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EPM ’89: 3rd International Conference on Energy Pulse and Particle Beam Modification of Materials, September 4.–8. 1989, Dresden, GDR最新文献

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PRACTICAL APPLICATIONS OF ION IMPLANTATION FOR WEAR PROTECTION 离子注入在磨损保护中的实际应用
A. Kolltsch, E. Richter, U. Scholz
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引用次数: 0
HETEROGENEOUS ION SYNTHESIS OP INSULATING LAYERS IN SILICON 硅绝缘层的非均相离子合成
A. Danilin, V. Mordkovich, M. Barabanenkov
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引用次数: 0
IMPLANTATION EFFECTS OF LASER EVAPORATED PARTICLES 激光蒸发粒子的注入效应
A. Pompe, M. Bobeth, M. Posselt
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引用次数: 0
STRUCTURAL CHARACTERIZATION OF THICK ZONE-MELTED SOI-LAYERS 厚带融化土壤层的结构特征
K. Hoeppner, B. Tillack, R. Banisch, H. H. Richter
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引用次数: 0
LOW ENERGY ION MICROSCOPE FOR DIAGNOSTICS AND PREPARATION OF MICROELECTRONIC STRUCTURES WITHIN AN MULTIANALYSIS SYSTEM 在多分析系统中用于诊断和制备微电子结构的低能离子显微镜
W. Driesel, F. Naehring
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引用次数: 0
A VACANCY DIFFUSION MODEL OF ION BEAM INDUCED EPITAXIAL CRYSTALLIZATION 离子束诱导外延结晶的空位扩散模型
V. Hee
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引用次数: 0
INVESTIGATION OF THE INFLUENCE OF A HIGH OXYGEN OR NITROGEN CONTAMINATION ON THE ELECTRICAL ACTIVATION AND RESIDUAL DEFECT EVOLUTION OF ARSENIC IMPLANTED SILICON LAYERS 高氧或高氮污染对砷注入硅层电活化和残余缺陷演化影响的研究
R. Kogler, D. Baither
{"title":"INVESTIGATION OF THE INFLUENCE OF A HIGH OXYGEN OR NITROGEN CONTAMINATION ON THE ELECTRICAL ACTIVATION AND RESIDUAL DEFECT EVOLUTION OF ARSENIC IMPLANTED SILICON LAYERS","authors":"R. Kogler, D. Baither","doi":"10.1515/9783112575666-025","DOIUrl":"https://doi.org/10.1515/9783112575666-025","url":null,"abstract":"","PeriodicalId":432951,"journal":{"name":"EPM ’89: 3rd International Conference on Energy Pulse and Particle Beam Modification of Materials, September 4.–8. 1989, Dresden, GDR","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129936520","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
TEE BORON IMPLANTATION EFFECT ON STRUCTURAL-PHASE CHANGES IN THE SYST9I Zr-O/Ni PRODUCED BY ATOMIC MIXING 硼注入对原子混合制备Zr-O/Ni体系结构-相变化的影响
V. Goltsev, G. Götz, V. V. Khodaseyich, I. I. Erikhodko, V. V. Uglot
{"title":"TEE BORON IMPLANTATION EFFECT ON STRUCTURAL-PHASE CHANGES IN THE SYST9I Zr-O/Ni PRODUCED BY ATOMIC MIXING","authors":"V. Goltsev, G. Götz, V. V. Khodaseyich, I. I. Erikhodko, V. V. Uglot","doi":"10.1515/9783112575666-066","DOIUrl":"https://doi.org/10.1515/9783112575666-066","url":null,"abstract":"","PeriodicalId":432951,"journal":{"name":"EPM ’89: 3rd International Conference on Energy Pulse and Particle Beam Modification of Materials, September 4.–8. 1989, Dresden, GDR","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129951544","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
PHYSICAL AND ELECTROPHYSICAL PROPERTIES OF Ge2x(GaAs)1-x LAYERS INDUCED BY PULSE ELECTRON BEAM ANNEALING 脉冲电子束退火诱导的Ge2x(GaAs)1-x层的物理和电物理性质
V. I. Baljtjba, V. P. Vobonkdv, A. P. Vjatkin, N. I. Lebedeva, D. E. Psoskdhovsky
{"title":"PHYSICAL AND ELECTROPHYSICAL PROPERTIES OF Ge2x(GaAs)1-x LAYERS INDUCED BY PULSE ELECTRON BEAM ANNEALING","authors":"V. I. Baljtjba, V. P. Vobonkdv, A. P. Vjatkin, N. I. Lebedeva, D. E. Psoskdhovsky","doi":"10.1515/9783112575666-034","DOIUrl":"https://doi.org/10.1515/9783112575666-034","url":null,"abstract":"","PeriodicalId":432951,"journal":{"name":"EPM ’89: 3rd International Conference on Energy Pulse and Particle Beam Modification of Materials, September 4.–8. 1989, Dresden, GDR","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125713725","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
RAMAN SCATTERING IN HEAVILY DOPED SILICON LAYERS PREPARED WITH LASER ANNEALING 激光退火制备的重掺杂硅层中的拉曼散射
V. A. Geisler, R. Grötzschel, A. Dvurechenskii, T. V. Kuroohkina, Yu. A. Manzhosov
{"title":"RAMAN SCATTERING IN HEAVILY DOPED SILICON LAYERS PREPARED WITH LASER ANNEALING","authors":"V. A. Geisler, R. Grötzschel, A. Dvurechenskii, T. V. Kuroohkina, Yu. A. Manzhosov","doi":"10.1515/9783112575666-021","DOIUrl":"https://doi.org/10.1515/9783112575666-021","url":null,"abstract":"","PeriodicalId":432951,"journal":{"name":"EPM ’89: 3rd International Conference on Energy Pulse and Particle Beam Modification of Materials, September 4.–8. 1989, Dresden, GDR","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-12-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127093802","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
EPM ’89: 3rd International Conference on Energy Pulse and Particle Beam Modification of Materials, September 4.–8. 1989, Dresden, GDR
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