Xiaojing Li, Dasen Wang, F. Nie, Pengfei Wu, Shiyan Zhao
Surface of fused silica optical components were polished by Ion Beam Figuring (IBF) ultra-precision process. Based on the analysis of the relationship between the ion beam current density distribution parameters obtained by faraday scan and the removal function, the removal function model for IBF was established. The IBF experiment for fused silica optical materials were carried out. The experimental results show that the IBF method based on faraday scan can achieve the same figure correcting ability as the traditional IBF method based on line scan experiment. But the offline calculation time of the removal function can be reduced from 2 hours to 5minutes, which improves the efficiency of IBF greatly. After several cycles the initial surface figure error of the optical element before processing, with a PV value from more than 500 nm to less than 15nm and an RMS value from more than 120nm to less than 1.5 nm. Ultra-precision surface of fused silica optical components with nanometer scale were obtained by IBF.
{"title":"Research on removal function and ion beam figuring process for ultra-precision manufacturing optical components","authors":"Xiaojing Li, Dasen Wang, F. Nie, Pengfei Wu, Shiyan Zhao","doi":"10.1117/12.2605262","DOIUrl":"https://doi.org/10.1117/12.2605262","url":null,"abstract":"Surface of fused silica optical components were polished by Ion Beam Figuring (IBF) ultra-precision process. Based on the analysis of the relationship between the ion beam current density distribution parameters obtained by faraday scan and the removal function, the removal function model for IBF was established. The IBF experiment for fused silica optical materials were carried out. The experimental results show that the IBF method based on faraday scan can achieve the same figure correcting ability as the traditional IBF method based on line scan experiment. But the offline calculation time of the removal function can be reduced from 2 hours to 5minutes, which improves the efficiency of IBF greatly. After several cycles the initial surface figure error of the optical element before processing, with a PV value from more than 500 nm to less than 15nm and an RMS value from more than 120nm to less than 1.5 nm. Ultra-precision surface of fused silica optical components with nanometer scale were obtained by IBF.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132856717","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
As a parameter of the process of an event, the measurement of decay time constant has been widely used in many fields such as electronic information, economy, chemistry and biology. How to quickly and accurately obtain the decay time constant of various kinds of decay signals has always been a hot issue in the field of testing technology. In this paper, research and carding are carried out on the fast and accurate decay acquisition method of time constant of single exponential decay signal. The main purpose is to comprehensively grasp the main methods adopted in current engineering technology and scientific research, and on this basis, a set of fast and accurate acquisition scheme of attenuation time constant based on ZYNQ system is proposed, It lays a foundation for the development of cavity ring down loss measurement and spectrum measurement system.
{"title":"Research on fast and accurate acquisition method of decay time constant","authors":"Yucheng Ouyang, Bin Zhang, Yuchuan Quan, Z. Tan","doi":"10.1117/12.2603948","DOIUrl":"https://doi.org/10.1117/12.2603948","url":null,"abstract":"As a parameter of the process of an event, the measurement of decay time constant has been widely used in many fields such as electronic information, economy, chemistry and biology. How to quickly and accurately obtain the decay time constant of various kinds of decay signals has always been a hot issue in the field of testing technology. In this paper, research and carding are carried out on the fast and accurate decay acquisition method of time constant of single exponential decay signal. The main purpose is to comprehensively grasp the main methods adopted in current engineering technology and scientific research, and on this basis, a set of fast and accurate acquisition scheme of attenuation time constant based on ZYNQ system is proposed, It lays a foundation for the development of cavity ring down loss measurement and spectrum measurement system.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133047778","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Sub-wavelength ratings (SWGs) have the property of the laser induced damage threshold (LIDT) close to that of bulk optical medium material, which becomes the focus of research to improve the anti-laser damage properties of optical element in recent years. SWGs are the effective substitutes for the laser anti-reflection (AR) of multilayer dielectric (MLD) thin films. In this paper, a polarization-dependent SWG with anti-reflection and wide-spectrum properties based on optical glass was designed using rigorous coupled wave analysis (RCWA). Figure 1 shows the schematic of the 1D grating, h is the ridge height of the grating, w is the bottom width of the grating,Λ is the period of the grating, and θ is the incident angle. The spectral characteristics were simulated using finite element analysis (FEA). The results show that the transmittance is not less than 95% from 350 nm-2500 nm in 0°~40° incident angle when the polarization component z of the electric field (TE) is parallel to the ridge direction of the grating. And it is not less than 98.5% at 0° incident angle from 350 nm to 2500 nm. When the polarization component z of the magnetic field (TM) is parallel to the ridge direction of the grating, the transmittance is not less than 95% from 300 nm to 900 nm in 0°~40° incident angle.
{"title":"Polarization-dependent, wide spectrum and wide-angle anti-reflection grating","authors":"Yuan Li, Junhong Su","doi":"10.1117/12.2604494","DOIUrl":"https://doi.org/10.1117/12.2604494","url":null,"abstract":"Sub-wavelength ratings (SWGs) have the property of the laser induced damage threshold (LIDT) close to that of bulk optical medium material, which becomes the focus of research to improve the anti-laser damage properties of optical element in recent years. SWGs are the effective substitutes for the laser anti-reflection (AR) of multilayer dielectric (MLD) thin films. In this paper, a polarization-dependent SWG with anti-reflection and wide-spectrum properties based on optical glass was designed using rigorous coupled wave analysis (RCWA). Figure 1 shows the schematic of the 1D grating, h is the ridge height of the grating, w is the bottom width of the grating,Λ is the period of the grating, and θ is the incident angle. The spectral characteristics were simulated using finite element analysis (FEA). The results show that the transmittance is not less than 95% from 350 nm-2500 nm in 0°~40° incident angle when the polarization component z of the electric field (TE) is parallel to the ridge direction of the grating. And it is not less than 98.5% at 0° incident angle from 350 nm to 2500 nm. When the polarization component z of the magnetic field (TM) is parallel to the ridge direction of the grating, the transmittance is not less than 95% from 300 nm to 900 nm in 0°~40° incident angle.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"160 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115599680","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Chao Yang, Xianchang Zhu, Jing Chuan, Xiaolong Cheng, H. Sun, Song Hu
This article introduces an image quality compensation method based on tolerance sensitivity matrix analysis. First, use the optical software CODE V to establish an optical system model, and add tolerances to a set of i-line projection objectives with a numerical aperture of 0.33. Then the singular value decomposition (SVD) is performed on the sensitivity matrix composed of the structural parameters of the system's sensitive components to select the image quality compensator. The image quality is compensated by coupling the determined three compensators to each other. Comparing the performance of the compensated lithography objective lens with the tolerance lithography objective lens, the system wave aberration is converged from 33.5nmRMS to 23.9nmRMS, the wave aberration PV value is reduced from 0.07λ to 0.02λ for the tolerance objective lens, and the distortion is reduced from 491nm to 48.6nm. The rate is reduced from 0.03ppm to 0.01ppm. This study uses fewer compensators to restore the system wave aberration, distortion and magnification to close to the design level, effectively reducing the manufacturing difficulty and cost of the projection lithography objective lens, and verifying the effectiveness of the compensation method and model.
{"title":"Image quality compensation via tolerance sensitivity matrix method in lithography","authors":"Chao Yang, Xianchang Zhu, Jing Chuan, Xiaolong Cheng, H. Sun, Song Hu","doi":"10.1117/12.2626166","DOIUrl":"https://doi.org/10.1117/12.2626166","url":null,"abstract":"This article introduces an image quality compensation method based on tolerance sensitivity matrix analysis. First, use the optical software CODE V to establish an optical system model, and add tolerances to a set of i-line projection objectives with a numerical aperture of 0.33. Then the singular value decomposition (SVD) is performed on the sensitivity matrix composed of the structural parameters of the system's sensitive components to select the image quality compensator. The image quality is compensated by coupling the determined three compensators to each other. Comparing the performance of the compensated lithography objective lens with the tolerance lithography objective lens, the system wave aberration is converged from 33.5nmRMS to 23.9nmRMS, the wave aberration PV value is reduced from 0.07λ to 0.02λ for the tolerance objective lens, and the distortion is reduced from 491nm to 48.6nm. The rate is reduced from 0.03ppm to 0.01ppm. This study uses fewer compensators to restore the system wave aberration, distortion and magnification to close to the design level, effectively reducing the manufacturing difficulty and cost of the projection lithography objective lens, and verifying the effectiveness of the compensation method and model.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"141 28","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"120820407","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The purpose of this paper is to make an overview of the development status of anti-reflective coating in optical coating. The preparation process of anti-reflective coating mainly includes the selection of coating materials and the design of the coating system based on the application requirements, and then the selection of appropriate preparation process for the preparation of the coating.Therefore, this paper first describes the principle of anti-reflective coating, then describes the design methods of single-layer and multilayer membrane systems, and compares the optical transmittance of the two methods in visible bands.Secondly, it describes the four kinds of coating preparation technology commonly used nowadays, including vacuum evaporation method, chemical vapor deposition method, sol-gel method, sputtering method, and its main application fields and advantages and disadvantages are summarized.Then the anti-reflection coating materials commonly used in coating technology and the film structures which are constantly updated and developed to adapt to different application fields are described.Finally, two applications of anti-reflective coating nowadays are listed, including multi-layer special optical coating applied by the space detection camera developed by our group and the application of the anti-reflective coating in solar cells.
{"title":"Discussion on the development status of optical anti-reflective coating technology","authors":"Yuting Wu, Zhiqiang Lin, Hao Zhang, Min Wang","doi":"10.1117/12.2603921","DOIUrl":"https://doi.org/10.1117/12.2603921","url":null,"abstract":"The purpose of this paper is to make an overview of the development status of anti-reflective coating in optical coating. The preparation process of anti-reflective coating mainly includes the selection of coating materials and the design of the coating system based on the application requirements, and then the selection of appropriate preparation process for the preparation of the coating.Therefore, this paper first describes the principle of anti-reflective coating, then describes the design methods of single-layer and multilayer membrane systems, and compares the optical transmittance of the two methods in visible bands.Secondly, it describes the four kinds of coating preparation technology commonly used nowadays, including vacuum evaporation method, chemical vapor deposition method, sol-gel method, sputtering method, and its main application fields and advantages and disadvantages are summarized.Then the anti-reflection coating materials commonly used in coating technology and the film structures which are constantly updated and developed to adapt to different application fields are described.Finally, two applications of anti-reflective coating nowadays are listed, including multi-layer special optical coating applied by the space detection camera developed by our group and the application of the anti-reflective coating in solar cells.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116096081","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Hongjun Wang, Chen Wei, A. Tian, Bingcai Liu, Xueliang Zhu
To achieve rapid and accurate detection of the surface roughness of optical elements, a surface roughness detection method based on region scattering was proposed in this paper. Firstly, starting from the basic principle of the angle-resolved scattering method, a surface roughness detection model based on the area scattering distribution is established. Then, the influence of incident angle, incident wavelength, etc. on the scattering distribution is simulated and analyzed, and the best sampling region of the scattering distribution is determined. Finally, the experiment completes the acquisition and processing of the surface scattering distribution of the optical elements, and the dynamic range of the scattering distribution is improved through the fusion of the multi-exposure scattering image, thereby realized the high-precision detection of surface roughness. Take optical components as test objects, the experimental results show that the use of regional scattering signals to characterize the surface roughness of components can improve the measurement speed while ensuring the measurement accuracy.
{"title":"Surface roughness detection method of optical elements based on region scattering","authors":"Hongjun Wang, Chen Wei, A. Tian, Bingcai Liu, Xueliang Zhu","doi":"10.1117/12.2605355","DOIUrl":"https://doi.org/10.1117/12.2605355","url":null,"abstract":"To achieve rapid and accurate detection of the surface roughness of optical elements, a surface roughness detection method based on region scattering was proposed in this paper. Firstly, starting from the basic principle of the angle-resolved scattering method, a surface roughness detection model based on the area scattering distribution is established. Then, the influence of incident angle, incident wavelength, etc. on the scattering distribution is simulated and analyzed, and the best sampling region of the scattering distribution is determined. Finally, the experiment completes the acquisition and processing of the surface scattering distribution of the optical elements, and the dynamic range of the scattering distribution is improved through the fusion of the multi-exposure scattering image, thereby realized the high-precision detection of surface roughness. Take optical components as test objects, the experimental results show that the use of regional scattering signals to characterize the surface roughness of components can improve the measurement speed while ensuring the measurement accuracy.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"192 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123329175","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Yansong Guo, Xiao-jing Yang, Tong Yao, G. Du, Xueying Wang
Optical freeform surfaces can provide a higher degree of freedom in optical design, compared with spherical and aspherical optical components. The application of freeform optical components in imaging optical systems is conducive to simplifying the system structure and improving imaging quality, and has wide applications in illumination, imaging and non-imaging, etc. This paper introduces the basic principle and process of fast tool servo (FTS) diamond turning, and its application in the field of optical processing. A series of machining experiment was carried out on aluminum materials by FTS diamond turning for XY polynomial freeform surface mirrors, and the surface accuracy and roughness were measured. The effects of feed rate, spindle speed, and cutting depth on surface roughness were studied and corresponding functional relationship curves were determined. The results show that the feed rate had the greatest influence on surface roughness of aluminum freeform surfaces, as the feed rate increased, the surface roughness increased gradually; the spindle speed and cutting depth have relatively little influence on surface roughness. The fitting degree of curves was very high, which can predict the surface roughness of machined freeform more accurately. The 3-D surface accuracy PV of the final processed freeform surface was 0.22μm, and the 2-D surface roughness Ra value was 3.5nm, the machined surface reached a mirror finish.
{"title":"Machining approach of freeform optics via fast tool servo diamond turning","authors":"Yansong Guo, Xiao-jing Yang, Tong Yao, G. Du, Xueying Wang","doi":"10.1117/12.2604680","DOIUrl":"https://doi.org/10.1117/12.2604680","url":null,"abstract":"Optical freeform surfaces can provide a higher degree of freedom in optical design, compared with spherical and aspherical optical components. The application of freeform optical components in imaging optical systems is conducive to simplifying the system structure and improving imaging quality, and has wide applications in illumination, imaging and non-imaging, etc. This paper introduces the basic principle and process of fast tool servo (FTS) diamond turning, and its application in the field of optical processing. A series of machining experiment was carried out on aluminum materials by FTS diamond turning for XY polynomial freeform surface mirrors, and the surface accuracy and roughness were measured. The effects of feed rate, spindle speed, and cutting depth on surface roughness were studied and corresponding functional relationship curves were determined. The results show that the feed rate had the greatest influence on surface roughness of aluminum freeform surfaces, as the feed rate increased, the surface roughness increased gradually; the spindle speed and cutting depth have relatively little influence on surface roughness. The fitting degree of curves was very high, which can predict the surface roughness of machined freeform more accurately. The 3-D surface accuracy PV of the final processed freeform surface was 0.22μm, and the 2-D surface roughness Ra value was 3.5nm, the machined surface reached a mirror finish.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127403509","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Peijia Jiang, Mengmeng Zhao, Wang Zhao, Shuai Wang, P. Yang
The uniformity of illumination can affect the detection ability of the Shack-Hartmann wavefront sensor to a certain extent and degrade the wavefront restoration accuracy. When the intensity distribution of the incident beam is very non-uniform, it is difficult for each sub-spot image to carry out optimal signal-to-noise ratio (SNR) at the same time. The spot image may be over-exposed or too dark, and that brings about the incorrect measurements of the centroid and further influences the reconstruction accuracy of the wavefront. In the paper, we use multi-frame image information fusion to generate an enhanced spot-array image with a high dynamic range, so as to improve the accuracy of the overall centroid calculation. The simulation results show that this method is effective in the above cases.
{"title":"Image enhancement of Shack-Hartmann wavefront sensor with non-uniform illumination","authors":"Peijia Jiang, Mengmeng Zhao, Wang Zhao, Shuai Wang, P. Yang","doi":"10.1117/12.2604676","DOIUrl":"https://doi.org/10.1117/12.2604676","url":null,"abstract":"The uniformity of illumination can affect the detection ability of the Shack-Hartmann wavefront sensor to a certain extent and degrade the wavefront restoration accuracy. When the intensity distribution of the incident beam is very non-uniform, it is difficult for each sub-spot image to carry out optimal signal-to-noise ratio (SNR) at the same time. The spot image may be over-exposed or too dark, and that brings about the incorrect measurements of the centroid and further influences the reconstruction accuracy of the wavefront. In the paper, we use multi-frame image information fusion to generate an enhanced spot-array image with a high dynamic range, so as to improve the accuracy of the overall centroid calculation. The simulation results show that this method is effective in the above cases.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125433932","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This paper presents a multi-carrier frequency spatial phase shift digital shearing speckle interferometry method which is capable of the first derivative and microdeformation synchronously. The dynamic deformation of the composite defects is carried out by thermal loading.The shear speckle interferometry is used to locate the defect position and holography was used to measure microdeformation of the defect. In Michelson shearing device, an optical fiber is used to introduce a reference beam,two shear images form a shear fringe pattern, and the reference beam introduced is combined with one of the shear patterns to generate a hologram. The spatial phase shifting technique is used to obtain the frequency domain after Fourier transform, holograms and shearograms are obtained at the same time. In this paper, the direct synchronous measurement of microdeformation and first derivative of deformation is realized without the need of numerical integration process. Finally, the experimental results show that the proposed method can quickly obtain the shear fringe image, which represents the first derivative of the deformation to position the defect in the composite material, and the hologram is filtered, unwrapped and 3D displayed to obtain accurate micron scale deformation values.
{"title":"Synchronous microdeformation and first derivative dynamic measurement based on laser shearing speckle interferometry","authors":"Xiao-shan Huang, Ji Liu, Lixia Yu","doi":"10.1117/12.2604382","DOIUrl":"https://doi.org/10.1117/12.2604382","url":null,"abstract":"This paper presents a multi-carrier frequency spatial phase shift digital shearing speckle interferometry method which is capable of the first derivative and microdeformation synchronously. The dynamic deformation of the composite defects is carried out by thermal loading.The shear speckle interferometry is used to locate the defect position and holography was used to measure microdeformation of the defect. In Michelson shearing device, an optical fiber is used to introduce a reference beam,two shear images form a shear fringe pattern, and the reference beam introduced is combined with one of the shear patterns to generate a hologram. The spatial phase shifting technique is used to obtain the frequency domain after Fourier transform, holograms and shearograms are obtained at the same time. In this paper, the direct synchronous measurement of microdeformation and first derivative of deformation is realized without the need of numerical integration process. Finally, the experimental results show that the proposed method can quickly obtain the shear fringe image, which represents the first derivative of the deformation to position the defect in the composite material, and the hologram is filtered, unwrapped and 3D displayed to obtain accurate micron scale deformation values.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"81 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125755513","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Recently, ternary semi-transparent organic photovoltaics (STOPVs) have developed rapidly due to their impressive application prospect in vegetable greenhouse, smart light window, and building-integrated solar cells. However, STOPVs have special requirements for the thickness of the active layer, which will affect the performance of the solar cells. Therefore, a new method developed to trade off device performance and average transmittance (AVT) are extremely important. Herein, we used an insulating polymer poly(N-vinylcarbazole) (PVK) as a color control agent to improve the AVT without changing the power conversion efficiency (PCE) of ternary STOPVs. Through mixing of PVK, the STOPVs show remarkable enhancement of the hole mobility and visible light transmittance, which leading the AVT of the device reaches 23.2% while maintaining the PCE over 14%. This method can effectively realize the preparation of high-performance neutral STOPVs, which is worthy of further promotion and research.
{"title":"Precise adjustment for neutral ternary semitransparent organic photovoltaics by mixing an insulating polymer","authors":"Dayong Zhang, Genjie Yang, R. Wang, Junsheng Yu","doi":"10.1117/12.2604415","DOIUrl":"https://doi.org/10.1117/12.2604415","url":null,"abstract":"Recently, ternary semi-transparent organic photovoltaics (STOPVs) have developed rapidly due to their impressive application prospect in vegetable greenhouse, smart light window, and building-integrated solar cells. However, STOPVs have special requirements for the thickness of the active layer, which will affect the performance of the solar cells. Therefore, a new method developed to trade off device performance and average transmittance (AVT) are extremely important. Herein, we used an insulating polymer poly(N-vinylcarbazole) (PVK) as a color control agent to improve the AVT without changing the power conversion efficiency (PCE) of ternary STOPVs. Through mixing of PVK, the STOPVs show remarkable enhancement of the hole mobility and visible light transmittance, which leading the AVT of the device reaches 23.2% while maintaining the PCE over 14%. This method can effectively realize the preparation of high-performance neutral STOPVs, which is worthy of further promotion and research.","PeriodicalId":236529,"journal":{"name":"International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121612070","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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