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Study of Far-Field Electroluminescence Emission to Enhance Micro-LED Performance 提高微型led性能的远场电致发光研究
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-11-08 DOI: 10.1002/jsid.2114
Fabian Rol, Stéphane Altazin, Nicolas Michit, Bastien Miralles, Clément Ballot, Bernard Aventurier, Paolo De Martino, Patrick Le Maitre, Julia Simon

This study investigates the angular dependence of far-field electroluminescence (EL) emission in InGaN/GaN LEDs and micro-LEDs to enhance their performance for micro-display and visible optical communication applications. We developed a measurement setup to analyze far-field EL emission across various wavelengths and compared the results with 1D optical simulations. This approach allowed us to observe the well-known dependence of emission directivity and light extraction efficiency (LEE) on the structural parameters of flip-chip LEDs, particularly the thicknesses of p-GaN and n-GaN layers, and to quantify the impact of total thickness variation resulting from wafer thinning processes. Using larger LEDs, the test vehicle offers a valuable tool for designing micro-LEDs with the desired directivity and for process monitoring. We also observed that the angular dependence of far-field emission varies with the applied bias and demonstrated how this could affect wafer-level micro-LED characterizations. Finally, we showed that the far-field EL emission of micro-LEDs progressively deviates from the description by a 1D optical cavity alone, suggesting an increasing influence of the limited size and necessitating 3D-FDTD simulations to accurately model both vertical cavity and sidewall effects. However, for sizes down to 5 μm, the directivity predicted by a 1D model seems roughly preserved.

本研究研究了InGaN/GaN led和微型led远场电致发光(EL)发射的角度依赖性,以提高其在微显示和可见光通信应用中的性能。我们开发了一个测量装置来分析不同波长的远场EL发射,并将结果与一维光学模拟进行了比较。这种方法使我们能够观察到众所周知的发射指向性和光提取效率(LEE)对倒片led结构参数的依赖,特别是p-GaN和n-GaN层的厚度,并量化晶圆变薄过程导致的总厚度变化的影响。使用更大的led,测试车辆为设计具有所需指向性和过程监控的微型led提供了有价值的工具。我们还观察到远场发射的角依赖性随应用偏置的变化而变化,并演示了这如何影响晶圆级微型led的表征。最后,我们发现微型led的远场EL发射逐渐偏离一维光腔的描述,这表明有限尺寸的影响越来越大,需要3D-FDTD模拟来准确模拟垂直腔和侧壁效应。然而,对于小于5 μm的尺寸,一维模型预测的指向性似乎大致保持不变。
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引用次数: 0
Effective E-Paper Driving Waveform Design Based on Dynamic Programming 基于动态规划的有效电子纸驱动波形设计
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-11-04 DOI: 10.1002/jsid.2113
Danling Kang, Xiaoyan Zhao, Xiaojie Wei, Hongxin Wu, Honghui Zhang, Tiesong Zhao

Electrophoretic display (EPD) driving involves controlling the electric field to drive the movement of charged particles in microcapsules, enabling image display and updates. The effectiveness of EPD technology relies on optimized driving waveform design to ensure display clarity and minimize response time. However, despite advancements, existing EPD techniques continue to face critical challenges such as ghost images, flicker, and long response times, all of which can detract from user experience. To address these issues, this paper proposes a novel EPD driving waveform design algorithm that integrates physical simulation and a dynamic programming approach. This algorithm is designed to identify the optimal driving path, thereby significantly reducing response time while effectively minimizing ghost images and flicker. Experimental results demonstrate that the proposed algorithm effectively mitigates ghost images and flicker, achieving shorter response time and higher display quality in 16-level grayscale print-style color EPD.

电泳显示(EPD)驱动包括控制电场来驱动微胶囊中带电粒子的运动,从而实现图像显示和更新。EPD技术的有效性依赖于优化的驱动波形设计,以确保显示清晰度和最小化响应时间。然而,尽管取得了进步,现有的EPD技术仍然面临着诸如鬼影、闪烁和长响应时间等关键挑战,所有这些都会影响用户体验。为了解决这些问题,本文提出了一种结合物理仿真和动态规划方法的新型EPD驱动波形设计算法。该算法旨在识别最优行驶路径,从而显著缩短响应时间,同时有效地减少鬼影和闪烁。实验结果表明,该算法有效地减轻了鬼影和闪烁,在16级灰度印刷风格彩色EPD中实现了更短的响应时间和更高的显示质量。
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引用次数: 0
Large-Area Hydrogenated Amorphous Silicon Schottky Photosensor Arrays for Display Integration 用于显示集成的大面积氢化非晶硅肖特基光传感器阵列
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-27 DOI: 10.1002/jsid.2116
Marco M. Dettling, Patrick Schalberger, Yannick Schellander, Norbert Fruehauf

In this work, a system for the real-time spatially resolved detection of visible light on a large area is realized on glass. Schottky photodiodes, consisting of hydrogenated amorphous silicon (a-Si:H) and molybdenum–tantalum (MoTa), are employed as detectors. The detectors exhibit an internal quantum efficiency of up to 70.96% and a response time smaller than 20 μs. The noise equivalent power was measured at 2.424e-10 W/√Hz. Process compatibility with commonly employed amorphous indium gallium zinc oxide (a-IGZO) and a-Si:H thin-film transistors (TFT) is shown. The driving and real-time readout of a photosensor array is demonstrated using a microcontroller and a current-input ADC.

本文在玻璃上实现了大面积可见光的实时空间分辨检测系统。采用由氢化非晶硅(a-Si:H)和钼钽(MoTa)组成的肖特基光电二极管作为探测器。该探测器的内量子效率高达70.96%,响应时间小于20 μs。测量噪声等效功率为2.424e-10 W/√Hz。显示了与常用的非晶铟镓氧化锌(a-IGZO)和a-Si:H薄膜晶体管(TFT)的工艺兼容性。使用微控制器和电流输入ADC演示了光敏传感器阵列的驱动和实时读出。
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引用次数: 0
High-Resolution Patterning via Electrohydrodynamic (EHD)-Jet Printing for Quantum Dot Light-Emitting Diodes 量子点发光二极管的电流体动力学(EHD)喷射打印高分辨率图案
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-15 DOI: 10.1002/jsid.2108
Yohan Kim, Manuel Gensler, Jiyong Kim, Christine Boeffel, Benjamin Heyne, Chul Jong Han, Kyoungwon Park, Min Suk Oh, Simon Ogier, Dan Sharkey, Armin Wedel

High-resolution printing technology is crucial for electroluminescent (EL) quantum dot light-emitting diodes (QD-LEDs) to be used in high-end display applications such as AR/VR displays. This study successfully demonstrates the patterning of PEDOT:PSS, ZnO nanoparticles (NPs), and InP-based QD/organic nanohybrids using electrohydrodynamic (EHD)-jet printing, fabricating top-emitting green conventional or inverted QD-LEDs on a PEN flexible substrate. The integration of a hydrophobic pixel defining layer and continuous-jet modes in the EHD-jet printing system enhances the patterning processability, showcasing the EL of patterned conventional and inverted QD-LEDs. Especially, the EL spectrum of an inverted QD-LED exhibits a sharp green emission at a peak wavelength of 542 nm, with a full width at half maximum (FWHM) of 46 nm. This indicates that the uniform layers were achieved through EHD-jet printing and balanced charge carriers in the device, despite the active layer consisting of not only InP-based QDs but also n-type and/or p-type organic transport materials. This research opens up new possibilities for the utilization of EHD-jet printing in various QD-LED structures for commercially viable printed display applications.

高分辨率印刷技术对于电致发光(EL)量子点发光二极管(qd - led)在AR/VR显示等高端显示应用中的应用至关重要。本研究成功地展示了PEDOT:PSS、ZnO纳米颗粒(NPs)和inp基QD/有机纳米杂化物的图案,利用电流体动力(EHD)喷射打印,在PEN柔性衬底上制造出顶部发光的绿色传统或反向QD- led。在ehd喷射打印系统中,疏水像素定义层和连续喷射模式的集成提高了图案的可加工性,展示了图案传统和倒置qd - led的EL。其中,倒转QD-LED的EL光谱在542 nm处呈现出明显的绿色发光,半峰宽为46 nm。这表明,尽管活性层不仅由inp基量子点组成,还由n型和/或p型有机输运材料组成,但通过ehd喷射打印和器件中的电荷载流子平衡实现了均匀层。这项研究为利用ehd喷射打印在各种QD-LED结构中实现商业上可行的印刷显示应用开辟了新的可能性。
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引用次数: 0
Time-Domain Analysis for Periodic and Aperiodic Display Flicker in Variable Refresh Rate Displays 可变刷新率显示器中周期性和非周期性闪烁的时域分析
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-10-01 DOI: 10.1002/jsid.2107
Hyosun Kim, Hyungsuk Hwang, Youra Kim, Yongwoo Yi

State-of-the-art displays are emerging with a technology called variable refresh rate (VRR) that supports a wider range of refresh rates, both above and below 60 Hz. While VRR can reduce power consumption, it can cause flicker issues for users when the refresh rate is lowered below 60 Hz or when the refresh rate is changed even above 60 Hz. Since users can perceive both types of flicker as similar image artifacts, we developed the integrated flicker index to predict them. We introduced time-domain analysis using impulse response functions (IRFs) to capture the onset of aperiodic luminance fluctuations in the VRR waveform and interpret human response to these fluctuations. In addition, based on the previous studies that display characteristics (e.g., luminance and size) affect flicker experience, we need to incorporate both effects of brightness and size into IRF. For this purpose, we utilized the converted IRFs from the TCSF model, which can explain these two effects. To validate the integrated flicker index, we conducted three experiments: flicker when the refresh rate is reduced below 60 Hz flicker (Exp1 and 2) and VRR flicker when the refresh rate is changed (Exp3). The results demonstrate that IRF converted from the appropriate TCSF could offer a more accurate prediction of flicker experience of VRR displays.

最先进的显示器正在采用一种称为可变刷新率(VRR)的技术,该技术支持60hz以上和低于60hz的更宽刷新率范围。虽然VRR可以降低功耗,但当刷新率低于60 Hz或当刷新率高于60 Hz时,它可能会给用户带来闪烁问题。由于用户可以将这两种类型的闪烁视为相似的图像伪影,因此我们开发了综合闪烁索引来预测它们。我们使用脉冲响应函数(irf)引入时域分析来捕捉VRR波形中非周期性亮度波动的开始,并解释人类对这些波动的反应。此外,基于以往显示特性(如亮度和尺寸)影响闪烁体验的研究,我们需要将亮度和尺寸的影响同时纳入IRF中。为此,我们利用从TCSF模型转换的irf,可以解释这两种效应。为了验证集成的闪烁指数,我们进行了三个实验:刷新率降低到60 Hz以下时的闪烁(Exp1和exp2)和刷新率改变时的VRR闪烁(Exp3)。结果表明,从适当的TCSF转换成的IRF可以更准确地预测VRR显示器的闪烁体验。
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引用次数: 0
Printed Chip Interconnects for MicroLED Displays 用于微型led显示屏的印刷芯片互连
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-09-28 DOI: 10.1002/jsid.2109
Kai Waldner, Holger Baur, Patrick Schalberger, Norbert Fruehauf, Emmanuel Fuchs, Prasanna Ramaswamy, Vincent Toomey, Sławomir Drozdek

This paper presents a newly developed process for interconnecting microICs with microLEDs through ultra-precise dispensing of conductive silver-based paste. Special cleaning and surface energy modification processes have been introduced to achieve interconnects with a width of 5 μm and a minimum pitch of 20 μm. The developed technology is part of the EU funded project “Building Active matrix MicroLED displays By Additive Manufacturing” (BAMBAM), which develops unique manufacturing technologies for realizing microLED displays without TFT backplanes.

本文介绍了一种通过超精密涂敷导电银基浆料实现微芯片与微型led互连的新工艺。引入了特殊的清洗和表面能改性工艺,实现了宽度为5 μm,最小间距为20 μm的互连。这项开发的技术是欧盟资助的“通过增材制造构建有源矩阵微型led显示屏”(BAMBAM)项目的一部分,该项目开发了独特的制造技术,用于实现没有TFT背板的微型led显示屏。
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引用次数: 0
Self-Supervised Anomaly Segmentation for Surface Defect Inspection in Display Panels 显示面板表面缺陷检测的自监督异常分割
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-09-13 DOI: 10.1002/jsid.2106
Jou-Won Song, Kyeongbo Kong, Ye-In Park, Seong-Gyun Kim, Suk-Ju Kang

Accurate segmentation of surface defects is essential for automated inspection in modern display panel manufacturing. Although recent studies have primarily focused on image-level anomaly detection, pixel-level anomaly segmentation remains underexplored due to the lack of annotated defect data. In this paper, we propose AnoSeg, a novel anomaly segmentation framework designed to directly generate accurate anomaly maps without requiring real defective samples. AnoSeg integrates three key techniques: (1) a hard augmentation strategy for synthesizing defect-like anomalies from normal images, (2) self-supervised learning with combined pixel-wise and adversarial losses to enhance segmentation quality, and (3) coordinate channel concatenation to incorporate spatial priors relevant to defect localization in structured panel layouts. By training on only normal and synthetically augmented data, AnoSeg learns to segment anomalous regions robustly and generalizes well to unseen defects. Additionally, the resulting anomaly maps can be leveraged to improve conventional anomaly detection performance. Experimental results on the MVTec Anomaly Detection (MVTec-AD) benchmark demonstrate that AnoSeg outperforms existing state-of-the-art methods in both segmentation accuracy and detection performance, as measured by intersection over union (IoU) and AUROC metrics. These results suggest the practical applicability of AnoSeg for high-precision surface inspection in intelligent display manufacturing systems.

在现代显示面板制造中,表面缺陷的准确分割是实现自动检测的关键。尽管最近的研究主要集中在图像级异常检测上,但由于缺乏注释缺陷数据,像素级异常分割仍未得到充分探索。在本文中,我们提出了AnoSeg,一种新的异常分割框架,旨在直接生成准确的异常图,而不需要真正的缺陷样本。AnoSeg集成了三个关键技术:(1)硬增强策略,用于从正常图像中合成缺陷类异常;(2)结合像素和对抗损失的自监督学习,以提高分割质量;(3)坐标通道拼接,以结合结构化面板布局中缺陷定位相关的空间先验。通过仅在正常和综合增强数据上进行训练,AnoSeg学会了鲁棒地分割异常区域,并很好地推广到看不见的缺陷。此外,可以利用生成的异常映射来提高常规异常检测的性能。MVTec异常检测(MVTec- ad)基准测试的实验结果表明,AnoSeg在分割精度和检测性能方面都优于现有的最先进的方法,如交叉比联合(IoU)和AUROC指标。这些结果表明了AnoSeg在智能显示制造系统中高精度表面检测的实际适用性。
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引用次数: 0
Designing Manufacturing Process for Oxide Thin-Film Transistors Based on End-to-End Graph Convolutional Networks Model 基于端到端图卷积网络模型的氧化薄膜晶体管制造工艺设计
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-09-05 DOI: 10.1002/jsid.2104
Zengyi Peng, Min Li, Hua Xu, Miao Xu, Lei Wang, Weijing Wu, Junbiao Peng, Zhuliang Yu

Large-area, high-resolution organic light-emitting diode (OLED) displays require high-performance oxide thin-film transistors (TFTs) with excellent mobility and stability, as well as little threshold voltage shift, especially for G8.5+ OLED production lines. Our previous work demonstrated rare-earth doped oxides are ideal channel layer materials for TFTs due to their superior mobility and stability. However, scaling up TFT production from pilot lines to mass manufacturing poses significant challenges, largely because of the complexity of multi-element composite materials and intricate processes. In this study, an end-to-end graph convolutional network (GCN) model is employed to optimize TFT production processes. By encoding process parameters as graph nodes and features, the GCN effectively predicts critical drain current–gate voltage (I–V) characteristics, enabling precise calculation of electron mobility, subthreshold slope, and threshold voltage. The model achieves a mean absolute percentage error of 19.9% on validation data. Based on the optimized parameters, a TFT device with properties including a mobility of 37.8 cm2/Vs, a threshold voltage of 0.9 V, and a subthreshold slope of 0.62 V/dec was successfully produced. These results highlight the potential of GCN-based models to address the complexities of TFT mass production, providing a powerful tool for process optimization and performance enhancement.

大面积、高分辨率有机发光二极管(OLED)显示器需要高性能的氧化物薄膜晶体管(TFTs),具有优异的移动性和稳定性,以及很小的阈值电压偏移,特别是对于G8.5+ OLED生产线。我们之前的工作表明,稀土掺杂氧化物由于其优越的迁移性和稳定性是理想的tft通道层材料。然而,将TFT生产从中试线扩大到大规模生产面临重大挑战,主要是因为多元素复合材料的复杂性和复杂的工艺。本研究采用端到端图卷积网络(GCN)模型对TFT生产过程进行优化。通过将过程参数编码为图节点和特征,GCN有效地预测临界漏极电流-门电压(I-V)特性,从而能够精确计算电子迁移率、亚阈值斜率和阈值电压。该模型在验证数据上的平均绝对百分比误差为19.9%。基于优化后的参数,成功制备出迁移率为37.8 cm2/Vs、阈值电压为0.9 V、亚阈值斜率为0.62 V/dec的TFT器件。这些结果突出了基于gcn的模型在解决TFT大规模生产的复杂性方面的潜力,为工艺优化和性能增强提供了强大的工具。
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引用次数: 0
SPICE Modeling of GaN MicroLEDs for Optical Communication 用于光通信的GaN微led的SPICE建模
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-09-02 DOI: 10.1002/jsid.2105
Sultan El Badaoui, Patrick Le Maitre, Anthony Cibié, Julia Simon, Aurélien Lardeau-Falcy, Jeremy Bilde, Louwenn Cherruault, Manon Arch, Michael Pelissier, Yannis Le Guennec

With the rapid expansion of data centers, there is a growing demand for high data-rate, energy-efficient optical links over short distances. One potential technology for this application is Gallium-Nitride (GaN) based microlight emitting diodes (μLEDs), thanks to their compact size, high-speed operation, and ease of manufacturability. During the development of these μLEDs, modeling plays an essential role in optimizing their performance. In this paper, we present various models to estimate both the static and dynamic performance of GaN μLEDs of various sizes. We then propose a methodology to integrate these models into a unified equivalent circuit model, enabling the simulation of the full response of the μLED. Finally, we implement this unified model in a circuit-simulation-compatible module and replicate the experimental setups within a simulation software to evaluate the module's ability to accurately simulate the μLED's response.

随着数据中心的快速扩张,对高数据速率、高能效的短距离光链路的需求日益增长。这一应用的一个潜在技术是基于氮化镓(GaN)的微发光二极管(μ led),由于其紧凑的尺寸,高速运行,易于制造。在这些μ led的开发过程中,建模对优化其性能起着至关重要的作用。在本文中,我们提出了各种模型来估计不同尺寸的GaN μ led的静态和动态性能。然后,我们提出了一种方法,将这些模型集成到一个统一的等效电路模型中,从而能够模拟μLED的全响应。最后,我们在兼容电路仿真的模块中实现了该统一模型,并在仿真软件中复制了实验设置,以评估该模块准确模拟μLED响应的能力。
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引用次数: 0
Narrower Emission Spectra From Multicolor InGaN Quantum Wells Monolithically Integrated on Polyhedral-Shaped GaN Templates 多色GaN量子阱在多面体GaN模板上的窄发射光谱研究
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-08-27 DOI: 10.1002/jsid.2103
Yoshinobu Matsuda, Mitsuru Funato, Yoichi Kawakami

InGaN-based quantum wells (QWs) integrated on arbitrary-shaped 3D GaN templates are promising light sources for ultra-high-resolution micro-LED displays. In this paper, we first demonstrate that the emissions from InGaN QWs on polyhedral-shaped GaN templates are broader than those from planar QWs. Microscopic observations by scanning electron microscopy and cathodoluminescence spectroscopy reveal that the broad emission is due to surface undulations formed during the crystal regrowth of the QW regions on the GaN templates. To suppress the formation of undulations, we subject 3D GaN templates to chemical mechanical polishing before the regrowth. This method successfully reduces the emission spectral width by 20% and can be a standard process for the growth integration of multicolor micro-LEDs.

基于GaN的量子阱(qw)集成在任意形状的3D GaN模板上,是超高分辨率微型led显示屏的光源。在本文中,我们首先证明了多面体形状GaN模板上的InGaN量子阱的发射比平面量子阱的发射宽。通过扫描电子显微镜和阴极发光光谱的观察发现,宽发射是由于GaN模板上的QW区域在晶体再生过程中形成的表面波动所致。为了抑制波动的形成,我们在再生之前对3D GaN模板进行化学机械抛光。该方法成功地将发射光谱宽度减小了约20%,可以成为多色微型led生长集成的标准工艺。
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引用次数: 0
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Journal of the Society for Information Display
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