Megan E. McCormack, Rameswar Bhattacharjee, Henry Jervis, Zheng Wei, Miklos Kertesz* and Marina A. Petrukhina*,
A cationic perylene salt was synthesized by chemical oxidation through treatment of perylene with triethyloxonium hexachloroantimonate in dichloromethane and characterized by single crystal X-ray diffraction as [(C20H12)2]•+(SbCl6)−. EPR spectrometry confirmed the formation of an organic radical with a g-factor of 2.0024. X-ray diffraction analysis revealed a 1D column stacking of perylene molecules with alternating interplanar distances of 3.255(2)–3.340(2) Å and 3.409(2)–3.466(3) Å, indicative of the dimer formation within infinite π-stacks. Within a dimer, a large π-surface overlap and a slight loss of planarity for perylene were also observed. As these structural characteristics are consistent with pancake bonding for a perylene dimer, further insights into bonding were sought with the help of density functional theory. The calculations revealed that the pancake interaction contributes significantly to the stabilization of the stacked perylene dimer, providing approximately 8.0–10.0 kcal/mol per pair. Further stabilization is achieved by an even distribution of the positive charge in the monocationic dimer. A direct comparison with the close analogue revealed the critical role of the solid-state packing effects in achieving a higher degree of overlap between the perylene monomers in the title product.
{"title":"Stabilizing Cationic Perylene Dimers through Pancake Bonding and Equal Charge Share","authors":"Megan E. McCormack, Rameswar Bhattacharjee, Henry Jervis, Zheng Wei, Miklos Kertesz* and Marina A. Petrukhina*, ","doi":"10.1021/acs.cgd.3c00912","DOIUrl":"https://doi.org/10.1021/acs.cgd.3c00912","url":null,"abstract":"<p >A cationic perylene salt was synthesized by chemical oxidation through treatment of perylene with triethyloxonium hexachloroantimonate in dichloromethane and characterized by single crystal X-ray diffraction as [(C<sub>20</sub>H<sub>12</sub>)<sub>2</sub>]<sup>•+</sup>(SbCl<sub>6</sub>)<sup>−</sup>. EPR spectrometry confirmed the formation of an organic radical with a g-factor of 2.0024. X-ray diffraction analysis revealed a 1D column stacking of perylene molecules with alternating interplanar distances of 3.255(2)–3.340(2) Å and 3.409(2)–3.466(3) Å, indicative of the dimer formation within infinite π-stacks. Within a dimer, a large π-surface overlap and a slight loss of planarity for perylene were also observed. As these structural characteristics are consistent with pancake bonding for a perylene dimer, further insights into bonding were sought with the help of density functional theory. The calculations revealed that the pancake interaction contributes significantly to the stabilization of the stacked perylene dimer, providing approximately 8.0–10.0 kcal/mol per pair. Further stabilization is achieved by an even distribution of the positive charge in the monocationic dimer. A direct comparison with the close analogue revealed the critical role of the solid-state packing effects in achieving a higher degree of overlap between the perylene monomers in the title product.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"23 10","pages":"7496–7503"},"PeriodicalIF":3.8,"publicationDate":"2023-09-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41086940","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The AZO/Cu/AZO heterogeneous interface is prepared to improve the optoelectronic property of AZO as Cu intercalation is introduced. The experimental results show that the Cu layer is at 8 nm, the (002) peak intensity of the sample reaches the maximum, the crystallization quality is the best, the roughness is the lowest, and the transmittance and conductivity have better values. In the meantime, the simulation results show that the interface of AZO/Cu is bonded, and the conductivity of AZO/Cu is higher than that of AZO, but the transmittance is the opposite. This is consistent with the experimental results. The research implies that we can design efficient optoelectronic properties with an AZO/Cu/AZO heterogeneous interface by adjusting Cu intercalation.
{"title":"Building an Efficient Optoelectronic Property at the AZO/Cu/AZO Heterogeneous Interface with Copper Intercalation","authors":"Jianpei Wang, and , Ping Yang*, ","doi":"10.1021/acs.cgd.3c00797","DOIUrl":"https://doi.org/10.1021/acs.cgd.3c00797","url":null,"abstract":"<p >The AZO/Cu/AZO heterogeneous interface is prepared to improve the optoelectronic property of AZO as Cu intercalation is introduced. The experimental results show that the Cu layer is at 8 nm, the (002) peak intensity of the sample reaches the maximum, the crystallization quality is the best, the roughness is the lowest, and the transmittance and conductivity have better values. In the meantime, the simulation results show that the interface of AZO/Cu is bonded, and the conductivity of AZO/Cu is higher than that of AZO, but the transmittance is the opposite. This is consistent with the experimental results. The research implies that we can design efficient optoelectronic properties with an AZO/Cu/AZO heterogeneous interface by adjusting Cu intercalation.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"23 10","pages":"7403–7411"},"PeriodicalIF":3.8,"publicationDate":"2023-09-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41086717","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2023-09-20DOI: 10.1109/COMST.2023.3316283
Malek Khammassi;Abla Kammoun;Mohamed-Slim Alouini
With the expanding demand for high data rates and extensive coverage, high throughput satellite (HTS) communication systems are emerging as a key technology for future communication generations. However, current frequency bands are increasingly congested. Until the maturity of communication systems to operate on higher bands, the solution is to exploit the already existing frequency bands more efficiently. In this context, precoding emerges as one of the prolific approaches to increasing spectral efficiency. This survey presents an overview and a classification of the recent precoding techniques for HTS communication systems from two main perspectives: 1) a problem formulation perspective and 2) a system design perspective. From a problem formulation point of view, precoding techniques are classified according to the precoding optimization problem, group, and level. From a system design standpoint, precoding is categorized based on the system architecture, the precoding implementation, and the type of the provided service. Further, practical system impairments are discussed, and robust precoding techniques are presented. Finally, future trends in precoding for satellites are addressed to spur further research.
{"title":"Precoding for High-Throughput Satellite Communication Systems: A Survey","authors":"Malek Khammassi;Abla Kammoun;Mohamed-Slim Alouini","doi":"10.1109/COMST.2023.3316283","DOIUrl":"10.1109/COMST.2023.3316283","url":null,"abstract":"With the expanding demand for high data rates and extensive coverage, high throughput satellite (HTS) communication systems are emerging as a key technology for future communication generations. However, current frequency bands are increasingly congested. Until the maturity of communication systems to operate on higher bands, the solution is to exploit the already existing frequency bands more efficiently. In this context, precoding emerges as one of the prolific approaches to increasing spectral efficiency. This survey presents an overview and a classification of the recent precoding techniques for HTS communication systems from two main perspectives: 1) a problem formulation perspective and 2) a system design perspective. From a problem formulation point of view, precoding techniques are classified according to the precoding optimization problem, group, and level. From a system design standpoint, precoding is categorized based on the system architecture, the precoding implementation, and the type of the provided service. Further, practical system impairments are discussed, and robust precoding techniques are presented. Finally, future trends in precoding for satellites are addressed to spur further research.","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"26 1","pages":"80-118"},"PeriodicalIF":35.6,"publicationDate":"2023-09-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135556044","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Wei-Lee Wu, Madeline M. Mills, Ulrich Schacht, Charlie Rabinowitz, Vaso Vlachos and Zoltan K. Nagy*,
Traditionally, off-line measurements via image analysis or laser diffraction methods are used to analyze the crystal product. It is often beneficial to extract crystal samples intermittently during the crystallization process to better understand the complex dynamics in batch and continuous crystallization. However, frequent invasive product sampling can lead to undesired disturbances in the process dynamics. Various process analytical technologies have been developed for in situ monitoring of crystallization systems; however, obtaining quantitative crystal size distribution (CSD) information from these is challenging. While in the case of traditional concentration monitoring tools system-specific calibration is an accepted standard procedure, most image analysis-based techniques attempt to provide direct measurement of CSD information. To obtain a fast and accurate in situ image analysis measurement of particle size for a high aspect ratio crystallization system, a systematic off-line image analysis calibration methodology was performed to model off-line Malvern Morphologi image analysis results. An image analysis algorithm was calibrated to extract size distribution data from in situ images of varying sizes and solid concentrations. Using a genetic algorithm, the various methods and parameters in the image analysis algorithm were automatically optimized by minimizing the size distribution error between the model and the off-line image analysis measurement. Trends observed in the calibrated parameters were then fitted to continuous functions depending on solid density to be able to adapt to changes in the solid loading. The algorithms were then validated with a different particle data set with a known solid loading. Last, to demonstrate the proof of concept in sensor fusion and online application, the adaptive image analysis algorithm was coupled with a UV/vis sensor and tested on a dynamic data set to predict the size distribution with varying solid loadings throughout the crystallization process due to dissolution, nucleation, and growth.
{"title":"Sensor Fusion and Calibration-Based Adaptive Image Analysis Procedure for In Situ Crystal Size Measurement","authors":"Wei-Lee Wu, Madeline M. Mills, Ulrich Schacht, Charlie Rabinowitz, Vaso Vlachos and Zoltan K. Nagy*, ","doi":"10.1021/acs.cgd.3c00273","DOIUrl":"https://doi.org/10.1021/acs.cgd.3c00273","url":null,"abstract":"<p >Traditionally, off-line measurements via image analysis or laser diffraction methods are used to analyze the crystal product. It is often beneficial to extract crystal samples intermittently during the crystallization process to better understand the complex dynamics in batch and continuous crystallization. However, frequent invasive product sampling can lead to undesired disturbances in the process dynamics. Various process analytical technologies have been developed for in situ monitoring of crystallization systems; however, obtaining quantitative crystal size distribution (CSD) information from these is challenging. While in the case of traditional concentration monitoring tools system-specific calibration is an accepted standard procedure, most image analysis-based techniques attempt to provide direct measurement of CSD information. To obtain a fast and accurate in situ image analysis measurement of particle size for a high aspect ratio crystallization system, a systematic off-line image analysis calibration methodology was performed to model off-line Malvern Morphologi image analysis results. An image analysis algorithm was calibrated to extract size distribution data from in situ images of varying sizes and solid concentrations. Using a genetic algorithm, the various methods and parameters in the image analysis algorithm were automatically optimized by minimizing the size distribution error between the model and the off-line image analysis measurement. Trends observed in the calibrated parameters were then fitted to continuous functions depending on solid density to be able to adapt to changes in the solid loading. The algorithms were then validated with a different particle data set with a known solid loading. Last, to demonstrate the proof of concept in sensor fusion and online application, the adaptive image analysis algorithm was coupled with a UV/vis sensor and tested on a dynamic data set to predict the size distribution with varying solid loadings throughout the crystallization process due to dissolution, nucleation, and growth.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"23 10","pages":"7076–7089"},"PeriodicalIF":3.8,"publicationDate":"2023-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41086982","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The deployment of the fifth-generation (5G) wireless networks in Internet of Everything (IoE) applications and future networks (e.g., sixth-generation (6G) networks) has raised a number of operational challenges and limitations, for example in terms of security and privacy. Edge learning is an emerging approach to training models across distributed clients while ensuring data privacy. Such an approach when integrated in future network infrastructures (e.g., 6G) can potentially solve challenging problems such as resource management and behavior prediction. However, edge learning (including distributed deep learning) are known to be susceptible to tampering and manipulation. This survey article provides a holistic review of the extant literature focusing on edge learning-related vulnerabilities and defenses for 6G-enabled Internet of Things (IoT) systems. Existing machine learning approaches for 6G–IoT security and machine learning-associated threats are broadly categorized based on learning modes, namely: centralized, federated, and distributed. Then, we provide an overview of enabling emerging technologies for 6G–IoT intelligence. We also provide a holistic survey of existing research on attacks against machine learning and classify threat models into eight categories, namely: backdoor attacks, adversarial examples, combined attacks, poisoning attacks, Sybil attacks, byzantine attacks, inference attacks, and dropping attacks. In addition, we provide a comprehensive and detailed taxonomy and a comparative summary of the state-of-the-art defense methods against edge learning-related vulnerabilities. Finally, as new attacks and defense technologies are realized, new research and future overall prospects for 6G-enabled IoT are discussed.
{"title":"Edge Learning for 6G-Enabled Internet of Things: A Comprehensive Survey of Vulnerabilities, Datasets, and Defenses","authors":"Mohamed Amine Ferrag;Othmane Friha;Burak Kantarci;Norbert Tihanyi;Lucas Cordeiro;Merouane Debbah;Djallel Hamouda;Muna Al-Hawawreh;Kim-Kwang Raymond Choo","doi":"10.1109/COMST.2023.3317242","DOIUrl":"10.1109/COMST.2023.3317242","url":null,"abstract":"The deployment of the fifth-generation (5G) wireless networks in Internet of Everything (IoE) applications and future networks (e.g., sixth-generation (6G) networks) has raised a number of operational challenges and limitations, for example in terms of security and privacy. Edge learning is an emerging approach to training models across distributed clients while ensuring data privacy. Such an approach when integrated in future network infrastructures (e.g., 6G) can potentially solve challenging problems such as resource management and behavior prediction. However, edge learning (including distributed deep learning) are known to be susceptible to tampering and manipulation. This survey article provides a holistic review of the extant literature focusing on edge learning-related vulnerabilities and defenses for 6G-enabled Internet of Things (IoT) systems. Existing machine learning approaches for 6G–IoT security and machine learning-associated threats are broadly categorized based on learning modes, namely: centralized, federated, and distributed. Then, we provide an overview of enabling emerging technologies for 6G–IoT intelligence. We also provide a holistic survey of existing research on attacks against machine learning and classify threat models into eight categories, namely: backdoor attacks, adversarial examples, combined attacks, poisoning attacks, Sybil attacks, byzantine attacks, inference attacks, and dropping attacks. In addition, we provide a comprehensive and detailed taxonomy and a comparative summary of the state-of-the-art defense methods against edge learning-related vulnerabilities. Finally, as new attacks and defense technologies are realized, new research and future overall prospects for 6G-enabled IoT are discussed.","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"25 4","pages":"2654-2713"},"PeriodicalIF":35.6,"publicationDate":"2023-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135555969","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Henrik Pedersen*, Chih-Wei Hsu, Neeraj Nepal, Jeffrey M. Woodward and Charles R. Eddy Jr,
Indium nitride (InN) is a low-band-gap semiconductor with unusually high electron mobility, making it suitable for IR-range optoelectronics and high-frequency transistors. However, the development of InN-based electronics is hampered by the metastable nature of InN. The decomposition temperature of InN is lower than the required growth temperature for most crystal growth techniques. Here, we discuss growth of InN films and epitaxial layers by atomic layer deposition (ALD), a growth technique based on self-limiting surface chemical reactions and, thus, inherently a low-temperature technique. We describe the current state of the art in ALD of InN and InN-based ternary alloys with GaN and AlN, and we contrast this to other growth technologies for these materials. We believe that ALD will be the enabling technology for realizing the promise of InN-based electronics.
Indium nitride (InN) is a low-band-gap semiconductor with unusually high electron mobility, making it suitable for IR-range optoelectronics and high-frequency transistors. This potential is hampered by the breakdown temperature of InN, which is lower than the required growth temperature for most crystal growth techniques. We describe the current state of the art in atomic layer deposition (ALD) of InN and InN-based ternary alloys with GaN and AlN and argue that ALD will be the technology for realizing the promises of InN-based electronics.
{"title":"Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys","authors":"Henrik Pedersen*, Chih-Wei Hsu, Neeraj Nepal, Jeffrey M. Woodward and Charles R. Eddy Jr, ","doi":"10.1021/acs.cgd.3c00775","DOIUrl":"https://doi.org/10.1021/acs.cgd.3c00775","url":null,"abstract":"<p >Indium nitride (InN) is a low-band-gap semiconductor with unusually high electron mobility, making it suitable for IR-range optoelectronics and high-frequency transistors. However, the development of InN-based electronics is hampered by the metastable nature of InN. The decomposition temperature of InN is lower than the required growth temperature for most crystal growth techniques. Here, we discuss growth of InN films and epitaxial layers by atomic layer deposition (ALD), a growth technique based on self-limiting surface chemical reactions and, thus, inherently a low-temperature technique. We describe the current state of the art in ALD of InN and InN-based ternary alloys with GaN and AlN, and we contrast this to other growth technologies for these materials. We believe that ALD will be the enabling technology for realizing the promise of InN-based electronics.</p><p >Indium nitride (InN) is a low-band-gap semiconductor with unusually high electron mobility, making it suitable for IR-range optoelectronics and high-frequency transistors. This potential is hampered by the breakdown temperature of InN, which is lower than the required growth temperature for most crystal growth techniques. We describe the current state of the art in atomic layer deposition (ALD) of InN and InN-based ternary alloys with GaN and AlN and argue that ALD will be the technology for realizing the promises of InN-based electronics.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"23 10","pages":"7010–7025"},"PeriodicalIF":3.8,"publicationDate":"2023-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/epdf/10.1021/acs.cgd.3c00775","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41086984","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Rahul Kumar*, Samir K. Saha, Andrian Kuchuk, Fernando Maia de Oliveira, Krista R. Khiangte, Shui-Qing Yu, Yuriy I. Mazur and Gregory J. Salamo,
High-quality GaAs on the c-plane sapphire has been achieved by employing a two-step growth technique, multiple annealing, and an AlAs nucleation layer using molecular beam epitaxy (MBE). The effect of growth parameters, namely, growth temperature, As2 flux, and low-temperature layer growth temperature (LTLGT) in two-step growth have been investigated. In all of the grown samples, the epitaxial orientation of the film is GaAs (111)A. Unlike the homoepitaxial GaAs (111)A MBE growth, where increasing the As2 flux improves the film quality, here the lowest As2 flux resulted in the best film quality. Very low LTLGT resulted in highly twinned material and film surface with many pits. Growth temperature also plays an important role, as seen by the exceptional structural and optical properties of samples grown at 650 °C, but at the cost of the rough film surface. We have observed low-temperature photoluminescence (PL) for all of the samples. However, for the first time, to the best of our knowledge, room-temperature PL (RT-PL) has been demonstrated from a heteroepitaxial GaAs (111)A film. This result is important because RT-PL from the epitaxial GaAs/c-plane sapphire will lead to the fabrication of GaAs laser on sapphire, which is an important functionality to realize photonic circuits on the sapphire platform.
{"title":"Improving the Material Quality of GaAs Grown on the c-Plane Sapphire by Molecular Beam Epitaxy to Achieve Room-Temperature Photoluminescence","authors":"Rahul Kumar*, Samir K. Saha, Andrian Kuchuk, Fernando Maia de Oliveira, Krista R. Khiangte, Shui-Qing Yu, Yuriy I. Mazur and Gregory J. Salamo, ","doi":"10.1021/acs.cgd.3c00792","DOIUrl":"https://doi.org/10.1021/acs.cgd.3c00792","url":null,"abstract":"<p >High-quality GaAs on the c-plane sapphire has been achieved by employing a two-step growth technique, multiple annealing, and an AlAs nucleation layer using molecular beam epitaxy (MBE). The effect of growth parameters, namely, growth temperature, As<sub>2</sub> flux, and low-temperature layer growth temperature (LTLGT) in two-step growth have been investigated. In all of the grown samples, the epitaxial orientation of the film is GaAs (111)A. Unlike the homoepitaxial GaAs (111)A MBE growth, where increasing the As<sub>2</sub> flux improves the film quality, here the lowest As<sub>2</sub> flux resulted in the best film quality. Very low LTLGT resulted in highly twinned material and film surface with many pits. Growth temperature also plays an important role, as seen by the exceptional structural and optical properties of samples grown at 650 °C, but at the cost of the rough film surface. We have observed low-temperature photoluminescence (PL) for all of the samples. However, for the first time, to the best of our knowledge, room-temperature PL (RT-PL) has been demonstrated from a heteroepitaxial GaAs (111)A film. This result is important because RT-PL from the epitaxial GaAs/c-plane sapphire will lead to the fabrication of GaAs laser on sapphire, which is an important functionality to realize photonic circuits on the sapphire platform.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"23 10","pages":"7385–7393"},"PeriodicalIF":3.8,"publicationDate":"2023-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41086775","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Haoyue Song, Meng Cai, Zhengyi Fu and Zhaoyong Zou*,
Amorphous calcium phosphate (ACP) has been widely reported as a metastable precursor during the mineralization of calcium phosphates in bone and enamel. Although the influence of fluoride on the crystallization of hydroxyapatite (HAP) has been extensively investigated, the mineralization pathways of ACP in the presence of fluoride are not fully understood. Here, using a combination of in situ monitoring and ex situ characterizations, we show that fluoride exhibits little effect on the formation and particle size of ACP nanospheres from a supersaturated calcium phosphate solution. However, the stability of ACP increases with increasing concentration of free fluoride ions in solution. We show that the aggregation of ACP nanospheres into larger spheres is an important step during ACP crystallization, which drives the nucleation of plate-like nanocrystals on the surface of ACP nanospheres and induces subsequent crystallization of ACP via a dissolution-recrystallization pathway. In the presence of fluoride, the aggregation of ACP nanospheres and the nucleation of crystalline phases are retarded, thus stabilizing the amorphous phase. In addition, fluoride promotes the formation rod-like crystals on the surface of ACP nanospheres, which grow both outward from solution ions and inward from ACP nanospheres. These results significantly improve our understanding of the mineralization pathways of ACP and explain the inhibitory effect of fluoride during ACP crystallization.
{"title":"Mineralization Pathways of Amorphous Calcium Phosphate in the Presence of Fluoride","authors":"Haoyue Song, Meng Cai, Zhengyi Fu and Zhaoyong Zou*, ","doi":"10.1021/acs.cgd.3c00541","DOIUrl":"https://doi.org/10.1021/acs.cgd.3c00541","url":null,"abstract":"<p >Amorphous calcium phosphate (ACP) has been widely reported as a metastable precursor during the mineralization of calcium phosphates in bone and enamel. Although the influence of fluoride on the crystallization of hydroxyapatite (HAP) has been extensively investigated, the mineralization pathways of ACP in the presence of fluoride are not fully understood. Here, using a combination of <i>in situ</i> monitoring and <i>ex situ</i> characterizations, we show that fluoride exhibits little effect on the formation and particle size of ACP nanospheres from a supersaturated calcium phosphate solution. However, the stability of ACP increases with increasing concentration of free fluoride ions in solution. We show that the aggregation of ACP nanospheres into larger spheres is an important step during ACP crystallization, which drives the nucleation of plate-like nanocrystals on the surface of ACP nanospheres and induces subsequent crystallization of ACP via a dissolution-recrystallization pathway. In the presence of fluoride, the aggregation of ACP nanospheres and the nucleation of crystalline phases are retarded, thus stabilizing the amorphous phase. In addition, fluoride promotes the formation rod-like crystals on the surface of ACP nanospheres, which grow both outward from solution ions and inward from ACP nanospheres. These results significantly improve our understanding of the mineralization pathways of ACP and explain the inhibitory effect of fluoride during ACP crystallization.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"23 10","pages":"7150–7158"},"PeriodicalIF":3.8,"publicationDate":"2023-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41086713","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Haotian Jiang, Yu Chen*, Shipei Sun, Zining Li, Qingchen Wang, Tinglu Song and Haizheng Zhong,
Crystalline orientation control is of great importance for the optoelectronic applications of perovskite single crystals due to their structural anisotropy. Herein, we develop an ionic liquid, named methylammonium difluoroacetate (MA2FAc), as a growth solvent to fabricate multifarious methylammonium-based perovskite single crystals. Typically, it can easily achieve preferably oriented growth of high-quality MAPbI3 single crystals with (002) facet exposition. Benefiting from the superior charge carrier properties along the [001] direction, a bias-modulating broadband/narrowband switchable photodetector is proposed, which exhibits a broadband specific detectivity D* of 1.1 × 1011 Jones under 0.1 V and a narrowband D* of 9.0 × 109 Jones with a full width at half-maximum (fwhm) of 31 at 810 nm merely under 0.25 mV, respectively. Theoretical calculations and experimental analysis reveal that the difluoromethyl substitution can simultaneously regulate solvation characteristics of the acetate anion as well as crystallization kinetics of perovskite single crystals. In light of the universal solvent utilization of MA2FAc, this work provides a new perspective in the solution growth process of high-quality methylammonium based perovskite single crystals.
{"title":"Preferably Oriented Growth of Methylammonium-Based Perovskite Single Crystals with Ionic Liquid Solvent","authors":"Haotian Jiang, Yu Chen*, Shipei Sun, Zining Li, Qingchen Wang, Tinglu Song and Haizheng Zhong, ","doi":"10.1021/acs.cgd.3c00818","DOIUrl":"https://doi.org/10.1021/acs.cgd.3c00818","url":null,"abstract":"<p >Crystalline orientation control is of great importance for the optoelectronic applications of perovskite single crystals due to their structural anisotropy. Herein, we develop an ionic liquid, named methylammonium difluoroacetate (MA2FAc), as a growth solvent to fabricate multifarious methylammonium-based perovskite single crystals. Typically, it can easily achieve preferably oriented growth of high-quality MAPbI<sub>3</sub> single crystals with (002) facet exposition. Benefiting from the superior charge carrier properties along the [001] direction, a bias-modulating broadband/narrowband switchable photodetector is proposed, which exhibits a broadband specific detectivity <i>D</i>* of 1.1 × 10<sup>11</sup> Jones under 0.1 V and a narrowband <i>D</i>* of 9.0 × 10<sup>9</sup> Jones with a full width at half-maximum (fwhm) of 31 at 810 nm merely under 0.25 mV, respectively. Theoretical calculations and experimental analysis reveal that the difluoromethyl substitution can simultaneously regulate solvation characteristics of the acetate anion as well as crystallization kinetics of perovskite single crystals. In light of the universal solvent utilization of MA2FAc, this work provides a new perspective in the solution growth process of high-quality methylammonium based perovskite single crystals.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"23 10","pages":"7424–7431"},"PeriodicalIF":3.8,"publicationDate":"2023-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"41086783","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}