Pub Date : 2022-12-16DOI: 10.2494/photopolymer.35.49
Yosuke Ohta, A. Sekiguchi, Shinji Yamakawa, T. Harada, Takeo Watanabe, Hiroki Yamamoto
{"title":"Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure","authors":"Yosuke Ohta, A. Sekiguchi, Shinji Yamakawa, T. Harada, Takeo Watanabe, Hiroki Yamamoto","doi":"10.2494/photopolymer.35.49","DOIUrl":"https://doi.org/10.2494/photopolymer.35.49","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76579671","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-16DOI: 10.2494/photopolymer.35.289
Yuichi Imai, Hiroyuki Fukue, T. Nakatani, S. Kunitsugu, K. Kanda, Tsuneo Suzuki, S. Watari, Y. Fujii, D. Ousaka, Susumu Oozawa, Tomio Uchi
{"title":"Biomimetic Diamond-like Carbon Coating on a Lumen of Small-diameter Long-sized Tube Modified Surface Uniformly with Carboxyl Group using Oxygen Plasma","authors":"Yuichi Imai, Hiroyuki Fukue, T. Nakatani, S. Kunitsugu, K. Kanda, Tsuneo Suzuki, S. Watari, Y. Fujii, D. Ousaka, Susumu Oozawa, Tomio Uchi","doi":"10.2494/photopolymer.35.289","DOIUrl":"https://doi.org/10.2494/photopolymer.35.289","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85874843","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-16DOI: 10.2494/photopolymer.35.313
Takashi Doi, Isao Nishimura, M. Kaneko, T. Shimokawa
{"title":"Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication","authors":"Takashi Doi, Isao Nishimura, M. Kaneko, T. Shimokawa","doi":"10.2494/photopolymer.35.313","DOIUrl":"https://doi.org/10.2494/photopolymer.35.313","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84237988","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-12-16DOI: 10.2494/photopolymer.35.87
C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley
{"title":"EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing","authors":"C. Dinh, S. Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Keisuke Yoshida, Soichiro Okada, T. Onitsuka, S. Kawakami, S. Shimura, M. Muramatsu, Kosuke Yoshihara, J. Petersen, D. D. Simone, P. Foubert, G. Vandenberghe, L. Huli, Steven Grzeskowiak, Alexandra Krawicz, Nayoung Bae, Kanzo Kato, K. Nafus, Angélique Raley","doi":"10.2494/photopolymer.35.87","DOIUrl":"https://doi.org/10.2494/photopolymer.35.87","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78107535","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2022-01-01DOI: 10.2494/photopolymer.35.365
Takeshi Aizawa, Tasuku Sakurai, Khant Nyar Paing, Yusuke Kayamori, Y. Nakano, Yasunori Tanaka, T. Ishijima
{"title":"High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate","authors":"Takeshi Aizawa, Tasuku Sakurai, Khant Nyar Paing, Yusuke Kayamori, Y. Nakano, Yasunori Tanaka, T. Ishijima","doi":"10.2494/photopolymer.35.365","DOIUrl":"https://doi.org/10.2494/photopolymer.35.365","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80087345","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.505
Atsuki Hosaka, Tsubasa Miyaki, Y. Mizushima, Satomi Hamada, Ryota Koshino, A. Fukunaga, T. Sanada
This study investigates nodule deformation and contact area during PVA roller-type brush scrubbing to clarify their relationship with cross-contamination. Two high-speed video cameras with collimating LED light sources and an evanescent field on a prism enabled us to observe brush nodule deformation and contact area. Deformation analysis showed that the volume of a roller-type brush changes gradually at the beginning of compression, deforms more when vertically pushed at maximum compression, and then recovers rapidly at the end of compression. The brush contact area changes according to the brush and wafer rotation speed. The contact area can be categorized into three: the front, rear side face in the brush traveling direction, and vertically pushed bottom face on the surface. We analyzed the three types of brush contacts on a 100 mm type wafer and observed that the vertical compression type significantly affected the cross-contamination region.
{"title":"Nodule Deformation on Cleaning of PVA Roller Brushes and its Relation to Cross-contamination","authors":"Atsuki Hosaka, Tsubasa Miyaki, Y. Mizushima, Satomi Hamada, Ryota Koshino, A. Fukunaga, T. Sanada","doi":"10.2494/photopolymer.34.505","DOIUrl":"https://doi.org/10.2494/photopolymer.34.505","url":null,"abstract":"This study investigates nodule deformation and contact area during PVA roller-type brush scrubbing to clarify their relationship with cross-contamination. Two high-speed video cameras with collimating LED light sources and an evanescent field on a prism enabled us to observe brush nodule deformation and contact area. Deformation analysis showed that the volume of a roller-type brush changes gradually at the beginning of compression, deforms more when vertically pushed at maximum compression, and then recovers rapidly at the end of compression. The brush contact area changes according to the brush and wafer rotation speed. The contact area can be categorized into three: the front, rear side face in the brush traveling direction, and vertically pushed bottom face on the surface. We analyzed the three types of brush contacts on a 100 mm type wafer and observed that the vertical compression type significantly affected the cross-contamination region.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74006296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.439
Hayato Maeda, Y. Nabae, T. Hayakawa
This study aimed to form a perpendicularly orientated lamellar structure with polystyrene-block -poly(methyl methacrylate) (PS- b -PMMA) by its microphase separation on a polyimide substrate. Eight types of polyimides were prepared from different combinations of monomers and tested as the bottom layer for the microphase separation of PS- b -PMMA. The surface free energies of those polyimide substrates were evaluated by the Owens-Wendt method. Thin films of PS- b -PMMA were prepared on the polyimide substrates and the self-assembly was induced by thermal annealing, and the surface architecture was observed by atomic force microscopy. In the tested polyimide substrates, only one from 2,2-bis[4-(3,4-dicarboxyphenoxy) phenyl]propane dianhydride (tetracarboxylic dianhydride) and 1,12-bis (4-aminophenoxy) dodecane (diamine) showed a perpendicularly oriented lamellar structure. This polyimide substrate shows one of the smallest polar components in its surface free energy. Relatively large domain size and long correlation length in the PS- b -PMMA layer were obtained by optimizing the conditions for fabrication of the polyimide substrate, which were prepared by casting the polyimide onto a silicon wafer, followed by thermal annealing. These results suggest that the combination of one monomer with relatively large molecular weight, which will result in a low density of imide groups, and the other monomer with long alkyl chains, which will reduce the polarity of the resulting polyimide, contributes to providing a perpendicular orientation.
本研究旨在利用聚苯乙烯-嵌段聚甲基丙烯酸甲酯(PS- b - pmma)在聚酰亚胺基底上的微相分离形成垂直取向的层状结构。以不同的单体组合制备了8种不同类型的聚酰亚胺，并对其作为微相分离PS- b - pmma的底层进行了测试。用Owens-Wendt法计算了这些聚酰亚胺衬底的表面自由能。在聚酰亚胺基底上制备了PS- b - pmma薄膜，通过热退火诱导其自组装，并用原子力显微镜观察其表面结构。在测试的聚酰亚胺底物中，只有2,2-二[4-(3,4-二氧基苯氧基)苯基]丙烷二酐(四羧基二酐)和1,12-二(4-氨基苯氧基)十二烷(二胺)表现出垂直取向的层状结构。这种聚酰亚胺衬底在其表面自由能中显示出最小的极性组分之一。通过优化聚酰亚胺衬底的制备条件，将聚酰亚胺浇铸在硅片上，然后进行热处理，得到了较大的畴尺寸和较长的相关长度。这些结果表明，一个相对较大分子量的单体的组合将导致亚胺基团的密度低，而另一个具有长烷基链的单体的组合将降低所得聚酰亚胺的极性，有助于提供垂直取向。
{"title":"Orientation Control of the Microphase-separated Nanostructures of Block Copolymers on Polyimide Substrates","authors":"Hayato Maeda, Y. Nabae, T. Hayakawa","doi":"10.2494/photopolymer.34.439","DOIUrl":"https://doi.org/10.2494/photopolymer.34.439","url":null,"abstract":"This study aimed to form a perpendicularly orientated lamellar structure with polystyrene-block -poly(methyl methacrylate) (PS- b -PMMA) by its microphase separation on a polyimide substrate. Eight types of polyimides were prepared from different combinations of monomers and tested as the bottom layer for the microphase separation of PS- b -PMMA. The surface free energies of those polyimide substrates were evaluated by the Owens-Wendt method. Thin films of PS- b -PMMA were prepared on the polyimide substrates and the self-assembly was induced by thermal annealing, and the surface architecture was observed by atomic force microscopy. In the tested polyimide substrates, only one from 2,2-bis[4-(3,4-dicarboxyphenoxy) phenyl]propane dianhydride (tetracarboxylic dianhydride) and 1,12-bis (4-aminophenoxy) dodecane (diamine) showed a perpendicularly oriented lamellar structure. This polyimide substrate shows one of the smallest polar components in its surface free energy. Relatively large domain size and long correlation length in the PS- b -PMMA layer were obtained by optimizing the conditions for fabrication of the polyimide substrate, which were prepared by casting the polyimide onto a silicon wafer, followed by thermal annealing. These results suggest that the combination of one monomer with relatively large molecular weight, which will result in a low density of imide groups, and the other monomer with long alkyl chains, which will reduce the polarity of the resulting polyimide, contributes to providing a perpendicular orientation.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73034268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.219
H. Hayashi, Hideki Tachi, K. Suyama
We prepared a new polyphthalaldehyde (PPA) macromonomer by introducing a polymerizable methacryloyl group at the terminal of PPA main-chain. Resulting macromonomer was copolymerized with butyl acrylate to obtain pressure-sensitive adhesives (PSAs). We also compared the behavior of the copolymers with those of polymer blends of poly(butyl acrylate) and linear PPA polymers to clarify the role of polymerization. Higher peel strengths were observed for copolymers than those of corresponding polymer blends. As an increase in irradiation time, the strength generally decreased, although once increased for the copolymer films at the early stage. These results suggest that the introduction and the depolymerization of PPA side-chains caused drastic changes in adhesive properties.
{"title":"Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation","authors":"H. Hayashi, Hideki Tachi, K. Suyama","doi":"10.2494/photopolymer.34.219","DOIUrl":"https://doi.org/10.2494/photopolymer.34.219","url":null,"abstract":"We prepared a new polyphthalaldehyde (PPA) macromonomer by introducing a polymerizable methacryloyl group at the terminal of PPA main-chain. Resulting macromonomer was copolymerized with butyl acrylate to obtain pressure-sensitive adhesives (PSAs). We also compared the behavior of the copolymers with those of polymer blends of poly(butyl acrylate) and linear PPA polymers to clarify the role of polymerization. Higher peel strengths were observed for copolymers than those of corresponding polymer blends. As an increase in irradiation time, the strength generally decreased, although once increased for the copolymer films at the early stage. These results suggest that the introduction and the depolymerization of PPA side-chains caused drastic changes in adhesive properties.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74249396","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.351
D. Xue, M. Saito, I. Osaka, K. Marumoto
phenomenon, we hypothesize that energy transfer from 1,2-dioxetanedione to DNSE occurred momentarily in the THF and water solution because of their miscibility. Note that, in highly polar solvents, the emission of DNSE was not visualized, probably because the rate of chemiluminescent reaction is too fast to visually detect the emission caused by the miscibility of their solvents with water in comparison with the case observed using low-polarity solvents. Moreover, no emission was observed with ethyl acetate, although it is immiscible with water. This is probably because the reaction of ethyl acetate with hydrogen peroxide was faster than the oxidation of bis(2,4,6-trichlorophenyl) oxalate. As a result, DNSE was not excited because 1,2-dioxetanedione was not produced.
{"title":"Analyses of Charge Accumulation of PTzBT Ternary Polymer Solar Cells Using ESR Spectroscopy","authors":"D. Xue, M. Saito, I. Osaka, K. Marumoto","doi":"10.2494/photopolymer.34.351","DOIUrl":"https://doi.org/10.2494/photopolymer.34.351","url":null,"abstract":"phenomenon, we hypothesize that energy transfer from 1,2-dioxetanedione to DNSE occurred momentarily in the THF and water solution because of their miscibility. Note that, in highly polar solvents, the emission of DNSE was not visualized, probably because the rate of chemiluminescent reaction is too fast to visually detect the emission caused by the miscibility of their solvents with water in comparison with the case observed using low-polarity solvents. Moreover, no emission was observed with ethyl acetate, although it is immiscible with water. This is probably because the reaction of ethyl acetate with hydrogen peroxide was faster than the oxidation of bis(2,4,6-trichlorophenyl) oxalate. As a result, DNSE was not excited because 1,2-dioxetanedione was not produced.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78503331","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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