In order to study the profile formation of photoresist microstructure (such as microlens) by the thermal reflow method, the viscoelastic dynamic model is developed based on motion equation, continuity equation, and thin film assumptions. The influence of viscoelastic properties, surface tension, as well as crosslinking effect on polymer melt profile evolution, are considered in this model, and the Oldroyd-B model is used to describe the viscoelastic constitutive relation of polymer melt. Since the viscoelastic dynamic model developed in this paper is a differential equation with regard to the height function of the polymer melt profile, the free surface profile of polymer melts can be obtained naturally during shape evolution by numerically coupling the solution of the film thickness equation and the Oldroyd-B constitutive equation. The computational efficiency of numerical simulation of the free-surface profile would be improved by using this equation as compared to solving the highly non-linear equations of viscoelastic hydrodynamics. The influence of key parameters such as baking time, baking temperature, and crosslinking effect on profile shape evolution is analyzed by this model, and the materials are compared by assigning them different Weissenberg number. In addition, the maximum relative error of verification experiments between the final profile predicted by the simulation and the experimental results is less than 10 %.
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