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Journal of Photopolymer Science and Technology最新文献

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Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing 原子氢退火氧化膜表面清洗与改性
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.351
A. Heya, K. Sumitomo
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引用次数: 0
Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight 主链断裂型抗蚀剂溶解动力学与分子量的关系
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.1
A. Konda, Hiroki Yamamoto, S. Yoshitake, T. Kozawa
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引用次数: 0
Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma 微波激发水蒸气等离子体光刻胶灰化过程压力依赖性研究
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.371
Khant Nyar Paing, Takeshi Aizawa, Hiroto Nishioka, Masashi Yamamoto, Tasuku Sakurai, Bat-Orgil Erdenezaya, Yusuke Kayamori, Y. Nakano, Yasunori Tanaka, T. Ishijima
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引用次数: 0
Controlled Sequence Photoresists from Polypeptoids 多肽类受控序列光刻胶
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.29
F. Kaefer, Z. MEng, R. Segalman, C. Ober
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引用次数: 5
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings 模拟蝉翅的纳米柱阵列聚合物抗菌表面
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.213
Natsuki Ogawa, Kodai Sato, K. Sunada, Hisashi Ishiguro, H. Kojima, Takeshi Ito
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引用次数: 1
Acid-responsive Emission Color Changes of Diarylaminobenzylideneanilines 二芳胺对偶酶二苯胺的酸响应性发光颜色变化
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.341
Takuma Tsukada, H. Nakano
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引用次数: 0
Fabrication of Glass Microchannels Using Plant Roots and Nematodes 利用植物根和线虫制备玻璃微通道
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.219
Tetsuro Koga, F. Tsumori
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引用次数: 0
Adhesion Improvement Mechanism of Polytetrafluoroethylene by Heat-assisted Atmospheric Pressure Glow Plasma Treatment 热辅助常压辉光等离子体处理提高聚四氟乙烯附着力的机理
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.299
Kunihito Tanaka, Koya Sato, Kazuo Takahashi, M. Kogoma
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引用次数: 0
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials 一种双吡啶二硫交联试剂的合成及其在异种材料光粘附中的应用
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.337
M. Furutani, Ritsuto Senkyo
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引用次数: 0
Determination of Radiation Dose Leading to Molecular Chain Destruction of Amino Acids 导致氨基酸分子链破坏的辐射剂量测定
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.255
Shunya Saegusa, Ryo Nakamura, N. Akamatsu, Y. Utsumi, Tomoko Ishihara, Masaki Oura, A. Yamaguchi
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引用次数: 0
期刊
Journal of Photopolymer Science and Technology
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