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2021 IEEE 17th International Conference on Group IV Photonics (GFP)最新文献

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Parametric Monte-Carlo Characterization of Si Ring Modulators 硅环调制器的参数蒙特卡罗表征
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673952
Youngkwan Jo, Yongjin Ji, Minkyu Kim, S. Lischke, C. Mai, L. Zimmermann, W. Choi
Monte-Carlo characterization based on the Si ring modulator equivalent circuit is performed for the modulation frequency responses based on experimentally determined key behavior model parameter distributions. Such Montel-Carlo characterization allows prediction of the statistical distribution of the performance metrics for Si photonic integrated circuit design.
基于实验确定的关键行为模型参数分布,基于硅环调制器等效电路对调制频率响应进行蒙特卡罗表征。这种蒙特卡罗表征允许预测Si光子集成电路设计的性能指标的统计分布。
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引用次数: 0
High-Q-factor tellurium oxide clad silicon microring resonators 高q因子氧化碲包覆硅微环谐振器
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673831
K. M. Kiani, Dawson B. Bonneville, A. Knights, J. Bradley
We present the design and experimental measurement of high-Q-factor on-chip tellurium-oxide-coated silicon microring resonators with internal Q factors of up to 1.5 × 106, corresponding to 0.4 dB/cm waveguide loss, at wavelengths around 1550 nm.
我们提出了高Q因子片上氧化碲涂层硅微环谐振器的设计和实验测量,其内部Q因子高达1.5 × 106,对应于0.4 dB/cm波导损耗,波长约为1550 nm。
{"title":"High-Q-factor tellurium oxide clad silicon microring resonators","authors":"K. M. Kiani, Dawson B. Bonneville, A. Knights, J. Bradley","doi":"10.1109/GFP51802.2021.9673831","DOIUrl":"https://doi.org/10.1109/GFP51802.2021.9673831","url":null,"abstract":"We present the design and experimental measurement of high-Q-factor on-chip tellurium-oxide-coated silicon microring resonators with internal Q factors of up to 1.5 × 106, corresponding to 0.4 dB/cm waveguide loss, at wavelengths around 1550 nm.","PeriodicalId":158770,"journal":{"name":"2021 IEEE 17th International Conference on Group IV Photonics (GFP)","volume":"24 4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133540923","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Genetic optimisation of Brillouin gain in subwavelength-structured silicon membranes 亚波长结构硅膜布里渊增益的遗传优化
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673808
P. N. Ruano, J. Zhang, D. Melati, X. Roux, E. Cassan, D. Marris-Morini, L. Vivien, N. Lanzillotti-Kimura, C. Alonso Ramos
Brillouin optomechanics has a great potential for applications in communications and sensing. Here, we propose a new strategy to optimize Brillouin gain in silicon waveguides. We exploit optomechanic subwavelength engineering and multi-physics genetic optimization to achieve a Brillouin gain of 3300 W−1m−1 at 14.79 GHz.
布里渊光力学在通信和传感领域具有巨大的应用潜力。本文提出了一种优化硅波导布里渊增益的新策略。我们利用光力学亚波长工程和多物理场遗传优化,在14.79 GHz下实现了3300 W−1m−1的布里渊增益。
{"title":"Genetic optimisation of Brillouin gain in subwavelength-structured silicon membranes","authors":"P. N. Ruano, J. Zhang, D. Melati, X. Roux, E. Cassan, D. Marris-Morini, L. Vivien, N. Lanzillotti-Kimura, C. Alonso Ramos","doi":"10.1109/GFP51802.2021.9673808","DOIUrl":"https://doi.org/10.1109/GFP51802.2021.9673808","url":null,"abstract":"Brillouin optomechanics has a great potential for applications in communications and sensing. Here, we propose a new strategy to optimize Brillouin gain in silicon waveguides. We exploit optomechanic subwavelength engineering and multi-physics genetic optimization to achieve a Brillouin gain of 3300 W−1m−1 at 14.79 GHz.","PeriodicalId":158770,"journal":{"name":"2021 IEEE 17th International Conference on Group IV Photonics (GFP)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122213227","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A multi-wavelength III-V/Si hybrid DFB laser with even wavelength spacing and uniform output power 一种波长间隔均匀、输出功率均匀的多波长III-V/Si混合DFB激光器
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673975
Ranjeet Kumar, Duanni Huang, M. Sakib, G. Su, Chaoxuan Ma, Xinru Wu, H. Rong
We demonstrate a four-wavelength DFB laser with 140 GHz wavelength spacing, 8.0 dBm/wavelength output power, <-140 dB/Hz RIN, and <300 kHz linewidth. We achieved >13 dBm/wavelength fiber coupled power with an amplifier. The wavelength spacing and power variations are <±5 GHz and <±0.8 dB, respectively.
设计了一种波长间隔为140 GHz、输出功率为8.0 dBm/波长、光纤耦合功率为13 dBm/波长的四波长DFB激光器。波长间隔<±5 GHz,功率变化<±0.8 dB。
{"title":"A multi-wavelength III-V/Si hybrid DFB laser with even wavelength spacing and uniform output power","authors":"Ranjeet Kumar, Duanni Huang, M. Sakib, G. Su, Chaoxuan Ma, Xinru Wu, H. Rong","doi":"10.1109/GFP51802.2021.9673975","DOIUrl":"https://doi.org/10.1109/GFP51802.2021.9673975","url":null,"abstract":"We demonstrate a four-wavelength DFB laser with 140 GHz wavelength spacing, 8.0 dBm/wavelength output power, <-140 dB/Hz RIN, and <300 kHz linewidth. We achieved >13 dBm/wavelength fiber coupled power with an amplifier. The wavelength spacing and power variations are <±5 GHz and <±0.8 dB, respectively.","PeriodicalId":158770,"journal":{"name":"2021 IEEE 17th International Conference on Group IV Photonics (GFP)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127936018","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of Resonant-Characteristics-Monitorable Si Wavelength Filter Using Face-To-Face Loop Mirrors For Heterogeneous Integrated Tunable Lasers 非均质集成可调谐激光器用面对面环镜设计谐振特性可监测的Si波长滤波器
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673924
Takanori Sato, T. Fujisawa, Takuya Mitarai, T. Hiratani, T. Okimoto, T. Ishikawa, N. Kono, Naoki Fujiwara, H. Yagi, K. Saitoh
A Si wavelength filter using face-to-face loop mirrors is newly proposed. It has two resonant modes that can be excited from different access ports. By using it as an external resonator in III-V/Si hybrid lasers, the resonant characteristics in each filter can be directly monitored.
提出了一种采用面对面环镜的硅波长滤波器。它具有两种谐振模式,可以从不同的接入端口激发。将其作为III-V/Si混合激光器的外腔,可直接监测各滤波器的谐振特性。
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引用次数: 0
Photodetection at 3.8 µm Using Intrinsic Monolithic Integrated Germanium Photodiodes 利用单片集成锗光电二极管在3.8µm处进行光电探测
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673858
L. Reid, M. Nedeljkovic, W. Cao, L. Mastronardi, R. Slavík, G. Mashanovich
Ge-on-SOI waveguide integrated photodiodes are demonstrated with a high responsivity of 0.1 A/W at a wavelength of 3.8 µm at room temperature. This is the first example of photodetection at 3.8 µm on an intrinsic germanium integrated detector.
在室温下,Ge-on-SOI波导集成光电二极管在3.8µm波长下具有0.1 a /W的高响应度。这是在本征锗集成探测器上进行3.8µm光探测的第一个例子。
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引用次数: 0
ZnS antireflection coating for Silicon for MIR - LWIR applications 用于MIR - LWIR的硅用ZnS增透涂层
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673918
Christian De Vita, M. Asa, M. Urquia, M. E. Castagna, C. Somaschini, F. Morichetti, A. Melloni
An antireflection coating (ARC) for silicon devices operating at 10 μm has been designed, fabricated and validated. The ARC is based on ZnS and Al2O3 and is deposited at room temperature. Both single and double side ARCs are considered, demonstrating a transmission enhancement respectively of 66% and 89% with respect to an uncoated silicon device.
设计、制作并验证了一种工作在10 μm的硅器件抗反射涂层(ARC)。电弧是基于ZnS和Al2O3,并在室温下沉积。考虑了单侧和双面电弧,表明相对于未涂覆的硅器件,传输增强分别为66%和89%。
{"title":"ZnS antireflection coating for Silicon for MIR - LWIR applications","authors":"Christian De Vita, M. Asa, M. Urquia, M. E. Castagna, C. Somaschini, F. Morichetti, A. Melloni","doi":"10.1109/GFP51802.2021.9673918","DOIUrl":"https://doi.org/10.1109/GFP51802.2021.9673918","url":null,"abstract":"An antireflection coating (ARC) for silicon devices operating at 10 μm has been designed, fabricated and validated. The ARC is based on ZnS and Al2O3 and is deposited at room temperature. Both single and double side ARCs are considered, demonstrating a transmission enhancement respectively of 66% and 89% with respect to an uncoated silicon device.","PeriodicalId":158770,"journal":{"name":"2021 IEEE 17th International Conference on Group IV Photonics (GFP)","volume":"79 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117017581","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Engineering Low Dark Current Density for Ge-on-Si Photodiodes 工程低暗电流密度锗硅光电二极管
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673841
E. Postelnicu, S. Marzen, Rui‐Tao Wen, D. Ma, Baoming Wang, K. Wada, J. Michel, L. Kimerling
We have studied the roles of 425-800C post-growth annealing and ALD surface passivation on the dark current of Geon-Si p-i-n photodiodes. Sidewall passivation via Al2O3 deposition at 250C removes all peripheral leakage components. These processes yield a mean value of Jd = 160nA/cm2 at -1V.
我们研究了425-800C生长后退火和ALD表面钝化对gan - si p-i-n光电二极管暗电流的影响。在250℃下通过Al2O3沉积的侧壁钝化去除所有外围泄漏成分。这些过程在-1V时产生Jd = 160nA/cm2的平均值。
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引用次数: 2
Ge-on-Si camera for NIR detection 用于近红外探测的锗硅相机
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673939
M. Oehme, M. Kaschel, M. Wanitzek, Steffen Epple, Xin Zhou, Zili Yu, D. Schwarz, J. Burghartz, J. Schulze
A Ge-on-Si camera for NIR detection with backside illumination, is presented. A 10x10 pixel array is controlled with a readout chip and a microcontroller, which is connected via USB. A linear behavior between digital output and optical power over a large dynamic range is shown.
介绍了一种具有背面照明的锗硅近红外相机。一个10x10像素阵列由一个读出芯片和一个微控制器控制,微控制器通过USB连接。在大动态范围内,数字输出和光功率呈线性关系。
{"title":"Ge-on-Si camera for NIR detection","authors":"M. Oehme, M. Kaschel, M. Wanitzek, Steffen Epple, Xin Zhou, Zili Yu, D. Schwarz, J. Burghartz, J. Schulze","doi":"10.1109/GFP51802.2021.9673939","DOIUrl":"https://doi.org/10.1109/GFP51802.2021.9673939","url":null,"abstract":"A Ge-on-Si camera for NIR detection with backside illumination, is presented. A 10x10 pixel array is controlled with a readout chip and a microcontroller, which is connected via USB. A linear behavior between digital output and optical power over a large dynamic range is shown.","PeriodicalId":158770,"journal":{"name":"2021 IEEE 17th International Conference on Group IV Photonics (GFP)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124444291","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Bandgap closure in 1D photonic crystals from interplay between Mie resonances 一维光子晶体中Mie共振相互作用下的带隙闭合
Pub Date : 2021-12-01 DOI: 10.1109/GFP51802.2021.9673954
E. Díaz-Escobar, Á. Barreda, L. Mercadé, A. Griol, A. Martínez
In this work, we study a 1D silicon photonic formed by a set of silicon nanobricks, which supports a Bragg photonic bandgap (PBG) for TE-like polarization. We show that the Bragg PBG can vanish because of the interplay between the electric and magnetic dipole of its constituent silicon nanobricks.
在这项工作中,我们研究了由一组硅纳米砖形成的一维硅光子,它支持类似te极化的Bragg光子带隙(PBG)。我们发现Bragg PBG可以消失是因为其组成硅纳米砖的电偶极子和磁偶极子之间的相互作用。
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引用次数: 0
期刊
2021 IEEE 17th International Conference on Group IV Photonics (GFP)
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