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Simulation of Laser Ablation of Materials within the Thermal Spike Model 在热尖峰模型内模拟激光烧蚀材料
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s1027451024020022
I. V. Amirkhanov, I. Sarkhadov, Z. K. Tukhliev, H. Gafurov

Abstract

Previously, numerical simulations of laser ablation of materials occurring under the action of ultrashort laser pulses in semiconfined samples and samples of finite thickness were carried out. Its thermal mechanism was described in terms of a one-dimensional unsteady heat equation in a coordinate system associated with a moving evaporation front. The action of the laser was taken into account through the source functions in the thermal conductivity equation, specifying the coordinate and time dependences of the laser source. In this work, similar simulations were carried out for semiconfined samples within the framework of a two-temperature thermal spike model, which consisted of two interrelated thermal conductivity equations for the electron gas and the crystal lattice. For the convenience of numerical simulation, in the equations of the thermal spike model, a transition was made to the coordinate system associated with the moving evaporation front of the material. Using numerical simulation, temperature profiles of the electron gas and crystal lattice at different times were obtained, and the dynamics of the temperatures of the electron gas and crystal lattice on the surface of the sample were calculated within the thermal spike model, taking into account the evaporation of the crystal lattice and the emission of electron gas from the surface of the sample. A comparative analysis of the numerical results obtained within both models was carried out.

摘要 以前曾对半封闭样品和有限厚度样品在超短激光脉冲作用下发生的材料激光烧蚀现象进行过数值模拟。其热机制是通过与移动蒸发前沿相关的坐标系中的一维非稳态热方程来描述的。激光的作用是通过热导方程中的源函数来考虑的,它指定了激光源的坐标和时间相关性。在这项工作中,我们在双温热尖峰模型的框架内对半封闭样品进行了类似的模拟,该模型由电子气体和晶格两个相互关联的导热方程组成。为了便于数值模拟,在热尖峰模型方程中,过渡到了与材料移动蒸发前沿相关的坐标系。通过数值模拟,得到了电子气体和晶格在不同时间的温度曲线,并在热尖峰模型中计算了样品表面电子气体和晶格温度的动态变化,同时考虑了晶格的蒸发和样品表面电子气体的发射。对两种模型得出的数值结果进行了比较分析。
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引用次数: 0
Accumulation and Suppression of Radiation-Induced Charge in MOS Structures MOS 结构中辐射诱导电荷的积累与抑制
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s102745102402023x
D. V. Andreev

Abstract

It is shown that when a MOS (metal–oxide–semiconductor) structure is simultaneously exposed to radiation and the high-field injection of electrons, part of the radiation-induced positive charge can be suppressed when interacting with injected electrons, and the density of surface states can increase. These phenomena must be taken into account during the operation of MOS radiation sensors in high-field charge injection modes. High-field injection modes used for postradiation suppression of positive charge in MOS sensors are analyzed. It is established that to annihilate one hole (radiation-induced positive charge), it is necessary to inject (0.5–2) × 104 electrons into the gate dielectric; the magnitude of the electric field has almost no effect on the process of suppression of the radiation-induced charge.

摘要 研究表明,当 MOS(金属氧化物半导体)结构同时暴露于辐射和高场注入电子时,部分辐射诱导的正电荷会在与注入电子相互作用时被抑制,表面态密度也会增加。在高场电荷注入模式下运行 MOS 辐射传感器时,必须考虑到这些现象。本文分析了用于 MOS 传感器正电荷辐照后抑制的高场注入模式。结果表明,要湮灭一个空穴(辐射诱导的正电荷),需要向栅极电介质注入 (0.5-2) × 104 个电子;电场的大小对辐射诱导电荷的抑制过程几乎没有影响。
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引用次数: 0
Dependence of the Charge State of a Light Ion Beam in Matter on Particle Velocity 物质中轻离子束的电荷状态与粒子速度的关系
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s1027451024020125
N. N. Mikheev, I. Zh. Bezbakh

Abstract

The results of applying the statistics of a discrete multiple scattering process to analytically describe the dependence of the charge state of light ions in matter on particle velocity are presented. It is shown that the use of a technique based on taking into account the dependence of the charge state of the beam ions on the ratio of the ion velocity to the minimum velocity of the electrons of the substance makes it possible to calculate the stopping power of the substance for lithium, beryllium, boron, and carbon ions of medium and low energies corresponding to the experimental results.

摘要 介绍了应用离散多重散射过程统计来分析描述物质中轻离子电荷状态对粒子速度依赖性的结果。结果表明,使用基于离子束电荷状态对离子速度与物质电子最小速度之比的依赖性的技术,可以计算出与实验结果相对应的中低能量的锂、铍、硼和碳离子的物质阻挡力。
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引用次数: 0
Lead Slowing-Down Neutron Spectrometry 1: Cross-Section Data for 241Am(n,f), 242mAm(n,f), and 243Am(n,f) at Energies up to 100 keV 铅减速中子能谱仪 1:能量高达 100 千伏的 241Am(n,f)、242mAm(n,f) 和 243Am(n,f) 的截面数据
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s1027451024020320
E. A. Koptelov

Abstract

This paper is an overview of the results obtained by a collaborative team of researchers from the Institute for Nuclear Research, Russian Academy of Sciences (INR RAS), and State Scientific Center of the Russian Federation—Institute of Physics and Power Engineering (SSC RF—IPPE) using the SVZ-100 lead slowing-down neutron spectrometer. The study focuses on measuring the fission cross sections of americium isotopes 241Am, 242mAm, and 243Am when bombarded by neutrons with energies below 100 keV. The high efficiency of the SVZ-100, facilitated by its substantial working-substance mass (100 t of high-purity lead) and neutron generation through proton irradiation with a 209-MeV accelerator at the INR RAS, enables the investigation of neutron-nuclear processes in microgram samples of radioactive nuclides, which is unattainable in experiments using time-of-flight spectrometry. Unique scientific information is acquired through lead slowing-down neutron spectrometry by collaborative research efforts at the INR RAS and SSC RF—IPPE. This information partially fills gaps or complements existing but often contradictory or insufficient data from experiments conducted on both time-of-flight installations and lead slowing-down neutron spectrometers at other research centers. The results of collaboration of the INR RAS and SSC RF—IPPE are documented in international nuclear data repositories, indicating, in several instances, the need for adjustments to recommended approximating and calculated values. Information is given on some implemented and planned studies on neutron fission cross sections of americium isotopes at other centers following completion of the collaboration of the INR RAS and SSC RF—IPPE.

摘要 本文概述了俄罗斯科学院核研究所(INR RAS)和俄罗斯联邦国家科学中心-物理与动力工程研究所(SSC RF-IPPE)的研究人员组成的合作小组利用 SVZ-100 铅减速中子谱仪取得的成果。研究重点是测量镅同位素 241Am、242mAm 和 243Am 在能量低于 100 千伏的中子轰击下的裂变截面。SVZ-100 的工作物质质量很大(100 吨高纯度铅),并通过 INR RAS 的 209 兆电子伏加速器进行质子辐照产生中子,因此效率很高,能够研究微克放射性核素样品中的中子-核过程,这是使用飞行时间光谱法进行实验所无法实现的。通过 INR RAS 和 SSC RF-IPPE 的合作研究,通过铅减速中子谱仪获得了独特的科学信息。这些信息部分填补了空白,或补充了在其他研究中心的飞行时间装置和铅减慢中子谱仪上进行的实验所获得的现有数据,但这些数据往往相互矛盾或不足。国际核数据储存库中记录了 INR RAS 和 SSC RF-IPPE 的合作结果,在一些情况下表明需要对建议的近似值和计算值进行调整。还介绍了在完成 INR RAS 和 SSC RF-IPPE 的合作后,其他中心对镅同位素的中子裂变截面进行的和计划进行的一些研究。
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引用次数: 0
Structural Analysis of the Interface of Contact Melting between AMg6 and Zn-Based Alloys AMg6 与锌基合金接触熔化界面的结构分析
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s1027451024020241
E. A. Batalova, L. V. Kamaeva, I. V. Shutov, M. N. Korolev, M. D. Krivilev

Abstract

We study the processes of the contact melting of AMg6 alloy with a solid Zn–Cu–Al solder and a model Zn–Al alloy, as well as the structure of the contact-melting zone. Sample preparation is carried out in two stages. In the first stage, the solder is mechanically applied (tinned) to the surface of AMg6 plates, and in the second stage, the obtained composite samples are subjected to heat treatment, varying the holding time in the liquid state. According to metallographic analysis, X-ray structural analysis, and differential scanning calorimetry, active interaction between Zn and Al occurs already at the tinning stage, leading to the formation of a developed morphology in the joint area. The presence of copper in the HTS-2000 solder decreases the melting temperature of the Zn–Al alloy by 30–40°C and improves the conditions of contact interaction with the AMg6 matrix. Active zinc diffusion ensures the formation of an extensive melting zone during heat treatment. Regions rich in zinc, upon crystallization, contain the intermetallic phase Zn5Cu, which hinders the formation of intermetallics based on the ZnMg system, preventing embrittlement of the contact zone.

摘要 我们研究了 AMg6 合金与固体 Zn-Cu-Al 焊料和模型 Zn-Al 合金的接触熔化过程,以及接触熔化区的结构。样品制备分两个阶段进行。在第一阶段,将焊料以机械方式涂抹(镀锡)到 AMg6 板表面;在第二阶段,对获得的复合样品进行热处理,改变液态下的保温时间。根据金相分析、X 射线结构分析和差示扫描量热法,锌和铝在镀锡阶段就已经发生了积极的相互作用,从而在接合区域形成了发达的形态。HTS-2000 焊料中铜的存在使锌铝合金的熔化温度降低了 30-40°C,并改善了与 AMg6 基体接触相互作用的条件。活跃的锌扩散确保了在热处理过程中形成广泛的熔化区。结晶后的富锌区域含有金属间相 Zn5Cu,这阻碍了基于 ZnMg 系统的金属间化合物的形成,防止了接触区的脆化。
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引用次数: 0
Formation of Bismuth Nanoparticles on Nanoporous Substrates 在纳米多孔基底上形成纳米铋粒子
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s1027451024020174
S. I. Supelnyak, V. V. Artemov

Abstract

Substrates with a layer of anodized aluminum oxide are obtained by one-stage and two-stage anodization. The samples have different porosity in volume and on the surface. Bismuth nanoparticles are obtained by thermal evaporation in an argon medium by condensation onto substrates with a layer of anodized aluminum oxide. The distribution of sizes, shapes, and the quantity of nanoparticles and microparticles is studied from images obtained using a scanning electron microscope. The largest number of nanoparticles (21%) on the sample with a surface layer of aluminum oxide without pores is characterized by a diameter of 70 nm. It is assumed that the presence of pores on the surface affects the migration of deposited atoms and particles of bismuth melt until stable condensation centers are formed. The presence of pores with a diameter from 20 to 100 nm leads to a decrease in the diameter of the most common bismuth nanoparticles from 80 to 40 nm. Nanoparticles with a diameter of 90 nm predominate (25%) in the sample with pores with a diameter from 60 to 220 nm. The largest number of spherical crystallites on all substrates has a diameter of 110 nm. It is found that a uniform distribution of particles is obtained for the sample, whose surface was not subjected to chemical polishing.

摘要--通过一段式和二段式阳极氧化,获得了具有阳极氧化铝层的基板。样品的体积和表面具有不同的孔隙率。铋纳米粒子是在氩气介质中通过热蒸发凝结在带有阳极氧化铝层的基底上获得的。通过扫描电子显微镜获得的图像研究了纳米颗粒和微颗粒的大小、形状和数量分布。在表面有一层无孔氧化铝的样品上,纳米粒子数量最多(21%),直径为 70 纳米。据推测,表面孔隙的存在会影响沉积原子和铋熔体颗粒的迁移,直至形成稳定的凝结中心。直径从 20 纳米到 100 纳米的孔隙的存在导致最常见的铋纳米粒子的直径从 80 纳米减小到 40 纳米。在孔径为 60 至 220 纳米的样品中,直径为 90 纳米的纳米颗粒占多数(25%)。所有基底上数量最多的球形晶体直径为 110 纳米。研究发现,表面未进行化学抛光的样品中的颗粒分布均匀。
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引用次数: 0
Structural, Transport, and Magnetic Properties of Ultrathin and Thin FeSi Films on Si(111) Si(111) 上超薄和超薄 FeSi 薄膜的结构、传输和磁性能
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s1027451024020265
N. G. Galkin, I. M. Chernev, E. Yu. Subbotin, O. A. Goroshko, S. A. Dotsenko, A. M. Maslov, K. N. Galkin, O. V. Kropachev, D. L. Goroshko, A. Yu. Samardak, A. V. Gerasimenko, E. V. Argunov

Abstract

Polycrystalline and epitaxial iron silicide (FeSi) films with thicknesses of 3.2–20.35 nm are grown on a Si(111) substrate using solid-phase and molecular-beam epitaxy at 350°C, as confirmed by X-ray diffraction data. Morphological studies reveal that the films grown by solid-phase epitaxy are continuous and smooth with a root-mean-square roughness ranging from 0.4 to 1.1 nm, while those grown by molecular-beam epitaxy exhibit increased roughness and consist of coalesced grains with sizes up to 1 μm and a pit density of up to 1 × 107 cm–2. In the case of solid-phase epitaxy, an increase in the thickness leads to incomplete silicide formation and the emergence of a layer of disordered iron silicide with a thickness ranging from 10 to 20 nm, possibly with an excess of iron. This is confirmed by a change in the nature of the temperature dependence of the resistivity ρ from semiconductor to semimetallic, which leads to a decrease in the resistivity by 1.5–2 times. The nonmonotonic character of the temperature dependence of the resistivity ρ(T) for an ultrathin FeSi film with a thickness of 3.2 nm is identified, exhibiting a maximum around 230–240 K, a rising segment from 160 to 65 K with Eg = 14.8 meV, and further unsaturated growth down to 1.5 K. As the thickness of the FeSi films grown by molecular-beam epitaxy increases, the minimum and maximum are not observed, but the nonmonotonic trend of ρ(T) with decreasing temperature and the opening of the band gap Eg = 23 meV are preserved. The possible reasons for the observed effects in the ρ(T) dependences are considered. An anomalous Hall effect is detected in ultrathin and thin FeSi films grown by solid-phase and molecular-beam epitaxy, respectively, which confirms the weak ferromagnetic properties of the films. The results demonstrate the feasibility of growing and controlling the properties of ultrathin and thin FeSi films on silicon using methods of solid-phase and molecular-beam epitaxy, providing them with unique transport and magnetic properties not present in single crystals.

摘要 利用固相外延和分子束外延技术,在 350℃的硅(111)衬底上生长出厚度为 3.2-20.35 nm 的多晶和外延硅化铁(FeSi)薄膜,X 射线衍射数据证实了这一点。形态学研究表明,固相外延法生长的薄膜连续光滑,均方根粗糙度在 0.4 至 1.1 nm 之间,而分子束外延法生长的薄膜粗糙度增加,由大小达 1 μm 的凝聚晶粒组成,凹坑密度达 1 × 107 cm-2。在固相外延的情况下,厚度的增加会导致硅化物形成不完全,出现一层厚度为 10 至 20 纳米的无序硅化铁层,其中可能含有过量的铁。电阻率 ρ 随温度变化的性质也证实了这一点,从半导体到半金属,电阻率降低了 1.5-2 倍。对于厚度为 3.2 nm 的超薄 FeSi 薄膜来说,电阻率 ρ(T) 的温度依赖性具有非单调性,在 230-240 K 左右达到最大值,在 160 至 65 K 之间出现上升段(Eg = 14.8 meV),并进一步不饱和地增长至 1.5 K。随着分子束外延生长的 FeSi 薄膜厚度的增加,没有观察到最小值和最大值,但保留了 ρ(T) 随温度降低的非单调趋势以及带隙 Eg = 23 meV 的打开。我们考虑了ρ(T) 相关性中观察到的效应的可能原因。在分别通过固相和分子束外延生长的超薄和超薄硅铁薄膜中检测到了反常霍尔效应,这证实了薄膜的弱铁磁特性。研究结果表明,利用固相和分子束外延方法在硅上生长超薄铁硅薄膜并控制其特性是可行的,而且这些薄膜具有单晶体所不具备的独特传输和磁性能。
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引用次数: 0
Electron–Plasmon Interaction in Bi2Te3–Sb2Te3 Crystals Bi2Te3-Sb2Te3 晶体中的电子-普拉斯门相互作用
IF 0.4 Q4 Materials Science Pub Date : 2024-05-07 DOI: 10.1134/s1027451024020381
N. P. Stepanov

Abstract

Upon studying the optical properties of solid solutions of p-type Bi2Te3–Sb2Te3 in the infrared range, it is found that in the single crystal Bi0.6Sb1.4Te3, deformation of the reflection-coefficient spectra is observed in the frequency range of observation of the plasma resonance of free charge carriers. Deformation of the plasma edge increases with a decrease in temperature. Using the Kramers–Kronig dispersion relations from experimental reflection spectra, the spectral dependences of the real ε1 and imaginary parts ε2 of the permittivity function, as well as the energy-loss function characterizing the rate of energy dissipation, are calculated. Splitting of the peak of the energy loss function is found, which indicates the effect on the plasma resonance from another process occurring in the electronic system. It is established that such a process is the transition of electrons between nonequivalent extrema of the valence band. Convergence of the collective and single-particle energies of the electronic system leads to amplification of the electron—plasmon interaction, which is the most probable cause of the observed deformation of the plasma edge.

摘要 在研究对型 Bi2Te3-Sb2Te3 固溶体在红外范围内的光学特性时发现,在单晶 Bi0.6Sb1.4Te3 中,在观察自由电荷载流子等离子体共振的频率范围内,反射系数光谱发生了变形。等离子体边缘的变形随着温度的降低而增加。利用实验反射光谱的克拉默-克罗尼格色散关系,计算了介电常数函数实部ε1 和虚部ε2 的光谱依赖关系,以及表征能量耗散率的能量损失函数。发现了能量损耗函数峰值的分裂,这表明电子系统中发生的另一个过程对等离子体共振产生了影响。这种过程是电子在价带的非等效极值之间的转变。电子系统的集合能量和单粒子能量的趋同导致了电子-等离子相互作用的放大,这是观测到的等离子体边缘变形的最可能原因。
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引用次数: 0
Tetraoxa[8]circulene Monolayer as Hydrogen Storage Material: Model with Boys–Bernardi Corrections Within Density Functional Theory 作为储氢材料的四氧杂[8]环烯单层:密度泛函理论中的 Boys-Bernardi 校正模型
IF 0.4 Q4 Materials Science Pub Date : 2024-05-02 DOI: 10.1134/s102745102401004x
E. V. Anikina, D. V. Babailova, M. S. Zhilin, V. P. Beskachko

Abstract

The parameters of molecular hydrogen adsorption on a tetraoxa[8]circulene monolayer were studied using the density functional theory with dispersion interaction corrections (semi-empirical and analytical). The calculations were carried out using two different approaches to the system wave function representation: atomic-like orbital basis set and plane wave basis. Utilizing a less computationally expensive pseudo-atomic basis, it is possible to obtain results for molecular hydrogen adsorption consistent with values calculated with plane waves if the atomic-like basis is optimized and basis set superposition error is corrected for both hydrogen binding energy and geometrical characteristics. Otherwise, the H2 binding energy will be overestimated by 4–6 times (sometimes even more, by 20); and the hydrogen–monolayer distance will be underestimated by 10–20%. The obtained optimized parameters of the pseudo-atomic basis set can be used for further study of the modified forms of the tetraoxa[8]circulene monolayer. Moreover, our calculations showed that the hydrogen binding to a pristine tetraoxa[8]circulene monolayer is predominantly van der Waals with an energy of 60–90 meV, which is several times less than the desired range of 200–600 meV. To achieve such values, it will be necessary to modify the surface of the monolayer, creating more active sorption cites, for example, by decorating it with metals or applying structural defects.

摘要 利用密度泛函理论和弥散相互作用校正(半经验和解析)研究了分子氢在四氧杂[8]环烯单层上的吸附参数。计算采用了两种不同的系统波函数表示方法:类原子轨道基集和平面波基。利用计算成本较低的伪原子基,如果对类原子基进行优化,并根据氢结合能和几何特征修正基集叠加误差,就有可能获得与平面波计算值一致的分子氢吸附结果。否则,氢结合能将被高估 4-6 倍(有时甚至高估 20 倍);氢单层距离将被低估 10-20%。得到的伪原子基集优化参数可用于进一步研究四氧杂[8]环烯单层的修饰形式。此外,我们的计算还表明,氢与原始四氧杂[8]环烯单层的结合主要是范德华结合,其能量为 60-90 meV,比理想的 200-600 meV 范围小几倍。要达到这样的数值,就必须对单层表面进行改性,例如,通过金属装饰或结构缺陷等方法,创造出更活跃的吸附引物。
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引用次数: 0
Influence of the Amplitude of the Pulsed-Magnetic-Field Intensity on the Parameters of the Magnetoplastic Effect in Aged Al–Si–Cu–Fe Aluminum Alloy 脉冲磁场强度振幅对铝-硅-铜-铁铝合金时效磁塑效应参数的影响
IF 0.4 Q4 Materials Science Pub Date : 2024-05-02 DOI: 10.1134/s1027451024010154
J. V. Osinskaya, S. G. Magamedova, A. V. Pokoev

Abstract

The results of a comprehensive experimental study of the influence of amplitude of the pulsed-magnetic-field intensity on the properties and characteristics of an Al–Si–Cu–Fe aluminum alloy during aging are presented. Data are presented on the modes of thermomagnetic treatment and the results of measurements of the microhardness, lattice parameter, and fine-structure parameters of the alloy aged at a temperature of 175°С for 4 h in a pulsed magnetic field with an intensity amplitude of 79.6–557.2 kA/m and in its absence. The main regularities of changes in the structure and properties of the metal alloy during annealing are formulated.

摘要 本文介绍了脉冲磁场强度振幅对铝-硅-铜-铁铝合金老化过程中性能和特征影响的综合实验研究结果。文中提供了热磁化处理模式的数据,以及在强度幅值为 79.6-557.2 kA/m 的脉冲磁场和无磁场条件下,在温度为 175°С 的条件下老化 4 小时的合金的显微硬度、晶格参数和精细结构参数的测量结果。本文阐述了退火过程中金属合金结构和性能变化的主要规律。
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引用次数: 0
期刊
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
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