Xiaojing Li, Dasen Wang, F. Nie, Pengfei Wu, Shiyan Zhao
Surface of fused silica optical components were polished by Ion Beam Figuring (IBF) ultra-precision process. Based on the analysis of the relationship between the ion beam current density distribution parameters obtained by faraday scan and the removal function, the removal function model for IBF was established. The IBF experiment for fused silica optical materials were carried out. The experimental results show that the IBF method based on faraday scan can achieve the same figure correcting ability as the traditional IBF method based on line scan experiment. But the offline calculation time of the removal function can be reduced from 2 hours to 5minutes, which improves the efficiency of IBF greatly. After several cycles the initial surface figure error of the optical element before processing, with a PV value from more than 500 nm to less than 15nm and an RMS value from more than 120nm to less than 1.5 nm. Ultra-precision surface of fused silica optical components with nanometer scale were obtained by IBF.
{"title":"Research on removal function and ion beam figuring process for ultra-precision manufacturing optical components","authors":"Xiaojing Li, Dasen Wang, F. Nie, Pengfei Wu, Shiyan Zhao","doi":"10.1117/12.2605262","DOIUrl":"https://doi.org/10.1117/12.2605262","url":null,"abstract":"Surface of fused silica optical components were polished by Ion Beam Figuring (IBF) ultra-precision process. Based on the analysis of the relationship between the ion beam current density distribution parameters obtained by faraday scan and the removal function, the removal function model for IBF was established. The IBF experiment for fused silica optical materials were carried out. The experimental results show that the IBF method based on faraday scan can achieve the same figure correcting ability as the traditional IBF method based on line scan experiment. But the offline calculation time of the removal function can be reduced from 2 hours to 5minutes, which improves the efficiency of IBF greatly. After several cycles the initial surface figure error of the optical element before processing, with a PV value from more than 500 nm to less than 15nm and an RMS value from more than 120nm to less than 1.5 nm. Ultra-precision surface of fused silica optical components with nanometer scale were obtained by IBF.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132856717","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
As a parameter of the process of an event, the measurement of decay time constant has been widely used in many fields such as electronic information, economy, chemistry and biology. How to quickly and accurately obtain the decay time constant of various kinds of decay signals has always been a hot issue in the field of testing technology. In this paper, research and carding are carried out on the fast and accurate decay acquisition method of time constant of single exponential decay signal. The main purpose is to comprehensively grasp the main methods adopted in current engineering technology and scientific research, and on this basis, a set of fast and accurate acquisition scheme of attenuation time constant based on ZYNQ system is proposed, It lays a foundation for the development of cavity ring down loss measurement and spectrum measurement system.
{"title":"Research on fast and accurate acquisition method of decay time constant","authors":"Yucheng Ouyang, Bin Zhang, Yuchuan Quan, Z. Tan","doi":"10.1117/12.2603948","DOIUrl":"https://doi.org/10.1117/12.2603948","url":null,"abstract":"As a parameter of the process of an event, the measurement of decay time constant has been widely used in many fields such as electronic information, economy, chemistry and biology. How to quickly and accurately obtain the decay time constant of various kinds of decay signals has always been a hot issue in the field of testing technology. In this paper, research and carding are carried out on the fast and accurate decay acquisition method of time constant of single exponential decay signal. The main purpose is to comprehensively grasp the main methods adopted in current engineering technology and scientific research, and on this basis, a set of fast and accurate acquisition scheme of attenuation time constant based on ZYNQ system is proposed, It lays a foundation for the development of cavity ring down loss measurement and spectrum measurement system.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133047778","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Hongjun Wang, Chen Wei, A. Tian, Bingcai Liu, Xueliang Zhu
To achieve rapid and accurate detection of the surface roughness of optical elements, a surface roughness detection method based on region scattering was proposed in this paper. Firstly, starting from the basic principle of the angle-resolved scattering method, a surface roughness detection model based on the area scattering distribution is established. Then, the influence of incident angle, incident wavelength, etc. on the scattering distribution is simulated and analyzed, and the best sampling region of the scattering distribution is determined. Finally, the experiment completes the acquisition and processing of the surface scattering distribution of the optical elements, and the dynamic range of the scattering distribution is improved through the fusion of the multi-exposure scattering image, thereby realized the high-precision detection of surface roughness. Take optical components as test objects, the experimental results show that the use of regional scattering signals to characterize the surface roughness of components can improve the measurement speed while ensuring the measurement accuracy.
{"title":"Surface roughness detection method of optical elements based on region scattering","authors":"Hongjun Wang, Chen Wei, A. Tian, Bingcai Liu, Xueliang Zhu","doi":"10.1117/12.2605355","DOIUrl":"https://doi.org/10.1117/12.2605355","url":null,"abstract":"To achieve rapid and accurate detection of the surface roughness of optical elements, a surface roughness detection method based on region scattering was proposed in this paper. Firstly, starting from the basic principle of the angle-resolved scattering method, a surface roughness detection model based on the area scattering distribution is established. Then, the influence of incident angle, incident wavelength, etc. on the scattering distribution is simulated and analyzed, and the best sampling region of the scattering distribution is determined. Finally, the experiment completes the acquisition and processing of the surface scattering distribution of the optical elements, and the dynamic range of the scattering distribution is improved through the fusion of the multi-exposure scattering image, thereby realized the high-precision detection of surface roughness. Take optical components as test objects, the experimental results show that the use of regional scattering signals to characterize the surface roughness of components can improve the measurement speed while ensuring the measurement accuracy.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"192 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123329175","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Guanwen Chen, Lihong Yang, Yinzi Wu, Menghan Li, Z. Xue
Laser damage identification is one of the hot research issues in recent years. Based on the mechanism of photothermal deflection, this paper established a physical model of reflective photothermal deflection based on laser damage.And designed an experimental test system for offset recognition based on the photothermal deflection method of the four-quadrant detector.The damage test of SiO2 film was carried out by the "1-0n-1" method specified by the national standard. The probe beam offset under different energies was studied, and the change trend of the detected beam offset during the damage of SiO2 film was analyzed.The optical properties and damage morphology of the samples were studied, and the damage threshold of SiO2 film was determined by zero probability damage threshold method.The experimental results show that when the SiO2 film is damaged by the photothermal deflection damage identification system based on the quadrant detector, when the offset is greater than 0.1mm, the SiO2 film is considered to be damaged, and the damage threshold is 12.7 J /cm2.The deviation of the test result based on the photothermal deflection damage offset of the four-quadrant detector and the test result of the phase contrast microscope method in the international standard ISO11254 is not more than 6.8%.
{"title":"Research of thin film damage testing based on photothermal deflection","authors":"Guanwen Chen, Lihong Yang, Yinzi Wu, Menghan Li, Z. Xue","doi":"10.1117/12.2604821","DOIUrl":"https://doi.org/10.1117/12.2604821","url":null,"abstract":"Laser damage identification is one of the hot research issues in recent years. Based on the mechanism of photothermal deflection, this paper established a physical model of reflective photothermal deflection based on laser damage.And designed an experimental test system for offset recognition based on the photothermal deflection method of the four-quadrant detector.The damage test of SiO2 film was carried out by the \"1-0n-1\" method specified by the national standard. The probe beam offset under different energies was studied, and the change trend of the detected beam offset during the damage of SiO2 film was analyzed.The optical properties and damage morphology of the samples were studied, and the damage threshold of SiO2 film was determined by zero probability damage threshold method.The experimental results show that when the SiO2 film is damaged by the photothermal deflection damage identification system based on the quadrant detector, when the offset is greater than 0.1mm, the SiO2 film is considered to be damaged, and the damage threshold is 12.7 J /cm2.The deviation of the test result based on the photothermal deflection damage offset of the four-quadrant detector and the test result of the phase contrast microscope method in the international standard ISO11254 is not more than 6.8%.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123064706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Sub-wavelength ratings (SWGs) have the property of the laser induced damage threshold (LIDT) close to that of bulk optical medium material, which becomes the focus of research to improve the anti-laser damage properties of optical element in recent years. SWGs are the effective substitutes for the laser anti-reflection (AR) of multilayer dielectric (MLD) thin films. In this paper, a polarization-dependent SWG with anti-reflection and wide-spectrum properties based on optical glass was designed using rigorous coupled wave analysis (RCWA). Figure 1 shows the schematic of the 1D grating, h is the ridge height of the grating, w is the bottom width of the grating,Λ is the period of the grating, and θ is the incident angle. The spectral characteristics were simulated using finite element analysis (FEA). The results show that the transmittance is not less than 95% from 350 nm-2500 nm in 0°~40° incident angle when the polarization component z of the electric field (TE) is parallel to the ridge direction of the grating. And it is not less than 98.5% at 0° incident angle from 350 nm to 2500 nm. When the polarization component z of the magnetic field (TM) is parallel to the ridge direction of the grating, the transmittance is not less than 95% from 300 nm to 900 nm in 0°~40° incident angle.
{"title":"Polarization-dependent, wide spectrum and wide-angle anti-reflection grating","authors":"Yuan Li, Junhong Su","doi":"10.1117/12.2604494","DOIUrl":"https://doi.org/10.1117/12.2604494","url":null,"abstract":"Sub-wavelength ratings (SWGs) have the property of the laser induced damage threshold (LIDT) close to that of bulk optical medium material, which becomes the focus of research to improve the anti-laser damage properties of optical element in recent years. SWGs are the effective substitutes for the laser anti-reflection (AR) of multilayer dielectric (MLD) thin films. In this paper, a polarization-dependent SWG with anti-reflection and wide-spectrum properties based on optical glass was designed using rigorous coupled wave analysis (RCWA). Figure 1 shows the schematic of the 1D grating, h is the ridge height of the grating, w is the bottom width of the grating,Λ is the period of the grating, and θ is the incident angle. The spectral characteristics were simulated using finite element analysis (FEA). The results show that the transmittance is not less than 95% from 350 nm-2500 nm in 0°~40° incident angle when the polarization component z of the electric field (TE) is parallel to the ridge direction of the grating. And it is not less than 98.5% at 0° incident angle from 350 nm to 2500 nm. When the polarization component z of the magnetic field (TM) is parallel to the ridge direction of the grating, the transmittance is not less than 95% from 300 nm to 900 nm in 0°~40° incident angle.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"160 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115599680","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Benefit from its subwavelength scale, metasurface has been widely used at the area of holograms. However, the existing researches about meta-hologram are mostly based on the illumination of propagating wave. In this condition, the ability of information coding of the evanescent wave is wasted. Thus, we demonstrated a complex structure which consists of prism and metasurface. This structure realizes the evanescent wave illumination, and extracted the image information from the evanescent wave region successfully. This scheme shows large potential in the area of information storage and information encryption.
{"title":"Two dimensional meta-hologram based on evanescent wave illumination","authors":"Peng Tian, Xiaoyi Guo","doi":"10.1117/12.2604769","DOIUrl":"https://doi.org/10.1117/12.2604769","url":null,"abstract":"Benefit from its subwavelength scale, metasurface has been widely used at the area of holograms. However, the existing researches about meta-hologram are mostly based on the illumination of propagating wave. In this condition, the ability of information coding of the evanescent wave is wasted. Thus, we demonstrated a complex structure which consists of prism and metasurface. This structure realizes the evanescent wave illumination, and extracted the image information from the evanescent wave region successfully. This scheme shows large potential in the area of information storage and information encryption.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114721147","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
J. Qiao, Yuanshu Cao, Sheng-zhao Wang, Yunfeng Wang
The plane launch of electron beam can be realized easily under the light for negative electron affinity (NEA) GaN vacuum electron source. With excellent stability in ultra high vacuum environment, GaN vacuum electron source is the best choice in the fields of microelectronics and electron beam lithography etc.. Using the activation and evaluation system for NEA photocathode, the GaN vacuum electron source material sample was activated with Cs and O, and the photocurrent curve for GaN photocathode was gotten. Aiming at the theoretical and technical problems in practical applications, surrounding the material property parameters of GaN vacuum electron source and the electron transport characteristics from the bulk to the surface, the photoemission theory was researched for NEA GaN vacuum electron source. And the application of NEA GaN vacuum electronic source was prospected.
{"title":"The material property and electron emission for NEA GaN vacuum electron source","authors":"J. Qiao, Yuanshu Cao, Sheng-zhao Wang, Yunfeng Wang","doi":"10.1117/12.2605036","DOIUrl":"https://doi.org/10.1117/12.2605036","url":null,"abstract":"The plane launch of electron beam can be realized easily under the light for negative electron affinity (NEA) GaN vacuum electron source. With excellent stability in ultra high vacuum environment, GaN vacuum electron source is the best choice in the fields of microelectronics and electron beam lithography etc.. Using the activation and evaluation system for NEA photocathode, the GaN vacuum electron source material sample was activated with Cs and O, and the photocurrent curve for GaN photocathode was gotten. Aiming at the theoretical and technical problems in practical applications, surrounding the material property parameters of GaN vacuum electron source and the electron transport characteristics from the bulk to the surface, the photoemission theory was researched for NEA GaN vacuum electron source. And the application of NEA GaN vacuum electronic source was prospected.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"120 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116891652","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numericalaperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a threestep eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.
{"title":"Polarization aberration in-situ measurement in lithography tools","authors":"Yuanhe Li, Jianhui Li, Yanqiu Li, Guodong Zhou","doi":"10.1117/12.2604286","DOIUrl":"https://doi.org/10.1117/12.2604286","url":null,"abstract":"Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numericalaperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a threestep eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116975760","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Recently, ternary semi-transparent organic photovoltaics (STOPVs) have developed rapidly due to their impressive application prospect in vegetable greenhouse, smart light window, and building-integrated solar cells. However, STOPVs have special requirements for the thickness of the active layer, which will affect the performance of the solar cells. Therefore, a new method developed to trade off device performance and average transmittance (AVT) are extremely important. Herein, we used an insulating polymer poly(N-vinylcarbazole) (PVK) as a color control agent to improve the AVT without changing the power conversion efficiency (PCE) of ternary STOPVs. Through mixing of PVK, the STOPVs show remarkable enhancement of the hole mobility and visible light transmittance, which leading the AVT of the device reaches 23.2% while maintaining the PCE over 14%. This method can effectively realize the preparation of high-performance neutral STOPVs, which is worthy of further promotion and research.
{"title":"Precise adjustment for neutral ternary semitransparent organic photovoltaics by mixing an insulating polymer","authors":"Dayong Zhang, Genjie Yang, R. Wang, Junsheng Yu","doi":"10.1117/12.2604415","DOIUrl":"https://doi.org/10.1117/12.2604415","url":null,"abstract":"Recently, ternary semi-transparent organic photovoltaics (STOPVs) have developed rapidly due to their impressive application prospect in vegetable greenhouse, smart light window, and building-integrated solar cells. However, STOPVs have special requirements for the thickness of the active layer, which will affect the performance of the solar cells. Therefore, a new method developed to trade off device performance and average transmittance (AVT) are extremely important. Herein, we used an insulating polymer poly(N-vinylcarbazole) (PVK) as a color control agent to improve the AVT without changing the power conversion efficiency (PCE) of ternary STOPVs. Through mixing of PVK, the STOPVs show remarkable enhancement of the hole mobility and visible light transmittance, which leading the AVT of the device reaches 23.2% while maintaining the PCE over 14%. This method can effectively realize the preparation of high-performance neutral STOPVs, which is worthy of further promotion and research.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121612070","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Chong Xie, Keyan Wang, Z. Pi, Chengxin Li, Xianqing Yin
A new structure of side powder feeding nozzles for extreme high-speed linear laser material deposition was designed. In this structure, the spatial concentration distribution of powder flow is controlled by multi-channel cylindrical beam splitting and conical rectifier. The turbulent and discrete phase models were used to study the flow field and powder distribution under the conditions of specific carrier gas flow rate and powder size. The results show that the powder feeding shaping structure can realize the powder flow linear and uniform distribution. Besides, it is proved that the prepared cladding layer has good surface quality through the experimental investigation.
{"title":"Numerical modeling of powder stream in extreme high-speed linear laser material deposition","authors":"Chong Xie, Keyan Wang, Z. Pi, Chengxin Li, Xianqing Yin","doi":"10.1117/12.2604849","DOIUrl":"https://doi.org/10.1117/12.2604849","url":null,"abstract":"A new structure of side powder feeding nozzles for extreme high-speed linear laser material deposition was designed. In this structure, the spatial concentration distribution of powder flow is controlled by multi-channel cylindrical beam splitting and conical rectifier. The turbulent and discrete phase models were used to study the flow field and powder distribution under the conditions of specific carrier gas flow rate and powder size. The results show that the powder feeding shaping structure can realize the powder flow linear and uniform distribution. Besides, it is proved that the prepared cladding layer has good surface quality through the experimental investigation.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121738869","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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