首页 > 最新文献

COMMAD 2012最新文献

英文 中文
Design and analysis of a metasurface for supporting spoof surface plasmon polaritons 支持欺骗表面等离子激元极化的超表面设计与分析
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472409
C. Shah, W. Withayachumnankul, S. Hanham, S. Maier, W. Rowe, M. Bhaskaran, S. Sriram, A. Mitchell
A chain of complementary split ring resonators (CSRRs) operating at terahertz frequencies have the potential to sustain surface plasmon polaritons (SPPs). As a first step, the transmission spectra of a 2D periodic array of scaled CSRRs operating at terahertz frequencies were obtained. A second investigation, explored the effect of a polydimethylsiloxane (PDMS) substrate on the resonance of CSRRs. These simulations confirm the strong resonance of the CSRRs and their potential for supporting SPPs.
在太赫兹频率下工作的互补分裂环谐振器(csrr)链具有维持表面等离子体激元(SPPs)的潜力。作为第一步,获得了在太赫兹频率下工作的二维缩放csrr周期阵列的透射光谱。第二项研究探讨了聚二甲基硅氧烷(PDMS)底物对csrs共振的影响。这些模拟证实了csrr的强共振及其支持spp的潜力。
{"title":"Design and analysis of a metasurface for supporting spoof surface plasmon polaritons","authors":"C. Shah, W. Withayachumnankul, S. Hanham, S. Maier, W. Rowe, M. Bhaskaran, S. Sriram, A. Mitchell","doi":"10.1109/COMMAD.2012.6472409","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472409","url":null,"abstract":"A chain of complementary split ring resonators (CSRRs) operating at terahertz frequencies have the potential to sustain surface plasmon polaritons (SPPs). As a first step, the transmission spectra of a 2D periodic array of scaled CSRRs operating at terahertz frequencies were obtained. A second investigation, explored the effect of a polydimethylsiloxane (PDMS) substrate on the resonance of CSRRs. These simulations confirm the strong resonance of the CSRRs and their potential for supporting SPPs.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130722837","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Mesh substrate for gravitational magnetoelastic metamaterial 重力磁弹性超材料的网状衬底
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472384
I. Khodasevych, G. Kostovski, W. Rowe, A. Mitchell
In this paper we present a microfabricated mesh substrate for use in gravitational magnetoelastic metamaterials. The high resolution technique allows the manipulation of the electromagnetic properties of the substrate towards free space-like performance. This is achieved via removal of predetermined substrate areas while simultaneously shaping the required mechanical features.
本文提出了一种用于重力磁弹性超材料的微加工网状衬底。高分辨率技术允许对基板的电磁特性进行操纵,使其具有自由的类空间性能。这是通过去除预定的基材区域,同时塑造所需的机械特征来实现的。
{"title":"Mesh substrate for gravitational magnetoelastic metamaterial","authors":"I. Khodasevych, G. Kostovski, W. Rowe, A. Mitchell","doi":"10.1109/COMMAD.2012.6472384","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472384","url":null,"abstract":"In this paper we present a microfabricated mesh substrate for use in gravitational magnetoelastic metamaterials. The high resolution technique allows the manipulation of the electromagnetic properties of the substrate towards free space-like performance. This is achieved via removal of predetermined substrate areas while simultaneously shaping the required mechanical features.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115636247","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Influence of growth temperature and V/III ratio on Au-assisted InxGa1−xAs nanowires 生长温度和V/III比对au辅助InxGa1−xAs纳米线的影响
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472348
A. Ameruddin, H. Tan, H. Fonseka, Q. Gao, J. Wong-Leung, P. Parkinson, S. Breuer, C. Jagadish
InxGa1-xAs nanowires were grown using metal-organic chemical vapour deposition (MOCVD) with various growth temperatures and V/III ratios. The morphology of these nanowires and the composition distribution along the nanowire were studied as a function of these growth parameters. With higher growth temperature and lower V/III ratio, the tapering of the nanowires is reduced. However, the incorporation of Ga in the nanowires is also reduced with lower V/III ratio. The composition distribution along the nanowires is non-uniform with typically In-rich bases and Ga-rich tips.
采用金属有机化学气相沉积法(MOCVD)在不同生长温度和V/III比下生长InxGa1-xAs纳米线。研究了这些生长参数对纳米线形貌和纳米线上成分分布的影响。随着生长温度的升高和V/III比的降低,纳米线的锥度减小。然而,随着V/III比的降低,Ga在纳米线中的掺入也减少了。沿纳米线的成分分布不均匀,典型的是富in基和富ga尖端。
{"title":"Influence of growth temperature and V/III ratio on Au-assisted InxGa1−xAs nanowires","authors":"A. Ameruddin, H. Tan, H. Fonseka, Q. Gao, J. Wong-Leung, P. Parkinson, S. Breuer, C. Jagadish","doi":"10.1109/COMMAD.2012.6472348","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472348","url":null,"abstract":"InxGa1-xAs nanowires were grown using metal-organic chemical vapour deposition (MOCVD) with various growth temperatures and V/III ratios. The morphology of these nanowires and the composition distribution along the nanowire were studied as a function of these growth parameters. With higher growth temperature and lower V/III ratio, the tapering of the nanowires is reduced. However, the incorporation of Ga in the nanowires is also reduced with lower V/III ratio. The composition distribution along the nanowires is non-uniform with typically In-rich bases and Ga-rich tips.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"94 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114962855","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Spintronics for instant-on nonvolatile electronics 用于瞬时非易失性电子器件的自旋电子学
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472388
K. Wang, P. Amiri
Using collective spins or nanomagnets offers the possibility of constructing high speed nonvolatile electronics, resulting in the energy dissipation at the device level possibly approaching the fundamental equilibrium Maxwell-Shannon-Landaur limit. This paper will describe the progress in energy-efficient MgO-based magnetic tunnel junction (MTJ) bits for high-speed spin-transfer-torque magnetoresistive random access memory (STT-MRAM). Furthermore, the possibility of a Magnetoelectric RAM (MeRAM) as a promising candidate for ultralow power is discussed. Demonstrated principles and experiments of voltage-induced switching of the magnetization and reorientation of the magnetic easy axis by electric field offer much reduced switching energy at high speed. The latter may enable a new paradigm of high speed nonvolatile electronics.
使用集体自旋或纳米磁体提供了构建高速非易失性电子器件的可能性,导致器件级的能量耗散可能接近基本平衡麦克斯韦-香农-朗道尔极限。本文将介绍用于高速自旋-传递-转矩磁阻随机存取存储器(STT-MRAM)的高效mgo型磁隧道结(MTJ)位的研究进展。此外,还讨论了磁电RAM (MeRAM)作为超低功耗的有希望的候选器件的可能性。利用电场对磁易轴的磁化和重定向进行电压感应开关的原理和实验证明,在高速下大大降低了开关能量。后者可能使高速非易失性电子的新范式成为可能。
{"title":"Spintronics for instant-on nonvolatile electronics","authors":"K. Wang, P. Amiri","doi":"10.1109/COMMAD.2012.6472388","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472388","url":null,"abstract":"Using collective spins or nanomagnets offers the possibility of constructing high speed nonvolatile electronics, resulting in the energy dissipation at the device level possibly approaching the fundamental equilibrium Maxwell-Shannon-Landaur limit. This paper will describe the progress in energy-efficient MgO-based magnetic tunnel junction (MTJ) bits for high-speed spin-transfer-torque magnetoresistive random access memory (STT-MRAM). Furthermore, the possibility of a Magnetoelectric RAM (MeRAM) as a promising candidate for ultralow power is discussed. Demonstrated principles and experiments of voltage-induced switching of the magnetization and reorientation of the magnetic easy axis by electric field offer much reduced switching energy at high speed. The latter may enable a new paradigm of high speed nonvolatile electronics.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117167565","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
An optically resonant, grating-based technique for the sensitive detection of MEMS cantilever beam height 基于光学谐振光栅的MEMS悬臂梁高度敏感检测技术
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472387
G. Putrino, M. Martyniuk, A. Keating, L. Faraone, J. Dell
We present an experimental demonstration of an integrated technique designed to measure the height position of a micro-cantilever with extremely high precision. Our experimental results show that changing the beam height by 200 nm can result in an up to 40 dB change in optical power transmitted through an underlying optical waveguide.
我们提出了一种集成技术的实验演示,该技术旨在以极高的精度测量微悬臂梁的高度位置。实验结果表明,将光束高度改变200 nm可导致通过底层光波导传输的光功率变化高达40 dB。
{"title":"An optically resonant, grating-based technique for the sensitive detection of MEMS cantilever beam height","authors":"G. Putrino, M. Martyniuk, A. Keating, L. Faraone, J. Dell","doi":"10.1109/COMMAD.2012.6472387","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472387","url":null,"abstract":"We present an experimental demonstration of an integrated technique designed to measure the height position of a micro-cantilever with extremely high precision. Our experimental results show that changing the beam height by 200 nm can result in an up to 40 dB change in optical power transmitted through an underlying optical waveguide.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"93 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125676433","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhanced electrochemical heavy metal ion sensor using liquid metal marbles - towards on-chip application 基于液态金属弹珠的增强型电化学重金属离子传感器——面向片上应用
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472436
V. Sivan, S. Tang, A. O’Mullane, P. Petersen, N. Eshtiaghi, K. Kalantar-zadeh, A. Mitchell
This paper reports on a highly sensitive electrochemical based heavy metal ion sensor obtained by using recently discovered liquid metal marbles. We present the procedure to form these liquid metal marbles with controlled coating density. We also show enhanced electrochemical sensitivity of these marbles towards heavy metal ions with excellent selectivity.
本文报道了利用新发现的液态金属弹珠制备的高灵敏度电化学重金属离子传感器。本文介绍了在控制涂层密度的条件下形成液态金属弹珠的方法。我们还发现这些弹珠对重金属离子的电化学敏感性增强,具有优异的选择性。
{"title":"Enhanced electrochemical heavy metal ion sensor using liquid metal marbles - towards on-chip application","authors":"V. Sivan, S. Tang, A. O’Mullane, P. Petersen, N. Eshtiaghi, K. Kalantar-zadeh, A. Mitchell","doi":"10.1109/COMMAD.2012.6472436","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472436","url":null,"abstract":"This paper reports on a highly sensitive electrochemical based heavy metal ion sensor obtained by using recently discovered liquid metal marbles. We present the procedure to form these liquid metal marbles with controlled coating density. We also show enhanced electrochemical sensitivity of these marbles towards heavy metal ions with excellent selectivity.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125355123","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Photo-ionisation spectra of single erbium centres by charge sensing with a nano transistor 用奈米电晶体电荷感测单铒中心的光离光谱
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472428
C. Yin, Miloš Rančić, N. Stavrias, G. D. Boo, J. McCallum, M. Sellars, S. Rogge
We show the photo-ionisation of an individual erbium centre in silicon. A single-electron transistor is used as a charge detector to observe the resonant ionization as a function of photon energy. This allows for optical addressing and electrical detection of individual erbium centres with exceptionally narrow line width.
我们展示了硅中单个铒中心的光电离。用单电子晶体管作为电荷探测器,观察谐振电离作为光子能量的函数。这允许光学寻址和电子检测的个别铒中心与特别窄的线宽。
{"title":"Photo-ionisation spectra of single erbium centres by charge sensing with a nano transistor","authors":"C. Yin, Miloš Rančić, N. Stavrias, G. D. Boo, J. McCallum, M. Sellars, S. Rogge","doi":"10.1109/COMMAD.2012.6472428","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472428","url":null,"abstract":"We show the photo-ionisation of an individual erbium centre in silicon. A single-electron transistor is used as a charge detector to observe the resonant ionization as a function of photon energy. This allows for optical addressing and electrical detection of individual erbium centres with exceptionally narrow line width.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114156053","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optimisation studies for AlGaN/GaN-based nitrate sensors 基于AlGaN/ gan的硝酸盐传感器优化研究
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472411
F. L. Khir, M. Myers, A. Podolska, M. Baker, B. Nener, G. Parish
AlGaN/GaN HEMT (high electron mobility transistor) sensors have been coated with a nitrate selective polymer membrane enabling nitrate ion sensing in water. In this study we optimise the thickness of the nitrate selective membrane to maximise sensor performance (sensitivity).
AlGaN/GaN HEMT(高电子迁移率晶体管)传感器已经被涂上硝酸盐选择性聚合物膜,使硝酸盐离子在水中传感。在这项研究中,我们优化了硝酸盐选择膜的厚度,以最大限度地提高传感器的性能(灵敏度)。
{"title":"Optimisation studies for AlGaN/GaN-based nitrate sensors","authors":"F. L. Khir, M. Myers, A. Podolska, M. Baker, B. Nener, G. Parish","doi":"10.1109/COMMAD.2012.6472411","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472411","url":null,"abstract":"AlGaN/GaN HEMT (high electron mobility transistor) sensors have been coated with a nitrate selective polymer membrane enabling nitrate ion sensing in water. In this study we optimise the thickness of the nitrate selective membrane to maximise sensor performance (sensitivity).","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"73 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121164067","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Vertical transport in InAs/GaSb type-II superlattices InAs/GaSb ii型超晶格中的垂直输运
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472332
G. Umana-Membreno, B. Klein, H. Kala, J. Antoszewski, G. Gautam, M. N. Kutty, E. Plis, S. Krishna, L. Faraone
In this work, we report on the measurement of vertical transport parameters in p-doped InAs/GaSb type-II superlattices for long-wavelength infrared detectors. Since the Hall effect technique cannot be used for vertical transport measurements, a magnetoresistance approach has been used. The magnetore-sistance data was obtained at electric fields not exceeding 25 V/cm and magnetic fields up to 12T. It is shown that at room temperature the sample conductivity is due to four distinct carriers, associated with the majority carrier holes, side-wall inversion layer electrons, and two minority carrier electrons likely associated with two distinct conduction band levels.
在这项工作中,我们报道了用于长波红外探测器的p掺杂InAs/GaSb ii型超晶格中垂直输运参数的测量。由于霍尔效应技术不能用于垂直输运测量,因此采用了磁电阻方法。在不超过25 V/cm的电场和高达12T的磁场下获得磁电阻数据。结果表明,在室温下,样品的导电性是由四个不同的载流子引起的,这些载流子与大多数载流子空穴、侧壁反转层电子和两个少数载流子电子可能与两个不同的导带能级有关。
{"title":"Vertical transport in InAs/GaSb type-II superlattices","authors":"G. Umana-Membreno, B. Klein, H. Kala, J. Antoszewski, G. Gautam, M. N. Kutty, E. Plis, S. Krishna, L. Faraone","doi":"10.1109/COMMAD.2012.6472332","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472332","url":null,"abstract":"In this work, we report on the measurement of vertical transport parameters in p-doped InAs/GaSb type-II superlattices for long-wavelength infrared detectors. Since the Hall effect technique cannot be used for vertical transport measurements, a magnetoresistance approach has been used. The magnetore-sistance data was obtained at electric fields not exceeding 25 V/cm and magnetic fields up to 12T. It is shown that at room temperature the sample conductivity is due to four distinct carriers, associated with the majority carrier holes, side-wall inversion layer electrons, and two minority carrier electrons likely associated with two distinct conduction band levels.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125623107","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Effect of FIB milling on MEMS SOI cantilevers FIB铣削对MEMS SOI悬臂梁的影响
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472412
C. Venkatesh, P. P. Singh, M. Renilkumar, M. Varma, N. Bhat, R. Pratap, M. Martyniuk, A. Keating, G. A. Umama-Membreno, K. Silva, J. Dell, L. Faraone
Stress induced by Focused Ion Beam (FIB) milling of cantilevers fabricated on silicon-on-insulator (SOI) wafer has been studied. Milling induces stress gradients ranging from -10MPa/μm to -120MPa/μm, depending on the location of cantilevers from the point of milling. Simulations were done to estimate the stress in the milled cantilevers.
研究了聚焦离子束(FIB)铣削在绝缘体上硅(SOI)晶圆上制造悬臂梁时产生的应力。铣削产生的应力梯度范围从-10MPa/μm到-120MPa/μm,这取决于悬臂梁距离铣削点的位置。对铣削悬臂梁的应力进行了模拟计算。
{"title":"Effect of FIB milling on MEMS SOI cantilevers","authors":"C. Venkatesh, P. P. Singh, M. Renilkumar, M. Varma, N. Bhat, R. Pratap, M. Martyniuk, A. Keating, G. A. Umama-Membreno, K. Silva, J. Dell, L. Faraone","doi":"10.1109/COMMAD.2012.6472412","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472412","url":null,"abstract":"Stress induced by Focused Ion Beam (FIB) milling of cantilevers fabricated on silicon-on-insulator (SOI) wafer has been studied. Milling induces stress gradients ranging from -10MPa/μm to -120MPa/μm, depending on the location of cantilevers from the point of milling. Simulations were done to estimate the stress in the milled cantilevers.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117097697","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
COMMAD 2012
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1