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Gate-Controlled InSe/PtS2 van der Waals Heterostructures for High-Performance Electronic and Optoelectronic Devices 用于高性能电子和光电器件的栅极控制 InSe/PtS2 范德华异质结构
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-14 DOI: 10.1021/acsaelm.4c0126410.1021/acsaelm.4c01264
Muhammad Wajid Zulfiqar, Sobia Nisar, Ghulam Dastgeer*, Faisal Ghafoor, Muhammad Rabeel, Vijay D. Chavan, Ali Alsalme, Muhammad Zahir Iqbal, Iqra Rabani and Deok-kee Kim*, 

The unique combination of atomically thin layers and well-defined interfaces in two-dimensional (2D) semiconductors holds promise for applications in electronics and optoelectronics. As promising newcomers, p-type InSe and n-type PtS2 nanosheets present exciting possibilities, with their unique characteristics. Here, we investigate gate-controlled InSe/PtS2 van der Waals heterostructures (vdWHs), highlighting their potential as candidates for advanced electronic and optoelectronic applications. This work demonstrates the realization of a 2D p-n diode with a precisely defined atomic interface, exhibiting strong interlayer interactions. InSe/PtS2 vdWHs demonstrate impressive functionalities surpassing previously reported van der Waals counterparts with gate-dependent rectification of 1.5 × 105 at a gate voltage of Vg = −20 V and ideality factor of 1.17, close to an ideal diode. Investigating the photovoltaic response of the InSe/PtS2 heterostructure under varied light intensities revealed a significant responsivity that varies from 31.85 to 43.2 A/W upon exposure to a light wavelength of 220 nm. Additionally, a substantial external quantum efficiency (EQE) ratio of ∼2.4 × 104 % with high detectivity (D*) of 7.06 × 109 Jones values is achieved. This work demonstrates the development of advanced p-n junctions, paving the way for the realization of high-performance electronics and optoelectronic devices.

二维(2D)半导体中的原子薄层和定义明确的界面的独特组合为电子学和光电子学的应用带来了希望。p 型 InSe 和 n 型 PtS2 纳米片是前景广阔的新成员,它们的独特特性带来了令人兴奋的可能性。在这里,我们研究了门控 InSe/PtS2 范德瓦耳斯异质结构(vdWHs),强调了它们作为先进电子和光电应用候选材料的潜力。这项工作展示了具有精确定义的原子界面的二维 p-n 二极管的实现,它表现出很强的层间相互作用。InSe/PtS2 vdWHs 具有令人印象深刻的功能,其栅极电压为 Vg = -20 V 时的栅极整流率为 1.5 × 105,理想度系数为 1.17,接近理想二极管,超过了之前报道的范德华二极管。对 InSe/PtS2 异质结构在不同光照强度下的光电响应进行研究后发现,在波长为 220 纳米的光照下,其响应率从 31.85 到 43.2 A/W 不等。此外,还实现了 2.4 × 104 % 的可观外部量子效率 (EQE),以及 7.06 × 109 Jones 的高检测率 (D*)。这项工作展示了先进 p-n 结的发展,为实现高性能电子和光电器件铺平了道路。
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引用次数: 0
Probing Charge Dynamics in Amorphous Oxide Semiconductors by Time-of-Flight Microwave Impedance Microscopy 利用飞行时间微波阻抗显微镜探测非晶氧化物半导体中的电荷动力学
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-14 DOI: 10.1021/acsaelm.4c0165210.1021/acsaelm.4c01652
Jia Yu, Yuchen Zhou, Xiao Wang, Xuejian Ma, Ananth Dodabalapur* and Keji Lai*, 

The unique electronic properties of amorphous indium gallium zinc oxide (a-IGZO) thin films are closely associated with the complex charge dynamics of the materials. Conventional studies of charge transport in a-IGZO usually involve steady-state or transient measurements on field-effect transistors. Here, we employed microwave impedance microscopy to carry out position-dependent time-of-flight (TOF) experiments on a-IGZO devices, which offer spatial and temporal information on the underlying transport dynamics. The drift mobility calculated from the delay time between carrier injection and onset of TOF response is 2–3 cm2/(V s), consistent with the field-effect mobility from device measurements. The spatiotemporal conductivity data can be nicely fitted to a two-step function, corresponding to two coexisting mechanisms with a typical time scale of milliseconds. The competition between multiple-trap-and-release conduction through band-tail states and hopping conduction through deep trap states is evident from the fitting parameters. The underlying length scale and time scale of charge dynamics in a-IGZO are of fundamental importance for transparent and flexible nanoelectronics and optoelectronics, as well as emerging back-end-of-line applications.

非晶铟镓锌氧化物(a-IGZO)薄膜的独特电子特性与材料复杂的电荷动力学密切相关。传统的 a-IGZO 电荷传输研究通常涉及场效应晶体管的稳态或瞬态测量。在这里,我们采用微波阻抗显微镜对 a-IGZO 器件进行了位置依赖性飞行时间(TOF)实验,从而提供了有关潜在传输动力学的空间和时间信息。根据载流子注入与 TOF 响应开始之间的延迟时间计算得出的漂移迁移率为 2-3 cm2/(V s),与器件测量得出的场效应迁移率一致。时空电导率数据可以很好地拟合为一个两步函数,对应于典型时间尺度为毫秒的两种共存机制。从拟合参数中可以明显看出,通过带尾态的多重捕获和释放传导与通过深阱态的跳跃传导之间存在竞争。a-IGZO 中电荷动力学的基本长度尺度和时间尺度对于透明和柔性纳米电子学和光电子学以及新兴的后端应用具有根本性的重要意义。
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引用次数: 0
Enhanced Ferroelectricity and Reliability in Sub-6 nm Ferroelectric Hf0.5Zr0.5O2/ZrO2/Hf0.5Zr0.5O2 Stack Film Compatible with BEOL Process 与 BEOL 工艺兼容的亚 6 纳米铁电 Hf0.5Zr0.5O2/ZrO2/Hf0.5Zr0.5O2 叠层薄膜的铁电性和可靠性得到增强
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-13 DOI: 10.1021/acsaelm.4c0174510.1021/acsaelm.4c01745
Yinchi Liu, Jining Yang, Hao Zhang, Dmitriy Anatolyevich Golosov, Chenjie Gu, Xiaohan Wu, Hongliang Lu, Lin Chen, Shijin Ding and Wenjun Liu*, 

In this work, the back-end of line (BEOL) compatible sub-6 nm Hf0.5Zr0.5O2/ZrO2/Hf0.5Zr0.5O2 (HZO/ZrO2/HZO) stack and the corresponding capacitors were fabricated. The capacitor with the sub-6 nm HZO/ZrO2/HZO stack annealed at 400 °C shows a superior remanent polarization (2Pr) of 26.3 μC/cm2 under only ±1.25 V sweeping, while the conventional HZO film presents nonferroelectricity. The enhanced ferroelectricity stems from the increased ferroelectric phase proportion with ZrO2 insertion. Moreover, the capacitor with a HZO/ZrO2/HZO stack also achieved an excellent endurance with a 2Pr of 27.1 μC/cm2 after 1011 cycles without breakdown and only ∼12% 2Pr degradation at 85 °C. The robust reliability is ascribed to the suppressed generation of defects and domain pinning under the low operating voltage. The sub-6 nm HZO/ZrO2/HZO stack presents great potential for BEOL compatible nonvolatile memories in advanced process nodes.

在这项工作中,制造出了兼容亚 6 纳米 Hf0.5Zr0.5O2/ZrO2/Hf0.5Zr0.5O2 (HZO/ZrO2/HZO) 的线路后端 (BEOL) 堆栈和相应的电容器。在 400 °C 下退火的亚 6 nm HZO/ZrO2/HZO 叠层电容器在仅±1.25 V 的扫描条件下显示出 26.3 μC/cm2 的出色剩电极化 (2Pr),而传统的 HZO 薄膜则显示出非铁电性。铁电性的增强源于插入 ZrO2 后铁电相比例的增加。此外,采用 HZO/ZrO2/HZO 叠层的电容器还实现了出色的耐久性,经过 1011 次循环后,2Pr 为 27.1 μC/cm2,没有发生击穿,在 85 °C 时 2Pr 退化率仅为∼12%。这种稳健的可靠性归功于低工作电压下缺陷的产生和畴钉的抑制。6 纳米以下的 HZO/ZrO2/HZO 堆栈为先进工艺节点中的 BEOL 兼容型非易失性存储器带来了巨大潜力。
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引用次数: 0
High Crystalline Quality Ta-Doped h-ZnTiO3 Epitaxial Films: Characteristics and Application in UV Detectors 掺杂 Ta 的高结晶质量 h-ZnTiO3 磊晶薄膜:紫外探测器的特性和应用
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-13 DOI: 10.1021/acsaelm.4c0162910.1021/acsaelm.4c01629
Biao Zhang, Xiaochen Ma*, HongYan Zhu, Hongdi Xiao, Jin Ma and Caina Luan*, 

Ta-doped h-ZnTiO3 (h-ZnTiO3:Ta) films with an atomic ratio of 0–5% are grown on sapphire substrates by pulsed laser deposition. The prepared films exhibit n-type semiconductor behavior with high epitaxial crystalline quality. These films have high transparency, and their optical band gaps exceed 3.72 eV. The Hall mobility and carrier concentration of the 1% Ta-doped film are 4.6 cm2/(V·s) and 4.20 × 1014 /cm3, respectively. The h-ZnTiO3:Ta film-based metal–semiconductor–metal (MSM) photodetectors are fabricated, and their characteristics are analyzed in detail. Among them, 1% Ta-doped h-ZnTiO3 film-based devices show the best detection performance, including responsivity of 4.23 mA/W and detectivity of 1.43 × 1011 Jones, under the wavelength of 308 nm ultraviolet light with an optical density of 140 μW/cm2. The detector also has an extremely fast response time (rise time: 0.16 s and fall time: 0.04 s). This work proves that h-ZnTiO3:Ta epitaxial films have great application prospects in future optoelectronic devices.

通过脉冲激光沉积法在蓝宝石衬底上生长出原子比为 0-5% 的掺 Ta h-ZnTiO3 (h-ZnTiO3:Ta)薄膜。制备出的薄膜具有 n 型半导体特性,外延结晶质量高。这些薄膜具有高透明度,其光带隙超过 3.72 eV。掺杂 1% Ta 的薄膜的霍尔迁移率和载流子浓度分别为 4.6 cm2/(V-s) 和 4.20 × 1014 /cm3。本文制作了基于 h-ZnTiO3:Ta 薄膜的金属-半导体-金属(MSM)光电探测器,并详细分析了它们的特性。其中,掺杂 1% Ta 的 h-ZnTiO3 膜基器件的探测性能最佳,在波长为 308 nm、光密度为 140 μW/cm2 的紫外光下,其响应率为 4.23 mA/W,探测率为 1.43 × 1011 Jones。该探测器的响应速度也非常快(上升时间:0.16 秒,下降时间:0.04 秒)。这项研究证明,h-ZnTiO3:Ta 外延薄膜在未来的光电器件中具有广阔的应用前景。
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引用次数: 0
Interface Engineering in All-Oxide Photovoltaic Devices Based on Photoferroelectric BiFe0.9Co0.1O3 Thin Films 基于光铁电 BiFe0.9Co0.1O3 薄膜的全氧化物光伏器件中的界面工程设计
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-13 DOI: 10.1021/acsaelm.4c0153310.1021/acsaelm.4c01533
Pamela Machado, Pol Salles, Alexander Frebel, Gabriele De Luca, Eloi Ros, Christian Hagendorf, Ignasi Fina, Joaquim Puigdollers and Mariona Coll*, 

Photoferroelectric BiFeO3 (BFO) has attracted renewed interest to be integrated into thin film photovoltaic (PV) devices as a stable, lead-free, and versatile photoabsorber with simplified architecture. While significant efforts have been dedicated toward the exploration of strategies to tailor the properties of this photoabsorber to improve the device performance, efficiencies still remain low. The modification of the BFO interface by the incorporation of transport-selective layers can offer fresh opportunities to modify the properties of the device. Identifying an optical and electrically suitable selective layer while ensuring easy device processing and controlled film properties is challenging. In this work, we determine the influence of incorporating a ZnO layer on the ferroelectric and photoresponse behavior of an epitaxial BiFe0.9Co0.1O3 (BFCO)-based heterostructure. The device is completed with Sn-doped In2O3 (ITO) and La0.7Sr0.3MnO3 (LSMO) electrodes. This all-oxide system is stable under ambient conditions and displays robust ferroelectricity. The coupled ferroelectricity–photoresponse measurements demonstrate that the short circuit current can be modulated by ferroelectric polarization in up to 68% under blue monochromatic light. Also, the responsivity of the system with the ZnO-modified interface is larger than that of the system with no ZnO. Complementary band energy alignment studies reveal that the observed increase in the short circuit current density of the device with ZnO is attributed to lower Fermi level energy at the ZnO/BFCO interface compared to the ITO/BFCO interface, which reduces charge recombination. Therefore, this study provides useful insights into the role of the ZnO interface layer in stable BFO-based devices to further explore their viability for potential optoelectronic applications.

作为一种稳定、无铅、多功能、结构简化的光吸收体,Biferroelectric BiFeO3(BFO)再次引起了人们对将其集成到薄膜光伏(PV)设备中的兴趣。虽然人们一直在努力探索如何调整这种光吸收体的特性以提高设备性能,但其效率仍然很低。通过加入传输选择层来改变 BFO 界面,可以为改变器件性能提供新的机会。在确保器件加工简便和薄膜性能可控的同时,确定一种光学和电学上合适的选择性层是一项挑战。在这项工作中,我们确定了加入氧化锌层对基于外延 BiFe0.9Co0.1O3 (BFCO) 异质结构的铁电和光电响应行为的影响。该器件采用掺杂锡的 In2O3 (ITO) 和 La0.7Sr0.3MnO3 (LSMO) 电极。这种全氧化物系统在环境条件下非常稳定,并显示出强大的铁电性。铁电-光响应耦合测量结果表明,在蓝色单色光下,铁电极化对短路电流的调制可达 68%。此外,有氧化锌修饰界面的系统的响应率大于没有氧化锌的系统。互补带能排列研究表明,与 ITO/BFCO 界面相比,ZnO/BFCO 界面的费米级能更低,从而减少了电荷重组,因此观察到带有 ZnO 的器件的短路电流密度增大。因此,这项研究为了解氧化锌界面层在基于 BFO 的稳定器件中的作用提供了有用的见解,有助于进一步探索其在潜在光电应用中的可行性。
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引用次数: 0
Mechanism and Application of Optical Modulation of Terahertz Waves in a Perovskite Heterojunction 过氧化物异质结中太赫兹波的光学调制机理与应用
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-13 DOI: 10.1021/acsaelm.4c0157810.1021/acsaelm.4c01578
Wen Li, Hengzhen Cheng, Caiyu Feng, Weiyi Zhou and Bo Zhang*, 

We investigated the mechanism and application of the modulation of terahertz waves using perovskite heterostructures. At the interface between PEDOT:PSS and the perovskite layers under excitation by an external light source, photogenerated carriers transferred from the perovskite layer to the PEDOT:PSS layer, which was accompanied by charge accumulation. A large number of photogenerated carriers scattered terahertz waves, thereby modulating the terahertz signal in the sample. The process of modulation and recovery of the terahertz signal by a perovskite material under external light is analogous to the principle of biological synapses, which are involved in memory and learning in animal brains. This enabled us to develop perovskite-based synaptic devices. The memory properties of perovskite heterojunction materials open up applications of terahertz technology.

我们研究了利用包晶异质结构调制太赫兹波的机制和应用。在外部光源的激发下,PEDOT:PSS 层和包晶层之间的界面上,光生载流子从包晶层转移到 PEDOT:PSS 层,并伴随着电荷积累。大量光生载流子散射太赫兹波,从而调制了样品中的太赫兹信号。包晶材料在外部光照下调制和恢复太赫兹信号的过程类似于生物突触的原理,而生物突触参与了动物大脑的记忆和学习。这使我们得以开发基于包晶的突触设备。包晶异质结材料的记忆特性为太赫兹技术的应用开辟了道路。
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引用次数: 0
Interface Engineering in All-Oxide Photovoltaic Devices Based on Photoferroelectric BiFe0.9Co0.1O3 Thin Films.
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-13 eCollection Date: 2024-11-26 DOI: 10.1021/acsaelm.4c01533
Pamela Machado, Pol Salles, Alexander Frebel, Gabriele De Luca, Eloi Ros, Christian Hagendorf, Ignasi Fina, Joaquim Puigdollers, Mariona Coll

Photoferroelectric BiFeO3 (BFO) has attracted renewed interest to be integrated into thin film photovoltaic (PV) devices as a stable, lead-free, and versatile photoabsorber with simplified architecture. While significant efforts have been dedicated toward the exploration of strategies to tailor the properties of this photoabsorber to improve the device performance, efficiencies still remain low. The modification of the BFO interface by the incorporation of transport-selective layers can offer fresh opportunities to modify the properties of the device. Identifying an optical and electrically suitable selective layer while ensuring easy device processing and controlled film properties is challenging. In this work, we determine the influence of incorporating a ZnO layer on the ferroelectric and photoresponse behavior of an epitaxial BiFe0.9Co0.1O3 (BFCO)-based heterostructure. The device is completed with Sn-doped In2O3 (ITO) and La0.7Sr0.3MnO3 (LSMO) electrodes. This all-oxide system is stable under ambient conditions and displays robust ferroelectricity. The coupled ferroelectricity-photoresponse measurements demonstrate that the short circuit current can be modulated by ferroelectric polarization in up to 68% under blue monochromatic light. Also, the responsivity of the system with the ZnO-modified interface is larger than that of the system with no ZnO. Complementary band energy alignment studies reveal that the observed increase in the short circuit current density of the device with ZnO is attributed to lower Fermi level energy at the ZnO/BFCO interface compared to the ITO/BFCO interface, which reduces charge recombination. Therefore, this study provides useful insights into the role of the ZnO interface layer in stable BFO-based devices to further explore their viability for potential optoelectronic applications.

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引用次数: 0
Paper-Based Electret Sensor/Actuator Array for Tactile Interaction 用于触觉交互的纸质驻极体传感器/执行器阵列
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-12 DOI: 10.1021/acsaelm.4c0173710.1021/acsaelm.4c01737
Yunfei Bai, Wenying Qiu, Jing Xing, Ruixi Wang, Dekuan Zhu and Min Zhang*, 

This study proposes a portable, paper-based tactile feedback system interaction device, engineered to serve blind users with an integrated platform for both input and output functionalities. The device comprises six functional units, each measuring 10 × 10 mm, crafted using a sandwiched structure of paper substrate, graphite, and two PLA films via the hot-pressing technique. Utilizing the corona charging method, the PLA electret films exhibit an impressive piezoelectric coefficient peaking at 3578 pC/N, making it highly sensitive for both sensing and actuating. The pressure sensor, used for writing purposes, demonstrates a sensitivity of 1.01 V/N, while the vibration actuator, used for reading, achieves an output force of 60 mN at an applied voltage of 400 V. Notably, both the surface charge density and the performance of the sensor and actuator stabilize post approximately 1000 interactions. Our psychophysical experiments indicate the device has a perceptible threshold voltage as low as 50 V. Subsequent tactile interaction communication tests offer a preliminary validation of the device’s applicability. The proposed tactile interaction device, being flexibly constructed and intrinsically biodegradable, paves the way for cost-effective tactile communication solutions.

本研究提出了一种基于纸张的便携式触觉反馈系统交互设备,旨在为盲人用户提供一个具有输入和输出功能的集成平台。该装置由六个功能单元组成,每个单元的尺寸为 10 × 10 毫米,采用纸基板、石墨和两层聚乳酸薄膜的夹层结构,通过热压技术制作而成。利用电晕充电法,聚乳酸驻极体薄膜显示出令人印象深刻的压电系数,峰值达到 3578 pC/N,使其在传感和致动方面都具有高灵敏度。用于书写的压力传感器的灵敏度为 1.01 V/N,而用于读取的振动致动器在施加 400 V 电压时的输出力为 60 mN。我们的心理物理实验表明,该装置的可感知阈值电压低至 50 V。所提出的触觉交互设备结构灵活,可生物降解,为具有成本效益的触觉通信解决方案铺平了道路。
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引用次数: 0
Creation of Two-Dimensional Electron Gas at the Heterointerface of CaZrO3/KTaO3 with Tunable Rashba Spin–Orbit Coupling 利用可调谐的拉什巴自旋轨道耦合在 CaZrO3/KTaO3 异界面创建二维电子气体
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-11 DOI: 10.1021/acsaelm.4c0161810.1021/acsaelm.4c01618
Shaojin Qi, Jiexing Liang, Guimei Shi, Yulin Gan, Yuansha Chen*, Yunzhong Chen* and Jirong Sun*, 

Compared to SrTiO3-based 3d two-dimensional electron gases (2DEGs), KTaO3-based 5d 2DEGs have much more exceptional physical properties, such as a higher Curie temperature of spin-polarized 2DEG, higher Tc for the 2DEG at superconducting state, and larger spin–orbit coupling. Herein, the CaZrO3 (CZO) films were deposited on KTaO3 (001) substrates at the deposition temperature varied from 700 °C to room temperature, and the conductive CZO/KTO interface was obtained at all deposition temperatures. The conductivity of the CZO/KTO heterointerface exhibits critical dependence on the film thickness, where the critical thickness for conduction increases from 3.2 to 6 nm when decreasing the deposition temperature from 700 °C to room temperature. Moreover, the electric properties of the heterointerface grown at room temperature can be modulated strongly by the light illumination. The strength of the spin–orbit coupling exhibits large relative variation with the carrier density. Under the light illumination, the strength of the spin–orbit coupling increases from ∼3.9 × 10–12 eV m to the maximum of ∼9 × 10–12 eV m, with the maximal change of the carrier density of only 3 × 1012 cm–2. The present work demonstrates an effective tuning of the special 5d-electron-based 2DEGs by light illumination, showing a feasible way for advanced optoelectronic device application.

与基于SrTiO3的三维二维电子气体(2DEG)相比,基于KTaO3的五维二维电子气体具有更优异的物理性质,例如自旋极化2DEG的居里温度更高、超导态2DEG的Tc更高以及自旋轨道耦合更大。本文在 KTaO3(001)基底上沉积了 CaZrO3(CZO)薄膜,沉积温度从 700 ℃ 到室温不等,在所有沉积温度下都获得了导电的 CZO/KTO 界面。CZO/KTO 异质界面的导电性与薄膜厚度呈临界关系,当沉积温度从 700 °C 降低到室温时,导电的临界厚度从 3.2 纳米增加到 6 纳米。此外,在室温下生长的异质表面的电学特性可受光照的强烈调制。自旋轨道耦合的强度随载流子密度的变化而呈现较大的相对变化。在光照下,自旋轨道耦合强度从 ∼3.9 × 10-12 eV m 增加到最大值 ∼9 × 10-12 eV m,而载流子密度的最大变化仅为 3 × 1012 cm-2。本研究成果证明了通过光照可以有效地调节基于 5d 电子的特殊二维电子元件,为先进光电器件的应用提供了一条可行的途径。
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引用次数: 0
Evidencing Dissipation Dilution in Large-Scale Arrays of Single-Layer WSe2 Mechanical Resonators 单层 WSe2 机械谐振器大规模阵列中的耗散稀释证明
IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC Pub Date : 2024-11-11 DOI: 10.1021/acsaelm.4c0126110.1021/acsaelm.4c01261
Michael Pitts, Matthew Feuer, Anthony K. C. Tan, Alejandro R.-P. Montblanch, James Kerfoot, Evgeny M. Alexeev, Michael Högen, Patrick Hays, Seth A. Tongay, Andrea C. Ferrari, Mete Atatüre and Dhiren M. Kara*, 

Micromechanical resonators with very low mass are highly desirable for sensing and transduction applications. Layered materials (LMs) can be used to fabricate single- to few-atom thick suspended membranes, representing the ultimate limit to low mass. Transition-metal dichalcogenides (TMDs), such as WSe2, are particularly compelling because they can host spatially confined excitons in single layer (1L), potentially enabling the creation of nonclassical mechanical states and interconnects between quantum networks and processors. However, these exciting prospects have been tempered by low device yields, invasive methods for detecting resonator motion, and high mechanical damping. Here, we report the creation of mechanical resonators by suspending 1L-WSe2 across a 90 × 90 array of 2.5-μm diameter holes with a > 75% success rate. We detect the resonator room-temperature (RT) Brownian motion and measure resonator mass to quantify contamination, using below-bandgap laser interferometry. We investigate the relation between frequency, diameter, and mechanical quality factor, which can exceed 1000 in our devices. We find the dependence agrees with the effect of dissipation dilution, highlighting the importance of reducing mechanical mode-bending. Key to this is the large-scale, high-quality arrays that make it possible to access a frequency range that surpasses previous works. Further, the ability to fabricate large numbers of 1L resonators, and the simplicity of probing their motion without electrodes or an underlying reflective substrate, facilitates previously hard-to-reach configurations, such as resonators in phononic crystals or within optical cavities.

对于传感和传导应用来说,质量极低的微型机械谐振器是非常理想的。层状材料(LMs)可用于制造单原子到几原子厚的悬浮膜,这代表了低质量的终极极限。二卤化过渡金属(TMD),如 WSe2,尤其引人注目,因为它们可以在单层(1L)中容纳空间约束激子,从而有可能创造出非经典的机械状态以及量子网络和处理器之间的互连。然而,这些令人兴奋的前景却因器件产量低、检测谐振器运动的侵入性方法以及高机械阻尼而受到了影响。在这里,我们报告了通过在 90 × 90 直径为 2.5 微米的孔阵列上悬挂 1L-WSe2 来创建机械谐振器的情况,成功率为 75%。我们利用带隙以下激光干涉测量法检测谐振器的室温布朗运动,并测量谐振器质量以量化污染。我们研究了频率、直径和机械品质因数(在我们的设备中可能超过 1000)之间的关系。我们发现,这种关系与耗散稀释效应一致,突出了减少机械模式弯曲的重要性。这其中的关键是大规模、高质量的阵列,它使我们有可能获得超越以往工作的频率范围。此外,制造大量 1L 谐振器的能力,以及在没有电极或底层反射基底的情况下探测其运动的简便性,都为以前难以触及的配置提供了便利,例如声子晶体中或光腔内的谐振器。
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ACS Applied Electronic Materials
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