M. Lorenz, H. Hochmuth, C. Grüner, H. Hilmer, A. Lajn, D. Spemann, M. Brandt, J. Zippel, R. Schmidt‐Grund, H. von Wenckstern, M. Grundmann
Advanced Pulsed Laser Deposition (PLD) processes allow the growth of oxide thin film heterostructures on large area substrates up to 4-inch diameter, with flexible and controlled doping, low dislocation density, and abrupt interfaces. These PLD processes are discussed and their capabilities demonstrated using selected results of structural, electrical, and optical characterization of superconducting (YBa 2Cu 3O 7−δ), semiconducting (ZnO-based), and ferroelectric (BaTiO 3-based) and dielectric (wide-gap oxide) thin films and multilayers. Regarding the homogeneity on large area of structure and electrical properties, flexibility of doping, and state-of-the-art electronic and optical performance, the comparably simple PLD processes are now advantageous or at least fully competitive to Metal Organic Chemical Vapor Deposition or Molecular Beam Epitaxy. In particular, the high flexibility connected with high film quality makes PLD a more and more widespread growth technique in oxide research.
{"title":"Oxide Thin Film Heterostructures on Large Area, with Flexible Doping, Low Dislocation Density, and Abrupt Interfaces: Grown by Pulsed Laser Deposition","authors":"M. Lorenz, H. Hochmuth, C. Grüner, H. Hilmer, A. Lajn, D. Spemann, M. Brandt, J. Zippel, R. Schmidt‐Grund, H. von Wenckstern, M. Grundmann","doi":"10.1155/2010/140976","DOIUrl":"https://doi.org/10.1155/2010/140976","url":null,"abstract":"Advanced Pulsed Laser Deposition (PLD) processes allow the growth of oxide thin film heterostructures on large area substrates up to 4-inch diameter, with flexible and controlled doping, low dislocation density, and abrupt interfaces. These PLD processes are discussed and their capabilities demonstrated using selected results of structural, electrical, and optical characterization of superconducting (YBa 2Cu 3O 7−δ), semiconducting (ZnO-based), and ferroelectric (BaTiO 3-based) and dielectric (wide-gap oxide) thin films and multilayers. \u0000Regarding the homogeneity on large area of structure and electrical properties, flexibility of doping, and state-of-the-art electronic and optical performance, the comparably simple PLD processes are now advantageous or at least fully competitive to Metal Organic Chemical Vapor Deposition or Molecular Beam Epitaxy. In particular, the high flexibility connected with high film quality makes PLD a more and more widespread growth technique in oxide research.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122436638","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Nanostructured Pt thin film catalysts of various morphologies have been synthesized by pulsed laser deposition and studied towards enhancing their tolerance to CO poisoning, a reaction of critical issue to liquid fuel cells. It was discovered that Pt film deposited under 5 Torr of He background pressure showed the highest electroactive surface area and the lowest onset potential of CO oxidation demonstrating an enhancement of the CO poisoning resistance. The reason for such enhanced electrocatalytic activity is ascribed to the high roughness of Pt surface. This study further provides a methodology for the proper design of electrocatalysts that might be considered to be developed by the pulsed laser deposition technique.
{"title":"Carbon Monoxide Oxidation on Nanostructured Pt Thin Films Synthesized by Pulsed Laser Deposition: Insights into the Morphology Effects","authors":"Fatma Saidani, D. Rochefort, M. Mohamedi","doi":"10.1155/2010/143684","DOIUrl":"https://doi.org/10.1155/2010/143684","url":null,"abstract":"Nanostructured Pt thin film catalysts of various morphologies have been synthesized by pulsed laser deposition and studied towards enhancing their tolerance to CO poisoning, a reaction of critical issue to liquid fuel cells. It was discovered that Pt film deposited under 5 Torr of He background pressure showed the highest electroactive surface area and the lowest onset potential of CO oxidation demonstrating an enhancement of the CO poisoning resistance. The reason for such enhanced electrocatalytic activity is ascribed to the high roughness of Pt surface. This study further provides a methodology for the proper design of electrocatalysts that might be considered to be developed by the pulsed laser deposition technique.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2010-11-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132444569","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Sakairi, Hiroomi Miyata, T. Kikuchi, Hideaki Takahashi
The effect of the applied potentials, temperature, and F − ions on the localized repassivation kinetics of titanium was investigated by the photon rupture method, PRM, and electrochemical techniques in phosphate buffered saline solution. The log I versus log t plots after laser beam irradiation showed a rapid increase, then a decrease with a slope of about − 1.5 , which is steeper than that expected from high field oxide film formation theory, suggesting that the repassivation of titanium is a combination of electrochemical and chemical reactions. The repassivation current increases with increases in the applied potential and addition of F − ions, while solution temperature does not influence the repassivation kinetics. The effect of F − ions on the repassivation kinetics can be explained by localized pH changes caused by very rapid dissolution of titanium when titanium was exposed to PBS solution.
{"title":"Effect of Potential, Temperature, and Fluoride Ions on the Repassivation Kinetics of Titanium in Phosphate Buffered Saline Solution with the Photon Rupture Method","authors":"M. Sakairi, Hiroomi Miyata, T. Kikuchi, Hideaki Takahashi","doi":"10.1155/2009/436065","DOIUrl":"https://doi.org/10.1155/2009/436065","url":null,"abstract":"The effect of the applied potentials, temperature, and F − ions on the localized repassivation kinetics of titanium was investigated by the photon rupture method, PRM, and electrochemical techniques in phosphate buffered saline solution. The log I versus log t plots after laser beam irradiation showed a \u0000rapid increase, then a decrease with a slope of about − 1.5 , which is steeper than that expected from \u0000high field oxide film formation theory, suggesting that the repassivation of titanium is a combination of electrochemical and chemical reactions. The repassivation current increases with increases in the applied potential and addition of F − ions, while solution temperature does not influence the repassivation kinetics. The effect of F − ions on the repassivation kinetics can be explained by localized pH changes caused by very rapid dissolution of titanium when titanium was exposed to PBS solution.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"116 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-07-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121380159","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Recent progress in aerosol science has resulted in more challenging demands in the design of new particle beam introduction systems. In this paper, the concept of a variable orifice aerodynamic lens system is presented and supported by the numerical simulation results. This novel particle beam inlet can serve as either a narrow band pass filter (a particle segregator) that only confines particles with a specific size or a broad band pass filter (a particle concentrator) that allows particles with a wide size range to be concentrated on the beam axis. Following a brief description of the inlet system, computational details are described. Simulation of this inlet has been carried out by the commercial computational fluid dynamics protocol FLUENT. Focusing performance and characteristic of single-thin plate orifices have been first revealed and discussed, and then the dynamics and advantages of using multiple lenses with variable orifices are addressed. It is clearly shown that the focusing size range can be primarily adjusted by varying the working pressure, the orifice geometry, and/or the arrangement of orifices. As a result, a selection of the desired particle focusing size range can be achieved without the need of changing the inlet, thus increasing the versatility of the device for a broad range of applications.
{"title":"Development, Characterization, and Application of a Versatile Single Particle Detection Apparatus for Time-Integrated and Time-Resolved Fluorescence Measurements—Part I: Theoretical Considerations","authors":"Xihong Wu, N. Omenetto, J. Winefordner","doi":"10.1155/2009/295765","DOIUrl":"https://doi.org/10.1155/2009/295765","url":null,"abstract":"Recent progress in aerosol science has resulted in more challenging demands in the design of new particle beam introduction systems. In this paper, the concept of a variable orifice aerodynamic lens system is presented and supported by the numerical simulation results. This novel particle beam inlet can serve as either a narrow band pass filter (a particle segregator) that only confines particles with a specific size or a broad band pass filter (a particle concentrator) that allows particles with a wide size range to be concentrated on the beam axis. Following a brief description of the inlet system, computational details are described. Simulation of this inlet has been carried out by the commercial computational fluid dynamics protocol FLUENT. Focusing performance and characteristic of single-thin plate orifices have been first revealed and discussed, and then the dynamics and advantages of using multiple lenses with variable orifices are addressed. It is clearly shown that the focusing size range can be primarily adjusted by varying the working pressure, the orifice geometry, and/or the arrangement of orifices. As a result, a selection of the desired particle focusing size range can be achieved without the need of changing the inlet, thus increasing the versatility of the device for a broad range of applications.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134157615","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. Canning, N. Groothoff, K. Cook, C. Martelli, A. Pohl, J. Holdsworth, S. Bandyopadhyay, M. Stevenson
Grating writing in structured optical fibres and their properties and applications are reviewed. To date, most gratings have been written in a straightforward manner into structured fibres containing a photosensitive germanosilicate step-index core. However, gratings have also been written directly into single material, structured silica fibres and into air-clad cores using two and higher-photon processes with both UV and near IR pulsed (nanosecond-femtosecond) light. Given the intrinsic-added functionality possible within a structured optical fibre, structured fibre gratings offer further capabilities for sensors, diagnostics, lasers, and devices.
{"title":"Gratings in structured optical fibres","authors":"J. Canning, N. Groothoff, K. Cook, C. Martelli, A. Pohl, J. Holdsworth, S. Bandyopadhyay, M. Stevenson","doi":"10.1155/2008/239417","DOIUrl":"https://doi.org/10.1155/2008/239417","url":null,"abstract":"Grating writing in structured optical fibres and their properties and applications are reviewed. To date, most gratings have been written in a straightforward manner into structured fibres containing a photosensitive germanosilicate step-index core. However, gratings have also been written directly into single material, structured silica fibres and into air-clad cores using two and higher-photon processes with both UV and near IR pulsed (nanosecond-femtosecond) light. Given the intrinsic-added functionality possible within a structured optical fibre, structured fibre gratings offer further capabilities for sensors, diagnostics, lasers, and devices.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116866769","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The effect of 248 nm laser radiation, with pulse duration of 5 picoseconds, 500 femtoseconds, and 120 femtoseconds, on the optical properties and the Knoop hardness of a commercial Er/Yb-codoped phosphate glass is presented here. Refractive index changes of the order of few parts of 10-4 are correlated with optical absorption centers induced in the glass volume, using Kramers-Kroning relationship. Accordingly, substantially lower refractive index changes are measured in volume Bragg gratings inscribed in the glass, indicating that, in addition to the optical density changes, volume dilation changes of negative sign may also be associated with the 248 nm ultrafast irradiation. The Knoop hardness experimental results reveal that the glass matrix undergoes an observable initial hardening and then a reversing softening and volume dilation process for modest accumulated energy doses, where the Knoop hardness follows a nonmonotonic trend. Comparative results on the Knoop hardness trend are also presented for the case of 193 nm excimer laser radiation. The above findings denote that the positive or negative evolution of refractive index changes induced by the 248 nm ultrafast radiation in the glass is dominated by the counteraction of the color center formation and the volume modification effects.
{"title":"Photosensitivity of the Er/Yb-Codoped Schott IOG1 Phosphate Glass Using 248 nm, Femtosecond, and Picosecond Laser Radiation","authors":"S. Pissadakis, I. Michelakaki","doi":"10.1155/2008/868767","DOIUrl":"https://doi.org/10.1155/2008/868767","url":null,"abstract":"The effect of 248 nm laser radiation, with pulse duration of 5 picoseconds, 500 femtoseconds, and 120 femtoseconds, on the optical properties and the Knoop hardness of a commercial Er/Yb-codoped phosphate glass is presented here. Refractive index changes of the order of few parts of 10-4 are correlated with optical absorption centers induced in the glass volume, using Kramers-Kroning relationship. Accordingly, substantially lower refractive index changes are measured in volume Bragg gratings inscribed in the glass, indicating that, in addition to the optical density changes, volume dilation changes of negative sign may also be associated with the 248 nm ultrafast irradiation. The Knoop hardness experimental results reveal that the glass matrix undergoes an observable initial hardening and then a reversing softening and volume dilation process for modest accumulated energy doses, where the Knoop hardness follows a nonmonotonic trend. Comparative results on the Knoop hardness trend are also presented for the case of 193 nm excimer laser radiation. The above findings denote that the positive or negative evolution of refractive index changes induced by the 248 nm ultrafast radiation in the glass is dominated by the counteraction of the color center formation and the volume modification effects.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"49 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123476407","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Laser-induced backside wet etching (LIBWE) allows the high-quality etching of transparent materials for micro- and nanopatterning. Recent own results of LIBWE with hydrocarbon and metallic absorbers (H- and M-LIBWE) are summarized and compared with selected results of other groups regarding the etching process and the etched surface. Significant results on the impact of the liquid absorber, the material and the wavelength, and the pulse length of the laser to the etching are selected for this comparison. The etching of submicron-sized periodic structures in sapphire and fused silica with interference techniques and the selection of the preferred method in dependence on the material and the processing goal discussed. The experimental results are discussed on a thermal model considering both interface and volume absorption of the laser beam. These results have the conclusion that the etching at M-LIBWE is mainly due to material melting and evaporation whereas at H-LIBWE, a modified near-surface region with a very high absorption is ablated.
{"title":"Laser-Induced Backside Wet Etching of Transparent Materials with Organic and Metallic Absorbers","authors":"K. Zimmer, R. Böhme","doi":"10.1155/2008/170632","DOIUrl":"https://doi.org/10.1155/2008/170632","url":null,"abstract":"Laser-induced backside wet etching (LIBWE) allows the high-quality etching of transparent materials for micro- and nanopatterning. Recent own results of LIBWE with hydrocarbon and metallic absorbers (H- and M-LIBWE) are summarized and compared with selected results of other groups regarding the etching process and the etched surface. Significant results on the impact of the liquid absorber, the material and the wavelength, and the pulse length of the laser to the etching are selected for this comparison. The etching of submicron-sized periodic structures in sapphire and fused silica with interference techniques and the selection of the preferred method in dependence on the material and the processing goal discussed. The experimental results are discussed on a thermal model considering both interface and volume absorption of the laser beam. These results have the conclusion that the etching at M-LIBWE is mainly due to material melting and evaporation whereas at H-LIBWE, a modified near-surface region with a very high absorption is ablated.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121131730","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Beresna, T. Gertus, R. Tomašiūnas, H. Misawa, S. Juodkazis
Thermal load as well as its three-dimensional (3D) spatial distribution has been estimated inside representative materials: glass (low thermal diffusion), silicon (semimetal properties), and sapphire (a crystalline dielectric of a high thermal conductivity) for typical laser processing and direct laser writing applications. The 3D temperature distribution allows to calculate thermal stress around the focal region. This provides an assessment tool for optimization of laser microprocessing conditions for controlled laser dicing and cutting applications.
{"title":"Three-Dimensional Modeling of the Heat-Affected Zone in Laser Machining Applications","authors":"M. Beresna, T. Gertus, R. Tomašiūnas, H. Misawa, S. Juodkazis","doi":"10.1155/2008/976205","DOIUrl":"https://doi.org/10.1155/2008/976205","url":null,"abstract":"Thermal load as well as its three-dimensional (3D) spatial distribution \u0000has been estimated inside representative materials: glass (low thermal \u0000diffusion), silicon (semimetal properties), and sapphire (a crystalline dielectric \u0000of a high thermal conductivity) for typical laser processing and \u0000direct laser writing applications. The 3D temperature distribution allows \u0000to calculate thermal stress around the focal region. This provides an \u0000assessment tool for optimization of laser microprocessing conditions for \u0000controlled laser dicing and cutting applications.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-11-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129467638","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Ovsianikov, A. Gaidukevičiūtė, B. Chichkov, M. Oubaha, B. MacCraith, I. Sakellari, A. Giakoumaki, D. Gray, M. Vamvakaki, M. Farsari, C. Fotakis
Two-photon polymerization of photosensitive materials has emerged as a very promising technique for the fabrication of photonic crystals and devices. We present our investigations into the structuring by two-photon polymerization of a new class of photosensitive sol-gel composites exhibiting ultra-low shrinkage. We particularly focus on two composites, the first containing a zirconium alkoxide and the second a nonlinear optical chromophore. The three-dimensional photonic crystal structures fabricated using these materials demonstrate high resolution and clear bandstops in the near IR region.
{"title":"Two-Photon Polymerization of Hybrid Sol-Gel Materials for Photonics Applications","authors":"A. Ovsianikov, A. Gaidukevičiūtė, B. Chichkov, M. Oubaha, B. MacCraith, I. Sakellari, A. Giakoumaki, D. Gray, M. Vamvakaki, M. Farsari, C. Fotakis","doi":"10.1155/2008/493059","DOIUrl":"https://doi.org/10.1155/2008/493059","url":null,"abstract":"Two-photon polymerization of photosensitive materials has emerged as a very promising technique for the fabrication of photonic crystals and devices. We present our investigations into the structuring by two-photon polymerization of a new class of photosensitive sol-gel composites exhibiting ultra-low shrinkage. We particularly focus on two composites, the first containing a zirconium alkoxide and the second a nonlinear optical chromophore. The three-dimensional photonic crystal structures fabricated using these materials demonstrate high resolution and clear bandstops in the near IR region.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122901508","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Microprocessing of dielectric optical coatings by UV laser ablation is demonstrated. Excimer laser ablation at deep UV wavelengths (248 nm, 193 nm) is used for the patterning of thin oxide films or layer stacks. The layer removal over extended areas as well as sub-μm-structuring is possible. The ablation of SiO2, Al2O3, HfO2, and Ta2O5 layers and layer systems has been investigated. Due to their optical, chemical, and thermal stability, these inorganic film materials are well suited for optical applications, even if UV-transparency is required. Transparent patterned films of SiO2 are produced by patterning a UV-absorbing precursor SiOx suboxide layer and oxidizing it afterwards to SiO2. In contrast to laser ablation of bulk material, in the case of thin films, the layer-layer or layer-substrate boundaries act as predetermined end points, so that precise depth control and a very smooth surface can be achieved. For large area ablation, nanosecond lasers are well suited; for patterning with submicron resolution, femtosecond excimer lasers are applied. Thus the fabrication of optical elements like dielectric masks, pixelated diffractive elements, and gratings can be accomplished.
{"title":"Processing of Dielectric Optical Coatings by Nanosecond and Femtosecond UV Laser Ablation","authors":"J. Ihlemann, J. Békési, J. Klein-Wiele, P. Simon","doi":"10.1155/2008/623872","DOIUrl":"https://doi.org/10.1155/2008/623872","url":null,"abstract":"Microprocessing of dielectric optical coatings by UV laser ablation is demonstrated. Excimer laser ablation at deep UV wavelengths (248 nm, 193 nm) is used for the patterning of thin oxide films or layer stacks. The layer removal over extended areas as well as sub-μm-structuring is possible. The ablation of SiO2, Al2O3, HfO2, and Ta2O5 layers and layer systems has been investigated. Due to their optical, chemical, and thermal stability, these inorganic film materials are well suited for optical applications, even if UV-transparency is required. Transparent patterned films of SiO2 are produced by patterning a UV-absorbing precursor SiOx suboxide layer and oxidizing it afterwards to SiO2. In contrast to laser ablation of bulk material, in the case of thin films, the layer-layer or layer-substrate boundaries act as predetermined end points, so that precise depth control and a very smooth surface can be achieved. For large area ablation, nanosecond lasers are well suited; for patterning with submicron resolution, femtosecond excimer lasers are applied. Thus the fabrication of optical elements like dielectric masks, pixelated diffractive elements, and gratings can be accomplished.","PeriodicalId":296295,"journal":{"name":"Laser Chemistry","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129792334","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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