The optical fabrication process has been traditionally labor intensive. With the advent of computer controlled machinery in the past decade steps have been taken to automate the optical fabrication process in specific cases. High speed fabrication facilities exist in most large optics companies for production of spherical surfaces with a few rings of power and irregularity. These facilities still require a great deal of labor intensive set up to initially produce the desired surface and then subsequent monitoring of the surfaces to determine if the surfaces are within the tolerance band. The subject of this work is to determine to what extent it is feasible to automate the set up and quality control using computer controlled machinery. The types of parts which are being considered are spherical surfaces on glass workpieces with diameters of from one half to three inches. Almost any radius of curvature surface can be produced.
{"title":"Optical Surfacing Center Using Computer Controlled Machinery","authors":"L. G. Atkinson, D. Moore","doi":"10.1364/oft.1984.thda1","DOIUrl":"https://doi.org/10.1364/oft.1984.thda1","url":null,"abstract":"The optical fabrication process has been traditionally labor intensive. With the advent of computer controlled machinery in the past decade steps have been taken to automate the optical fabrication process in specific cases. High speed fabrication facilities exist in most large optics companies for production of spherical surfaces with a few rings of power and irregularity. These facilities still require a great deal of labor intensive set up to initially produce the desired surface and then subsequent monitoring of the surfaces to determine if the surfaces are within the tolerance band. The subject of this work is to determine to what extent it is feasible to automate the set up and quality control using computer controlled machinery. The types of parts which are being considered are spherical surfaces on glass workpieces with diameters of from one half to three inches. Almost any radius of curvature surface can be produced.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131927732","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Mentzer, R. Hunsperger, J. Bartko, J. Zavada, H. Jenkinson
Free carrier compensation by ion implantation is an important fabrication technology for the formation of infrared optical waveguides for a variety of applications. Gallium arsenide is a very attractive substrate material for optical fabrication since it is transparent out to the far infrared. In addition, GaAs, together with its related ternary and quarternary compounds, has many of the optical and electronic properties necessary for integration of optical devices into sensing and signal processing circuits. This will afford the ultimate merger of the VLSI electronics and GaAs optoelectronics, as well as the monolithic integration of microwave electronic devices such as gunn diodes and Schottky gate FET's, with GaAs optical components. Experiments were performed to characterize the influence of various H+ implantation parameters on the carrier compensation process and to relate the resulting optical effects to electronic changes. The design techniques utilized are applicable from 1 to 12 micron operating wavelengths and may be utilized in a variety of specific device applications.
{"title":"Infrared ION Implanted GaAs Optics","authors":"M. Mentzer, R. Hunsperger, J. Bartko, J. Zavada, H. Jenkinson","doi":"10.1364/oft.1984.thdb3","DOIUrl":"https://doi.org/10.1364/oft.1984.thdb3","url":null,"abstract":"Free carrier compensation by ion implantation is an important fabrication technology for the formation of infrared optical waveguides for a variety of applications. Gallium arsenide is a very attractive substrate material for optical fabrication since it is transparent out to the far infrared. In addition, GaAs, together with its related ternary and quarternary compounds, has many of the optical and electronic properties necessary for integration of optical devices into sensing and signal processing circuits. This will afford the ultimate merger of the VLSI electronics and GaAs optoelectronics, as well as the monolithic integration of microwave electronic devices such as gunn diodes and Schottky gate FET's, with GaAs optical components. Experiments were performed to characterize the influence of various H+ implantation parameters on the carrier compensation process and to relate the resulting optical effects to electronic changes. The design techniques utilized are applicable from 1 to 12 micron operating wavelengths and may be utilized in a variety of specific device applications.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"60 24","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134126874","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A scan lens test bench must be adaptable to the wide range of sizes, formats, and wavelengths of scan lenses manufactured today. In addition, it's metrology must be capable of accurately measuring angles and distances for verification of scan linearity. All of the above were carefully considered in the design and fabrication of this bench. Fringe counting interferometry is employed for monitoring linear and angular motions. Attached to a fringe counter via a tangent arm, a flat mirror, pivoting at the test lens' entrance pupil location, is used to accurately deflect the input beam to the desired scan angles within a few seconds of arc. Since the beam deflection is produced with the pivoting mirror, the laser and beam expander optics are stationary. Therefore, virtually any laser and beam expander can be adapted to the setup. This simplifies the selection of desired wavelengths and input beam sizes. Adapter plates facilitate mounting of lenses having a wide range of sizes. Long precision linear slide motions are used to accommodate larger format lenses. The design, fabrication, alignment, and use of this test bench will be discussed.
{"title":"Versatile, High Accuracy Scan Lens Test Bench","authors":"Wayne M. Richard, Glenn Parker","doi":"10.1364/oft.1987.thbb7","DOIUrl":"https://doi.org/10.1364/oft.1987.thbb7","url":null,"abstract":"A scan lens test bench must be adaptable to the wide range of sizes, formats, and wavelengths of scan lenses manufactured today. In addition, it's metrology must be capable of accurately measuring angles and distances for verification of scan linearity. All of the above were carefully considered in the design and fabrication of this bench. Fringe counting interferometry is employed for monitoring linear and angular motions. Attached to a fringe counter via a tangent arm, a flat mirror, pivoting at the test lens' entrance pupil location, is used to accurately deflect the input beam to the desired scan angles within a few seconds of arc. Since the beam deflection is produced with the pivoting mirror, the laser and beam expander optics are stationary. Therefore, virtually any laser and beam expander can be adapted to the setup. This simplifies the selection of desired wavelengths and input beam sizes. Adapter plates facilitate mounting of lenses having a wide range of sizes. Long precision linear slide motions are used to accommodate larger format lenses. The design, fabrication, alignment, and use of this test bench will be discussed.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"99 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134276473","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Optical components such as lens elements require progressively better protection during their processing to prevent chipping, rubbing, or other damage. Shallow trays with foam or paper lining and cardboard separators are commonly used, but as optical surfaces are polished and coated, the parts become very delicate and can easily be damaged as they slide, particularly on their convex surfaces, on flat tray bottoms. Polished and/or coated optical components are often individually wrapped in tissue paper and/or sealed in bags for protection between final process/inspection steps, but wrapping, unwrapping, re-wrapping, etc. are very time-consuming and costly, and the parts can be easily dropped and damaged.
{"title":"Multi-step Universal Optical Component Tray","authors":"R. Hartmann","doi":"10.1364/oft.1986.wa2","DOIUrl":"https://doi.org/10.1364/oft.1986.wa2","url":null,"abstract":"Optical components such as lens elements require progressively better protection during their processing to prevent chipping, rubbing, or other damage. Shallow trays with foam or paper lining and cardboard separators are commonly used, but as optical surfaces are polished and coated, the parts become very delicate and can easily be damaged as they slide, particularly on their convex surfaces, on flat tray bottoms. Polished and/or coated optical components are often individually wrapped in tissue paper and/or sealed in bags for protection between final process/inspection steps, but wrapping, unwrapping, re-wrapping, etc. are very time-consuming and costly, and the parts can be easily dropped and damaged.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131570767","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This paper addresses the present state and trends in phase measuring interferometry from the user's point of view. Phase measuring interferometry extends the capabilities of interferometric testing. While phase interferometry has been used since the late sixties, it is only with the technical advances of the past few years that it has emerged as a practical tool for general use.
{"title":"Present State of Phase Measuring Interferometry","authors":"Joann Horwitz","doi":"10.1364/oft.1982.wb6","DOIUrl":"https://doi.org/10.1364/oft.1982.wb6","url":null,"abstract":"This paper addresses the present state and trends in phase measuring interferometry from the user's point of view. Phase measuring interferometry extends the capabilities of interferometric testing. While phase interferometry has been used since the late sixties, it is only with the technical advances of the past few years that it has emerged as a practical tool for general use.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"16 12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133083261","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A fabrication technique is described for producing fused silica surfaces with controllable rms roughness and correlation length. The rough surfaces are generated by coating a fused silica surface with Shipley 1400-17 photoresist and exposing the photoresist to a laser speckle pattern and a coherent reference beam. The photoresist is developed and the structured photoresist surface is eroded into the fused silica surface with an argon ion mill. The rms roughness of the resulting surface is controlled by the exposure energy and development conditions. The correlation function of the surface is related to the Fourier transform of the intensity distribution that produces the speckle pattern. The surface height distribution is a function of the ratio of the reference beam irradiance to the speckle beam irradiance.
{"title":"Fabrication of Fused Silica Surfaces with Controllable RMS Roughness and Correlation Length","authors":"J. Zavislan","doi":"10.1364/oft.1987.faa5","DOIUrl":"https://doi.org/10.1364/oft.1987.faa5","url":null,"abstract":"A fabrication technique is described for producing fused silica surfaces with controllable rms roughness and correlation length. The rough surfaces are generated by coating a fused silica surface with Shipley 1400-17 photoresist and exposing the photoresist to a laser speckle pattern and a coherent reference beam. The photoresist is developed and the structured photoresist surface is eroded into the fused silica surface with an argon ion mill. The rms roughness of the resulting surface is controlled by the exposure energy and development conditions. The correlation function of the surface is related to the Fourier transform of the intensity distribution that produces the speckle pattern. The surface height distribution is a function of the ratio of the reference beam irradiance to the speckle beam irradiance.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131147165","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The requirement for a reflecting slit optical element resulted from design of a visual/IR imaging spectrometer optical system for an earth remote sensing instrument. In this optical system, the reflecting slit is located at the focus of a Schmidt telescope and serves as a field lens, field flattener, and entrance aperture to a two band visual/IR imaging spectrometer. These multiple functions make the reflecting slit a critical element in the optical design. This and concern for the ability to manufacture such an optical element dictated that a breadboard slit be manufacturer and verified before proceeding further with the development of the optical design. The configuration of the optical system is shown in Fig. 1. Unlike the usual spectrometer arrangement, radiation at the focus of the telescope (fore-optic) is reflected, instead of transmitted, by the slit into the spectrometer.
{"title":"Manufacture of a Reflecting Slit Optical Element","authors":"N. Page, P. Lam, Robert E. Parks, J. Rodgers","doi":"10.1364/oft.1984.fda7","DOIUrl":"https://doi.org/10.1364/oft.1984.fda7","url":null,"abstract":"The requirement for a reflecting slit optical element resulted from design of a visual/IR imaging spectrometer optical system for an earth remote sensing instrument. In this optical system, the reflecting slit is located at the focus of a Schmidt telescope and serves as a field lens, field flattener, and entrance aperture to a two band visual/IR imaging spectrometer. These multiple functions make the reflecting slit a critical element in the optical design. This and concern for the ability to manufacture such an optical element dictated that a breadboard slit be manufacturer and verified before proceeding further with the development of the optical design. The configuration of the optical system is shown in Fig. 1. Unlike the usual spectrometer arrangement, radiation at the focus of the telescope (fore-optic) is reflected, instead of transmitted, by the slit into the spectrometer.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130746587","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A heterodyne interferometer system is described which incorporates a two-dimensional CCD photodetector array to provide accurate optical phase measurements of a wavefront at each of its 244 by 190 detector locations. The intensity of each detector is digitized and read directly into the memory of a Data General Eclipse computer at a rate of approximately 2.5 x 106 pixels per second. The phase is calculated using the 3-bucket technique described below. The basic interferometer is a Twyman-Green (LUPI). A 320 x 240 element 16 grey level or color graphics display helps in quickly accessing figure quality from the map of calculated phase values.
描述了一种外差干涉仪系统，该系统包含一个二维CCD光电探测器阵列，可以在其244 × 190个探测器位置的每个位置提供精确的波前光学相位测量。每个探测器的强度被数字化，并以大约每秒2.5 x 106像素的速率直接读取到Data General Eclipse计算机的存储器中。使用下面描述的3桶技术计算相位。基本干涉仪是一个特怀曼-格林(LUPI)。320 x 240单元16灰度或彩色图形显示有助于从计算相位值的地图中快速访问图形质量。
{"title":"Heterodyne Interferometric Analysis System","authors":"C. Koliopoulos, J. Wyant","doi":"10.1364/oft.1981.tc2","DOIUrl":"https://doi.org/10.1364/oft.1981.tc2","url":null,"abstract":"A heterodyne interferometer system is described which incorporates a two-dimensional CCD photodetector array to provide accurate optical phase measurements of a wavefront at each of its 244 by 190 detector locations. The intensity of each detector is digitized and read directly into the memory of a Data General Eclipse computer at a rate of approximately 2.5 x 106 pixels per second. The phase is calculated using the 3-bucket technique described below. The basic interferometer is a Twyman-Green (LUPI). A 320 x 240 element 16 grey level or color graphics display helps in quickly accessing figure quality from the map of calculated phase values.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130989176","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
There is little doubt that single point machining technology will continue its rapid development in the immediate future. Today’s spindles, air bearing ways, and servo positioning systems are all significantly more accurate than their counterparts of as little as five years ago. Diffraction limited single point machined optics operating in the visible are not beyond contemplation. The one discouraging aspect to this otherwise optimistic picture is the diamond tools themselves. It appears to me that unless we focus the same kind of attention on the diamond tools that we have lavished on machines and operating techniques, cutting tools will soon be the major source of error in our optics. This is because we must have accurate tool parameters in order to calculate the tool path to cut a given surface.
{"title":"Tool Parameters in Diamond Turned Aspheric Optics","authors":"R. Weeks","doi":"10.1364/oft.1980.tua7","DOIUrl":"https://doi.org/10.1364/oft.1980.tua7","url":null,"abstract":"There is little doubt that single point machining technology will continue its rapid development in the immediate future. Today’s spindles, air bearing ways, and servo positioning systems are all significantly more accurate than their counterparts of as little as five years ago. Diffraction limited single point machined optics operating in the visible are not beyond contemplation. The one discouraging aspect to this otherwise optimistic picture is the diamond tools themselves. It appears to me that unless we focus the same kind of attention on the diamond tools that we have lavished on machines and operating techniques, cutting tools will soon be the major source of error in our optics. This is because we must have accurate tool parameters in order to calculate the tool path to cut a given surface.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"139 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132139260","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 1900-01-01DOI: 10.1201/9780824741587.ch2
M. W. Grindel
The tutorial will be on the company owner's view in the selection of materials and processes for the manufacture of optical components, coatings, and sub-assemb1ies. It will start with the receiving of a quotation from the customer. Depending on the quantity requirements, either prototype quantities or large volume production quantities, it will have to be determined how to buy raw materials and a decision will have to be made on temporary or hard tooling. We will show a comparison of different manufacturers suppling the same type of raw materials and their impact on quality, price, and delivery. We will discuss interfacing between engineering or designers and manufacturers. A cost comparison will be made between single elements and large volume production. We will also discuss the effect of tolerances on pricing. One would also have to look if test equipment is available or will have to be modified or possibly purchased. Specifications will be discussed to establish coating parameters. We will also discuss the impact that quality, environmental requirements, and change orders have on delivery.
{"title":"Selection of Materials and Processes","authors":"M. W. Grindel","doi":"10.1201/9780824741587.ch2","DOIUrl":"https://doi.org/10.1201/9780824741587.ch2","url":null,"abstract":"The tutorial will be on the company owner's view in the selection of materials and processes for the manufacture of optical components, coatings, and sub-assemb1ies. It will start with the receiving of a quotation from the customer. Depending on the quantity requirements, either prototype quantities or large volume production quantities, it will have to be determined how to buy raw materials and a decision will have to be made on temporary or hard tooling. We will show a comparison of different manufacturers suppling the same type of raw materials and their impact on quality, price, and delivery. We will discuss interfacing between engineering or designers and manufacturers. A cost comparison will be made between single elements and large volume production. We will also discuss the effect of tolerances on pricing. One would also have to look if test equipment is available or will have to be modified or possibly purchased. Specifications will be discussed to establish coating parameters. We will also discuss the impact that quality, environmental requirements, and change orders have on delivery.","PeriodicalId":170034,"journal":{"name":"Workshop on Optical Fabrication and Testing","volume":"559 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133154497","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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