首页 > 最新文献

Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)最新文献

英文 中文
Oscillation Of The Current Sheet Velocity In Plasma Focus Discharges 等离子体聚焦放电中电流片速度的振荡
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588864
K. Melzacki, V. Nardi
{"title":"Oscillation Of The Current Sheet Velocity In Plasma Focus Discharges","authors":"K. Melzacki, V. Nardi","doi":"10.1109/PLASMA.1994.588864","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588864","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122837839","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An Evaluation Of an End Excited Electron Cyclotron Resonance Plasma Source 末端激发电子回旋共振等离子体源的评价
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588708
P. Mak, J. Asmussen
In this paper, the experimental performance of several different multipolar ECR plasma source configuration will be compared using an argon gas input and measuring: 1) impressed electric field, 2) plasma source output species densities, 3) electron and ion energy distribution functions, input and pressure. Meanwhile, the evaluation of each reactor configuration will also investigate the output performance as the excitation is varied through several different electromagnetic modes. The evaluation is done by comparing output density uniformity, ion production power cost in eV/ion, microwave coupling efficiency and absorbed microwave power density in Watts/cm.
本文将比较几种不同的多极ECR等离子体源配置的实验性能,采用氩气输入和测量:1)外加电场,2)等离子体源输出物种密度,3)电子和离子能量分布函数,输入和压力。同时,对每个电抗器配置的评估也将研究在几种不同的电磁模式下励磁变化时的输出性能。通过比较输出密度均匀性、离子产生功率成本(eV/ion)、微波耦合效率和吸收微波功率密度(Watts/cm)进行评价。
{"title":"An Evaluation Of an End Excited Electron Cyclotron Resonance Plasma Source","authors":"P. Mak, J. Asmussen","doi":"10.1109/PLASMA.1994.588708","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588708","url":null,"abstract":"In this paper, the experimental performance of several different multipolar ECR plasma source configuration will be compared using an argon gas input and measuring: 1) impressed electric field, 2) plasma source output species densities, 3) electron and ion energy distribution functions, input and pressure. Meanwhile, the evaluation of each reactor configuration will also investigate the output performance as the excitation is varied through several different electromagnetic modes. The evaluation is done by comparing output density uniformity, ion production power cost in eV/ion, microwave coupling efficiency and absorbed microwave power density in Watts/cm.","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"66 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114572617","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Frequency Independence Of Helicon Discharges 频率无关的螺旋放电
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588750
D. Blackwell, I.D. Sudit, M. E. Light, F.F. Chen
{"title":"Frequency Independence Of Helicon Discharges","authors":"D. Blackwell, I.D. Sudit, M. E. Light, F.F. Chen","doi":"10.1109/PLASMA.1994.588750","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588750","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128973993","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Azimuthal Anisotropy In The Distribution Of Fusion Products And Fast Ion Emission In Plasma Focus Discharges 聚变产物分布的方位各向异性和等离子体聚焦放电中的快离子发射
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588866
J.S. Brzosko, V. Nardi, D. Goldstein, J.R. Brzosko
{"title":"Azimuthal Anisotropy In The Distribution Of Fusion Products And Fast Ion Emission In Plasma Focus Discharges","authors":"J.S. Brzosko, V. Nardi, D. Goldstein, J.R. Brzosko","doi":"10.1109/PLASMA.1994.588866","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588866","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"101 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129315710","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Analysis And Simulation Of Vircators With Step Circular Waveguides 阶跃圆波导矢量分析与仿真
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589072
Y. Hu, Y. Lan
It has been previously shown that higher-power microwaves can be generated from vircators with an abrupt discontinuity in circular waveguides. In this paper the authors investigate the effects of the distance of the waveguide step from the anode on the microwave output and the dominant microwave frequency via the two-dimensional, relativistic, electromagnetic, particle-in-cell code. The parameters of the vircator in this simulation study are: a negative constant voltage of 270 kV applied to the cathode, a constant injection current of 7.3 kA at the cathode surface, 0.46 cm for the cathode to anode distance, 1.3 cm cathode radius, 12.5 cm for the drift tube length, and the radii of the front and the rear section of the drift tube are 4 and 5 cm, respectively. Simulation results show that the dominant microwave frequencies are concentrated in two bands centered roughly at 8.24 and 11 GHz. As the distance of the waveguide step from the anode increases from 0 to 7 cm, the dominant microwave frequency hops between lower- and higher-frequency bands. Among each band, the frequency gradually decreases with increasing distance of the waveguide step. They have demonstrated qualitatively, through time-domain analysis of open cavities containing no sources, the dependencemore » of the dominant microwave frequency on the distance of the waveguide step. The output powers observed in the simulation are greatly enhanced at the waveguide steps of, roughly, 0.8, 1.7, 3.7--4.3, and 7.0 cm from the anode with respective dominant-mode excitation of TM{sub 01}, TM{sub 02}, TM{sub 03}, and TM{sub 04}.« less
先前已经证明,高功率微波可以由圆波导中具有突然不连续的virator产生。本文通过二维、相对论、电磁、细胞内粒子编码研究了波导步距阳极的距离对微波输出和主微波频率的影响。在本次仿真研究中,vircator的参数为:对阴极施加270 kV的负恒压,阴极表面注入7.3 kA的恒定电流,阴极与阳极的距离为0.46 cm,阴极半径为1.3 cm,漂移管长度为12.5 cm,漂移管前段半径为4 cm,后段半径为5 cm。仿真结果表明,主要的微波频率集中在以8.24 GHz和11 GHz为中心的两个频段。当波导阶跃与阳极的距离从0厘米增加到7厘米时,主导微波频率在低频段和高频段之间跳跃。在每个波段中,频率随波导阶跃距离的增加而逐渐降低。通过对不含源的开腔的时域分析,他们定性地证明了主导微波频率与波导阶跃距离的依赖关系。在TM{sub 01}、TM{sub 02}、TM{sub 03}和TM{sub 04}的主模激励下,在距离阳极大约0.8、1.7、3.7—4.3和7.0 cm的波导阶跃处,模拟中观察到的输出功率大大增强。«少
{"title":"Analysis And Simulation Of Vircators With Step Circular Waveguides","authors":"Y. Hu, Y. Lan","doi":"10.1109/PLASMA.1994.589072","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589072","url":null,"abstract":"It has been previously shown that higher-power microwaves can be generated from vircators with an abrupt discontinuity in circular waveguides. In this paper the authors investigate the effects of the distance of the waveguide step from the anode on the microwave output and the dominant microwave frequency via the two-dimensional, relativistic, electromagnetic, particle-in-cell code. The parameters of the vircator in this simulation study are: a negative constant voltage of 270 kV applied to the cathode, a constant injection current of 7.3 kA at the cathode surface, 0.46 cm for the cathode to anode distance, 1.3 cm cathode radius, 12.5 cm for the drift tube length, and the radii of the front and the rear section of the drift tube are 4 and 5 cm, respectively. Simulation results show that the dominant microwave frequencies are concentrated in two bands centered roughly at 8.24 and 11 GHz. As the distance of the waveguide step from the anode increases from 0 to 7 cm, the dominant microwave frequency hops between lower- and higher-frequency bands. Among each band, the frequency gradually decreases with increasing distance of the waveguide step. They have demonstrated qualitatively, through time-domain analysis of open cavities containing no sources, the dependencemore » of the dominant microwave frequency on the distance of the waveguide step. The output powers observed in the simulation are greatly enhanced at the waveguide steps of, roughly, 0.8, 1.7, 3.7--4.3, and 7.0 cm from the anode with respective dominant-mode excitation of TM{sub 01}, TM{sub 02}, TM{sub 03}, and TM{sub 04}.« less","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129035254","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Cryogenic High Current Discharges 低温大电流放电
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588917
B.E. Meirovich
{"title":"Cryogenic High Current Discharges","authors":"B.E. Meirovich","doi":"10.1109/PLASMA.1994.588917","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588917","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124235754","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Measurement Of Electromagnetic Wave Structure In Novel Geometry Heiicon Source. 新型几何震源中电磁波结构的测量。
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588884
R. Jewett, H. Anderson
{"title":"Measurement Of Electromagnetic Wave Structure In Novel Geometry Heiicon Source.","authors":"R. Jewett, H. Anderson","doi":"10.1109/PLASMA.1994.588884","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588884","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123662897","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Study Of The Plasma Centrifuge As A Compact, Low Cost, Stable Isotope Separator 等离子体离心机作为一种紧凑、低成本、稳定同位素分离器的研究
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588758
N. Qi, P. Greene, R. Prasad, M. Krishnan
A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate
采用平行板电极的等离子体- cvd反应器在简单几何形状的三维基底上使用Ha混合物制备TLN涂层。N2和Tic14作为反应气体。涂层的化学和机械性能被确定为沉积过程中选定参数的函数。讨论了等离子体反应器的一般特性和实验结果。采用氟化氪激光烧蚀法对氧化铝进行了实验研究
{"title":"Study Of The Plasma Centrifuge As A Compact, Low Cost, Stable Isotope Separator","authors":"N. Qi, P. Greene, R. Prasad, M. Krishnan","doi":"10.1109/PLASMA.1994.588758","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588758","url":null,"abstract":"A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121195428","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects Of Selected Process Parameters The Properties Of TiN Coatings Produced Plasma-CVD 工艺参数对等离子体cvd TiN涂层性能的影响
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.588760
C. Lasorsa, M. Shimozuma, A. Rodrigo
A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate
采用平行板电极的等离子体- cvd反应器在简单几何形状的三维基底上使用Ha混合物制备TLN涂层。N2和Tic14作为反应气体。涂层的化学和机械性能被确定为沉积过程中选定参数的函数。讨论了等离子体反应器的一般特性和实验结果。采用氟化氪激光烧蚀法对氧化铝进行了实验研究
{"title":"Effects Of Selected Process Parameters The Properties Of TiN Coatings Produced Plasma-CVD","authors":"C. Lasorsa, M. Shimozuma, A. Rodrigo","doi":"10.1109/PLASMA.1994.588760","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.588760","url":null,"abstract":"A plasma-CVD reactor with parallel plate electrodes has been used to produce TLN coatings on three-dimensional substrates of simple geometry, using a mixture of Ha. N2 and Tic14 as reactive gases. The chemical and mechanical properties of the coatings have been determined as a function of selected parameters of the deposition process. The general characteristics of the plasma reactor and the obtained results are discussed. Krypton-fluoride laser ablation experiments have been performed on A I 2 0 3 (alumina) to investigate","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"153 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121396689","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effects Of A Transverse-magnetic Field On A Laser-ablation-assisted-plasma Discharge Ion Source 横向磁场对激光烧蚀辅助等离子体放电离子源的影响
Pub Date : 1994-06-06 DOI: 10.1109/PLASMA.1994.589010
J. Lash, R. Gilgenbach, C. H. Ching
{"title":"Effects Of A Transverse-magnetic Field On A Laser-ablation-assisted-plasma Discharge Ion Source","authors":"J. Lash, R. Gilgenbach, C. H. Ching","doi":"10.1109/PLASMA.1994.589010","DOIUrl":"https://doi.org/10.1109/PLASMA.1994.589010","url":null,"abstract":"","PeriodicalId":254741,"journal":{"name":"Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)","volume":"146 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1994-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116504633","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1