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Journal of Photopolymer Science and Technology最新文献

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Unimolecular Benzodioxole-based Photoinitiators for Free Radical and Cationic Photopolymerization Under LED Light Irradiation LED光照射下单分子苯二酚基自由基和阳离子光聚合引发剂研究
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.179
Mengqi Li, P. Hu, Junzhe Zhu, Ren Liu, Zhiquan Li
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引用次数: 0
Fabrication of Polyimide Nano-Particles by Precipitation Polymerization 沉淀聚合法制备聚酰亚胺纳米颗粒
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.271
Satoshi Kuretani, Y. Nabae, T. Hayakawa
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引用次数: 0
Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool 极紫外曝光仪合成含碘材料及其抗敏性能研究
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.41
Yutaro Iwashige, Hiroto Kudo, K. Okamoto, T. Kozawa
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引用次数: 0
Preparation of a Polysilane-(1-Pyrene)Methyl Methacrylate Copolymer 聚硅烷-(1-芘)甲基丙烯酸甲酯共聚物的制备
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.347
Y. Matsuura, Yuuri Higashide, Y. Takagishi, Masanobu Ohkita, Tomoharu Tachikawa
{"title":"Preparation of a Polysilane-(1-Pyrene)Methyl Methacrylate Copolymer","authors":"Y. Matsuura, Yuuri Higashide, Y. Takagishi, Masanobu Ohkita, Tomoharu Tachikawa","doi":"10.2494/photopolymer.35.347","DOIUrl":"https://doi.org/10.2494/photopolymer.35.347","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82163398","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process 磁控溅射法制备薄水铝石纳米阵列上生长的金纳米粒子表面增强拉曼散射衬底的评价
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.249
Takuzi Tanaka, Syunya Saegusa, Masayuki Naya, T. Fukuoka, Sho Amano, Y. Utsumi, A. Yamaguchi
{"title":"Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process","authors":"Takuzi Tanaka, Syunya Saegusa, Masayuki Naya, T. Fukuoka, Sho Amano, Y. Utsumi, A. Yamaguchi","doi":"10.2494/photopolymer.35.249","DOIUrl":"https://doi.org/10.2494/photopolymer.35.249","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89381951","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes 类金刚石碳膜生物相容性聚合物刷的表面功能化
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.303
Y. Sasai, D. Ousaka, Y. Fujii, Aoi Isono, Y. Yamauchi, S. Kondo, Tatsuyuki Nakatiani
{"title":"Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes","authors":"Y. Sasai, D. Ousaka, Y. Fujii, Aoi Isono, Y. Yamauchi, S. Kondo, Tatsuyuki Nakatiani","doi":"10.2494/photopolymer.35.303","DOIUrl":"https://doi.org/10.2494/photopolymer.35.303","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82943060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of UV-Light Irradiation on Charge-Accumulation States in PTzBT Polymer Solar Cells 紫外光照射对PTzBT聚合物太阳能电池电荷积累态的影响
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.193
D. Xue, Masahiko Saito, I. Osaka, K. Marumoto
{"title":"Effect of UV-Light Irradiation on Charge-Accumulation States in PTzBT Polymer Solar Cells","authors":"D. Xue, Masahiko Saito, I. Osaka, K. Marumoto","doi":"10.2494/photopolymer.35.193","DOIUrl":"https://doi.org/10.2494/photopolymer.35.193","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83037096","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Synthesis of the High Resolution i Line Novolak Resist 高分辨率i线诺瓦拉克阻片的合成
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.327
A. Sekiguchi, M. Hanabata, H. Minami, Y. Matsumoto, Yosuke Ohta, Fucheng Wang, Martin Z Ma, Zhiqiang Su
{"title":"The Synthesis of the High Resolution i Line Novolak Resist","authors":"A. Sekiguchi, M. Hanabata, H. Minami, Y. Matsumoto, Yosuke Ohta, Fucheng Wang, Martin Z Ma, Zhiqiang Su","doi":"10.2494/photopolymer.35.327","DOIUrl":"https://doi.org/10.2494/photopolymer.35.327","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82605773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Synthesis, Properties, and Photovoltaic Characteristics of Fluoranthenedione-containing Nonfullerene Acceptors for Organic Solar Cells 有机太阳能电池用含氟蒽二酮非富勒烯受体的合成、性质及光伏特性
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.187
Shreyam Chatterjee, Y. Ie
{"title":"Synthesis, Properties, and Photovoltaic Characteristics of Fluoranthenedione-containing Nonfullerene Acceptors for Organic Solar Cells","authors":"Shreyam Chatterjee, Y. Ie","doi":"10.2494/photopolymer.35.187","DOIUrl":"https://doi.org/10.2494/photopolymer.35.187","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86649830","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement EUV光刻技术中硒元素pag的高灵敏度研究进展
IF 0.8 4区 化学 Q3 Materials Science Pub Date : 2022-12-16 DOI: 10.2494/photopolymer.35.55
Tomohito Kizu, Shinji Yamakawa, Takeo Watanabe, S. Yasui, Tomoyuki Shibagaki
{"title":"Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement","authors":"Tomohito Kizu, Shinji Yamakawa, Takeo Watanabe, S. Yasui, Tomoyuki Shibagaki","doi":"10.2494/photopolymer.35.55","DOIUrl":"https://doi.org/10.2494/photopolymer.35.55","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77078740","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Journal of Photopolymer Science and Technology
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