Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6635164
Eriko Mitsuyasu, T. Iwao, M. Yumoto, S. Tashiro, Manabu Tanaka
Summary form only given. The arc lighting to obtain the environment to evacuate, save the life, keep the safety and be comfortable are focus on. The lack of radiation intensity and color rendering is problem because of inappropriate energy balance. This research elucidates the color rendering affected by scandium vapor mixed with argon using wall-stabilized arc. The color rendering, lightness, radiation power and luminous efficacy increases with increasing the current and radius of wall-stabilized arc because of the increment of continuous spectrum emitted from high temperature argon. In addition, they increases with increasing the contamination ratio of scandium vapor using the xy coordinate in chromaticity diagram even if the temperature is low derived from the scandium vapor contamination. This research defines the aim area within 0.5 from the white color point of the xy coordinate in chromaticity diagram. When the wall-stabilized argon arc contaminates the scandium, the mean distance for this aim area becomes small with increasing the current, radius and contamination ratio of scandium. The improvement of color rendering occurs because of the control of balance between the continuous spectrum of argon and line spectrum of scandium with temperature distribution, current and radius of wall-stabilized argon arc. In addition, this appropriate temperature distribution is derived from the arc pinch.
{"title":"Color rendering affected by scandium vapor mixed with argon using wall-stabilized arc","authors":"Eriko Mitsuyasu, T. Iwao, M. Yumoto, S. Tashiro, Manabu Tanaka","doi":"10.1109/PLASMA.2013.6635164","DOIUrl":"https://doi.org/10.1109/PLASMA.2013.6635164","url":null,"abstract":"Summary form only given. The arc lighting to obtain the environment to evacuate, save the life, keep the safety and be comfortable are focus on. The lack of radiation intensity and color rendering is problem because of inappropriate energy balance. This research elucidates the color rendering affected by scandium vapor mixed with argon using wall-stabilized arc. The color rendering, lightness, radiation power and luminous efficacy increases with increasing the current and radius of wall-stabilized arc because of the increment of continuous spectrum emitted from high temperature argon. In addition, they increases with increasing the contamination ratio of scandium vapor using the xy coordinate in chromaticity diagram even if the temperature is low derived from the scandium vapor contamination. This research defines the aim area within 0.5 from the white color point of the xy coordinate in chromaticity diagram. When the wall-stabilized argon arc contaminates the scandium, the mean distance for this aim area becomes small with increasing the current, radius and contamination ratio of scandium. The improvement of color rendering occurs because of the control of balance between the continuous spectrum of argon and line spectrum of scandium with temperature distribution, current and radius of wall-stabilized argon arc. In addition, this appropriate temperature distribution is derived from the arc pinch.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"42 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86610145","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6635040
S. Jacq, C. Cardinaud, L. Le Brizoual, A. Granier
In microelectronics and microtechnology, as the semiconductor feature size decreases and pattern density increases, the industry is facing the challenge of finding new plasma processes to meet the requirement of the next devices generation. Within this scheme pulsed RF plasmas are increasingly being employed for plasma etching or deposition. Besides the interest for potential applications, pulsed plasmas combined to time resolved measurements are known to be powerful tools to study species kinetics.
{"title":"Effect of N2 addition on species kinetics in hydrogen and methane based inductively coupled pulsed plasmas","authors":"S. Jacq, C. Cardinaud, L. Le Brizoual, A. Granier","doi":"10.1109/PLASMA.2013.6635040","DOIUrl":"https://doi.org/10.1109/PLASMA.2013.6635040","url":null,"abstract":"In microelectronics and microtechnology, as the semiconductor feature size decreases and pattern density increases, the industry is facing the challenge of finding new plasma processes to meet the requirement of the next devices generation. Within this scheme pulsed RF plasmas are increasingly being employed for plasma etching or deposition. Besides the interest for potential applications, pulsed plasmas combined to time resolved measurements are known to be powerful tools to study species kinetics.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"11 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86754231","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6633200
A. Mermigkas, I. Timoshkin, S. Macgregor, M. Given, Mark P. Wilson, Tao Wang
Summary form only given. Power plants, internal combustion engines and other sources produce micron and sub-micron particles, which contaminate the air. This problem is faced mainly in large cities where both population and industrial activities are higher leading to significantly reduced air quality. Recent research has pointed out particles less than 2.5 μm in diameter (PM2.5) as a potential health hazard. In the light of these results directives and strict legislation has been put into force in order to reduce PM2.5 emissions. This research paper is focused on an impulsive microelectrostatic precipitation technology in order to charge and remove suspended particles from the air in an economically feasible way. HV impulses together with dc voltage has been used in order to energise the reactor as it has been shown to enhance the precipitation efficiency. In the present work a compact, yet larger in scale, coaxial precipitator has been developed for possible indoor applications. This precipitation system has been tested for removal of smoke and fine airborne particles from ambient air. In addition to the experimental part, analytical work has been conducted in order to optimize the electrostatic precipitation process and reduce power consumption.
{"title":"The use of impulsive corona discharges for the removal of fine particles in a novel coaxial electrostatic precipitator","authors":"A. Mermigkas, I. Timoshkin, S. Macgregor, M. Given, Mark P. Wilson, Tao Wang","doi":"10.1109/PLASMA.2013.6633200","DOIUrl":"https://doi.org/10.1109/PLASMA.2013.6633200","url":null,"abstract":"Summary form only given. Power plants, internal combustion engines and other sources produce micron and sub-micron particles, which contaminate the air. This problem is faced mainly in large cities where both population and industrial activities are higher leading to significantly reduced air quality. Recent research has pointed out particles less than 2.5 μm in diameter (PM2.5) as a potential health hazard. In the light of these results directives and strict legislation has been put into force in order to reduce PM2.5 emissions. This research paper is focused on an impulsive microelectrostatic precipitation technology in order to charge and remove suspended particles from the air in an economically feasible way. HV impulses together with dc voltage has been used in order to energise the reactor as it has been shown to enhance the precipitation efficiency. In the present work a compact, yet larger in scale, coaxial precipitator has been developed for possible indoor applications. This precipitation system has been tested for removal of smoke and fine airborne particles from ambient air. In addition to the experimental part, analytical work has been conducted in order to optimize the electrostatic precipitation process and reduce power consumption.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"10 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88895471","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6635077
D. Aguglia
The new linear accelerator (Linac4) under construction at CERN [1] is designed to provide a 160MeV negative hydrogen ions (H-) beam to the Proton Synchrotron Booster (PSB). Linac4 is intended to replace the ageing 50MeV Linac2 and aims to increase the LHC beam luminosity. Several H-sources are under development [2] in view of gradually increasing the H-intensity to 80 mA with a limited co-extracted electron beam of 1-1.5 A. Previous attempts to reach this H-beam intensity showed the necessity of replacing the source's high voltage DC power supplies with high voltage pulsed power converters, with the objective of mitigating destructive arc events inside the source between two RF pulses (beam extraction length of 700 μs with 2 Hz repetition rate).
{"title":"Design of a system of high voltage pulsed power converters for CERN's Linac4 H-ion source","authors":"D. Aguglia","doi":"10.1109/PLASMA.2013.6635077","DOIUrl":"https://doi.org/10.1109/PLASMA.2013.6635077","url":null,"abstract":"The new linear accelerator (Linac4) under construction at CERN [1] is designed to provide a 160MeV negative hydrogen ions (H-) beam to the Proton Synchrotron Booster (PSB). Linac4 is intended to replace the ageing 50MeV Linac2 and aims to increase the LHC beam luminosity. Several H-sources are under development [2] in view of gradually increasing the H-intensity to 80 mA with a limited co-extracted electron beam of 1-1.5 A. Previous attempts to reach this H-beam intensity showed the necessity of replacing the source's high voltage DC power supplies with high voltage pulsed power converters, with the objective of mitigating destructive arc events inside the source between two RF pulses (beam extraction length of 700 μs with 2 Hz repetition rate).","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"44 4","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91505392","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PPC.2013.6627435
S. Cui, Shaofei Wang, Weiduo Zhao
Over the past three decades, electromagnetic launch technology has made significant progress. Some researchers have begun to study the missile which is accelerated by a railgun to supersonic speed. Compared to conventional missile, an electromagnetic launch missile has the advantages of high muzzle velocity and strong concealment. However, a railgun represents a harsh electromagnetic environment for the missile. Pulse current in the railgun can produce a high amplitude and broad spectrum magnetic field. Electromagnetic interference might affect any sensitive electrical devices that the missile is being equipped with. For this reason, it is necessary to study the missile magnetic field shield in rail launcher environment. This paper has built 3D model of the railgun and missile. Using finite-element analysis, we study separately missile inner magnetic field distribution under various shielding configurations, including monolayer shield-multilayer shield and the shield body with having hole. The shielding effectiveness (SE) of various shielding configurations is presented. Based on the above results, we design a kind of double layer shielding for missile in railgun. And this paper investigates the impact of the drilling point the hole size and the opening directions in shielding performance. In addition, we found that the electromagnetic force on the armature, namely, inductance gradient becomes large because of magnetic field shielding of missile. The relation between inductance gradient and shield has been analyzed. Study shows that inductance gradient is increased by 20%.
{"title":"Magnetic field shielding of electromagnetic launch missile","authors":"S. Cui, Shaofei Wang, Weiduo Zhao","doi":"10.1109/PPC.2013.6627435","DOIUrl":"https://doi.org/10.1109/PPC.2013.6627435","url":null,"abstract":"Over the past three decades, electromagnetic launch technology has made significant progress. Some researchers have begun to study the missile which is accelerated by a railgun to supersonic speed. Compared to conventional missile, an electromagnetic launch missile has the advantages of high muzzle velocity and strong concealment. However, a railgun represents a harsh electromagnetic environment for the missile. Pulse current in the railgun can produce a high amplitude and broad spectrum magnetic field. Electromagnetic interference might affect any sensitive electrical devices that the missile is being equipped with. For this reason, it is necessary to study the missile magnetic field shield in rail launcher environment. This paper has built 3D model of the railgun and missile. Using finite-element analysis, we study separately missile inner magnetic field distribution under various shielding configurations, including monolayer shield-multilayer shield and the shield body with having hole. The shielding effectiveness (SE) of various shielding configurations is presented. Based on the above results, we design a kind of double layer shielding for missile in railgun. And this paper investigates the impact of the drilling point the hole size and the opening directions in shielding performance. In addition, we found that the electromagnetic force on the armature, namely, inductance gradient becomes large because of magnetic field shielding of missile. The relation between inductance gradient and shield has been analyzed. Study shows that inductance gradient is increased by 20%.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"319 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91523137","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6633247
Yiting Zhang, M. Kushner, S. Nam, S. Sriraman
Summary form only given. Dual frequency capacitively coupled plasmas provide the microelectronics fabrication industry flexible control, high selectivity and uniformity. The spatial variation of the phases, magnitude and wavelength of the high frequency (HF) rf bias will affect electron density, electron temperature, sheath thickness and ion transit time through the sheath. These variations ultimately affect the ion energy and angular distributions (IEADs) to the substrate which are of critical importance for anisotropic etching or deposition. To optimize the separate control of rates of ionization and IEADs, the HF should be significantly different than the low frequency (LF), which results in the LF being few MHz. For classical sinusoidal rf biases applied on the same electrode, the HF/LF harmonic currents can be distinguished by their Fourier transforms. Recently, nonsinusoidal bias waveforms are being applied in etching recipes to control etching speed and selectivity, which then complicates separating the HF from LF since both now have high harmonic contents. In this paper, we report on a computational investigation of the rf power absorption, power coupling control and IEADs in a CCP resembling those industrially employed with dual-frequency biases both applied to the wafer substrate. The Hybrid Plasma Equipment Module (HPEM) was employed to predict plasma properties and obtain the harmonic contributions of voltage waveforms applied to the same electrode. The operating conditions are 20-50 mTorr in pure Ar and Ar/C4F8/O2 gas mixtures under with 2 MHz + 60 MHz rf biases. The ratio of the HF/LF power can be used to control plasma density, and provide extra control for the width and energy of the IEADs.
{"title":"Computational investigation of dual-frequency power transfer in capacitively coupled plasmas","authors":"Yiting Zhang, M. Kushner, S. Nam, S. Sriraman","doi":"10.1109/PLASMA.2013.6633247","DOIUrl":"https://doi.org/10.1109/PLASMA.2013.6633247","url":null,"abstract":"Summary form only given. Dual frequency capacitively coupled plasmas provide the microelectronics fabrication industry flexible control, high selectivity and uniformity. The spatial variation of the phases, magnitude and wavelength of the high frequency (HF) rf bias will affect electron density, electron temperature, sheath thickness and ion transit time through the sheath. These variations ultimately affect the ion energy and angular distributions (IEADs) to the substrate which are of critical importance for anisotropic etching or deposition. To optimize the separate control of rates of ionization and IEADs, the HF should be significantly different than the low frequency (LF), which results in the LF being few MHz. For classical sinusoidal rf biases applied on the same electrode, the HF/LF harmonic currents can be distinguished by their Fourier transforms. Recently, nonsinusoidal bias waveforms are being applied in etching recipes to control etching speed and selectivity, which then complicates separating the HF from LF since both now have high harmonic contents. In this paper, we report on a computational investigation of the rf power absorption, power coupling control and IEADs in a CCP resembling those industrially employed with dual-frequency biases both applied to the wafer substrate. The Hybrid Plasma Equipment Module (HPEM) was employed to predict plasma properties and obtain the harmonic contributions of voltage waveforms applied to the same electrode. The operating conditions are 20-50 mTorr in pure Ar and Ar/C4F8/O2 gas mixtures under with 2 MHz + 60 MHz rf biases. The ratio of the HF/LF power can be used to control plasma density, and provide extra control for the width and energy of the IEADs.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"38 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83013741","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PPC.2013.6627473
J. Macdonald, J. Threadgold, K. Webb, S. Chima
Summary form only given. The repeatability of the radiographic performance of the Self Magnetic Pinch (SMP) diode is crucial to its use in Hydrodynamic experiments. Years of experience of operation at AWE have shown that its repeatability is dependant upon the build quality of the diode, this includes component initial design, manufacture, storage, preparation and installation. A program of work is being undertaken to enhance repeatability of the diode preparation process. As part of this program an electroplating method to prepare the cathode is being investigated. Reported here is work carried out to investigate the surface finish that can be achieved from both traditionally hand painted and electroplated cathodes as well as the results of an experimental series carried out to compare the performance of cathodes prepared using the two techniques.
{"title":"Comparison of electroplated and hand painted cathodes on self magnetic pinch radiographic diode operation","authors":"J. Macdonald, J. Threadgold, K. Webb, S. Chima","doi":"10.1109/PPC.2013.6627473","DOIUrl":"https://doi.org/10.1109/PPC.2013.6627473","url":null,"abstract":"Summary form only given. The repeatability of the radiographic performance of the Self Magnetic Pinch (SMP) diode is crucial to its use in Hydrodynamic experiments. Years of experience of operation at AWE have shown that its repeatability is dependant upon the build quality of the diode, this includes component initial design, manufacture, storage, preparation and installation. A program of work is being undertaken to enhance repeatability of the diode preparation process. As part of this program an electroplating method to prepare the cathode is being investigated. Reported here is work carried out to investigate the surface finish that can be achieved from both traditionally hand painted and electroplated cathodes as well as the results of an experimental series carried out to compare the performance of cathodes prepared using the two techniques.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"37 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79088817","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6634800
A. Steuer, J. Zhuang, J. Kolb, G. Daeschlein
Summary form only given. Pulsed electric fields can charge the membranes of biological cells and as a result change cell morphologies and cell functions. Subcellular structures are stronger affected by exposures to pulses with durations that are short in comparison with the charging time of the cell's boundary. Conversely, longer pulses primarily affect the outer membrane. As a consequence there is a wide range of opportunities for applications, depending on pulse duration and pulse amplitude. The formation of pores in the plasma membrane, also known as electroporation, can be used to deliver drugs and genes into cells. Effects on organelles can change subcellular biochemistry and trigger cascade pathways such as the induction of apoptosis1. The latter mechanism is currently exploited as potentially novel cancer therapy. Studies so far have mostly focused on the interaction between pulsed electric fields and individual cells in vitro or on empirical investigations of treatment efficacies in vivo. However, an understanding of therapies that are based on pulsed electric fields further requires closing our gap in knowledge about processes affecting connected cells, i.e. the response of tissues. In fact communication between cells or impairment of communication pathways is a crucial factor in many diseases 2. The topic of our investigations are pulsed electric field effects on tissue with respect to tissue structures and properties and thus in particular the effect on the propagation of a stimulus across several cells. Cell-cell-communication via gap junctions will be examined by injecting a fluorescent dye into a single cell of a monolayer of liver cells. The propagation of the dye to adjacent cells after the exposure to a pulsed electric field will be compared to the propagation in unexposed cells. Concurrently special attention will be paid to the response at different temperatures. Based on our findings we hypothesize to be able to manipulate cell-cellcommunication with pulsed electric fields and possibly provide an additional pathway to increase treatment efficacies.
{"title":"Effect of pulsed electric fields on cell-cell-communication via gap junctions in cell-monolayers","authors":"A. Steuer, J. Zhuang, J. Kolb, G. Daeschlein","doi":"10.1109/PLASMA.2013.6634800","DOIUrl":"https://doi.org/10.1109/PLASMA.2013.6634800","url":null,"abstract":"Summary form only given. Pulsed electric fields can charge the membranes of biological cells and as a result change cell morphologies and cell functions. Subcellular structures are stronger affected by exposures to pulses with durations that are short in comparison with the charging time of the cell's boundary. Conversely, longer pulses primarily affect the outer membrane. As a consequence there is a wide range of opportunities for applications, depending on pulse duration and pulse amplitude. The formation of pores in the plasma membrane, also known as electroporation, can be used to deliver drugs and genes into cells. Effects on organelles can change subcellular biochemistry and trigger cascade pathways such as the induction of apoptosis1. The latter mechanism is currently exploited as potentially novel cancer therapy. Studies so far have mostly focused on the interaction between pulsed electric fields and individual cells in vitro or on empirical investigations of treatment efficacies in vivo. However, an understanding of therapies that are based on pulsed electric fields further requires closing our gap in knowledge about processes affecting connected cells, i.e. the response of tissues. In fact communication between cells or impairment of communication pathways is a crucial factor in many diseases 2. The topic of our investigations are pulsed electric field effects on tissue with respect to tissue structures and properties and thus in particular the effect on the propagation of a stimulus across several cells. Cell-cell-communication via gap junctions will be examined by injecting a fluorescent dye into a single cell of a monolayer of liver cells. The propagation of the dye to adjacent cells after the exposure to a pulsed electric field will be compared to the propagation in unexposed cells. Concurrently special attention will be paid to the response at different temperatures. Based on our findings we hypothesize to be able to manipulate cell-cellcommunication with pulsed electric fields and possibly provide an additional pathway to increase treatment efficacies.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"103 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83419073","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6633457
J. Kelley, D. Wetz, G. Turner, I. Cohen
Summary form only given. Many pulsed power systems (PPSs) are fielded in civilian applications however the vast majorities are developed for use in areas of defense. The PPSs are almost always high power/energy in nature and are often required to operate in a fast repetitive mode of operation. This load profile is extremely taxing on the fossil fuel based generators from which the prime power originates when used in forward operating bases (FOBs) or aboard movable platforms. Conventional electrical grid architectures, which are used both on land and aboard movable vehicles, are being transitioned into MicroGrids, which integrate as many different types of distributed electrical generation sources (DEGSs) as possible. As this conversion process unfolds, it is critical to understand what generation sources are needed to ensure that both conventional AC loads and high repetitive pulsed power loads can be sourced simultaneously without impacting the power quality of either. Many of the DEGSs being installed are renewable technologies which are often either power or energy dense but not both. Since pulsed power loads are vastly different than conventional loads, evaluation of how to integrate them into these new grid architectures is needed. Hybrid energy storage modules (HESMs) that integrate various energy storage technologies such as lithium-ion batteries, lithium-ion capacitors, and electric double layer capacitors, will play a key role in leveling the simultaneous operation of these types of loads. Further, novel bi-directional power electronic converters are needed to intelligently control and optimize the flow of energy from all of the vastly different generation sources. While much research is being performed in the area of MicroGrids, few are evaluating the integration of pulsed power loads. Research, sponsored by the US Office of Naval Research, is being performed at UT Arlington to evaluate how the power quality is impacted when high power conventional and pulsed power loads are sourced simultaneously. A MicroGrid testbed has been developed which is capable of simulating the operation of pulsed power loads simultaneously with high power AC loads. The rational for the research, the grid architecture, and the results collected thus far will be discussed.
{"title":"Integration of pulsed loads into a Microgrid architecture","authors":"J. Kelley, D. Wetz, G. Turner, I. Cohen","doi":"10.1109/PLASMA.2013.6633457","DOIUrl":"https://doi.org/10.1109/PLASMA.2013.6633457","url":null,"abstract":"Summary form only given. Many pulsed power systems (PPSs) are fielded in civilian applications however the vast majorities are developed for use in areas of defense. The PPSs are almost always high power/energy in nature and are often required to operate in a fast repetitive mode of operation. This load profile is extremely taxing on the fossil fuel based generators from which the prime power originates when used in forward operating bases (FOBs) or aboard movable platforms. Conventional electrical grid architectures, which are used both on land and aboard movable vehicles, are being transitioned into MicroGrids, which integrate as many different types of distributed electrical generation sources (DEGSs) as possible. As this conversion process unfolds, it is critical to understand what generation sources are needed to ensure that both conventional AC loads and high repetitive pulsed power loads can be sourced simultaneously without impacting the power quality of either. Many of the DEGSs being installed are renewable technologies which are often either power or energy dense but not both. Since pulsed power loads are vastly different than conventional loads, evaluation of how to integrate them into these new grid architectures is needed. Hybrid energy storage modules (HESMs) that integrate various energy storage technologies such as lithium-ion batteries, lithium-ion capacitors, and electric double layer capacitors, will play a key role in leveling the simultaneous operation of these types of loads. Further, novel bi-directional power electronic converters are needed to intelligently control and optimize the flow of energy from all of the vastly different generation sources. While much research is being performed in the area of MicroGrids, few are evaluating the integration of pulsed power loads. Research, sponsored by the US Office of Naval Research, is being performed at UT Arlington to evaluate how the power quality is impacted when high power conventional and pulsed power loads are sourced simultaneously. A MicroGrid testbed has been developed which is capable of simulating the operation of pulsed power loads simultaneously with high power AC loads. The rational for the research, the grid architecture, and the results collected thus far will be discussed.","PeriodicalId":6313,"journal":{"name":"2013 Abstracts IEEE International Conference on Plasma Science (ICOPS)","volume":"4 1","pages":"1-1"},"PeriodicalIF":0.0,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83393772","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2013-06-16DOI: 10.1109/PLASMA.2013.6634850
L. Ludeking, L. W. Cavey, A. Woods
Summary form only given. The MAGIC Tool Suite [1] is FDTD-PIC software designed for the simulation of plasma wave interactions in complex geometries. Complex geometries often require elaborate command language scripts. Thus prototyping a new device can be cumbersome and time consuming. Recent enhancements to MAGIC allow for more efficient generation of several common complex geometries. In addition, by using Trimble Sketchup we can make the process visual and relatively intuitive. We demonstrate the use of Trimble Sketchup to generate complex three dimensional geometries. Sketchup is attractive as an inexpensive modeling tool which allows for customized scripts (plugins) which can then save the geometry to the command data format used by the MAGIC Tool Suite. Sketchup may be customized with an Application Procedural Interface (API), we provide for easy modeling of complex structure such as waveguide, cavities, helices, and serpentine waveguides. The customization includes: Buttons to select particular shapes, visualization control of the shapes, dialogs to specify material properties, and finally export as MAGIC Tool Suite Script commands. Of particular importance is the automatic generation of the MAGIC command script for the geometry and the specification of coordinate system. In this paper we will illustrate the use of Sketchup to generate the geometry models for the following microwave devices: An helix TWT, a Serpentine traveling wave circuit, and a multi-cavity klystron circuit.
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