首页 > 最新文献

2015 6th Asia Symposium on Quality Electronic Design (ASQED)最新文献

英文 中文
Decision-based Biochips: A novel design for concurrent execution of networked bioassays integrated in scalable DMFBs 基于决策的生物芯片:一种集成在可扩展dmfb中的网络生物测定并发执行的新设计
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274023
P. Roy, Mriganka Chakraborty, Aatreyi Bal, H. Rahaman, P. Dasgupta
Digital Microfluidic Biochips, a promising platform for Lab-on-chip systems are capable of automated biochemical analysis targeted for medical diagnostics and other biochemical applications. Due to its reconfigurability and scalability, a DMFB device is capable of integrating multiple bioassay protocols within the same array for simultaneous execution. We propose a DMFB design capable of executing multiple Bioassays selectively based on prior detection of results of already executed protocols at previous timestamps. We propose specified detection analyzers to be integrated with photodiodes preplaced at dedicated detection sites and a centralized memory to decide on the predefined signal set for a given execution sequence. The simulation is carried out using FPGA prototypes integrated with a DMFB with a prespecified layout for multilevel execution and the results are found to be in conformance with conventional benchtop procedures.
数字微流控生物芯片是一个很有前途的实验室芯片系统平台,能够针对医学诊断和其他生化应用进行自动生化分析。由于其可重构性和可扩展性,DMFB设备能够在同一阵列中集成多种生物测定协议以同时执行。我们提出了一种DMFB设计,能够根据先前时间戳中已经执行的协议的先前检测结果选择性地执行多种生物测定。我们建议将指定的检测分析仪与预置在专用检测点的光电二极管和集中存储器集成,以确定给定执行序列的预定义信号集。利用FPGA原型与DMFB集成进行了仿真,该DMFB具有预先指定的多级执行布局,结果与传统的台式程序一致。
{"title":"Decision-based Biochips: A novel design for concurrent execution of networked bioassays integrated in scalable DMFBs","authors":"P. Roy, Mriganka Chakraborty, Aatreyi Bal, H. Rahaman, P. Dasgupta","doi":"10.1109/ACQED.2015.7274023","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274023","url":null,"abstract":"Digital Microfluidic Biochips, a promising platform for Lab-on-chip systems are capable of automated biochemical analysis targeted for medical diagnostics and other biochemical applications. Due to its reconfigurability and scalability, a DMFB device is capable of integrating multiple bioassay protocols within the same array for simultaneous execution. We propose a DMFB design capable of executing multiple Bioassays selectively based on prior detection of results of already executed protocols at previous timestamps. We propose specified detection analyzers to be integrated with photodiodes preplaced at dedicated detection sites and a centralized memory to decide on the predefined signal set for a given execution sequence. The simulation is carried out using FPGA prototypes integrated with a DMFB with a prespecified layout for multilevel execution and the results are found to be in conformance with conventional benchtop procedures.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116951022","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Realization of non-linear i-v curve with low power dissipation using linear ion drift memristor model 用线性离子漂移忆阻器模型实现低功耗非线性i-v曲线
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274025
T. A. Anusudha, S. Prabaharan
Modern memories are very power hungry, larger in size, low retention period, low chip density and high cost. Memristor is a missing passive circuit element and regarded as a new class of emerging non-volatile memories overcoming the above problems. Memristor may be thought of an active as well as passive device based on the conditions of Memristance and Dynamic Negative Differential Resistance (DNDR). Memristor has been used for non-volatile memory applications, if and only if it produces non-linear pinched hysteresis curve. If the size of the pinched hysteresis curve increases, power dissipation increases as well. In this paper, we discuss the parametric analysis of memristor adopting the linear ion-drift model to achieve low power dissipation while retaining the nonlinear i-v characteristics.
现代存储器非常耗电,体积更大,保留期低,芯片密度低,成本高。忆阻器是一种缺少的无源电路元件,是一种克服上述问题的新型非易失性存储器。基于忆阻和动态负差分电阻(DNDR)的条件,忆阻器既可以被认为是有源器件,也可以被认为是无源器件。忆阻器已被用于非易失性存储应用,当且仅当它产生非线性压缩滞回曲线。如果缩紧迟滞曲线的尺寸增大,则功耗也会增大。本文讨论了采用线性离子漂移模型的忆阻器的参数分析,以在保持非线性i-v特性的同时实现低功耗。
{"title":"Realization of non-linear i-v curve with low power dissipation using linear ion drift memristor model","authors":"T. A. Anusudha, S. Prabaharan","doi":"10.1109/ACQED.2015.7274025","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274025","url":null,"abstract":"Modern memories are very power hungry, larger in size, low retention period, low chip density and high cost. Memristor is a missing passive circuit element and regarded as a new class of emerging non-volatile memories overcoming the above problems. Memristor may be thought of an active as well as passive device based on the conditions of Memristance and Dynamic Negative Differential Resistance (DNDR). Memristor has been used for non-volatile memory applications, if and only if it produces non-linear pinched hysteresis curve. If the size of the pinched hysteresis curve increases, power dissipation increases as well. In this paper, we discuss the parametric analysis of memristor adopting the linear ion-drift model to achieve low power dissipation while retaining the nonlinear i-v characteristics.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117178965","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Method to improve ball grid array Imax distribution for small form factor package design 小尺寸封装设计中改进球栅阵列Imax分布的方法
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274009
C. Kuan, Jimmy Huang, B. E. Cheah, J. Kong
Maximum current (Imax) distribution across substrate has been one of the major design factors that govern the electronic package form factor. Particularly on ball grid array (BGA) package design, often times Imax distribution determines the number of solder balls required for each interface to sustain respective workloads hence defines the total ball count and the x-y dimension of the electronic package. This paper introduces a new method to improve BGA Imax distribution while keeping ball count minimal for to enable small form-factor package design. The proposed solution utilizes fundamental of electrical resistance control through on-board BGA pad design customization to achieve more uniform Imax distribution across solder balls and enable up-to 25% Imax reduction with negligible IR drop impact. Power losses across plane were also simulated and compared against conventional design in this study.
最大电流(Imax)分布在衬底上一直是决定电子封装外形的主要设计因素之一。特别是在球栅阵列(BGA)封装设计中,通常Imax分布决定了每个接口维持各自工作负载所需的焊球数量,从而定义了电子封装的总球数和x-y尺寸。本文介绍了一种新的方法来改善BGA Imax分布,同时保持最小的球数,以实现小尺寸封装设计。所提出的解决方案通过定制板载BGA焊盘设计,利用电阻控制的基本原理,在焊锡球上实现更均匀的Imax分布,并在可忽略IR跌落影响的情况下实现高达25%的Imax减少。本研究还模拟了平面上的功率损耗,并与传统设计进行了比较。
{"title":"Method to improve ball grid array Imax distribution for small form factor package design","authors":"C. Kuan, Jimmy Huang, B. E. Cheah, J. Kong","doi":"10.1109/ACQED.2015.7274009","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274009","url":null,"abstract":"Maximum current (Imax) distribution across substrate has been one of the major design factors that govern the electronic package form factor. Particularly on ball grid array (BGA) package design, often times Imax distribution determines the number of solder balls required for each interface to sustain respective workloads hence defines the total ball count and the x-y dimension of the electronic package. This paper introduces a new method to improve BGA Imax distribution while keeping ball count minimal for to enable small form-factor package design. The proposed solution utilizes fundamental of electrical resistance control through on-board BGA pad design customization to achieve more uniform Imax distribution across solder balls and enable up-to 25% Imax reduction with negligible IR drop impact. Power losses across plane were also simulated and compared against conventional design in this study.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"20 5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125775153","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
SER mitigation technique through selective flip-flop replacement 选择性触发器替换的SER缓解技术
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274002
Pavan Vithal Torvi, V. Devanathan, Ashish Vanjari, V. Kamakoti
The advancement in the semiconductor manufacturing process has reduced the device dimensions, which in turn has reduced design and manufacturing costs of the Integrated Chips (IC). This has accelerated the IC penetration in automobiles, health care and safety critical systems. However, the smaller device dimensions have made the ICs vulnerable to soft-errors. The sequential cells in a given design contribute significantly to its soft-error rate (SER). Some of the soft-errors get masked and do not cause any adverse impact. The masking can occur due to logic or timing reasons. This paper presents a flow that uses the Timing Vulnerability Factor (TVF) and Architecture Vulnerability Factor (AVF) of the sequential instances in a given design to reduce its soft-error rate (SER). The paper proposes a novel method to efficiently compute the TVF and AVF parameters followed by a linear programming technique that uses these parameters to reduce the SER of the given design. Using the proposed technique, we have reduced the sequential cell contribution to the SER of an in-house IP design by 36% for an increase of 9% in sequential cells area.
半导体制造工艺的进步使器件尺寸减小,从而降低了集成芯片(IC)的设计和制造成本。这加速了集成电路在汽车、医疗保健和安全关键系统中的渗透。然而,较小的设备尺寸使ic容易受到软错误的影响。给定设计中的顺序单元对其软错误率(SER)有很大贡献。一些软错误被掩盖,不会造成任何不利影响。屏蔽可能是由于逻辑或时间原因造成的。本文提出了一种利用给定设计中顺序实例的时序脆弱性因子(TVF)和体系结构脆弱性因子(AVF)来降低其软错误率的流程。本文提出了一种新的方法来有效地计算TVF和AVF参数,然后采用线性规划技术利用这些参数来降低给定设计的SER。使用所提出的技术,我们将内部IP设计的顺序单元对SER的贡献减少了36%,而顺序单元面积增加了9%。
{"title":"SER mitigation technique through selective flip-flop replacement","authors":"Pavan Vithal Torvi, V. Devanathan, Ashish Vanjari, V. Kamakoti","doi":"10.1109/ACQED.2015.7274002","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274002","url":null,"abstract":"The advancement in the semiconductor manufacturing process has reduced the device dimensions, which in turn has reduced design and manufacturing costs of the Integrated Chips (IC). This has accelerated the IC penetration in automobiles, health care and safety critical systems. However, the smaller device dimensions have made the ICs vulnerable to soft-errors. The sequential cells in a given design contribute significantly to its soft-error rate (SER). Some of the soft-errors get masked and do not cause any adverse impact. The masking can occur due to logic or timing reasons. This paper presents a flow that uses the Timing Vulnerability Factor (TVF) and Architecture Vulnerability Factor (AVF) of the sequential instances in a given design to reduce its soft-error rate (SER). The paper proposes a novel method to efficiently compute the TVF and AVF parameters followed by a linear programming technique that uses these parameters to reduce the SER of the given design. Using the proposed technique, we have reduced the sequential cell contribution to the SER of an in-house IP design by 36% for an increase of 9% in sequential cells area.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"176 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123255375","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Performance analysis of 22 nm deep submicron NMOS transistors 22 nm深亚微米NMOS晶体管的性能分析
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274020
K. Yeap, Jor Gie Liew, S. Loh, H. Nisar, Z. I. Rizman
We present the design and analysis of 22 nm deep submicron indium gallium nitride InGaN and silicon Si NMOS transistors. The results show that the saturation and breakdown behavior of the InGaN transistor is significantly higher than that of its silicon Si counterpart. Our analysis suggests that InGaN could be a better alternative substrate material in the design and fabrication of transistors, as the size of the channel approaches the mean free path of the carriers.
我们设计和分析了22 nm深亚微米氮化铟镓InGaN和硅硅NMOS晶体管。结果表明,InGaN晶体管的饱和和击穿性能明显高于硅硅晶体管。我们的分析表明,当通道的尺寸接近载流子的平均自由程时,InGaN可能是晶体管设计和制造中更好的替代衬底材料。
{"title":"Performance analysis of 22 nm deep submicron NMOS transistors","authors":"K. Yeap, Jor Gie Liew, S. Loh, H. Nisar, Z. I. Rizman","doi":"10.1109/ACQED.2015.7274020","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274020","url":null,"abstract":"We present the design and analysis of 22 nm deep submicron indium gallium nitride InGaN and silicon Si NMOS transistors. The results show that the saturation and breakdown behavior of the InGaN transistor is significantly higher than that of its silicon Si counterpart. Our analysis suggests that InGaN could be a better alternative substrate material in the design and fabrication of transistors, as the size of the channel approaches the mean free path of the carriers.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128011126","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
An efficient Mesh-of-Tree based interconnect architecture for high performance 3D FPGAs 一种高效的基于Mesh-of-Tree的高性能3D fpga互连架构
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274000
V. Pangracious, Z. Marrakchi, H. Mehrez
In this paper we propose a three-dimensional (3D) interconnect network implementation based on a modified Mesh-of-Trees (MoT) topology for FPGA architecture design. To obtain the optimal MoT-based interconnect structure, the routing architecture of the 2D MoT-based FPGA is modified to include long routing segments that span multiple switch blocks in every row and column. By adjusting the percentage of long wire and span, a 2.5D or 3D high density MoT FPGAs can be designed. To design 3D multi-stacked MoT-based FPGAs, the 2D MoT FPGA is cut into two or more equal sections by adjusting the long wire span. The long wire segments are realized using 3D through silicon via (TSV). To design 2.5D interposer-based multi-FPGAs, we increase the number of cuts and apply appropriate optimization models to scale down the number of long wires and horizontal inter-FPGA interposer wires. Using our 2.5/3D design and simulation CAD flow, we demonstrate the speed and area of 3D MoT-based FPGA architecture is improved by 54% and 41% respectively in comparison to 3D Mesh-based FPGA.
在本文中,我们提出了一种基于改进的树网格(MoT)拓扑的三维(3D)互连网络实现,用于FPGA架构设计。为了获得最佳的mot互连结构,修改了二维mot FPGA的路由架构,使其包含跨越每行和每列多个交换块的长路由段。通过调整长导线和跨距的比例,可以设计出2.5D或3D高密度MoT fpga。为了设计3D多堆叠MoT FPGA,通过调整长线跨度将2D MoT FPGA切割成两个或多个相等的部分。长线段采用三维硅通孔(TSV)技术实现。为了设计基于2.5D中间层的多fpga,我们增加了切割数量,并应用适当的优化模型来减少长线和水平fpga间中间层线的数量。利用我们的2.5/3D设计和仿真CAD流程,我们证明了基于3D mot的FPGA架构的速度和面积分别比基于3D mesh的FPGA提高了54%和41%。
{"title":"An efficient Mesh-of-Tree based interconnect architecture for high performance 3D FPGAs","authors":"V. Pangracious, Z. Marrakchi, H. Mehrez","doi":"10.1109/ACQED.2015.7274000","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274000","url":null,"abstract":"In this paper we propose a three-dimensional (3D) interconnect network implementation based on a modified Mesh-of-Trees (MoT) topology for FPGA architecture design. To obtain the optimal MoT-based interconnect structure, the routing architecture of the 2D MoT-based FPGA is modified to include long routing segments that span multiple switch blocks in every row and column. By adjusting the percentage of long wire and span, a 2.5D or 3D high density MoT FPGAs can be designed. To design 3D multi-stacked MoT-based FPGAs, the 2D MoT FPGA is cut into two or more equal sections by adjusting the long wire span. The long wire segments are realized using 3D through silicon via (TSV). To design 2.5D interposer-based multi-FPGAs, we increase the number of cuts and apply appropriate optimization models to scale down the number of long wires and horizontal inter-FPGA interposer wires. Using our 2.5/3D design and simulation CAD flow, we demonstrate the speed and area of 3D MoT-based FPGA architecture is improved by 54% and 41% respectively in comparison to 3D Mesh-based FPGA.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"81 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126239327","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Combined SRAM read/write assist techniques for near/sub-threshold voltage operation 组合式SRAM读/写辅助技术,用于接近/亚阈值电压操作
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7273998
Farah B. Yahya, H. Patel, V. Chandra, B. Calhoun
This paper investigates the use of combined read and write assist techniques to reduce the minimum operating voltage (VMIN) of the 6T SRAM bit-cell. While write failures initially limit VMIN, applying write assist introduces row and column half-select failures. Thus, read and write assist must be combined to allow scaling VMIN down to near/sub threshold voltages. We find that combining negative bitline (BL) for write assist with array VDD boosting for read assist is most effective for reducing the array VMIN and eliminating half-select failures for commercial 130nm and sub-20nm FinFET technologies across different process corners and temperatures. The proposed combination results in the highest reduction in SRAM VMIN (to 300mV for FinFET and to 600mV for 130nm CMOS). This paper also shows that controlling the degree of applied assist based on the chip corner will allow further reductions in VMIN for the 130nm CMOS (to 450mV) and the required assist needed to achieve VMIN for both the FinFET and the 130nm bit-cells.
本文研究了使用组合式读写辅助技术来降低6T SRAM位单元的最小工作电压(VMIN)。虽然写失败最初会限制VMIN,但应用写辅助会导致行和列半选择失败。因此,读写辅助必须结合起来,以允许将VMIN降低到接近/亚阈值电压。我们发现,将用于写辅助的负位线(BL)与用于读辅助的阵列VDD增强相结合,对于降低阵列VMIN和消除跨不同工艺角和温度的商用130nm和sub-20nm FinFET技术的半选择故障最为有效。所提出的组合导致SRAM VMIN的最大降低(FinFET为300mV, 130nm CMOS为600mV)。本文还表明,基于芯片角控制应用辅助的程度将进一步降低130nm CMOS的VMIN(至450mV),以及FinFET和130nm位单元实现VMIN所需的辅助。
{"title":"Combined SRAM read/write assist techniques for near/sub-threshold voltage operation","authors":"Farah B. Yahya, H. Patel, V. Chandra, B. Calhoun","doi":"10.1109/ACQED.2015.7273998","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7273998","url":null,"abstract":"This paper investigates the use of combined read and write assist techniques to reduce the minimum operating voltage (VMIN) of the 6T SRAM bit-cell. While write failures initially limit VMIN, applying write assist introduces row and column half-select failures. Thus, read and write assist must be combined to allow scaling VMIN down to near/sub threshold voltages. We find that combining negative bitline (BL) for write assist with array VDD boosting for read assist is most effective for reducing the array VMIN and eliminating half-select failures for commercial 130nm and sub-20nm FinFET technologies across different process corners and temperatures. The proposed combination results in the highest reduction in SRAM VMIN (to 300mV for FinFET and to 600mV for 130nm CMOS). This paper also shows that controlling the degree of applied assist based on the chip corner will allow further reductions in VMIN for the 130nm CMOS (to 450mV) and the required assist needed to achieve VMIN for both the FinFET and the 130nm bit-cells.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127276132","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
An all-digital adaptive approach to combat aging effects in clock networks 一种对抗时钟网络老化效应的全数字自适应方法
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274016
S. Arasu, M. Nourani, Hao Luo
In this paper, we analyze the impact of asymmetrical aging due to Bias Temperature Instability (BTI) in the clock tree segments of power efficient designs. The nonuniform aging of launch and capture clock segments could not only violate the setup timing but also result in gross hold violations. Aging in clock networks also results in pulse width compression which impacts the half-cycle paths' timing adversely. We present a reference-less alldigital technique to detect the aging effects and measure quantitatively the extent of pulse-width-distortion. The measurement results are then applied to rectify the pulse width distortion such that the clock network output is restored to a 50-50 duty cycle. The technique is validated using SPICE simulation based on 45nm industry standard library. A resolution of sub-1ps is achievable for both distortion measurement and correction circuits.
在本文中,我们分析了由偏置温度不稳定性(BTI)引起的时钟树段不对称老化对节能设计的影响。发射和捕获时钟段的不均匀老化不仅会违反设置时间,而且会导致严重的保持违规。时钟网络的老化也会导致脉冲宽度压缩,从而对半周期路径的时序产生不利影响。我们提出了一种无参考的全数字技术来检测老化效应和定量测量脉宽畸变的程度。然后应用测量结果来校正脉宽失真,使时钟网络输出恢复到50-50占空比。基于45nm工业标准库的SPICE仿真验证了该技术的有效性。失真测量和校正电路的分辨率均可达到低于1ps。
{"title":"An all-digital adaptive approach to combat aging effects in clock networks","authors":"S. Arasu, M. Nourani, Hao Luo","doi":"10.1109/ACQED.2015.7274016","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274016","url":null,"abstract":"In this paper, we analyze the impact of asymmetrical aging due to Bias Temperature Instability (BTI) in the clock tree segments of power efficient designs. The nonuniform aging of launch and capture clock segments could not only violate the setup timing but also result in gross hold violations. Aging in clock networks also results in pulse width compression which impacts the half-cycle paths' timing adversely. We present a reference-less alldigital technique to detect the aging effects and measure quantitatively the extent of pulse-width-distortion. The measurement results are then applied to rectify the pulse width distortion such that the clock network output is restored to a 50-50 duty cycle. The technique is validated using SPICE simulation based on 45nm industry standard library. A resolution of sub-1ps is achievable for both distortion measurement and correction circuits.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"55 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127729039","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
True 3D antenna for UHF RFID application 用于超高频RFID应用的真正3D天线
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274012
Y. Zhang, Bin Wang, Haipeng Zhang, Weixin Kong
This paper presented a new kind of Omni-directional UHF RFID tag antenna. The antenna is composed of four identical arrow-shape modules that are completely center-symmetric. Compared with the traditional dipole planar antenna, the antenna proposed has a -10dB bandwidth at 244MHz and shows better performance in Omni-direction in the reading range. The new Omni-directional UHF RFID tag antenna can effectively eliminate the reading blind spots caused by the antenna direction.
提出了一种新型的全向超高频RFID标签天线。天线由四个完全中心对称的相同箭头形状模块组成。与传统的偶极平面天线相比,该天线在244MHz时的带宽为-10dB,在全向读取范围内表现出更好的性能。新型全向超高频RFID标签天线可以有效消除因天线方向造成的读取盲点。
{"title":"True 3D antenna for UHF RFID application","authors":"Y. Zhang, Bin Wang, Haipeng Zhang, Weixin Kong","doi":"10.1109/ACQED.2015.7274012","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274012","url":null,"abstract":"This paper presented a new kind of Omni-directional UHF RFID tag antenna. The antenna is composed of four identical arrow-shape modules that are completely center-symmetric. Compared with the traditional dipole planar antenna, the antenna proposed has a -10dB bandwidth at 244MHz and shows better performance in Omni-direction in the reading range. The new Omni-directional UHF RFID tag antenna can effectively eliminate the reading blind spots caused by the antenna direction.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"199 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128682778","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Current-mode simultaneous bidirectional transceiver for on-chip global interconnects 用于片上全球互连的电流模式同时双向收发器
Pub Date : 2015-09-24 DOI: 10.1109/ACQED.2015.7274001
N. Wary, P. Mandal
A new current-mode simultaneous bidirectional transceiver for high speed asynchronous communication over on-chip global interconnects has been proposed in this paper. The new transceiver can receive and transmit the data simultaneously over a same differential interconnect, thereby decreasing the number of interconnects required compared to unidirectional signalling schemes. The transceiver provides a low input impedance and so supports high bandwidth of transmission. The circuit has been implemented in 65nm UMC process with a global interconnect of length 5mm and width 1.5μm. The energy efficiency of the transceiver for simultaneous bidirectional data transmission of 10 Gbps data is 0.38 pJ/b.
本文提出了一种用于片上全局互连高速异步通信的新型电流型同时双向收发器。新的收发器可以通过相同的差分互连同时接收和发送数据,从而减少了与单向信号方案相比所需的互连数量。该收发器提供低输入阻抗,因此支持高带宽传输。该电路采用65nm UMC工艺实现,整体互连长度为5mm,宽度为1.5μm。同时双向传输10gbps数据的收发器能量效率为0.38 pJ/b。
{"title":"Current-mode simultaneous bidirectional transceiver for on-chip global interconnects","authors":"N. Wary, P. Mandal","doi":"10.1109/ACQED.2015.7274001","DOIUrl":"https://doi.org/10.1109/ACQED.2015.7274001","url":null,"abstract":"A new current-mode simultaneous bidirectional transceiver for high speed asynchronous communication over on-chip global interconnects has been proposed in this paper. The new transceiver can receive and transmit the data simultaneously over a same differential interconnect, thereby decreasing the number of interconnects required compared to unidirectional signalling schemes. The transceiver provides a low input impedance and so supports high bandwidth of transmission. The circuit has been implemented in 65nm UMC process with a global interconnect of length 5mm and width 1.5μm. The energy efficiency of the transceiver for simultaneous bidirectional data transmission of 10 Gbps data is 0.38 pJ/b.","PeriodicalId":376857,"journal":{"name":"2015 6th Asia Symposium on Quality Electronic Design (ASQED)","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125440180","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
期刊
2015 6th Asia Symposium on Quality Electronic Design (ASQED)
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1