首页 > 最新文献

Journal of Physics D最新文献

英文 中文
Influence of Operating Conditions on Electron Density in Atmospheric Pressure Helium Plasma Jets 大气压氦等离子体射流中工作条件对电子密度的影响
Pub Date : 2023-10-18 DOI: 10.1088/1361-6463/ad0479
wenwen xu, yonghang lu, xiaofeng Yue, xiaoping liu, Zhengwei Wu
Abstract In recent years, atmospheric-pressure plasma jets (APPJs) have emerged as valuable tools in many application areas, including material modification, environmental remediation and biomedicine. Understanding the discharge characteristics of these plasma jets under various operating conditions is crucial for optimizing process outcomes. This paper presents a two-dimensional fluid model for numerical simulation to study the variation in electron density within an atmospheric-pressure helium plasma jet under different operating conditions. The investigated parameters include helium gas flow rate, voltage amplitude, needle-to-ring discharge gap, and relative permittivity of the dielectric tube. The results reveal that the peak electric field and electron density initially occur at the wall of the dielectric tube and subsequently shift towards the head of the propagating jet. Gas flow rate has minimal impact on the electron density throughout the plasma jet, whereas increasing the needle-to-ring discharge gap significantly decreases the average electron density within the jet. In addition, an increase in the voltage amplitude and the relative permittivity of the dielectric tube enhances the electric field within the discharge space, thereby increasing the electron density in the plasma jet. These findings underscore the importance of understanding the correlation between electron density and operating conditions to precisely control plasma jets and enhance material treatment effectiveness for specific applications.
近年来,大气压等离子体射流(APPJs)在材料改性、环境修复和生物医学等许多应用领域都具有重要的应用价值。了解这些等离子体射流在各种操作条件下的放电特性对于优化工艺结果至关重要。本文建立了一个二维流体模型,用于数值模拟大气压氦等离子体射流在不同工作条件下的电子密度变化。研究的参数包括氦气流速、电压幅值、针环放电间隙和介电管的相对介电常数。结果表明,电场和电子密度的峰值最初出现在介质管壁上,随后向传播射流的头部移动。气体流速对整个等离子体射流的电子密度影响最小,而增大针环放电间隙会显著降低射流内的平均电子密度。此外,电压幅值和介质管相对介电常数的增加增强了放电空间内的电场,从而增加了等离子体射流中的电子密度。这些发现强调了理解电子密度和操作条件之间的相关性对于精确控制等离子体射流和提高特定应用的材料处理效率的重要性。
{"title":"Influence of Operating Conditions on Electron Density in Atmospheric Pressure Helium Plasma Jets","authors":"wenwen xu, yonghang lu, xiaofeng Yue, xiaoping liu, Zhengwei Wu","doi":"10.1088/1361-6463/ad0479","DOIUrl":"https://doi.org/10.1088/1361-6463/ad0479","url":null,"abstract":"Abstract In recent years, atmospheric-pressure plasma jets (APPJs) have emerged as valuable tools in many application areas, including material modification, environmental remediation and biomedicine. Understanding the discharge characteristics of these plasma jets under various operating conditions is crucial for optimizing process outcomes. This paper presents a two-dimensional fluid model for numerical simulation to study the variation in electron density within an atmospheric-pressure helium plasma jet under different operating conditions. The investigated parameters include helium gas flow rate, voltage amplitude, needle-to-ring discharge gap, and relative permittivity of the dielectric tube. The results reveal that the peak electric field and electron density initially occur at the wall of the dielectric tube and subsequently shift towards the head of the propagating jet. Gas flow rate has minimal impact on the electron density throughout the plasma jet, whereas increasing the needle-to-ring discharge gap significantly decreases the average electron density within the jet. In addition, an increase in the voltage amplitude and the relative permittivity of the dielectric tube enhances the electric field within the discharge space, thereby increasing the electron density in the plasma jet. These findings underscore the importance of understanding the correlation between electron density and operating conditions to precisely control plasma jets and enhance material treatment effectiveness for specific applications.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"43 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135824761","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Simultaneous dual-wavelength digital holographic microscopy as a tool for the analysis of keratoacanthoma skin samples 同时双波长数字全息显微镜作为分析角质棘瘤皮肤样本的工具
Pub Date : 2023-10-17 DOI: 10.1088/1361-6463/ad015c
Natalith Palacios-Ortega, Maria Del Socorro Hernandez-Montes, Fernando Mendoza Santoyo, Mauricio Flores-Moreno, Manuel De la Torre Ibarra, Daniel Luis-Noriega, Pedro G. Méndez-Sashida
Abstract A keratoacanthoma (KA) skin tumor is usually caused by sun exposure and may be an alert sign prior to the development of a more aggressive tumor or skin cancer. Studying the shape of the KA cells and their 3D rendering visualization are important parameters to prevent its evolution to higher stages of tumor cells or skin cancer. KA cells shape can be obtained through digital holographic microscopy; for that purpose, a setup with two illumination wavelengths (532 and 638 nm) is implemented to render a synthetic wavelength of 3.2 μ m that avoids wrapping the optical phase of the processed holograms and increases measurement range. To recover the optical phase, two off-axis digital holograms are simultaneously recorded at each wavelength. From the processed hologram height variations, the shape and length of KA cells, as well as the stratum corneum epidermal layer, are obtained as phase images. The results achieved aid to discriminate healthy from malignant cells.
角棘瘤(KA)皮肤肿瘤通常是由阳光照射引起的,可能是发展为更具侵袭性的肿瘤或皮肤癌之前的预警信号。研究KA细胞的形状及其三维渲染可视化是防止其向更高阶段的肿瘤细胞或皮肤癌发展的重要参数。通过数字全息显微镜可以获得KA细胞的形状;为此,实现了两个照明波长(532和638 nm)的设置,以呈现3.2 μ m的合成波长,避免了处理全息图的光学相位包裹,并增加了测量范围。为了恢复光相位,在每个波长同时记录两个离轴数字全息图。从处理后的全息图高度变化中,获得KA细胞的形状和长度以及角质层表皮层的相位图像。所取得的结果有助于区分健康细胞和恶性细胞。
{"title":"Simultaneous dual-wavelength digital holographic microscopy as a tool for the analysis of keratoacanthoma skin samples","authors":"Natalith Palacios-Ortega, Maria Del Socorro Hernandez-Montes, Fernando Mendoza Santoyo, Mauricio Flores-Moreno, Manuel De la Torre Ibarra, Daniel Luis-Noriega, Pedro G. Méndez-Sashida","doi":"10.1088/1361-6463/ad015c","DOIUrl":"https://doi.org/10.1088/1361-6463/ad015c","url":null,"abstract":"Abstract A keratoacanthoma (KA) skin tumor is usually caused by sun exposure and may be an alert sign prior to the development of a more aggressive tumor or skin cancer. Studying the shape of the KA cells and their 3D rendering visualization are important parameters to prevent its evolution to higher stages of tumor cells or skin cancer. KA cells shape can be obtained through digital holographic microscopy; for that purpose, a setup with two illumination wavelengths (532 and 638 nm) is implemented to render a synthetic wavelength of 3.2 μ m that avoids wrapping the optical phase of the processed holograms and increases measurement range. To recover the optical phase, two off-axis digital holograms are simultaneously recorded at each wavelength. From the processed hologram height variations, the shape and length of KA cells, as well as the stratum corneum epidermal layer, are obtained as phase images. The results achieved aid to discriminate healthy from malignant cells.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"53 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135944153","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma-Induced Reversible Surface Modification and its Impact on Oxygen Heterogeneous Recombination 等离子体诱导的可逆表面修饰及其对氧非均相复合的影响
Pub Date : 2023-10-16 DOI: 10.1088/1361-6463/ad039b
José Afonso, Luca Vialetto, Vasco Guerra, Pedro Viegas
Abstract A novel model is developed for atomic oxygen surface kinetics in silica-like walls, introducing a plasma-induced surface modification, which may impact intermediate pressure plasma reactors. The model is the first to reproduce experimental measurements in an oxygen glow discharge operating in the pressure range between 0.27 mbar (0.2 Torr) and 4 mbar (3 Torr), showing a decrease with pressure of the O recombination probability on Pyrex between 0.27 mbar and 1 mbar. The numerical simulations suggest that a modification is induced by the production and destruction of metastable chemisorption sites at the surface. As such, the Langmuir-Hinshelwood (L-H) and Eley-Rideal (E-R) recombination mechanisms take place involving not only physisorption (1) and stable chemisorption (2) sites, but also metastable chemisorption sites (3), produced by the impact of fast O2 ions and neutrals. The presence of metastable sites can be reversed by increasing the plasma pressure.
摘要建立了一种新的原子氧表面动力学模型,引入了等离子体诱导的表面修饰,这可能会影响中压等离子体反应器。该模型是第一个在0.27 mbar (0.2 Torr)和4 mbar (3 Torr)压力范围内的氧辉光放电中重现实验测量的模型,显示在0.27 mbar和1 mbar之间,Pyrex上的O重组概率随压力的降低而降低。数值模拟表明,表面亚稳化学吸附位点的产生和破坏引起了改性。因此,Langmuir-Hinshelwood (L-H)和Eley-Rideal (E-R)的重组机制不仅涉及物理吸附(1)和稳定的化学吸附(2)位点,还涉及由快速O2离子和中性离子的冲击产生的亚稳化学吸附位点(3)。亚稳部位的存在可以通过增加等离子体压力来逆转。
{"title":"Plasma-Induced Reversible Surface Modification and its Impact on Oxygen Heterogeneous Recombination","authors":"José Afonso, Luca Vialetto, Vasco Guerra, Pedro Viegas","doi":"10.1088/1361-6463/ad039b","DOIUrl":"https://doi.org/10.1088/1361-6463/ad039b","url":null,"abstract":"Abstract A novel model is developed for atomic oxygen surface kinetics in silica-like walls, introducing a plasma-induced surface modification, which may impact intermediate pressure plasma reactors. The model is the first to reproduce experimental measurements in an oxygen glow discharge operating in the pressure range between 0.27 mbar (0.2 Torr) and 4 mbar (3 Torr), showing a decrease with pressure of the O recombination probability on Pyrex between 0.27 mbar and 1 mbar. The numerical simulations suggest that a modification is induced by the production and destruction of metastable chemisorption sites at the surface. As such, the Langmuir-Hinshelwood (L-H) and Eley-Rideal (E-R) recombination mechanisms take place involving not only physisorption (1) and stable chemisorption (2) sites, but also metastable chemisorption sites (3), produced by the impact of fast O2 ions and neutrals. The presence of metastable sites can be reversed by increasing the plasma pressure.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"101 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136079743","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma Characteristics of Medium Voltage AC Air Arc Discharge and Its Application on Arc Electrical Parameters Calculation 中压交流空气电弧放电等离子体特性及其在电弧电学参数计算中的应用
Pub Date : 2023-10-16 DOI: 10.1088/1361-6463/ad00c8
Tong Zhou, Qing Yang, Tao Yuan, Hengxin He, Hongwen Liu
Abstract Medium voltage (MV) AC air arcs occur frequently in distribution networks. An electric arc can easily cause electrical fires, leading to serious accident consequences. Obtaining the electrical characteristics of arc faults through arc models is a crucial measure to detect and prevent arc faults. The arc electrical characteristics are affected by many factors such as the ambient air pressure, current magnitude, and arc length, and it is difficult to describe it in an analytical form. The widely used conventional black-box arc model reflects the influence of multiple factors on the electrical characteristics of arcs through fitting or empirical formulae. The model ignores the intrinsic physical and chemical processes, and the applicable range of the model is limited. Focusing on this problem, based on the physicochemical processes of the arc in the arcing and post-arcing stages, a relationship between the electrical and plasma characteristics of the MV AC air arc was established. Subsequently, the arc plasma characteristics were determined experimentally, and were applied to the calculation of the arc electric characteristics. Finally, the calculation results of the arc electrical characteristics were verified using the experimental results, providing a basis for related model improvements and applications.
配电网中压(MV)交流空气电弧是配电网中常见的电弧。电弧很容易引起电气火灾,导致严重的事故后果。通过电弧模型获取电弧故障的电特性是检测和预防电弧故障的关键措施。电弧电特性受环境气压、电流大小、电弧长度等诸多因素的影响,难以用解析形式描述。广泛使用的传统黑盒电弧模型通过拟合或经验公式来反映多种因素对电弧电特性的影响。该模型忽略了内在的物理和化学过程,模型的适用范围有限。针对这一问题,基于电弧在电弧前后阶段的物理化学过程,建立了中压交流空气电弧的电特性与等离子体特性之间的关系。实验确定了电弧等离子体的特性,并将其应用于电弧电特性的计算。最后,利用实验结果验证了电弧电特性的计算结果,为相关模型的改进和应用提供了依据。
{"title":"Plasma Characteristics of Medium Voltage AC Air Arc Discharge and Its Application on Arc Electrical Parameters Calculation","authors":"Tong Zhou, Qing Yang, Tao Yuan, Hengxin He, Hongwen Liu","doi":"10.1088/1361-6463/ad00c8","DOIUrl":"https://doi.org/10.1088/1361-6463/ad00c8","url":null,"abstract":"Abstract Medium voltage (MV) AC air arcs occur frequently in distribution networks. An electric arc can easily cause electrical fires, leading to serious accident consequences. Obtaining the electrical characteristics of arc faults through arc models is a crucial measure to detect and prevent arc faults. The arc electrical characteristics are affected by many factors such as the ambient air pressure, current magnitude, and arc length, and it is difficult to describe it in an analytical form. The widely used conventional black-box arc model reflects the influence of multiple factors on the electrical characteristics of arcs through fitting or empirical formulae. The model ignores the intrinsic physical and chemical processes, and the applicable range of the model is limited. Focusing on this problem, based on the physicochemical processes of the arc in the arcing and post-arcing stages, a relationship between the electrical and plasma characteristics of the MV AC air arc was established. Subsequently, the arc plasma characteristics were determined experimentally, and were applied to the calculation of the arc electric characteristics. Finally, the calculation results of the arc electrical characteristics were verified using the experimental results, providing a basis for related model improvements and applications.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136077734","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Low Voltage Drop AlGaN UV-A Laser Structures with Transparent Tunnel Junctions and Optimized Quantum Wells 具有透明隧道结和优化量子阱的低电压降AlGaN UV-A激光器结构
Pub Date : 2023-10-16 DOI: 10.1088/1361-6463/ad039c
Arnob Ghosh, Agnes Maneesha Dominic Merwin Xavier, Syed M N Hasan, Sheikh Ifatur Rahman, Alex Blackston, Andrew A Allerman, Roberto C Myers, Siddharth Rajan, Shamsul Arafin
Abstract This paper presents the design, material growth and fabrication of AlGaN laser structures grown by plasma-assisted molecular beam epitaxy. Considering hole transport to be the major challenge, our ultraviolet-A diode laser structures have a compositionally graded transparent tunnel junction, resulting in superior hole injection and a low contact resistance. By optimizing active region thickness, a five-fold improvement in photoluminescence intensity is obtained compared to that of our own non-optimized test structures. The electrical and optical characteristics of processed devices demonstrate only spontaneous emission with a peak wavelength at 354 nm. The devices operate up to a continuous-wave current density of 11.1 kA/cm2 at room temperature, which is the highest reported for laser structures grown on AlGaN templates. Additionally, they exhibit a record-low voltage drop of 8.5 V to achieve this current density.
摘要本文介绍了等离子体辅助分子束外延生长AlGaN激光结构的设计、材料生长和制备。考虑到空穴输运是主要的挑战,我们的紫外- a二极管激光器结构具有成分渐变的透明隧道结,从而产生优越的空穴注入和低接触电阻。通过优化活性区厚度,光致发光强度比我们自己未优化的测试结构提高了5倍。处理后的器件的电学和光学特性仅表现出峰值波长为354nm的自发发射。该器件在室温下的连续波电流密度可达11.1 kA/cm2,这是在AlGaN模板上生长的激光结构的最高报道。此外,它们表现出创纪录的低电压降8.5 V,以实现这种电流密度。
{"title":"Low Voltage Drop AlGaN UV-A Laser Structures with Transparent Tunnel Junctions and Optimized Quantum Wells","authors":"Arnob Ghosh, Agnes Maneesha Dominic Merwin Xavier, Syed M N Hasan, Sheikh Ifatur Rahman, Alex Blackston, Andrew A Allerman, Roberto C Myers, Siddharth Rajan, Shamsul Arafin","doi":"10.1088/1361-6463/ad039c","DOIUrl":"https://doi.org/10.1088/1361-6463/ad039c","url":null,"abstract":"Abstract This paper presents the design, material growth and fabrication of AlGaN laser structures grown by plasma-assisted molecular beam epitaxy. Considering hole transport to be the major challenge, our ultraviolet-A diode laser structures have a compositionally graded transparent tunnel junction, resulting in superior hole injection and a low contact resistance. By optimizing active region thickness, a five-fold improvement in photoluminescence intensity is obtained compared to that of our own non-optimized test structures. The electrical and optical characteristics of processed devices demonstrate only spontaneous emission with a peak wavelength at 354 nm. The devices operate up to a continuous-wave current density of 11.1 kA/cm2 at room temperature, which is the highest reported for laser structures grown on AlGaN templates. Additionally, they exhibit a record-low voltage drop of 8.5 V to achieve this current density.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"136079744","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A compact low-frequency sound absorption metastructure realized by resonators with wavy bending necks 一种由波纹弯曲颈谐振器实现的紧凑的低频吸声元结构
Pub Date : 2023-10-13 DOI: 10.1088/1361-6463/ad0309
Songyi Zhang, Ailing Song, Shuai Wang, Xinhai Yu
Abstract In this work, a compact low-frequency sound absorption metastructure composed of multiple resonators with embedded wavy bending necks is proposed. By arranging this metastructure in parallel and optimizing the parameters, it exhibits excellent broadband sound absorption capability in low-frequency range and has a much more compact volume. Compared with the traditional resonators, an individual resonator of this metastructure can move down the absorption frequency about 120 Hz while maintaining the same thickness. Furthermore, different resonator units are combined into a sound absorption array by employing appropriate design techniques. We first built a small metastructure composed of four units to demonstrate the correctness and accuracy of our design method. Both theoretical models and finite element simulation models are built and experimental results show good agreement between them. To achieve the same absorption value and frequency range, the thickest resonator in the traditional resonator array must be 30% thicker than the one in the wavy bending neck resonator array, which means the overall size of the structure is 30% larger. Following this design method, perfect sound absorption within the frequency range of 248 Hz to 420 Hz is achieved with a compact volume of 53 mm in radius and 47 mm in height. The design strategy presents a new approach to achieve perfect broadband low-frequency sound absorption.
摘要:本文提出了一种由多谐振器组成的紧凑的低频吸声元结构。通过对该结构的平行排列和参数优化,使其在低频范围内具有良好的宽带吸声性能,并且具有更紧凑的体积。与传统谐振器相比,该元结构的单个谐振器在保持厚度不变的情况下,可以将吸收频率降低约120 Hz。此外,采用适当的设计技术,将不同的谐振器单元组合成一个吸声阵列。我们首先构建了一个由四个单元组成的小元结构来证明我们的设计方法的正确性和准确性。建立了理论模型和有限元仿真模型,实验结果表明两者吻合较好。为了达到相同的吸收值和频率范围,传统谐振器阵列中最厚的谐振器必须比波浪形弯颈谐振器阵列中最厚的谐振器厚30%,这意味着结构的整体尺寸要大30%。采用这种设计方法,以半径53毫米、高度47毫米的紧凑体积,在248赫兹至420赫兹的频率范围内实现了完美的吸声。该设计策略为实现宽带低频吸声提供了一种新的途径。
{"title":"A compact low-frequency sound absorption metastructure realized by resonators with wavy bending necks","authors":"Songyi Zhang, Ailing Song, Shuai Wang, Xinhai Yu","doi":"10.1088/1361-6463/ad0309","DOIUrl":"https://doi.org/10.1088/1361-6463/ad0309","url":null,"abstract":"Abstract In this work, a compact low-frequency sound absorption metastructure composed of multiple resonators with embedded wavy bending necks is proposed. By arranging this metastructure in parallel and optimizing the parameters, it exhibits excellent broadband sound absorption capability in low-frequency range and has a much more compact volume. Compared with the traditional resonators, an individual resonator of this metastructure can move down the absorption frequency about 120 Hz while maintaining the same thickness. Furthermore, different resonator units are combined into a sound absorption array by employing appropriate design techniques. We first built a small metastructure composed of four units to demonstrate the correctness and accuracy of our design method. Both theoretical models and finite element simulation models are built and experimental results show good agreement between them. To achieve the same absorption value and frequency range, the thickest resonator in the traditional resonator array must be 30% thicker than the one in the wavy bending neck resonator array, which means the overall size of the structure is 30% larger. Following this design method, perfect sound absorption within the frequency range of 248 Hz to 420 Hz is achieved with a compact volume of 53 mm in radius and 47 mm in height. The design strategy presents a new approach to achieve perfect broadband low-frequency sound absorption.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"42 2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135853138","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Flexible Dielectric Spacer with Tunable Dielectric Properties for Metamaterial Absorber Application 具有可调介电特性的柔性介电间隔材料在超材料吸收中的应用
Pub Date : 2023-10-13 DOI: 10.1088/1361-6463/ad030e
KAJAL CHAUDHARY, Sudha Malik, Gaganpreet Singh, Sudeb Bhattacharya, J Ramkumar, S Anantha Ramakrishna, Kumar Vaibhav Srivastava
Abstract The development of the flexible and robust metamaterial absorber is the great motivation for the new generation of microwave absorbers covering any conformal shape. The ceramic-polymer composites with variable dielectric constant within the microwave frequencies are proposed as a flexible middle dielectric spacer (MDS) layer to provide additional degree of design freedom for metamaterial absorber application. By varying the dielectric constant of MDS layer, the resonance band of metamaterial absorber can be tuned while retaining a low profile besides enhancing its EM performance for TM polarized wave. To formulate these composites, tetragonal structured Barium Titanate ( BaTiO3) powder is selected as an excellent candidate when mixed with elastomer Polydimethylsiloxane (PDMS) resulting in high mechanical strength substrates. Experimentally, samples with a range of dielectric permittivity from 2.81 to 5.67 were obtained for 0% to 20% volume fill fraction of BaTiO3 in PDMS. The obtained dielectric permittivities being consistent with Bruggeman effective medium theory. Utilizing an optimized composition (10% BaTiO3 ), resulting in εr = 4 substrate, an X-band flexible absorber is designed and fabricated to absorb more than 90% of incident EM waves within frequency band of 8.16-12.12 GHz.
柔性和鲁棒的超材料吸收体的发展是新一代微波吸收体覆盖任何保形的巨大动力。提出了在微波频率范围内具有可变介电常数的陶瓷-聚合物复合材料作为柔性中间介电间隔层(MDS),为超材料吸收器的应用提供了额外的设计自由度。通过改变MDS层的介电常数,可以在保持低轮廓的同时调节超材料吸波器的共振带,提高其对TM极化波的电磁性能。为了制备这些复合材料,选择了四边形结构的钛酸钡(BaTiO3)粉末与弹性体聚二甲基硅氧烷(PDMS)混合,从而获得高机械强度的基材。实验结果表明,当BaTiO3在PDMS中体积填充率为0% ~ 20%时,得到介电常数范围为2.81 ~ 5.67的样品。得到的介电常数符合Bruggeman有效介质理论。利用优化组合物(10% BaTiO3),得到εr = 4衬底,设计并制作了x波段柔性吸波器,在8.16 ~ 12.12 GHz频段吸收90%以上的入射电磁波。
{"title":"Flexible Dielectric Spacer with Tunable Dielectric Properties for Metamaterial Absorber Application","authors":"KAJAL CHAUDHARY, Sudha Malik, Gaganpreet Singh, Sudeb Bhattacharya, J Ramkumar, S Anantha Ramakrishna, Kumar Vaibhav Srivastava","doi":"10.1088/1361-6463/ad030e","DOIUrl":"https://doi.org/10.1088/1361-6463/ad030e","url":null,"abstract":"Abstract The development of the flexible and robust metamaterial absorber is the great motivation for the new generation of microwave absorbers covering any conformal shape. The ceramic-polymer composites with variable dielectric constant within the microwave frequencies are proposed as a flexible middle dielectric spacer (MDS) layer to provide additional degree of design freedom for metamaterial absorber application. By varying the dielectric constant of MDS layer, the resonance band of metamaterial absorber can be tuned while retaining a low profile besides enhancing its EM performance for TM polarized wave. To formulate these composites, tetragonal structured Barium Titanate ( BaTiO3) powder is selected as an excellent candidate when mixed with elastomer Polydimethylsiloxane (PDMS) resulting in high mechanical strength substrates. Experimentally, samples with a range of dielectric permittivity from 2.81 to 5.67 were obtained for 0% to 20% volume fill fraction of BaTiO3 in PDMS. The obtained dielectric permittivities being consistent with Bruggeman effective medium theory. Utilizing an optimized composition (10% BaTiO3 ), resulting in εr = 4 substrate, an X-band flexible absorber is designed and fabricated to absorb more than 90% of incident EM waves within frequency band of 8.16-12.12 GHz.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"118 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135853434","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Influence of thiourea concentration during deposition of a CdS buffer layer on the electric properties of Cu2SnS3 solar cells CdS缓冲层沉积过程中硫脲浓度对Cu2SnS3太阳能电池电性能的影响
Pub Date : 2023-10-13 DOI: 10.1088/1361-6463/ad00c7
Ayaka Kanai, Soichiro Saito, Araki Hideaki, Kunihiko Tanaka
Abstract The p–n interface state and depletion layer region of solar cells were investigated using electrochemical impedance spectroscopy (EIS) measurements to elucidate the effect of varying thiourea (TU) concentrations in chemical bath deposition (CBD) on the photovoltaic properties of Cu 2 SnS 3 (CTS) solar cells. The photoconversion efficiency (PCE) increased as the TU concentration increased, peaking at 0.16 M and decreasing thereafter. Additionally, the constant phase element- p value, which is indicative of the p–n interface state in CTS solar cells, exhibited a similar trend to that of the PCE of CTS solar cells with increasing TU concentration. The decrease in the PCE was due to the electron recombination that occurred at the p–n interface of CTS solar cells with increasing TU concentrations. Therefore, to improve the PCE of the CTS solar cells, the TU concentration in CBD must be optimized because the p–n interface state is sensitive to changes in the growth conditions of CdS films. By studying the effects on the p–n interface state and depletion layer in CTS solar cells using EIS measurements, useful knowledge can be obtained to increase the PCE of all-sulfide-compound solar cells using n-type CdS films as well as CTS.
摘要利用电化学阻抗谱(EIS)研究了太阳能电池的p-n界面态和耗尽层区域,以阐明化学浴沉积(CBD)中不同硫脲(TU)浓度对CTS太阳能电池光伏性能的影响。光转换效率(PCE)随TU浓度的增加而增加,在0.16 M处达到峰值,之后逐渐下降。此外,随着TU浓度的增加,反映CTS太阳电池中p - n界面状态的恒相元- p值与CTS太阳电池的PCE值呈现相似的趋势。PCE的下降是由于碳纳米管太阳能电池的p-n界面随着TU浓度的增加而发生电子重组。因此,为了提高CTS太阳能电池的PCE,必须优化CBD中的TU浓度,因为p-n界面态对CdS膜生长条件的变化很敏感。通过利用EIS测量研究对CTS太阳能电池中p-n界面态和耗尽层的影响,可以获得使用n型CdS薄膜和CTS提高全硫化物化合物太阳能电池PCE的有用知识。
{"title":"Influence of thiourea concentration during deposition of a CdS buffer layer on the electric properties of Cu<sub>2</sub>SnS<sub>3</sub> solar cells","authors":"Ayaka Kanai, Soichiro Saito, Araki Hideaki, Kunihiko Tanaka","doi":"10.1088/1361-6463/ad00c7","DOIUrl":"https://doi.org/10.1088/1361-6463/ad00c7","url":null,"abstract":"Abstract The p–n interface state and depletion layer region of solar cells were investigated using electrochemical impedance spectroscopy (EIS) measurements to elucidate the effect of varying thiourea (TU) concentrations in chemical bath deposition (CBD) on the photovoltaic properties of Cu 2 SnS 3 (CTS) solar cells. The photoconversion efficiency (PCE) increased as the TU concentration increased, peaking at 0.16 M and decreasing thereafter. Additionally, the constant phase element- p value, which is indicative of the p–n interface state in CTS solar cells, exhibited a similar trend to that of the PCE of CTS solar cells with increasing TU concentration. The decrease in the PCE was due to the electron recombination that occurred at the p–n interface of CTS solar cells with increasing TU concentrations. Therefore, to improve the PCE of the CTS solar cells, the TU concentration in CBD must be optimized because the p–n interface state is sensitive to changes in the growth conditions of CdS films. By studying the effects on the p–n interface state and depletion layer in CTS solar cells using EIS measurements, useful knowledge can be obtained to increase the PCE of all-sulfide-compound solar cells using n-type CdS films as well as CTS.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135805679","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Structural, dielectric, and optical properties based on Spinel Ferrite (Mn0.5Fe1.5Mg0.5Ni0.5O4) nanoparticles filler reinforced PVA for optoelectronic, laser CUT-OFF filters and energy storage devices. 基于尖晶石铁氧体(Mn0.5Fe1.5Mg0.5Ni0.5O4)纳米颗粒填料增强PVA的光电、激光截止滤波器和储能器件的结构、介电和光学性能
Pub Date : 2023-10-13 DOI: 10.1088/1361-6463/ad030b
E. A. Rabiea, Aly Samy Abouhaswa, Hala Abomostafa
Abstract The fabrication of polymer nanocomposites with specialized traits is gaining popularity across the world due to novel added qualities. In this work we used a flash auto-combustion method to prepare Mn0.5Fe1.5Mg0.5Ni0.5O4 nanoparticles and the casting method to prepare Mn0.5Fe1.5Mg0.5Ni0.5O4/PVA nanocomposite polymer films with doping of nanoparticles various from 1–5 wt. %. The effect of Mn0.5Fe1.5Mg0.5Ni0.5O4 nanoparticles addition on the structural, optical, and dielectric characteristics of nanocomposite polymer films was analyzed. The structural properties were studied using X-ray diffraction pattern (XRD), high resolution transmission electron microscope (HRTEM), Fourier transform infrared (FTIR), and field emission scanning electron microscope (FESEM). The effects of nanoparticles doping on ac conductivity, electric modulus, impedance, and dielectric constant were investigated. It shows that Mn0.5Fe1.5Mg0.5Ni0.5O4/PVA nanocomposite films have higher values of permittivity and ac conductivity than PVA and exhibit lower values of dielectric loss, electric modulus, and impedance. The optical properties showed the indirect optical decreased from 4.8 to 4.4 eV. According to the experimental results, these nanocomposite polymer films show promise for laser CUT-OFF filters and energy storage devices.
具有特殊特性的聚合物纳米复合材料由于具有新的附加特性而在世界范围内越来越受欢迎。本文采用闪速自燃烧法制备了Mn0.5Fe1.5Mg0.5Ni0.5O4纳米颗粒,并采用浇铸法制备了掺杂1-5 wt. %纳米颗粒的Mn0.5Fe1.5Mg0.5Ni0.5O4/PVA纳米复合聚合物薄膜。分析了Mn0.5Fe1.5Mg0.5Ni0.5O4纳米粒子的加入对纳米复合聚合物薄膜结构、光学和介电特性的影响。采用x射线衍射图(XRD)、高分辨透射电子显微镜(HRTEM)、傅里叶变换红外(FTIR)和场发射扫描电子显微镜(FESEM)研究了其结构性质。研究了纳米颗粒掺杂对导电率、电模量、阻抗和介电常数的影响。结果表明,Mn0.5Fe1.5Mg0.5Ni0.5O4/PVA纳米复合膜具有比PVA更高的介电常数和交流电导率,具有更低的介电损耗、电模量和阻抗。光学性质表明间接光学从4.8 eV降低到4.4 eV。实验结果表明,这些纳米复合聚合物薄膜在激光截止滤光片和储能器件方面具有广阔的应用前景。
{"title":"Structural, dielectric, and optical properties based on Spinel Ferrite (Mn0.5Fe1.5Mg0.5Ni0.5O4) nanoparticles filler reinforced PVA for optoelectronic, laser CUT-OFF filters and energy storage devices.","authors":"E. A. Rabiea, Aly Samy Abouhaswa, Hala Abomostafa","doi":"10.1088/1361-6463/ad030b","DOIUrl":"https://doi.org/10.1088/1361-6463/ad030b","url":null,"abstract":"Abstract The fabrication of polymer nanocomposites with specialized traits is gaining popularity across the world due to novel added qualities. In this work we used a flash auto-combustion method to prepare Mn0.5Fe1.5Mg0.5Ni0.5O4 nanoparticles and the casting method to prepare Mn0.5Fe1.5Mg0.5Ni0.5O4/PVA nanocomposite polymer films with doping of nanoparticles various from 1–5 wt. %. The effect of Mn0.5Fe1.5Mg0.5Ni0.5O4 nanoparticles addition on the structural, optical, and dielectric characteristics of nanocomposite polymer films was analyzed. The structural properties were studied using X-ray diffraction pattern (XRD), high resolution transmission electron microscope (HRTEM), Fourier transform infrared (FTIR), and field emission scanning electron microscope (FESEM). The effects of nanoparticles doping on ac conductivity, electric modulus, impedance, and dielectric constant were investigated. It shows that Mn0.5Fe1.5Mg0.5Ni0.5O4/PVA nanocomposite films have higher values of permittivity and ac conductivity than PVA and exhibit lower values of dielectric loss, electric modulus, and impedance. The optical properties showed the indirect optical decreased from 4.8 to 4.4 eV. According to the experimental results, these nanocomposite polymer films show promise for laser CUT-OFF filters and energy storage devices.","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135854037","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Design of Sn-doped cadmium chalcogenide based monolayers for valleytronics properties 基于谷电子性能的锡掺杂硫系镉单层材料的设计
Pub Date : 2023-10-13 DOI: 10.1088/1361-6463/ad0308
Sutapa Chattopadhyay, Anjali Kshirsagar
Abstract Valleytronics has emerged as an interesting field of research in two-dimensional (2D) systems and uses the valley index or valley pseudospin to encode information. Spin-orbit coupling (SOC) and inversion symmetry breaking leads to spin-splitting of bands near the valleys. This property has promising device applications.&#xD;In order to find a new 2D material useful for valleytronics, we have designed hexagonal planar monolayers of cadmium chalcogenides (CdX, X = S, Se, Te) from the (111) surface of bulk CdX zinc blende structure. The structural, dynamic, mechanical and thermal stability of these structures is confirmed. Band structure study reveals valence band local maxima (valleys) at K and K′ symmetry points. Application of SOC initiates spin-splitting in the valleys that lifts the energy degeneracy and shows strong valley-spin coupling character. To initiate stronger SOC, we have substituted two Cd atoms in the almost planar monolayers by Sn atoms which increases the spin-splitting significantly. Zeeman-type spin-splitting is observed in the valley region and Rashba spin-splitting is observed at the Γ point for Sn-doped CdSe and CdTe monolayers. Berry curvature values are more in all the Sn-doped monolayers than the pristine monolayers. These newly designed monolayers are thus found to be suitable for valleytronics applications. Sn-doped monolayers show band inversion deep in the valence and conduction bands between Sn s and p and X p states but lack topological properties.&#xD;&#xD;
谷电子学是二维系统中一个有趣的研究领域,它使用谷指数或谷伪自旋来编码信息。自旋轨道耦合(SOC)和反转对称破缺导致了谷附近能带的自旋分裂。这一性质具有很好的器件应用前景。 为了找到一种新的用于谷电子的二维材料,我们从块状CdX锌闪锌矿结构的(111)表面设计了六方平面单层镉硫族化合物(CdX, X = S, Se, Te)。确定了这些结构的结构稳定性、动力稳定性、力学稳定性和热稳定性。带结构研究揭示了价带在K和K′对称点处的局部最大值(谷)。SOC的应用引发了谷中的自旋分裂,提高了能量简并性,表现出较强的谷-自旋耦合特性。为了引发更强的SOC,我们用Sn原子取代了几乎是平面的单层中的两个Cd原子,这大大增加了自旋分裂。掺杂锡的CdSe和CdTe单层在谷区观察到zeeman型自旋分裂,在Γ点观察到Rashba自旋分裂。所有掺杂锡的单分子膜的Berry曲率值都大于未掺杂锡的单分子膜。因此,这些新设计的单分子层被发现适用于谷电子应用。掺杂锡的单层膜在锡s、p态和p态之间的价带和导带深处显示出能带反转,但缺乏拓扑性质。
{"title":"Design of Sn-doped cadmium chalcogenide based monolayers for valleytronics properties","authors":"Sutapa Chattopadhyay, Anjali Kshirsagar","doi":"10.1088/1361-6463/ad0308","DOIUrl":"https://doi.org/10.1088/1361-6463/ad0308","url":null,"abstract":"Abstract Valleytronics has emerged as an interesting field of research in two-dimensional (2D) systems and uses the valley index or valley pseudospin to encode information. Spin-orbit coupling (SOC) and inversion symmetry breaking leads to spin-splitting of bands near the valleys. This property has promising device applications.&amp;#xD;In order to find a new 2D material useful for valleytronics, we have designed hexagonal planar monolayers of cadmium chalcogenides (CdX, X = S, Se, Te) from the (111) surface of bulk CdX zinc blende structure. The structural, dynamic, mechanical and thermal stability of these structures is confirmed. Band structure study reveals valence band local maxima (valleys) at K and K′ symmetry points. Application of SOC initiates spin-splitting in the valleys that lifts the energy degeneracy and shows strong valley-spin coupling character. To initiate stronger SOC, we have substituted two Cd atoms in the almost planar monolayers by Sn atoms which increases the spin-splitting significantly. Zeeman-type spin-splitting is observed in the valley region and Rashba spin-splitting is observed at the Γ point for Sn-doped CdSe and CdTe monolayers. Berry curvature values are more in all the Sn-doped monolayers than the pristine monolayers. These newly designed monolayers are thus found to be suitable for valleytronics applications. Sn-doped monolayers show band inversion deep in the valence and conduction bands between Sn s and p and X p states but lack topological properties.&amp;#xD;&amp;#xD;","PeriodicalId":16833,"journal":{"name":"Journal of Physics D","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2023-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"135853618","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
Journal of Physics D
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1