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Annealing Effects on Mechanically Damaged ZnO Ceramics 机械损伤ZnO陶瓷的退火效应
Pub Date : 1988-05-16 DOI: 10.1002/PSSA.2211070120
P. Fernández, J. Llopis, J. Piqueras
Annealing experiments in nitrogen, oxygen, and reducing atmospheres are made on mechanically damaged ZnO ceramics. The annealing effect is monitored by means of the sample CL emission. Deformation induced damage appears to be unstable at temperatures above 1040 K indepently of the annealing atmosphere. The role played by reducing and oxidizing treatments on the CL changes in damaged areas is discussed on the basis of different charge states of copper. Der Einflus des Anlassens in N2, O2 und in reduzierenden Atmospharen auf verformte ZnO-Keramik-Proben wird mittels Kathodolumineszenz untersucht. Die von der Verformung erzeugte Defektstruktur ist instabil beim Anlassen uber 1040 K, unabhangig von der Behandlungsatmosphare. Der Effekt von oxydierenden und reduzierenden Behandlungen auf die KL von geschadigten Probengebieten wird auf der Basis der Zustande von Kupferverunreinigungen diskutiert.
合并氮气氧气和减少大气层是机械震动ZnO ceramics的试验方法合并效应是samcro的地址未经高温压制住大气层,原属一属1040克它设定了减少和氧化处理不同的二分之一利用双筒火箭筒对N2、O2和缩水的zo陶瓷样本的影响进行分析。歪曲的错误结构由治好法产生,原属不稳定,由治疗方案必不可少。oxydierenden和reduzierenden治疗方法的效果的升geschadigten Probengebieten的基础上由Kupferverunreinigungen .讨论
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引用次数: 5
Generation and Characterization of Thick Silicon-on-Insulator Films 厚绝缘体上硅薄膜的制备与表征
Pub Date : 1988-05-16 DOI: 10.1002/PSSA.2211070129
B. Tillack, R. Banisch, H. Richter
Seeded recrystallization of thick (up to 25 μm) polycrystalline silicon on SiO2 using zone melting technique provides films which contain no grain boundaries and exhibit large areas without subgrain boundaries (mm2). The results, especially the comparison of the two irradiation systems used (laser and strip heater), indicate the dominating role of the thermal gradient at the crystallization front for the origin and arrangement of defects. The electrical properties measured at CMOS transistors and diodes are comparable to a bulk reference preparation. Die Rekristallisation von dickem, polykristallinem Silizium auf SiO2 in einem Zonenschmelzprozes fuhrt bei Verwendung eines Kristallisationskeimes zu Schichten, die keine Krongrenzen enthalten und ausgedehnte Gebiete ohne Kleinwinkelkorngrenzen aufweisen (mm2). Die dargestellten Ergebnisse, besonders der Vergleich der Bestrahlung mit Laser und Streifenheizer, zeigen den dominierenden Einflus des Temperaturgradienten an der Kristallisationsfront auf die Entstehung und Anordnung der Defekte. CMOS-Transistoren und Dioden, erzeugt in den SOI-Schichten, haben mit in einkristallinen Substraten praparierten Strukturen vergleichbare Eigenschaften.
Seeded recrystallization of thick (up to 25μm) polycrystalline矽on SiO2教科书区melting technique provides电影的contain无空boundaries and exhibit大型areas菲subgrain boundaries (mm2) .结果是,虽然使用了“两层推力和脱臼”比较,但再明显不过“炉灶里的火”是《制造失败的尾部》的基本原理。特别需要电力和电力实施的后续措施当你用结晶过程,结晶时,它会给SiO2层结晶,过程是结晶过程中的结晶。这种结晶过程会形成不含王冠边境线的一层,无垠的无缩结边长(mm2)。这里所展现的结果,特别是对镭射光和带线粒体放射度的比较,反映了在结晶线温度斜线的影响。cmos晶体管和冠心病是在索尔基下等体所产生的可与此相比。
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引用次数: 3
Time-Domain Spectroscopy. Method for Investigation of YSZ 时域光谱。YSZ的调查方法
Pub Date : 1988-05-16 DOI: 10.1002/PSSA.2211070124
M. Hrobár, I. Travěnec
A method for investigating the properties of YSZ by time-domain spectroscopy is described. Simple calculation shows that there are cases where this spectroscopy can distinguish processes not separable by classical Bauerle impedance spectroscopy. Several measurements are performed to demonstrate the ability of this method to investigate the electro-physical properties of YSZ. Eine Methode zum Untersuchen der Eigenschaften von YSZ mittels Transientspektroskopie wird beschrieben. Eine einfache Rechnung zeigt die Existenz der Falle, wo diese Spektroskopie mehrere Prozesse identifizieren kann, die bei der klassischen Bauerle-Impedanzspektroskopie nicht voneinander zu trennen waren. Einige Messungen werden gemacht, um zu demonstrieren, das sich diese Methode dazu eignet, die elektro-physikalischen Eigenschaften von YSZ zu untersuchen.
土地之眼能带走这一切很简单的计算,那里的猫腻可以做出经典可忽略不满足的经典构造。实施需要说明YSZ所有化学物能增加这种投资方法的可接受性。本文还描述了一种检测YSZ质对质的方法。简单的计算可以揭示出这种光谱探求原理的存在,可以识别出很多不能从典型的土生土化结构中分离出来的过程。人们进行了一些实验,以证明这些实验能够分析YSZ的电子物理特性。
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引用次数: 1
Influence of Pipe Diffusion of Defects on the Amplitude Dependence of Hysteresis Internal Friction 缺陷管道扩散对迟滞内摩擦幅值依赖性的影响
Pub Date : 1988-05-16 DOI: 10.1002/PSSA.2211070113
I. Т. Suprun
Formulae are obtained which describe the damping decrement of hysteresis dislocation internal friction with due account of pipe diffusion of mobile pinning points. The amplitude dependence of a damping decrement is described by a non-monotoneous function which has maximum at some value of the applied stress amplitude. The asymptotic formulae are obtained for the damping decrement at low and high amplitudes. The pipe diffusion of pinning points results in the displacement of both the beginning of an amplitude dependence and the point of maximum into the region of low amplitudes. The question is dicsussed about the influence of a number of mobile pinning points and the energy of dislocation interaction with point defect on the amplitude dependence of internal friction. [Russian Text Ignored]
得到了考虑可动钉点管道扩散的滞回位错内摩擦阻尼减量的计算公式。阻尼减量的幅值依赖性由一个非单调函数来描述,该函数在施加应力幅值的某个值处有最大值。得到了低幅和高幅时阻尼衰减的渐近公式。钉点的管道扩散导致幅值依赖的起始点和最大值点向低幅值区域的位移。讨论了活动钉点数和位错与点缺陷相互作用能量对内摩擦幅值依赖性的影响。[俄语文本被忽略]
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引用次数: 2
Influence of Argon Implantation on the Formation of Platinum Silicides 注入氩气对铂硅化物形成的影响
Pub Date : 1988-05-16 DOI: 10.1002/PSSA.2211070154
V. Borisenko, D. I. Zarovskii, V. Tokarev
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引用次数: 2
Charge Transport in Cu-Cd Ferrospinels Cu-Cd铁尖晶石中的电荷输运
Pub Date : 1985-12-31 DOI: 10.1515/9783112495124-040
S. Mazen, A. A. Ghani, A. Ashour
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引用次数: 1
Frontmatter
Pub Date : 1985-12-31 DOI: 10.1515/9783112495124-fm
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引用次数: 0
Frontmatter
Pub Date : 1985-12-31 DOI: 10.1515/9783112494646-fm
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引用次数: 0
Injection of Degenerate Electron-Hole Plasma 简并电子空穴等离子体的注入
Pub Date : 1985-12-31 DOI: 10.1515/9783112495124-004
Yu. A. Katulevskii
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引用次数: 0
Liquidus Curves of Eutectic Na-K and Na-Cs Systems from Semiempirical Theories of Mixtures 从半经验混合理论看共晶Na-K和Na-Cs体系的液相曲线
Pub Date : 1985-12-31 DOI: 10.1515/9783112494646-006
L. J. Gallego, J. Somoza, J. A. Alonso
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引用次数: 0
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May 16
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