOIUrl":"https://doi.org/10.1117/12.868922","url":null,"abstract":"Tolerancing has long been identified as a crucial part in the development of optical systems. It aims at finding the best balance between quality and cost as tolerances closely tie together manufacturing expenses and performance. Tolerance effects have been included into the optimization function (merit function) by some lens designers to find insensitive designs1-5 and frequently compensators are employed to further improve the performance of assembled lenses. Compensators are limited to a small number of system parameters, but selective assembly of components can extend the number of parameters available for compensation. It can be employed to reduce tolerance effects of disturbed parameters by finding the best matches out of a set of components. In this work we discuss how desensitization and selective assembly can be combined to loosen tolerances and increase as-built performance. The investigations concentrate on tolerance insensitive design forms under the presence of selective assembly compensators. In contrast to desensitizing a given lens or introducing new design means we focus on introducing new assembly strategies into the design procedure and investigate how using selective assembly as a compensator while desensitizing the remaining design parameters can lead to even less sensitive designs.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134302328","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Optimization of a mobile imaging lens, which is for 5-megapixel, 1.4μm, CMOS image sensor, with multiple configurations to reduce flare is presented. The most severe flare, which could cause artifacts such as "purple flare" in images, is due to totally internal reflection (TIR) from optical surfaces in a mobile phone camera lens. We illustrate how to optimize the lens for good performance and manufacturable tolerances to reduce flare due to TIR. The MTF, distortion, relative illumination, lateral color, cumulative probability function for lens with tolerances and flare amount is shown for the starting lens. An optimization method for lens design to reduce TIR flare is proposed and described. The resulting optimized lens performance, tolerances and flare are compared with that of the starting lens.
{"title":"Mobile phone camera lens design with reduced flare","authors":"X. Chen","doi":"10.1117/12.869061","DOIUrl":"https://doi.org/10.1117/12.869061","url":null,"abstract":"Optimization of a mobile imaging lens, which is for 5-megapixel, 1.4μm, CMOS image sensor, with multiple configurations to reduce flare is presented. The most severe flare, which could cause artifacts such as \"purple flare\" in images, is due to totally internal reflection (TIR) from optical surfaces in a mobile phone camera lens. We illustrate how to optimize the lens for good performance and manufacturable tolerances to reduce flare due to TIR. The MTF, distortion, relative illumination, lateral color, cumulative probability function for lens with tolerances and flare amount is shown for the starting lens. An optimization method for lens design to reduce TIR flare is proposed and described. The resulting optimized lens performance, tolerances and flare are compared with that of the starting lens.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"28 14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133135918","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Rosete-Aguilar, F. C. Estrada-Silva, J. Garduño-Mejía, N. Bruce
We analyze the focusing of 20fs, 15fs and 10fs ultrashort pulses using achromatic lenses by expanding the wave numbers of the pulse around the center frequency of the incident pulse up to the third order.
{"title":"Third order dispersion effects generated by achromatic doublets on sub-20 femtosecond optical pulses","authors":"M. Rosete-Aguilar, F. C. Estrada-Silva, J. Garduño-Mejía, N. Bruce","doi":"10.1117/12.868903","DOIUrl":"https://doi.org/10.1117/12.868903","url":null,"abstract":"We analyze the focusing of 20fs, 15fs and 10fs ultrashort pulses using achromatic lenses by expanding the wave numbers of the pulse around the center frequency of the incident pulse up to the third order.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"94 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123015104","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The retardance associated with a three-by-three polarization ray tracing matrix is analyzed. The retardance of the polarization ray tracing matrix contains both a geometrical transformation and the polarization properties of diattenuation and retardance associated with a ray path through the optical and polarization elements. A method using parallel transport of transverse vectors is able to separate the geometrical transformation from the "physical" retardance, allowing the retardance to be calculated. A non-polarizing ray tracing matrix provides proper local coordinates to calculate the physical retardance without the geometrical transformation.
{"title":"Three-dimensional polarization ray tracing, retardance","authors":"Garam Yun, R. Chipman","doi":"10.1117/12.868589","DOIUrl":"https://doi.org/10.1117/12.868589","url":null,"abstract":"The retardance associated with a three-by-three polarization ray tracing matrix is analyzed. The retardance of the polarization ray tracing matrix contains both a geometrical transformation and the polarization properties of diattenuation and retardance associated with a ray path through the optical and polarization elements. A method using parallel transport of transverse vectors is able to separate the geometrical transformation from the \"physical\" retardance, allowing the retardance to be calculated. A non-polarizing ray tracing matrix provides proper local coordinates to calculate the physical retardance without the geometrical transformation.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"125 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124502486","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Significant advances have been made in recent years in the development of lithography optics. The resolution of structures smaller than 45 nm demanded a new class of catadioptric objective lenses whose design and construction is the result of decades of development in lithography optics. This article describes the best-performing lens types and design principles of the catadioptric concept of these lenses.
{"title":"Toward the global optimum in lithographic lens design","authors":"Aurelian Dodoc","doi":"10.1117/12.868530","DOIUrl":"https://doi.org/10.1117/12.868530","url":null,"abstract":"Significant advances have been made in recent years in the development of lithography optics. The resolution of structures smaller than 45 nm demanded a new class of catadioptric objective lenses whose design and construction is the result of decades of development in lithography optics. This article describes the best-performing lens types and design principles of the catadioptric concept of these lenses.","PeriodicalId":386109,"journal":{"name":"International Optical Design Conference","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121286923","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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