Pub Date : 1900-01-01DOI: 10.1016/B978-0-08-102430-0.00005-X
M. Park, T. Schenk, U. Schroeder
{"title":"Dopants in Atomic Layer Deposited HfO2 Thin Films","authors":"M. Park, T. Schenk, U. Schroeder","doi":"10.1016/B978-0-08-102430-0.00005-X","DOIUrl":"https://doi.org/10.1016/B978-0-08-102430-0.00005-X","url":null,"abstract":"","PeriodicalId":401168,"journal":{"name":"Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129144362","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1016/B978-0-08-102430-0.00008-5
M. Park, T. Schenk, C. Hwang, U. Schroeder
{"title":"Impact of Electrodes on the Ferroelectric Properties","authors":"M. Park, T. Schenk, C. Hwang, U. Schroeder","doi":"10.1016/B978-0-08-102430-0.00008-5","DOIUrl":"https://doi.org/10.1016/B978-0-08-102430-0.00008-5","url":null,"abstract":"","PeriodicalId":401168,"journal":{"name":"Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130237134","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1016/B978-0-08-102430-0.00022-X
Johannes Mueller, S. Slesazeck, T. Mikolajick
{"title":"Ferroelectric Field Effect Transistor","authors":"Johannes Mueller, S. Slesazeck, T. Mikolajick","doi":"10.1016/B978-0-08-102430-0.00022-X","DOIUrl":"https://doi.org/10.1016/B978-0-08-102430-0.00022-X","url":null,"abstract":"","PeriodicalId":401168,"journal":{"name":"Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125230552","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1016/B978-0-08-102430-0.00006-1
Christopher Künneth, Rohit Batra, G. Rossetti, R. Ramprasad, A. Kersch
{"title":"Thermodynamics of Phase Stability and Ferroelectricity From First Principles","authors":"Christopher Künneth, Rohit Batra, G. Rossetti, R. Ramprasad, A. Kersch","doi":"10.1016/B978-0-08-102430-0.00006-1","DOIUrl":"https://doi.org/10.1016/B978-0-08-102430-0.00006-1","url":null,"abstract":"","PeriodicalId":401168,"journal":{"name":"Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121442367","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1016/B978-0-08-102430-0.00023-1
M. Hoffmann, S. Slesazeck, T. Mikolajick, C. Hwang
{"title":"Negative Capacitance in HfO2- and ZrO2-Based Ferroelectrics","authors":"M. Hoffmann, S. Slesazeck, T. Mikolajick, C. Hwang","doi":"10.1016/B978-0-08-102430-0.00023-1","DOIUrl":"https://doi.org/10.1016/B978-0-08-102430-0.00023-1","url":null,"abstract":"","PeriodicalId":401168,"journal":{"name":"Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131188091","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1016/B978-0-08-102430-0.00014-0
N. Balke, T. Schenk, I. Stolichnov, A. Gruverman
{"title":"Piezoresponse Force Microscopy (PFM)","authors":"N. Balke, T. Schenk, I. Stolichnov, A. Gruverman","doi":"10.1016/B978-0-08-102430-0.00014-0","DOIUrl":"https://doi.org/10.1016/B978-0-08-102430-0.00014-0","url":null,"abstract":"","PeriodicalId":401168,"journal":{"name":"Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126109850","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：