The ubiquitous Schottky barrier (SB) formation at metal-semiconductor interfaces remains a fundamental challenge that degrades device performance, while achieving Ohmic contacts in 2D heterostructures could revolutionize nanoelectronics. Herein, we employ first-principles calculations to systematically investigate the SB modulation mechanisms in 2D TaSe2/SeMoSiP2 heterostructures. Four energetically stable configurations (Ⅰ-Ⅳ) are identified, exhibiting distinct contact characteristics: 1T-phase-based types Ⅰ and Ⅱ form n-type Schottky contacts with barriers of 0.38/0.25 eV, whereas 2H-phase-based types Ⅲ and Ⅳ demonstrate p-type behavior (0.42/0.31 eV barriers). Notably, external stimuli induce remarkable transitions: (1) ±0.6 V/Å electric fields enable reversible n↔p contact-type switching, achieving ideal Ohmic contacts at critical field strengths; (2) ±10 % biaxial strain triggers universal Ohmic transitions via bandgap renormalization, particularly effective in type Ⅱ under compression; and (3) synergistic field-strain modulation amplifies band-edge shifts by 300 % compared to individual stimuli, with compressive strain (−4 %) plus negative field (−0.4 V/Å) inducing VBM-Fermi level crossing, while tensile strain (6 %) with positive field (0.5 V/Å) drives CBM crossing. These findings establish a comprehensive dual-regulation paradigm for tailored SB engineering, providing fundamental insights and practical guidelines for designing high-performance 2D nanoelectronics devices.
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