{"title":"Actinic EUV reflectometry and scatterometry: from national lab to commercial applications","authors":"Stuart Sherwin","doi":"10.1117/12.2643550","DOIUrl":"https://doi.org/10.1117/12.2643550","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123147628","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Ashwanth Subramanian, Nikhil Tiwale, Wonmoo Lee, K. Kisslinger, Ming Lu, A. Stein, Jiyoung Kim, C. Nam
{"title":"EUVL characteristics of indium-oxide-infiltrated PMMA hybrid photoresist synthesized by vapor-phase infiltration","authors":"Ashwanth Subramanian, Nikhil Tiwale, Wonmoo Lee, K. Kisslinger, Ming Lu, A. Stein, Jiyoung Kim, C. Nam","doi":"10.1117/12.2643226","DOIUrl":"https://doi.org/10.1117/12.2643226","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130329021","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Juhee Hong, Hae-Bang Lee, Yesong Kim, Donghoi Kim, Munsu Choi, Seungjo Lee, Byeong Sung Yu, Chul-Hee Park, Min Wook Jung, Chang Hoon Lee, Byoung Hoon Seung, C. Shin
{"title":"Full size EUV pellicle development for high power","authors":"Juhee Hong, Hae-Bang Lee, Yesong Kim, Donghoi Kim, Munsu Choi, Seungjo Lee, Byeong Sung Yu, Chul-Hee Park, Min Wook Jung, Chang Hoon Lee, Byoung Hoon Seung, C. Shin","doi":"10.1117/12.2641755","DOIUrl":"https://doi.org/10.1117/12.2641755","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125830533","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
T. Kovalevich, L. van Look, J. Franke, V. Philipsen
{"title":"Evaluation of LS printing and general understanding of imaging with DF low-n mask","authors":"T. Kovalevich, L. van Look, J. Franke, V. Philipsen","doi":"10.1117/12.2644701","DOIUrl":"https://doi.org/10.1117/12.2644701","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116827125","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Nagahara, Arnaud Dauendorffer, Xiang Liu, T. Onitsuka, H. Genjima, Noriaki Nagamine, Yuhei Kuwahara, Y. Kamei, S. Kawakami, M. Muramatsu, S. Shimura, K. Nafus, N. Oikawa, Y. Feurprier, M. Demand, S. Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, E. Liu, C. Catano, J. LaRose, Jeffrery C. Shearer, L. Huli, P. Foubert, D. De Simone
{"title":"Holistic litho-etch development to address patterning challenges towards high NA EUV","authors":"S. Nagahara, Arnaud Dauendorffer, Xiang Liu, T. Onitsuka, H. Genjima, Noriaki Nagamine, Yuhei Kuwahara, Y. Kamei, S. Kawakami, M. Muramatsu, S. Shimura, K. Nafus, N. Oikawa, Y. Feurprier, M. Demand, S. Thibaut, Alexandra Krawicz, Steven Grzeskowiak, Katie Lutker-Lee, E. Liu, C. Catano, J. LaRose, Jeffrery C. Shearer, L. Huli, P. Foubert, D. De Simone","doi":"10.1117/12.2642941","DOIUrl":"https://doi.org/10.1117/12.2642941","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115957041","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Wonmoo Lee, Ashwanth Subramanian, Nikhil Tiwale, Dan N. Le, S. Hwang, Jiyoung Kim, C. Nam
{"title":"Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition","authors":"Wonmoo Lee, Ashwanth Subramanian, Nikhil Tiwale, Dan N. Le, S. Hwang, Jiyoung Kim, C. Nam","doi":"10.1117/12.2641794","DOIUrl":"https://doi.org/10.1117/12.2641794","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"44 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130537353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Yongkyun Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, Jinho Ahn
{"title":"Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle","authors":"Yongkyun Kim, Kihun Seong, Donggi Lee, Seungchan Moon, Hyun-Mi Kim, Hyeongkeun Kim, Seul-Gi Kim, Jinho Ahn","doi":"10.1117/12.2643003","DOIUrl":"https://doi.org/10.1117/12.2643003","url":null,"abstract":"","PeriodicalId":374992,"journal":{"name":"International Conference on Extreme Ultraviolet Lithography 2022","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130923343","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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