Journal of Micro and Nano-Manufacturing最新文献

英文中文

Transfer Learning For Predictive Quality In Laser-Induced Plasma Micro-Machining 激光诱导等离子体微加工中预测质量的迁移学习

Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2023-11-07 DOI: 10.1115/1.4064010

Mengfei Chen, Rajiv Malhotra, Weihong (Grace) Guo

Abstract In laser-induced plasma micro-machining (LIPMM), a focused, ultrashort pulsed laser beam creates a highly localized plasma zone within a transparent liquid dielectric. When the beam intensity is greater than the breakdown threshold in the dielectric media, plasma is formed which is then used to ablate the workpiece. This paper aims to facilitate in-situ process monitoring and quality prediction for LIPMM by developing a deep learning model to (1) understand the relationship between acoustic emission data and quality of micro-machining with LIPMM, (2) transfer such understanding across different process parameters, and (3) predict quality accurately by fine-tuning models with a smaller dataset. Experiments and results show that the relationship learned from one process parameter can be transferred to other parameters, requiring lesser data and lesser computational time for training the model. We investigate the feasibility of transfer learning and compare the performance of various transfer learning models: different input features, different CNN structures, and the same structure with different fine-tuned layers. The findings provide insights into how to design effective transfer learning models for manufacturing applications.

在激光诱导等离子体微加工(LIPMM)中，聚焦的超短脉冲激光束在透明液体介质内产生高度局部化的等离子体区。当光束强度大于介电介质中的击穿阈值时，形成等离子体，然后用于烧蚀工件。本文旨在通过开发深度学习模型来促进LIPMM的现场过程监测和质量预测，以(1)了解声发射数据与LIPMM微加工质量之间的关系，(2)跨不同工艺参数传递这种理解，以及(3)使用较小的数据集通过微调模型准确预测质量。实验和结果表明，从一个过程参数中学习到的关系可以转移到其他参数中，从而减少了训练模型所需的数据量和计算时间。我们研究了迁移学习的可行性，并比较了各种迁移学习模型的性能:不同的输入特征，不同的CNN结构，以及具有不同微调层的相同结构。研究结果为如何为制造应用设计有效的迁移学习模型提供了见解。

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引用次数: 0

Simultaneous Micro- and Nanoscale Silicon Fabrication by Metal-Assisted Chemical Etch 金属辅助化学蚀刻同时制备微纳米级硅

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2023-03-21 DOI: 10.1115/1.4062167

Raul Lema Galindo, P. Ajay, S. V. Sreenivasan

Simultaneous micro and nanoscale etching of silicon on a wafer-scale is nowadays performed using plasma etching techniques. These plasma techniques, however, suffer from low throughput due to Aspect-Ratio Dependent Etch (ARDE) rate, etch lag from changes in feature size, loading effects from increased etch area, and undesirable surface characteristics such as sidewall taper and scalloping, which are particularly problematic at the nanoscale and can affect the etch uniformity. Additionally, the hardware required for plasma etching can be very expensive. A potential alternative, which addresses the above issues with plasma etching is Metal Assisted Chemical Etch (MacEtch). To date, however, an integrated micro and nanoscale MacEtch process, which has uniform and clean (i.e. without nanowire-like defects in microscale areas) etch front has not been presented in the literature. In this work, we present for the first time a feasible process flow for simultaneous micro and nanoscale silicon etching without nanowire-like defects, which we call Integrated Micro- and Nanoscale MacEtch (IMN-MacEtch). Successful etching of silicon features ranging from 100 nm to 100 µm was achieved with etch rates of about 1.8 µm/min in a single step to achieve features with an Aspect Ratio (AR) ~18:1. We thus conclude that the process represents a feasible alternative to current dry etch methods for patterning feature sizes spanning three orders of magnitude.

目前在晶圆尺度上同时进行微纳米尺度的硅蚀刻是使用等离子体蚀刻技术。然而，这些等离子体技术由于宽高比相关蚀刻(ARDE)速率、特征尺寸变化导致的蚀刻滞后、蚀刻面积增加带来的负载效应以及不希望的表面特性(如侧壁锥度和扇形)而遭受低吞吐量的困扰，这些特性在纳米尺度上尤其成问题，并可能影响蚀刻均匀性。此外，等离子体蚀刻所需的硬件可能非常昂贵。金属辅助化学蚀刻(MacEtch)是一种潜在的替代方案，可以解决等离子体蚀刻的上述问题。然而，迄今为止，在文献中还没有提出一种集成的微纳米尺度MacEtch工艺，该工艺具有均匀和清洁的蚀刻前沿(即在微尺度区域没有纳米线状缺陷)。在这项工作中，我们首次提出了一种可行的工艺流程，可以同时进行微纳米级硅蚀刻，而不存在纳米线状缺陷，我们称之为集成微纳米蚀刻(IMN-MacEtch)。在单步蚀刻速率约为1.8 μ m/min的情况下，成功蚀刻了100 nm ~ 100µm的硅特征，获得了宽高比(AR) ~18:1的特征。因此，我们得出结论，该工艺代表了当前干蚀刻方法的可行替代方案，用于图案特征尺寸跨越三个数量级。

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引用次数: 0

Thermodynamic Evaluation of Electroosmotic Peristaltic Pumping for Shear-Thinning Fluid Flow 剪切减薄流体电渗流蠕动泵送的热力学评价

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2023-03-21 DOI: 10.1115/1.4062168

S. Noreen, M. Zahra

The design and operation of lab-on-a-chip systems that are based on electrical circuits require fluids that are propelled by thermo-electrokinetic forces. On-chip operations including the generation of heat along microchannels and the control of liquid flow are all relevant in the traditional sense. The influence of heat on pseudoplastic fluid flow is demonstrated in this work using electroosmotic (EOF) peristaltic pumping. The fundamental heat-transport equations that govern microchannel applications are developed from theoretical considerations. Explicit equations are presented for pressure gradient, stream functions, heat transfer coefficient, and temperature distribution when long wave length and low Reynolds numbers are taken into account. Analytical solutions employ a regular perturbation approach. Then, Mathematica software is used to solve the resulting equation. Physical quantities are analysed using a variety of parameters. The results are visibly presented for each parameter at the end.

基于电路的芯片实验室系统的设计和操作需要由热电动力推动的流体。芯片上的操作，包括沿着微通道产生热量和控制液体流动，在传统意义上都是相关的。本文利用电渗（EOF）蠕动泵演示了热对假塑性流体流动的影响。控制微通道应用的基本热传输方程是从理论考虑发展起来的。当考虑长波长和低雷诺数时，给出了压力梯度、流函数、传热系数和温度分布的显式方程。解析解采用正则摄动方法。然后，使用Mathematica软件对所得方程进行求解。物理量使用各种参数进行分析。每个参数的结果在最后都可以直观地显示出来。

引用次数: 0

Electric-field and Mechanical Vibration-assisted Atomic Force Microscope (AFM)-based Nanopatterning 基于电场和机械振动辅助原子力显微镜（AFM）的纳米图案

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2023-01-23 DOI: 10.1115/1.4056731

Huimin Zhou, Yingchun Jiang, C. Ke, Jia Deng

Atomic force microscope (AFM)-based nanopatterning is a cost-effective set of techniques to fabricate nanostructures with arbitrary shapes. However, existing AFM-based nanopatterning approaches have limitations in the patterning resolution and efficiency. Minimum feature size and nanopatterning performance in the mechanical force-induced process are limited by the radius and sharpness of the AFM tip. Electric-field-assisted atomic force microscope (E-AFM) nanolithography can fabricate nanopatterns with features smaller than the tip radius, but it is very challenging to find the appropriate input parameter window because the applicable tip bias range for success nanopatterning in E-AFM process is typically very small. Moreover, the small tip bias range often varies due to the variations in the tip geometry, tip radius, and tip conductive coating thickness, which causes difficult nanopatterning implementation. In this paper, we demonstrate a novel electric-field and mechanical vibration-assisted AFM-based nanofabrication approach, which enables high-resolution (sub-10 nm towards sub-5nm) and high-efficiency nanopatterning processes. The integration of in-plane vibration with the electric field increases the patterning speed, broadens the selectable ranges of applied voltages, and reduces the minimum tip bias required for nanopatterning as compared with E-AFM process, which significantly increases the versatility and capability of AFM-based nanopatterning and effectively avoids the tip damage.

基于原子力显微镜(AFM)的纳米图像化技术是一种经济有效的制造任意形状纳米结构的技术。然而，现有的基于原子力显微镜的纳米图像化方法在图像化分辨率和效率方面存在局限性。在机械力诱导过程中，最小特征尺寸和纳米图形性能受到AFM尖端半径和锐度的限制。电场辅助原子力显微镜(E-AFM)纳米光刻可以制备出特征小于针尖半径的纳米图案，但由于在E-AFM工艺中成功制备纳米图案的针尖偏压范围通常非常小，因此很难找到合适的输入参数窗口。此外，由于尖端几何形状、尖端半径和尖端导电涂层厚度的变化，小尖端偏置范围经常发生变化，这导致难以实现纳米图案。在本文中，我们展示了一种新的电场和机械振动辅助的基于afm的纳米制造方法，该方法实现了高分辨率(从10纳米到5纳米)和高效率的纳米图像化工艺。与E-AFM工艺相比，平面内振动与电场的集成提高了图形速度，拓宽了施加电压的选择范围，减小了纳米图形所需的最小尖端偏压，从而显著提高了基于afm的纳米图形的通用性和能力，并有效地避免了尖端损伤。

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引用次数: 0

Fabrication of Bioinspired Micro/nano-textured Surfaces Through Scalable Roll Coating Manufacturing 利用可伸缩滚涂工艺制备仿生微/纳米纹理表面

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2023-01-23 DOI: 10.1115/1.4056732

B. Black, S. Chockalingam, Md. Didarul Islam, Sipan Liu, Himendra Perera, Saad A Khan, J. Ryu

Bioinspired, micro/nano-textured surfaces have a variety of applications including superhydrophobicity, self-cleaning, anti-icing, anti-biofouling, and drag reduction. In this paper, a template-free and scalable roll coating process is studied for fabrication of micro/nano-scale topographies surfaces. These micro/nano-scale structures are generated with viscoelastic polymer nanocomposites and derived by controlling ribbing instabilities in forward roll coating. The relationship between process conditions and surface topography is studied in terms of shear rate, capillary number, and surface roughness parameters (e.g., Wenzel factor and the density of peaks). For a given shear rate, the sample roughness increased with a higher capillary number until a threshold point. Similarly, for a given capillary number, the roughness increased up to a threshold range associated with shear rate. The optimum range of the shear rate and the capillary number was found to be 40-60 s-1 and 4.5×105- 6×105, respectively. This resulted in a maximum Wenzel roughness factor of 1.91, a peak density of 3.94×104 (1/mm2), and a water contact angle (WCA)of 128°.

仿生、微/纳米纹理表面具有多种应用，包括超疏水性、自清洁、防冰、防生物污染和减阻。本文研究了一种无模板、可扩展的滚涂工艺，用于制备微纳米尺度的形貌表面。这些微纳米级结构是由粘弹性聚合物纳米复合材料生成的，并通过控制前滚涂层中的罗纹不稳定性而得到的。从剪切速率、毛细数和表面粗糙度参数(如Wenzel因子和峰密度)等方面研究了工艺条件与表面形貌的关系。在剪切速率一定的情况下，试样粗糙度随毛细数的增加而增加，直至一个阈值点。同样，对于给定的毛细管数，粗糙度增加到与剪切速率相关的阈值范围。剪切速率和毛细管数的最佳范围分别为40 ~ 60 s-1和4.5×105 ~ 6×105。这导致最大Wenzel粗糙度因子为1.91，峰值密度为3.94×104 (1/mm2)，水接触角(WCA)为128°。

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引用次数: 0

Manufacturing Processes of Implantable Microelectrode Array for In Vivo Neural Electrophysiological Recordings and Stimulation: A State-Of-the-Art Review. 用于体内神经电生理记录和刺激的可植入微电极阵列的制造工艺：最新技术综述。

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2022-12-01 Epub Date: 2023-10-09 DOI: 10.1115/1.4063179

Dongyang Yi, Yao Yao, Yi Wang, Lei Chen

Electrophysiological recording and stimulation of neuron activities are important for us to understand the function and dysfunction of the nervous system. To record/stimulate neuron activities as voltage fluctuation extracellularly, microelectrode array (MEA) implants are a promising tool to provide high temporal and spatial resolution for neuroscience studies and medical treatments. The design configuration and recording capabilities of the MEAs have evolved dramatically since their invention and manufacturing process development has been a key driving force for such advancement. Over the past decade, since the White House Brain Research Through Advancing Innovative Neurotechnologies (BRAIN) Initiative launched in 2013, advanced manufacturing processes have enabled advanced MEAs with increased channel count and density, access to more brain areas, more reliable chronic performance, as well as minimal invasiveness and tissue reaction. In this state-of-the-art review paper, three major types of electrophysiological recording MEAs widely used nowadays, namely, microwire-based, silicon-based, and flexible MEAs are introduced and discussed. Conventional design and manufacturing processes and materials used for each type are elaborated, followed by a review of further development and recent advances in manufacturing technologies and the enabling new designs and capabilities. The review concludes with a discussion on potential future directions of manufacturing process development to enable the long-term goal of large-scale high-density brain-wide chronic recordings in freely moving animals.

神经元活动的电生理记录和刺激对我们了解神经系统的功能和功能障碍很重要。微电极阵列（MEA）植入物通过细胞外电压波动来记录/刺激神经元活动，是一种很有前途的工具，可以为神经科学研究和医学治疗提供高的时间和空间分辨率。MEA的设计配置和记录能力自其发明以来已经发生了巨大的变化，制造工艺的开发一直是这种进步的关键驱动力。在过去的十年里，自2013年启动白宫通过推进创新神经技术进行大脑研究（Brain）倡议以来，先进的制造工艺使先进的MEA能够增加通道数量和密度，进入更多的大脑区域，更可靠的慢性性能，以及最小的侵袭性和组织反应。在这篇最新的综述文章中，介绍并讨论了目前广泛使用的三种主要类型的电生理记录MEA，即基于微丝的、基于硅的和柔性MEA。详细阐述了每种类型的常规设计和制造工艺以及使用的材料，然后回顾了制造技术的进一步发展和最新进展，以及新的设计和能力。该综述最后讨论了制造工艺发展的潜在未来方向，以实现在自由移动的动物中进行大规模高密度全脑慢性记录的长期目标。

{"title":"Manufacturing Processes of Implantable Microelectrode Array for In Vivo Neural Electrophysiological Recordings and Stimulation: A State-Of-the-Art Review.","authors":"Dongyang Yi, Yao Yao, Yi Wang, Lei Chen","doi":"10.1115/1.4063179","DOIUrl":"10.1115/1.4063179","url":null,"abstract":"<p><p>Electrophysiological recording and stimulation of neuron activities are important for us to understand the function and dysfunction of the nervous system. To record/stimulate neuron activities as voltage fluctuation extracellularly, microelectrode array (MEA) implants are a promising tool to provide high temporal and spatial resolution for neuroscience studies and medical treatments. The design configuration and recording capabilities of the MEAs have evolved dramatically since their invention and manufacturing process development has been a key driving force for such advancement. Over the past decade, since the White House Brain Research Through Advancing Innovative Neurotechnologies (BRAIN) Initiative launched in 2013, advanced manufacturing processes have enabled advanced MEAs with increased channel count and density, access to more brain areas, more reliable chronic performance, as well as minimal invasiveness and tissue reaction. In this state-of-the-art review paper, three major types of electrophysiological recording MEAs widely used nowadays, namely, microwire-based, silicon-based, and flexible MEAs are introduced and discussed. Conventional design and manufacturing processes and materials used for each type are elaborated, followed by a review of further development and recent advances in manufacturing technologies and the enabling new designs and capabilities. The review concludes with a discussion on potential future directions of manufacturing process development to enable the long-term goal of large-scale high-density brain-wide chronic recordings in freely moving animals.</p>","PeriodicalId":45459,"journal":{"name":"Journal of Micro and Nano-Manufacturing","volume":"10 4","pages":"041001"},"PeriodicalIF":1.0,"publicationDate":"2022-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.ncbi.nlm.nih.gov/pmc/articles/PMC10583290/pdf/jmnm-23-1024_041001.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49683377","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

The Effect of Speed-Varying Micro-Cutting Tool Dynamics on Stability During High Speed Micromilling of Ti6Al4V 高速微铣削Ti6Al4V时变速微刀具动力学对稳定性的影响

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2022-11-11 DOI: 10.1115/1.4056215

G. S., B. Panigrahi, Kundan K. Singh

Chatter free machining is necessary in micromilling to avoid the catastrophic failure of micro-end mill. The accuracy of the prediction of chatter free machining condition in high speed micromilling has been improved in present work by including speed varying micro-end mill dynamics. An optimum design of exponential window has been devised to remove the unwanted spindle dynamics from the displacement signal to construct the speed dependent frequency response function (FRF) of micro-end mill. The stiffness of the micro-end mill has been found to be increasing with increase in spindle speed and the natural frequency of the micro-end mill has been found to be changing with change in spindle speeds. The cutting velocity-chip load dependent cutting coefficients has been included to predict the stability using Nyquist criterion. The predicted stability lobe with speed varying micro-end mill dynamics has increased chatter free depth of cut significantly compared to the chatter free depth of cut predicted with static micro-end mill dynamics. The increase in depth of cut with speed varying dynamics has been found to be 28% at 20000 rpm, 150% at 52000 rpm and 250% at 70000 rpm. A critical value of acceleration of the workpiece has been identified for chatter onset detection and it has been validated with machined surface image analysis. The magnitude of acceleration in both feed and normal to feed direction has been characterized to analyze the effect of spindle speed and depth of cut on the vibration of workpiece.

在微铣削中，无颤振加工是避免微立铣刀灾难性失效的必要条件。将变速微立铣刀动力学纳入研究范围，提高了高速微铣削无颤振加工状态预测的精度。通过指数窗的优化设计，消除了位移信号中不需要的主轴动态，构建了微立铣刀的速度相关频响函数。微立铣刀的刚度随主轴转速的增加而增大，其固有频率随主轴转速的变化而变化。采用奈奎斯特准则将切削速度-切屑负荷相关切削系数纳入稳定性预测。与静态微立铣刀动力学预测的无颤振切削深度相比，基于变转速微立铣刀动力学预测的稳定叶瓣显著提高了无颤振切削深度。随着速度的变化，切削深度的增加在20000 rpm时为28%，在52000 rpm时为150%，在70000 rpm时为250%。确定了用于颤振起始检测的工件加速度临界值，并通过加工表面图像分析对其进行了验证。对进给方向和法向进给方向的加速度大小进行了表征，分析了主轴转速和切削深度对工件振动的影响。

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引用次数: 1

Fabrication of Micro-channels On Biomaterial Ti-6Al-4V ELI Using Micro Abrasive Jet Machining 微磨料射流在生物材料Ti-6Al-4V ELI上制备微通道

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2022-10-17 DOI: 10.1115/1.4055991

Anu Tomy, S. Somashekhar

The paper primarily explores the suitability of using Abrasive jet machining (AJM) in fabricating micro-channels on Ti-6Al-4V ELI alloy. The work evaluates the micro-channels generated using process parameters such as air pressure, feed rate, and standoff distance and their effect on channel geometries like width, depth, surface roughness, and topography. Since Ti-6Al-4V ELI alloy is commonly used in bio-implants, the contact angle and surface free energy of generated micro-channels is measured using the sessile drop technique and Chibowski approach, respectively to assess the benefits of creating such features using AJM, which can have probable applications in the medical field. The result indicates that AJM can produce hydrophilic micro-channels with nano-level surface roughness without the effects of heat-affected zone (HAZ), resolidification, burrs, and particle embedment.

本文主要探讨了磨料射流加工在Ti-6Al-4V ELI合金上制备微通道的适用性。该工作评估了使用工艺参数（如空气压力、进给速率和间隔距离）生成的微通道，以及它们对通道几何形状（如宽度、深度、表面粗糙度和形貌）的影响。由于Ti-6Al-4V ELI合金通常用于生物植入物，因此分别使用固着跌落技术和Chibowski方法测量产生的微通道的接触角和表面自由能，以评估使用AJM创建这种特征的好处，AJM可能在医学领域有应用。结果表明，AJM可以在不受热影响区（HAZ）、再固化、毛刺和颗粒嵌入影响的情况下产生具有纳米级表面粗糙度的亲水性微通道。

引用次数: 0

Metal Assisted Chemical Etch of Polycrystalline Silicon 金属辅助化学蚀刻多晶硅

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2022-08-30 DOI: 10.1115/1.4055401

Crystal Barrera, P. Ajay, Akhila Mallavarapu, Mark Hrdy, S. V. Sreenivasan

Metal Assisted Chemical Etching (MacEtch) of silicon shows reliable vertical anisotropic wet etching only in single-crystal silicon, which limits its applications to a small number of devices. This work extends the capabilities of MacEtch to polysilicon which has potential to enable high-volume and cost-sensitive applications such as optical metasurfaces, anodes for high capacity and flexible batteries, electrostatic supercapacitors, sensors, nanofluidic deterministic lateral displacement devices, etc. This work presents a MacEtch of polysilicon that produces nanostructure arrays with sub-50nm resolution and anisotropic profile. The three demonstrated structures are pillars of 5:1 aspect ratio and 50nm spacing for comparison to single crystal silicon MacEtch literature, pillars of 30nm spacing and a diamond pillar array with sharp corners to establish resolution limits of polysilicon MacEtch.

硅的金属辅助化学蚀刻(MacEtch)仅在单晶硅上表现出可靠的垂直各向异性湿法蚀刻，这限制了其在少数器件中的应用。这项工作将MacEtch的能力扩展到多晶硅，多晶硅有潜力实现大批量和成本敏感的应用，如光学超表面、高容量和柔性电池的阳极、静电超级电容器、传感器、纳米流体确定性横向位移装置等。这项工作提出了一种多晶硅MacEtch，可以产生低于50nm分辨率和各向异性剖面的纳米结构阵列。所演示的三种结构是5:1长宽比和50nm间距的柱子(用于与单晶硅MacEtch文献进行比较)，30nm间距的柱子和具有尖角的金刚石柱阵列(用于建立多晶硅MacEtch的分辨率限制)。

引用次数: 0

Pulsed Power Supply Superposed with RF Oscillating Wave for the Improvement of Micro EDM Process 脉冲电源与射频振荡波叠加改善微细电火花加工工艺

IF 1 Q4 ENGINEERING, MANUFACTURING

Journal of Micro and Nano-Manufacturing

Pub Date : 2022-07-13 DOI: 10.1115/1.4054974

Peiyao Cao, H. Tong, Yong Li

During the micro electrical discharge machining (micro EDM) process, the dielectric property of narrow interelectrode gap is transiently changing. With the hysteretic servo motion of spindle, the effective discharge ratio (EDR) between electrodes is low. In this research, a pulsed power supply superposed with the radio-frequency (RF) oscillating wave of controllable frequency and amplitude is proposed in order to induce interelectrode continuous discharge, so that the machining efficiency and accuracy are improved simultaneously. The experimental results of micro-hole machining shows that under the oscillating frequency of 160 MHz and amplitude of ±10 V, the machining efficiency is increased by 35%, the tool electrode wear rate (TWR) remains almost unchanged, and the taper error of micro-hole is reduced by 43%. Furthermore, the process of relatively enlarging discharge gap range and increasing number of discharges after superposition is discussed, and the proper superposed oscillating amplitude is identified.

在微细电火花加工过程中，窄电极间隙的介电性能会发生瞬态变化。由于主轴的滞后伺服运动，电极之间的有效放电比(EDR)很低。本文提出了一种频率和幅度可控的射频振荡波叠加脉冲电源，以诱导电极间连续放电，从而提高加工效率和加工精度。微孔加工实验结果表明，在振荡频率为160 MHz、振幅为±10 V的条件下，加工效率提高35%，刀电极磨损率(TWR)基本保持不变，微孔锥度误差降低43%。进一步讨论了叠加后放电间隙范围相对增大和放电次数增加的过程，确定了合适的叠加振荡幅度。

引用次数: 1

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