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Fabrication and bending reliability evaluation of flexible electrowetting display device 柔性电润湿显示装置的制作及弯曲可靠性评价
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-28 DOI: 10.1002/jsid.2085
Tinghong Yang, Miaoyang Wei, Jianyang Guo, Caihong Sun, Luyao Yan, Xiaomeng Li, Simin Ma, Dongxiang Luo, Rui Zhou, Tang Biao, Jiawei Lai, Dong Yuan

The Electrowetting Display (EWD) has numerous advantages making it a potential candidate for flexible displays. However, there has been limited research on the bending performance of Flexible Electrowetting Displays (FLEWD) and their feasibility in terms of flexibility has not been confirmed. To investigate the impact of bending on stability performance, FLEWD using flexible active-matrix substrate and PEN conductive substrates were fabricated. A systematic performance evaluation system for flexible devices is established. The results showed that FLEWD can display videos normally during bending. In the off state, the device can withstand a bending limit represented by a radius of 2 cm at a bending speed of 80 mm/s for 5,000 times. In the on state, the corresponding limits are 4 cm, 40 mm/s, and 100 times. Besides, the failure mode of FLEWD bending is clarified, which provides a guideline for the improvement of the flexural performance of flexible EWD in the future.

电润湿显示(EWD)具有许多优点,使其成为柔性显示的潜在候选者。然而,关于柔性电润湿显示器(FLEWD)弯曲性能的研究有限,其在柔性方面的可行性尚未得到证实。为了研究弯曲对稳定性能的影响,分别制备了柔性有源基板和PEN导电基板的FLEWD。建立了柔性器件系统的性能评价体系。结果表明,FLEWD在弯曲过程中可以正常显示视频。在关闭状态下,设备可以承受半径为2cm的弯曲极限,弯曲速度为80mm /s,弯曲次数为5000次。在导通状态下,相应的极限为4 cm、40 mm/s、100次。阐明了挠性电钻弯曲的破坏模式,为今后提高挠性电钻的弯曲性能提供了指导。
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引用次数: 0
4032-pixels per inch threshold voltage compensation pixel circuit for organic light-emitting diode-on-silicon 硅基有机发光二极管的4032像素/英寸阈值电压补偿像素电路
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-24 DOI: 10.1002/jsid.2067
Sanghyun Heo, Joon Chul Goh, Taehun Lee, Seungha Baek, Ohjo Kwon, Sangmyeon Han, Jaebeom Choi

Virtual reality (VR) headsets with pancake lenses require organic light-emitting diode-on-silicon (OLEDoS) panels for higher pixel density and superior image quality. Achieving high-quality OLEDoS panels necessitates integrating pixel compensation circuits within the limited pixel area of high-resolution displays. However, reduced transistor count increases Vth variation, while smaller storage capacitors with higher parasitic capacitance degrade image quality. This study proposes a novel 7T1C pixel compensation circuit for 4032-ppi OLEDoS panels operating at 8 V. The circuit minimizes the body effect in CMOS transistors by maintaining equal voltage at the source and body nodes of the driving transistor. An area-efficient single-capacitor design and a data-driving method without toggling mitigate image quality degradation caused by capacitor coupling. The proposed 4032-ppi panel enhances short-range uniformity (SRU) from 90.4% to 97.3% and reduces horizontal cross-talk from 2.0% to 1.3%.

带有煎饼镜头的虚拟现实(VR)头显需要有机硅上发光二极管(oledo)面板,以获得更高的像素密度和卓越的图像质量。实现高质量的oled面板需要在高分辨率显示器的有限像素区域内集成像素补偿电路。然而,晶体管数量的减少增加了Vth的变化,而更小的存储电容器具有更高的寄生电容会降低图像质量。本研究提出了一种新颖的7T1C像素补偿电路,用于工作在8 V的4032 ppi oled面板。该电路通过在驱动晶体管的源和体节点上保持相等的电压来最小化CMOS晶体管中的体效应。面积高效的单电容设计和无切换的数据驱动方法减轻了由电容耦合引起的图像质量下降。提议的4032-ppi面板将短距离均匀性(SRU)从90.4%提高到97.3%,并将水平串扰从2.0%降低到1.3%。
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引用次数: 0
Real-time per-pixel predistortion for head-tracked light field displays 头部跟踪光场显示的实时逐像素预失真
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-23 DOI: 10.1002/jsid.2062
Tianyu Wu, Anuraag Jajoo, Hee-Jin Choi, Benjamin Watson

The latest light-field displays (LFDs) have improved greatly with head tracking but continue to be based on the approximate pinhole model, meaning that cross-talk is often visible at large viewing angles and when virtual objects are distant from the display panel. To address these problems, our real-time LFD technique evaluates a full optical model for every frame and then displays an image predistorted during ray-traced rendering at the subpixel level to the current pixel-to-eye light flow, reducing cross-talk and increasing viewing angle. A comparison to imagery produced with the pinhole model shows clear advantages for our LFD technique, and in a user study with interactive, head-tracked display of several different scenes, viewers reported a significant preference for our novel LFD technique. Our unoptimized prototype implementation is already real time, and as GPUs improve in performance and ray tracing becomes increasingly common, we expect that our LFD technique will be easy to add to a variety of 3D applications, including games.

最新的光场显示器(lfd)在头部跟踪方面有了很大的改进,但仍然基于近似针孔模型,这意味着在大视角下,当虚拟物体远离显示面板时,串音通常是可见的。为了解决这些问题,我们的实时LFD技术对每一帧进行全光学模型评估,然后在亚像素级的光线跟踪渲染过程中显示图像预失真,以显示当前像素到眼睛的光流,从而减少串扰并增加视角。通过与针孔模型产生的图像进行比较,我们的LFD技术具有明显的优势,并且在对几个不同场景的交互式头部跟踪显示的用户研究中,观众报告了我们新颖的LFD技术的显著偏好。我们未优化的原型实现已经是实时的,随着gpu性能的提高和光线追踪变得越来越普遍,我们希望我们的LFD技术可以很容易地添加到各种3D应用程序中,包括游戏。
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引用次数: 0
Mesh-patterned silver electrode via electrohydrodynamic printing for transparent and flexible quantum-dot light-emitting diodes 透明柔性量子点发光二极管的电流体动力印刷网状银电极
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-23 DOI: 10.1002/jsid.2080
Suyoun Kim, Jong Ho Park, Yongtaek Hong

A precise and efficient patterning method for mesh-structured electrodes is crucial for fabricating transparent and flexible quantum-dot light-emitting diodes (TF-QLEDs). In this study, we present an electrohydrodynamic (EHD) printing method to directly pattern Ag mesh electrodes on flexible QLED devices, eliminating the need for sacrificial layers or chemical etching. By investigating the printing parameters, we achieved Ag mesh electrodes with excellent optical transparency exceeding 84%T, electrical conductivity with a sheet resistance of less than 8 Ω/sq, and mechanical stability with less than 5% variation after over 2000 bending cycles. These mesh-patterned electrodes demonstrated superior characteristics compared to conventional electrodes. Additionally, the device efficiency of mesh-patterned electrodes was comparable to that of conventional planar electrodes, making them highly suitable for flexible electronic devices. This method offers significant advantages in transparency, flexibility, and cost-efficiency, presenting a promising approach for the fabrication of next-generation flexible displays.

一种精确、高效的网状结构电极图像化方法是制造透明柔性量子点发光二极管的关键。在这项研究中,我们提出了一种电流体动力学(EHD)印刷方法,可以直接在柔性QLED器件上绘制Ag网状电极的图案,从而消除了牺牲层或化学蚀刻的需要。通过研究打印参数,我们实现了银网电极具有优异的光学透明度超过84%T,电导率小于8 Ω/sq,并且在超过2000次弯曲循环后机械稳定性变化小于5%。与传统电极相比,这些网状电极表现出优越的特性。此外,网状电极的器件效率与传统平面电极相当,使其非常适合柔性电子器件。这种方法在透明度、灵活性和成本效益方面具有显著的优势,为下一代柔性显示器的制造提供了一种有前途的方法。
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引用次数: 0
Electroless fabrication of super uniform nickel bumps on the TFT driver substrates for micro-LED display 微型led显示用TFT驱动基板上超均匀镍凸点的化学制备
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-21 DOI: 10.1002/jsid.2088
Shuaishuai Wang, Yu Lu, Kaixin Zhang, Zhonghang Huang, Tianxi Yang, Chang Lin, Jie Sun, Qun Yan, Tailiang Guo

This study aims to achieve high-yield micro-LED chip bonding and thus further advance the innovation of micro-LED interconnection technology. In this research, an electroless plating method was used to achieve the highly uniform nickel bump arrays on a thin-film transistor (TFT) driver substrate. Initially, the photoresists AZ4620 and AZ2070 are chosen for the experiments, which can cover the step structure uniformly of TFT substrate. Subsequently, the shape of bumps on the TFT substrate influenced by the plasma treatment and the deposition time was investigated. The result indicated that microbump arrays with a uniformity of less than 1% could be successfully fabricated by employing a 5-min plasma treatment and incorporating surfactant additions at concentrations of 0.02%, and the process of preparation has a high repeatability, which lays a solid foundation for the subsequent electroless plating bonding, and provides a critical reference for the breakthrough of micro-LED interconnection key technology.

本研究旨在实现高成品率的微型led芯片键合,从而进一步推进微型led互连技术的创新。在本研究中,采用化学镀方法在薄膜晶体管(TFT)驱动衬底上实现了高度均匀的镍凹凸阵列。首先选择AZ4620和AZ2070光刻胶进行实验,这两种光刻胶可以均匀覆盖TFT衬底的阶梯结构。随后,研究了等离子体处理和沉积时间对TFT衬底上凸起形状的影响。结果表明,通过5 min等离子体处理和添加0.02%浓度的表面活性剂,可以成功制备出均匀度小于1%的微凹凸阵列,制备过程具有较高的重复性,为后续的化学镀键合奠定了坚实的基础,为突破微型led互连关键技术提供了重要参考。
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引用次数: 0
Optical measurement with foveated rendering and dynamic compensation in eye-tracking near-eye displays 眼动跟踪近眼显示的注视点渲染和动态补偿光学测量
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-21 DOI: 10.1002/jsid.2081
Congshan Rui, Yining Li, Pengfei Li, Guanghang Mei, Mengna Zhao, Dongliang Shi, Xing Sun, Lei Zhao

Eye-tracking technology has been widely adopted in the extended reality (XR) industry, particularly in applications such as foveated rendering, eye-tracking interactions, and optical algorithm compensation, enhancing user immersion and providing smooth virtual experiences. For near-eye display systems integrated with eye-tracking capabilities, optical performance metrics such as the contrast transfer function (CTF), distortion, chromaticity uniformity (CU), and chromatic aberration (CA) vary with shifts in the user's fixation point, rendering traditional measurement methods inadequate for such systems. To address this, this paper proposes a novel approach for measuring CTF based on foveated rendering, as well as a dynamic compensation-based method for assessing distortion, CU and CA in eye-tracking near-eye display systems. Experiments are conducted to measure the CTF under both eye-tracked foveated rendering (ETFR) and fixed foveated rendering (FFR). The results demonstrate that the CTF under ETFR is higher than that under FFR, more accurately reflecting the image clarity perceived by the human eye. Additionally, CU shows marked improvement after compensation, with a noticeable reduction in green color shift. The average uv decreases from 0.0092 to 0.0042, suggesting improved CU. Moreover, dynamic distortion is effectively mitigated after compensation. However, CA exhibited no significant improvement after compensation.

眼动追踪技术已广泛应用于扩展现实(XR)行业,特别是在注视点渲染、眼动追踪交互、光学算法补偿等应用中,增强了用户沉浸感,提供了流畅的虚拟体验。对于具有眼动追踪功能的近眼显示系统,对比度传递函数(CTF)、失真、色度均匀性(CU)和色差(CA)等光学性能指标会随着用户注视点的变化而变化,这使得传统的测量方法不适用于此类系统。为了解决这一问题,本文提出了一种基于注视点渲染的CTF测量方法,以及一种基于动态补偿的眼动追踪近眼显示系统畸变、CU和CA评估方法。实验测量了眼动注视点绘制(ETFR)和固定注视点绘制(FFR)下的CTF。结果表明,ETFR下的CTF高于FFR下的CTF,能更准确地反映人眼感知到的图像清晰度。此外,CU在补偿后表现出明显的改善,绿色偏移明显减少。平均∆u ‘ v ’从0.0092下降到0.0042,表明CU得到改善。此外,补偿后的动态失真也得到了有效的缓解。但补偿后CA无明显改善。
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引用次数: 0
Effective 10-bit OLED driver IC with 11-bit DAC, double capacitor-coupled adder, and offset calibration for enhanced panel driving 有效的10位OLED驱动IC,带有11位DAC,双电容耦合加法器,以及用于增强面板驱动的偏移校准
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-21 DOI: 10.1002/jsid.2068
Changwhan Kim, Sewon Lee, Minjae Lee

In this paper, we propose an 11-bit source driver IC optimized for high-resolution OLED display driving. The proposed IC adopts a Double Capacitor Coupled Adder (DCCA) structure, which enables parallel execution of the sampling and driving stages, thereby improving temporal efficiency and response speed. Additionally, we introduce a novel Slew Rate Enhancement (SRE) structure that enables rapid response even in conditions with minimal input–output voltage differences, delivering performance well-suited for high-resolution display driving. An Offset Calibration circuit is included to minimize inter-channel voltage discrepancies, ensuring high precision and consistent output performance. Experimental results demonstrate that the proposed IC achieves a short horizontal line time(H) of 2.0 μs and a slew rate of 9.9 V/μs. The differential nonlinearity (DNL) and integral nonlinearity (INL) are 0.66 LSB and 0.98 LSB, respectively, and, after Offset Calibration, the maximum inter-channel deviation of output voltage (DVO) is reduced to 2.43 mV.

在本文中,我们提出了一种针对高分辨率OLED显示驱动进行优化的11位源驱动IC。该集成电路采用双电容耦合加法器(DCCA)结构,可实现采样和驱动级并行执行,从而提高时间效率和响应速度。此外,我们还引入了一种新颖的摆率增强(SRE)结构,即使在最小输入输出电压差的条件下也能实现快速响应,提供非常适合高分辨率显示驱动的性能。包括一个失调校准电路,以尽量减少通道间电压差异,确保高精度和一致的输出性能。实验结果表明,所设计的集成电路具有较短的水平线时间(H) 2.0 μs和9.9 V/μs的转换速率。差分非线性(DNL)和积分非线性(INL)分别为0.66 LSB和0.98 LSB,经过偏置校正后,输出电压(DVO)的最大通道间偏差降至2.43 mV。
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引用次数: 0
BDLUT: Blind image denoising with hardware-optimized look-up tables bdlt:使用硬件优化的查找表进行盲图像去噪
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-15 DOI: 10.1002/jsid.2075
Boyu Li, Zhilin Ai, Baizhou Jiang, Binxiao Huang, Jason Chun Lok Li, Jie Liu, Zhengyuan Tu, Guoyu Wang, Daihai Yu, Ngai Wong

Denoising sensor-captured images on edge display devices remains challenging due to deep neural networks' (DNNs) high computational overhead and synthetic noise training limitations. This work proposes BDLUT(-D), a novel blind denoising method combining optimized lookup tables (LUTs) with hardware-centric design. While BDLUT describes the LUT-based network architecture, BDLUT-D represents BDLUT trained with a specialized noise degradation model. Designed for edge deployment, BDLUT(-D) eliminates neural processing units (NPUs) and functions as a standalone ASIC IP solution. Experimental results demonstrate BDLUT-D achieves up to 2.42 dB improvement over state-of-the-art LUT methods on mixed-noise-intensity benchmarks, requiring only 66 KB storage. FPGA implementation shows over 10× reduction in logic resources, 75% less storage compared to DNN accelerators, while achieving 57% faster processing than traditional bilateral filtering methods. These optimizations enable practical integration into edge scenarios like low-cost webcam enhancement and real-time 4 K-to-4 K denoising without compromising resolution or latency. By enhancing silicon efficiency and removing external accelerator dependencies, BDLUT(-D) establishes a new standard for practical edge imaging denoising. Implementation is available at https://github.com/HKU-LiBoyu/BDLUT.

由于深度神经网络(dnn)的高计算开销和合成噪声训练的限制,在边缘显示设备上对传感器捕获的图像进行降噪仍然具有挑战性。这项工作提出了bdlt (-D),一种结合优化查找表(lut)和以硬件为中心的设计的新型盲去噪方法。BDLUT描述的是基于lut的网络架构,而BDLUT- d表示的是经过专门噪声退化模型训练的BDLUT。bplut (-D)专为边缘部署而设计,消除了神经处理单元(npu),可作为独立的ASIC IP解决方案。实验结果表明,在混合噪声强度基准测试中,BDLUT-D比最先进的LUT方法提高了2.42 dB,只需要66 KB的存储空间。FPGA实现显示,与DNN加速器相比,逻辑资源减少了10倍以上,存储空间减少了75%,而处理速度比传统的双边滤波方法快57%。这些优化可以实际集成到边缘场景中,如低成本的网络摄像头增强和实时4k到4k去噪,而不会影响分辨率或延迟。通过提高硅效率和消除外部加速器依赖,bdlt (d)为实际边缘成像去噪建立了新的标准。具体实现请访问https://github.com/HKU-LiBoyu/BDLUT。
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引用次数: 0
A color and brightness shift compensation method for OLED TDDI panel using metal mesh capacitive touch sensor with temperature sensing 一种采用带温度传感的金属网电容式触摸传感器的OLED TDDI面板颜色和亮度偏移补偿方法
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-14 DOI: 10.1002/jsid.2079
Wan-Nung Tsung, Xuan-Yong Lin, Hua-Wei Liu, Shang-Yu Su, Chen-Yu Lin, Feng-Ting Pai, Chih-Chang Lai, Ching-Chun Lin

Color and luminance of OLED panel may shift under different ambient temperatures. To address this, raw data from touch sensors can be used to obtain local temperature information. By using this data, the proposed compensation method can be employed to solve the effects of temperature-induced color and luminance shifts. After compensation, OLED panels can provide a more stable and reliable visual experience in diverse ambient temperatures.

在不同的环境温度下,OLED面板的颜色和亮度会发生变化。为了解决这个问题,可以使用触摸传感器的原始数据来获取局部温度信息。利用这些数据,所提出的补偿方法可以解决温度引起的颜色和亮度变化的影响。经过补偿后,OLED面板可以在不同的环境温度下提供更稳定可靠的视觉体验。
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引用次数: 0
Hydrogen-free oxide thin-film transistor toward resolving hydrogen-associated instability 无氢氧化物薄膜晶体管解决氢相关的不稳定性
IF 2.2 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2025-04-13 DOI: 10.1002/jsid.2084
Mamoru Furuta, Mir Mutakabbir Alom, Motoki Ando, Yoshihiro Sato, Takafumi Kambe, Tsutomu Satoyoshi

We propose and demonstrate the concept of hydrogen-free (H-free) amorphous oxide semiconductor thin-film transistors (AOS TFTs) to resolve hydrogen-associated instability of TFT. H-free SiO2 and SiNx films were successfully deposited by large-area inductively coupled plasma chemical vapor deposition (ICP-CVD) using hydrogen-free source gases. H-free SiO2 and SiNx films were applied as the gate insulator and passivation layers of the TFT, respectively. The H-free In–Ga–Zn–Sn–O (IGZTO) TFT exhibited field-effect mobility of 23.2 cm2V−1 s−1 and excellent stability under positive gate bias stresses for 7,200 s at stress temperatures in the range of 60–100°C.

我们提出并演示了无氢(H-free)非晶氧化物半导体薄膜晶体管(AOS TFTs)的概念,以解决TFT的氢相关不稳定性。采用大面积电感耦合等离子体化学气相沉积(ICP-CVD)技术,采用无氢源气体制备了无h SiO2和SiNx薄膜。采用无h SiO2和SiNx薄膜分别作为TFT的栅绝缘层和钝化层。无h in - ga - zn - sn - o (IGZTO) TFT的场效应迁移率为23.2 cm2V−1 s−1,在60-100°C的正栅偏置应力下,稳定性为7200 s。
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引用次数: 0
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Journal of the Society for Information Display
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