Compared to SrTiO3-based 3d two-dimensional electron gases (2DEGs), KTaO3-based 5d 2DEGs have much more exceptional physical properties, such as a higher Curie temperature of spin-polarized 2DEG, higher Tc for the 2DEG at superconducting state, and larger spin–orbit coupling. Herein, the CaZrO3 (CZO) films were deposited on KTaO3 (001) substrates at the deposition temperature varied from 700 °C to room temperature, and the conductive CZO/KTO interface was obtained at all deposition temperatures. The conductivity of the CZO/KTO heterointerface exhibits critical dependence on the film thickness, where the critical thickness for conduction increases from 3.2 to 6 nm when decreasing the deposition temperature from 700 °C to room temperature. Moreover, the electric properties of the heterointerface grown at room temperature can be modulated strongly by the light illumination. The strength of the spin–orbit coupling exhibits large relative variation with the carrier density. Under the light illumination, the strength of the spin–orbit coupling increases from ∼3.9 × 10–12 eV m to the maximum of ∼9 × 10–12 eV m, with the maximal change of the carrier density of only 3 × 1012 cm–2. The present work demonstrates an effective tuning of the special 5d-electron-based 2DEGs by light illumination, showing a feasible way for advanced optoelectronic device application.
与基于SrTiO3的三维二维电子气体(2DEG)相比,基于KTaO3的五维二维电子气体具有更优异的物理性质,例如自旋极化2DEG的居里温度更高、超导态2DEG的Tc更高以及自旋轨道耦合更大。本文在 KTaO3(001)基底上沉积了 CaZrO3(CZO)薄膜,沉积温度从 700 ℃ 到室温不等,在所有沉积温度下都获得了导电的 CZO/KTO 界面。CZO/KTO 异质界面的导电性与薄膜厚度呈临界关系,当沉积温度从 700 °C 降低到室温时,导电的临界厚度从 3.2 纳米增加到 6 纳米。此外,在室温下生长的异质表面的电学特性可受光照的强烈调制。自旋轨道耦合的强度随载流子密度的变化而呈现较大的相对变化。在光照下,自旋轨道耦合强度从 ∼3.9 × 10-12 eV m 增加到最大值 ∼9 × 10-12 eV m,而载流子密度的最大变化仅为 3 × 1012 cm-2。本研究成果证明了通过光照可以有效地调节基于 5d 电子的特殊二维电子元件,为先进光电器件的应用提供了一条可行的途径。
{"title":"Creation of Two-Dimensional Electron Gas at the Heterointerface of CaZrO3/KTaO3 with Tunable Rashba Spin–Orbit Coupling","authors":"Shaojin Qi, Jiexing Liang, Guimei Shi, Yulin Gan, Yuansha Chen*, Yunzhong Chen* and Jirong Sun*, ","doi":"10.1021/acsaelm.4c0161810.1021/acsaelm.4c01618","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01618https://doi.org/10.1021/acsaelm.4c01618","url":null,"abstract":"<p >Compared to SrTiO<sub>3</sub>-based 3d two-dimensional electron gases (2DEGs), KTaO<sub>3</sub>-based 5d 2DEGs have much more exceptional physical properties, such as a higher Curie temperature of spin-polarized 2DEG, higher <i>T</i><sub><i>c</i></sub> for the 2DEG at superconducting state, and larger spin–orbit coupling. Herein, the CaZrO<sub>3</sub> (CZO) films were deposited on KTaO<sub>3</sub> (001) substrates at the deposition temperature varied from 700 °C to room temperature, and the conductive CZO/KTO interface was obtained at all deposition temperatures. The conductivity of the CZO/KTO heterointerface exhibits critical dependence on the film thickness, where the critical thickness for conduction increases from 3.2 to 6 nm when decreasing the deposition temperature from 700 °C to room temperature. Moreover, the electric properties of the heterointerface grown at room temperature can be modulated strongly by the light illumination. The strength of the spin–orbit coupling exhibits large relative variation with the carrier density. Under the light illumination, the strength of the spin–orbit coupling increases from ∼3.9 × 10<sup>–12</sup> eV m to the maximum of ∼9 × 10<sup>–12</sup> eV m, with the maximal change of the carrier density of only 3 × 10<sup>12</sup> cm<sup>–2</sup>. The present work demonstrates an effective tuning of the special 5d-electron-based 2DEGs by light illumination, showing a feasible way for advanced optoelectronic device application.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8404–8412 8404–8412"},"PeriodicalIF":4.3,"publicationDate":"2024-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142713529","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-11DOI: 10.1021/acsaelm.4c0126110.1021/acsaelm.4c01261
Michael Pitts, Matthew Feuer, Anthony K. C. Tan, Alejandro R.-P. Montblanch, James Kerfoot, Evgeny M. Alexeev, Michael Högen, Patrick Hays, Seth A. Tongay, Andrea C. Ferrari, Mete Atatüre and Dhiren M. Kara*,
Micromechanical resonators with very low mass are highly desirable for sensing and transduction applications. Layered materials (LMs) can be used to fabricate single- to few-atom thick suspended membranes, representing the ultimate limit to low mass. Transition-metal dichalcogenides (TMDs), such as WSe2, are particularly compelling because they can host spatially confined excitons in single layer (1L), potentially enabling the creation of nonclassical mechanical states and interconnects between quantum networks and processors. However, these exciting prospects have been tempered by low device yields, invasive methods for detecting resonator motion, and high mechanical damping. Here, we report the creation of mechanical resonators by suspending 1L-WSe2 across a 90 × 90 array of 2.5-μm diameter holes with a > 75% success rate. We detect the resonator room-temperature (RT) Brownian motion and measure resonator mass to quantify contamination, using below-bandgap laser interferometry. We investigate the relation between frequency, diameter, and mechanical quality factor, which can exceed 1000 in our devices. We find the dependence agrees with the effect of dissipation dilution, highlighting the importance of reducing mechanical mode-bending. Key to this is the large-scale, high-quality arrays that make it possible to access a frequency range that surpasses previous works. Further, the ability to fabricate large numbers of 1L resonators, and the simplicity of probing their motion without electrodes or an underlying reflective substrate, facilitates previously hard-to-reach configurations, such as resonators in phononic crystals or within optical cavities.
{"title":"Evidencing Dissipation Dilution in Large-Scale Arrays of Single-Layer WSe2 Mechanical Resonators","authors":"Michael Pitts, Matthew Feuer, Anthony K. C. Tan, Alejandro R.-P. Montblanch, James Kerfoot, Evgeny M. Alexeev, Michael Högen, Patrick Hays, Seth A. Tongay, Andrea C. Ferrari, Mete Atatüre and Dhiren M. Kara*, ","doi":"10.1021/acsaelm.4c0126110.1021/acsaelm.4c01261","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01261https://doi.org/10.1021/acsaelm.4c01261","url":null,"abstract":"<p >Micromechanical resonators with very low mass are highly desirable for sensing and transduction applications. Layered materials (LMs) can be used to fabricate single- to few-atom thick suspended membranes, representing the ultimate limit to low mass. Transition-metal dichalcogenides (TMDs), such as WSe<sub>2</sub>, are particularly compelling because they can host spatially confined excitons in single layer (1L), potentially enabling the creation of nonclassical mechanical states and interconnects between quantum networks and processors. However, these exciting prospects have been tempered by low device yields, invasive methods for detecting resonator motion, and high mechanical damping. Here, we report the creation of mechanical resonators by suspending 1L-WSe<sub>2</sub> across a 90 × 90 array of 2.5-μm diameter holes with <i>a</i> > 75% success rate. We detect the resonator room-temperature (RT) Brownian motion and measure resonator mass to quantify contamination, using below-bandgap laser interferometry. We investigate the relation between frequency, diameter, and mechanical quality factor, which can exceed 1000 in our devices. We find the dependence agrees with the effect of dissipation dilution, highlighting the importance of reducing mechanical mode-bending. Key to this is the large-scale, high-quality arrays that make it possible to access a frequency range that surpasses previous works. Further, the ability to fabricate large numbers of 1L resonators, and the simplicity of probing their motion without electrodes or an underlying reflective substrate, facilitates previously hard-to-reach configurations, such as resonators in phononic crystals or within optical cavities.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"7898–7905 7898–7905"},"PeriodicalIF":4.3,"publicationDate":"2024-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719154","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-09DOI: 10.1021/acsaelm.4c0163210.1021/acsaelm.4c01632
Sanghoon Baek*, Youngmin Jo, Yongwoo Lee, Jimin Kwon* and Sungjune Jung*,
Soft sensors that emulate the modulus of human skin have shown significant potential for wearable sensing applications by ensuring robust, conformal contact that enables the acquisition of high-quality signals. Organic thin-film transistor (TFT)-based pixelated soft sensor arrays have been crucial for advanced spatiotemporal signal measurements, thanks to their active-matrix configuration, which minimizes signal crosstalk. Despite these advancements, challenges such as limited sensitivity, high power consumption, and the need for cost-effective, large-area integration technologies persist, hindering their practical application. This paper explores strategies for developing high-performance TFT-based soft sensing arrays. We begin by discussing the design principles for organic TFT-based sensors, offering strategies to enhance sensitivity while reducing power consumption, with a focus on the underlying device physics. We also introduce a method for ultrathin, large-area, high-performance TFT integration using systematic inkjet printing technology. To demonstrate the practical applications of our approach, we present high-performance spatiotemporal measurements of arterial pulse waves using active-matrix pressure and optical sensing arrays. The low-power, high-sensitivity, and large-area integration strategies discussed in this paper are expected to significantly advance organic TFT-based sensors, paving the way for their practical application in healthcare, wearable technology, and environmental monitoring.
{"title":"Design and Integration of Organic Printed Thin-Film Transistor-Based Soft Biosensors for Wearable Applications","authors":"Sanghoon Baek*, Youngmin Jo, Yongwoo Lee, Jimin Kwon* and Sungjune Jung*, ","doi":"10.1021/acsaelm.4c0163210.1021/acsaelm.4c01632","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01632https://doi.org/10.1021/acsaelm.4c01632","url":null,"abstract":"<p >Soft sensors that emulate the modulus of human skin have shown significant potential for wearable sensing applications by ensuring robust, conformal contact that enables the acquisition of high-quality signals. Organic thin-film transistor (TFT)-based pixelated soft sensor arrays have been crucial for advanced spatiotemporal signal measurements, thanks to their active-matrix configuration, which minimizes signal crosstalk. Despite these advancements, challenges such as limited sensitivity, high power consumption, and the need for cost-effective, large-area integration technologies persist, hindering their practical application. This paper explores strategies for developing high-performance TFT-based soft sensing arrays. We begin by discussing the design principles for organic TFT-based sensors, offering strategies to enhance sensitivity while reducing power consumption, with a focus on the underlying device physics. We also introduce a method for ultrathin, large-area, high-performance TFT integration using systematic inkjet printing technology. To demonstrate the practical applications of our approach, we present high-performance spatiotemporal measurements of arterial pulse waves using active-matrix pressure and optical sensing arrays. The low-power, high-sensitivity, and large-area integration strategies discussed in this paper are expected to significantly advance organic TFT-based sensors, paving the way for their practical application in healthcare, wearable technology, and environmental monitoring.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"7657–7678 7657–7678"},"PeriodicalIF":4.3,"publicationDate":"2024-11-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719410","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Layered Sn- and Ge-based monochalcogenides have been known as promising semiconductor materials with appropriately narrow band gaps close to those of Si and GaAs. On the other hand, Pb-based ones possess much narrower band gaps and adopt the cubic rock-salt (RS)-type structure under ambient conditions, and their layered structures are considered thermodynamically unstable. We recently succeeded in the stabilization of GeS-type layered structures in lightly Sn-doped PbS by the combination of a high-temperature solid-state reaction with thermal quenching. In this paper, we have comprehensively investigated the relationship between the crystal structures, electronic structures, and also electronic and thermal transport properties of (Pb1–xSnx)S (x = 0–1). It is experimentally confirmed that an equilibrium phase of layered GeS-type Sn-rich (Pb1–xSnx)S is a p-type semiconductor at x ≥ 0.7, whereas n-type conduction is observed at x = 0.5 and 0.6. In contrast, the stabilized nonequilibrium layered phase with 0.2 ≤ x ≤ 0.4 is an n-type semiconductor with the band gaps of 1.18–1.22 eV, and the electron density increases up to 6.4 × 1017 cm–3 in (Pb0.8Sn0.2)S. Furthermore, the layered nonequilibrium phase exhibits an ultralow room-temperature thermal conductivity of 0.40–0.65 W/(mK), much lower than those of both end members, i.e., GeS-type SnS (x = 1) and RS-type PbS (x = 0). Based on first-principles electron and phonon transport calculations, layered n-type (Pb0.75Sn0.25)S potentially shows a high thermoelectric figure of-merit of 0.34 even at 300 K under an optimized electron concentration. The controllability of bipolar carrier polarity in layered (Pb1–xSnx)S alongside the low thermal conductivity is an advantageous characteristic for applications based on p–n homojunctions, such as photovoltaics and thermoelectrics.
层状锡基和锗基单粲化合物具有接近硅和砷化镓的适当窄带隙,是一种很有前途的半导体材料。另一方面,铅基单质具有更窄的带隙,在环境条件下呈立方体岩盐(RS)型结构,其层状结构被认为在热力学上是不稳定的。最近,我们通过高温固态反应与热淬火相结合的方法,成功地稳定了轻度掺锡 PbS 中的 GeS 型层状结构。本文全面研究了 (Pb1-xSnx)S (x = 0-1) 的晶体结构、电子结构以及电子和热传输特性之间的关系。实验证实,层状 GeS 型富锡 (Pb1-xSnx)S 的平衡相在 x ≥ 0.7 时是 p 型半导体,而在 x = 0.5 和 0.6 时则是 n 型传导。相反,0.2 ≤ x ≤ 0.4 的稳定非平衡层状相是一种 n 型半导体,带隙为 1.18-1.22 eV,电子密度在(Pb0.8Sn0.2)S 中增加到 6.4 × 1017 cm-3。此外,层状非平衡相的室温热导率为 0.40-0.65 W/(mK),远低于两个端成员(即 GeS 型 SnS(x = 1)和 RS 型 PbS(x = 0))的室温热导率。根据第一原理电子和声子输运计算,层状 n 型(Pb0.75Sn0.25)S 在优化的电子浓度下,即使在 300 K 时也可能显示出 0.34 的高热电功率。层状(Pb1-xSnx)S 中双极载流子极性的可控性以及低热导率是基于 p-n 同结的应用(如光伏和热电)的有利特性。
{"title":"Nonequilibrium Layered PbS Stabilized by Sn Doping: Bipolar Semiconductors with Low Thermal Conductivity","authors":"Mari Hiramatsu, Zhongxu Hu, Sakura Yoshikawa, Zan Yang, Xinyi He, Takayoshi Katase*, Jun-ichi Yamaura, Hajime Sagayama, Terumasa Tadano, Shigenori Ueda, Hidenori Hiramatsu, Hideo Hosono and Toshio Kamiya*, ","doi":"10.1021/acsaelm.4c0157210.1021/acsaelm.4c01572","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01572https://doi.org/10.1021/acsaelm.4c01572","url":null,"abstract":"<p >Layered Sn- and Ge-based monochalcogenides have been known as promising semiconductor materials with appropriately narrow band gaps close to those of Si and GaAs. On the other hand, Pb-based ones possess much narrower band gaps and adopt the cubic rock-salt (RS)-type structure under ambient conditions, and their layered structures are considered thermodynamically unstable. We recently succeeded in the stabilization of GeS-type layered structures in lightly Sn-doped PbS by the combination of a high-temperature solid-state reaction with thermal quenching. In this paper, we have comprehensively investigated the relationship between the crystal structures, electronic structures, and also electronic and thermal transport properties of (Pb<sub>1–<i>x</i></sub>Sn<sub><i>x</i></sub>)S (<i>x</i> = 0–1). It is experimentally confirmed that an equilibrium phase of layered GeS-type Sn-rich (Pb<sub>1–<i>x</i></sub>Sn<sub><i>x</i></sub>)S is a p-type semiconductor at <i>x</i> ≥ 0.7, whereas n-type conduction is observed at <i>x</i> = 0.5 and 0.6. In contrast, the stabilized nonequilibrium layered phase with 0.2 ≤ <i>x</i> ≤ 0.4 is an n-type semiconductor with the band gaps of 1.18–1.22 eV, and the electron density increases up to 6.4 × 10<sup>17</sup> cm<sup>–3</sup> in (Pb<sub>0.8</sub>Sn<sub>0.2</sub>)S. Furthermore, the layered nonequilibrium phase exhibits an ultralow room-temperature thermal conductivity of 0.40–0.65 W/(mK), much lower than those of both end members, i.e., GeS-type SnS (<i>x</i> = 1) and RS-type PbS (<i>x</i> = 0). Based on first-principles electron and phonon transport calculations, layered n-type (Pb<sub>0.75</sub>Sn<sub>0.25</sub>)S potentially shows a high thermoelectric figure of-merit of 0.34 even at 300 K under an optimized electron concentration. The controllability of bipolar carrier polarity in layered (Pb<sub>1–<i>x</i></sub>Sn<sub><i>x</i></sub>)S alongside the low thermal conductivity is an advantageous characteristic for applications based on p–n homojunctions, such as photovoltaics and thermoelectrics.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8339–8350 8339–8350"},"PeriodicalIF":4.3,"publicationDate":"2024-11-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719401","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-08DOI: 10.1021/acsaelm.4c0157410.1021/acsaelm.4c01574
He-Yu Chen, Jheng-Jie Lin, Sheng-Shong Wong, Zhen-You Lin, Yu-Chiang Hsieh, Kuo-En Chang, Chung-Lin Wu, Kenji Watanabe, Takashi Taniguchi, Tse-Ming Chen and Luke W. Smith*,
While two-dimensional (2D) materials have shown great promise for scaling technology nodes beyond the limits of silicon devices, key challenges remain for realizing high-quality and practical 2D field-effect transistors (FETs), including lowering contact resistance, demonstrating device structures with high electrical stability, reducing interface charge trapping, and integrating n- and p-FETs for beyond-complementary metal oxide semiconductor devices. High contact resistance often stems from Schottky contacts and Fermi level pinning and can be reduced by local doping or transferred contacts, respectively. However, these approaches to date have been mutually incompatible. Here, we combine both into a single structure and demonstrate a locally doped, transfer-contact stack containing access regions adjacent to the metal via contacts embedded in hexagonal boron nitride. Doping is applied by oxygen plasma treatment of access regions, while the fully encapsulated WSe2 channel remains pristine, creating a lateral p+–i–p+ junction. We demonstrate a reduction in contact resistance by up to >30,000 times with the contact strategy, with a lowest individual contact resistance of ∼3.6 kΩ · μm, limited by the doping density at the contacts. Our results highlight increasing doping in the contact region as being crucial for achieving improved contact resistance in p-type WSe2 devices. For our FET devices, the geometry of gates, doped access regions, and the channel are all defined by an electron beam lithography giving full and precise control over size and position. The p-FET behavior is strongly enhanced with a high on/off ratio up to 107, but ambipolar characteristics from the intrinsic channel are still retained. Negligible, temperature-independent hysteresis is achieved from T = 10 to 300 K, with only back gate carrier control. High electrical stability is evident in the excellent reproducibility of transfer characteristics between multiple contact sets on a single device and different devices. The doping reduces contact resistance by reducing the Schottky barrier height and width, achieving Ohmic IV characteristics. The doping appears very stable, with negligible degradation of performance, keeping the device for 50 days in atmosphere. This reasonably simple device structure incorporates two important strategies to enhance contact quality, improving p-FET performance and retaining intrinsic channel quality.
虽然二维(2D)材料已显示出超越硅器件极限的技术节点扩展的巨大前景,但要实现高质量和实用的二维场效应晶体管(FET),仍然面临着关键的挑战,包括降低接触电阻、展示具有高电气稳定性的器件结构、减少界面电荷捕获,以及将 n 型和 p 型场效应晶体管集成到超互补金属氧化物半导体器件中。高接触电阻通常源于肖特基接触和费米级钉销,可分别通过局部掺杂或转移接触来降低。然而,迄今为止,这些方法互不兼容。在这里,我们将这两种方法结合到一个结构中,并展示了一种局部掺杂的转移触点堆栈,其中包含与嵌入六角氮化硼的金属通路触点相邻的接入区。掺杂是通过氧等离子体处理接入区来实现的,而完全封装的 WSe2 沟道则保持原始状态,从而形成一个横向 p+-i-p+ 结。我们证明,采用这种接触策略,接触电阻最多可降低 30,000 倍,最低单个接触电阻为 ∼3.6 kΩ - μm,受接触处掺杂密度的限制。我们的研究结果突出表明,增加接触区的掺杂量对于提高 p 型 WSe2 器件的接触电阻至关重要。对于我们的场效应晶体管器件,栅极、掺杂接入区和沟道的几何形状都是通过电子束光刻技术确定的,可以完全精确地控制尺寸和位置。p 型场效应晶体管的性能大大增强,导通/关断比高达 107,但仍保留了本征沟道的伏极特性。在 T = 10 至 300 K 的温度范围内,只需控制栅极背面的载流子,就能实现可忽略的、与温度无关的滞后。高电气稳定性体现在单个器件上多个触点组之间以及不同器件之间的传输特性具有极佳的再现性。掺杂通过降低肖特基势垒高度和宽度来减少接触电阻,从而实现欧姆 IV 特性。这种掺杂显得非常稳定,在大气中保持器件 50 天的性能下降可以忽略不计。这种结构相当简单的器件采用了两种重要的策略来提高接触质量,即提高 p-FET 性能和保持固有沟道质量。
{"title":"Locally Doped Transferred Contacts for WSe2 Transistors","authors":"He-Yu Chen, Jheng-Jie Lin, Sheng-Shong Wong, Zhen-You Lin, Yu-Chiang Hsieh, Kuo-En Chang, Chung-Lin Wu, Kenji Watanabe, Takashi Taniguchi, Tse-Ming Chen and Luke W. Smith*, ","doi":"10.1021/acsaelm.4c0157410.1021/acsaelm.4c01574","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01574https://doi.org/10.1021/acsaelm.4c01574","url":null,"abstract":"<p >While two-dimensional (2D) materials have shown great promise for scaling technology nodes beyond the limits of silicon devices, key challenges remain for realizing high-quality and practical 2D field-effect transistors (FETs), including lowering contact resistance, demonstrating device structures with high electrical stability, reducing interface charge trapping, and integrating n- and p-FETs for beyond-complementary metal oxide semiconductor devices. High contact resistance often stems from Schottky contacts and Fermi level pinning and can be reduced by local doping or transferred contacts, respectively. However, these approaches to date have been mutually incompatible. Here, we combine both into a single structure and demonstrate a locally doped, transfer-contact stack containing access regions adjacent to the metal via contacts embedded in hexagonal boron nitride. Doping is applied by oxygen plasma treatment of access regions, while the fully encapsulated WSe<sub>2</sub> channel remains pristine, creating a lateral p<sup>+</sup>–i–p<sup>+</sup> junction. We demonstrate a reduction in contact resistance by up to >30,000 times with the contact strategy, with a lowest individual contact resistance of ∼3.6 kΩ · μm, limited by the doping density at the contacts. Our results highlight increasing doping in the contact region as being crucial for achieving improved contact resistance in p-type WSe<sub>2</sub> devices. For our FET devices, the geometry of gates, doped access regions, and the channel are all defined by an electron beam lithography giving full and precise control over size and position. The p-FET behavior is strongly enhanced with a high on/off ratio up to 10<sup>7</sup>, but ambipolar characteristics from the intrinsic channel are still retained. Negligible, temperature-independent hysteresis is achieved from <i>T</i> = 10 to 300 K, with only back gate carrier control. High electrical stability is evident in the excellent reproducibility of transfer characteristics between multiple contact sets on a single device and different devices. The doping reduces contact resistance by reducing the Schottky barrier height and width, achieving Ohmic IV characteristics. The doping appears very stable, with negligible degradation of performance, keeping the device for 50 days in atmosphere. This reasonably simple device structure incorporates two important strategies to enhance contact quality, improving p-FET performance and retaining intrinsic channel quality.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8319–8327 8319–8327"},"PeriodicalIF":4.3,"publicationDate":"2024-11-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/epdf/10.1021/acsaelm.4c01574","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719345","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The flexible electrothermal heaters based on the Joule heating effect have attracted extensive attention in recent years due to their wide range of applications in personal thermal management and wearable devices. However, the fabrication of this kind of flexible heater with high performance but at low cost remains a challenge. Here in this work, a high-performance and flexible electrothermal heater was developed through layer-by-layer self-assembly of graphite nanoplates (GNPs) and carbon black (CB) on paper driven by capillarity. The resistivity of the assembled GNP/CB layer was around 0.02 Ω·cm after dip-coating 10 times. The heater reached a maximum temperature of 197.3 °C with a heating rate of 23 °C s–1 under a relatively low voltage of 6 V. Importantly, no attenuation of the heating performance was observed under deformation of the device. This flexible electrothermal heater may find versatile applications, including water heating, deicing, wearable devices, and medical treatments.
{"title":"A High-Performance and Flexible Electrothermal Heater with Bending Tolerance from Layer-by-Layer Self-Assembled Graphite Nanoplates and Carbon Black on Paper","authors":"Zhou Bai, Zhijian Li, Huacui Xiang, Xiaohong Jiang, Haiwei Wu, Guodong Liu, Jiajie Liu, Hongwei Zhou and Hanbin Liu*, ","doi":"10.1021/acsaelm.4c0160510.1021/acsaelm.4c01605","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01605https://doi.org/10.1021/acsaelm.4c01605","url":null,"abstract":"<p >The flexible electrothermal heaters based on the Joule heating effect have attracted extensive attention in recent years due to their wide range of applications in personal thermal management and wearable devices. However, the fabrication of this kind of flexible heater with high performance but at low cost remains a challenge. Here in this work, a high-performance and flexible electrothermal heater was developed through layer-by-layer self-assembly of graphite nanoplates (GNPs) and carbon black (CB) on paper driven by capillarity. The resistivity of the assembled GNP/CB layer was around 0.02 Ω·cm after dip-coating 10 times. The heater reached a maximum temperature of 197.3 °C with a heating rate of 23 °C s<sup>–1</sup> under a relatively low voltage of 6 V. Importantly, no attenuation of the heating performance was observed under deformation of the device. This flexible electrothermal heater may find versatile applications, including water heating, deicing, wearable devices, and medical treatments.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8384–8393 8384–8393"},"PeriodicalIF":4.3,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719271","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-07DOI: 10.1021/acsaelm.4c0151010.1021/acsaelm.4c01510
Saurabh Khuje, Long Zhu, Jian Yu* and Shenqiang Ren*,
Flexible conducting ceramics offer exciting potential for advanced high-temperature electronic and thermal management applications, but challenges remain in achieving both flexibility and high electrical conductivity without compromising the material’s structural integrity. In this study, we present a flexible metallized E-glass fiber network formed via mixing copper molecular ink with ceramic fibers (copper-coated aluminum borosilicate) to enable strain sensing under harsh conditions, exhibiting a gauge factor of 1.34 and a response time of 100 ms at room temperature. A silicon carbide preceramic precursor was further coated to achieve a synergistic combination of high-temperature oxidation resistance. The flexible sensor functions effectively at temperatures of up to 400 °C, making it suitable for high-temperature environments, with a gauge factor of 0.181. Additionally, incorporating a printed dipole antenna allows for a self-powered system that can wirelessly respond to real-time applied strains.
柔性导电陶瓷为先进的高温电子和热管理应用提供了令人兴奋的潜力,但在实现柔性和高导电性的同时又不影响材料的结构完整性方面仍然存在挑战。在本研究中,我们介绍了一种通过将铜分子墨水与陶瓷纤维(铜涂层硼硅酸铝)混合而形成的柔性金属化 E 玻璃纤维网络,该网络可在恶劣条件下实现应变传感,在室温下的测量系数为 1.34,响应时间为 100 毫秒。为了实现高温抗氧化性的协同组合,还进一步涂覆了碳化硅陶瓷前驱体。这种柔性传感器可在高达 400 °C 的温度下有效工作,适用于高温环境,测量系数为 0.181。此外,结合印刷偶极子天线可实现自供电系统,以无线方式对实时施加的应变做出响应。
{"title":"Copper-Coated E-Glass Fiber-Based Strain Sensors for High Temperatures","authors":"Saurabh Khuje, Long Zhu, Jian Yu* and Shenqiang Ren*, ","doi":"10.1021/acsaelm.4c0151010.1021/acsaelm.4c01510","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01510https://doi.org/10.1021/acsaelm.4c01510","url":null,"abstract":"<p >Flexible conducting ceramics offer exciting potential for advanced high-temperature electronic and thermal management applications, but challenges remain in achieving both flexibility and high electrical conductivity without compromising the material’s structural integrity. In this study, we present a flexible metallized E-glass fiber network formed via mixing copper molecular ink with ceramic fibers (copper-coated aluminum borosilicate) to enable strain sensing under harsh conditions, exhibiting a gauge factor of 1.34 and a response time of 100 ms at room temperature. A silicon carbide preceramic precursor was further coated to achieve a synergistic combination of high-temperature oxidation resistance. The flexible sensor functions effectively at temperatures of up to 400 °C, making it suitable for high-temperature environments, with a gauge factor of 0.181. Additionally, incorporating a printed dipole antenna allows for a self-powered system that can wirelessly respond to real-time applied strains.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8226–8231 8226–8231"},"PeriodicalIF":4.3,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719339","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The consumption of indium (In) is an obstacle for terawatt-scale silicon heterojunction (SHJ) solar cells. To reduce the use of In and achieve sustainable development, the development of economical and environmentally friendly transparent electrodes has become a critical issue. Here, we report crystalline silicon heterojunction solar cells with reactive plasma deposition (RPD) grown ZnO:Ga2O3 (GZO) at room temperature as a transparent conductive oxide (TCO) layer. Meanwhile, SHJ solar cells with magnetron sputtered indium tin oxide (ITO) transparent conductive layers are compared as reference. GZO thin films exhibit good crystallinity with (002) preferred orientation. The optical and electrical properties of GZO thin films with different doping concentrations have been systematically studied. Under the condition of 3.0 wt % doping concentration and 545 nm thickness, the carrier concentration and electron mobility of GZO film reach 2.95 × 1020/cm3 and 32.56 cm2/V·s, respectively; thus, a resistivity of 7.46 × 10–4 Ω cm is obtained. The average transmittance of the glass/GZO film is 83.3% in the wavelength range of 400–1200 nm. The contact resistance for GZO/n-a-Si:H is calculated to be 48.0 mΩ cm2. GZO-SHJ solar cell exhibits a higher minority carrier lifetime and thus higher Voc due to less interface damage during thin film deposition. The GZO-TCO film is used in a SHJ solar cell, achieving a device efficiency of 21.48%. The results shows that gallium doping of GZO increases electrical conductivity and regulates oxygen vacancies. In-free TCO grown by a low-bombardment RPD technique will contribute to boosting the development of the SHJ solar cell photovoltaic industry.
{"title":"Highly Transparent Conductive Gallium-Doped Zinc Oxide Thin Films Grown by Reactive Plasma Deposition for Silicon Heterojunction Solar Cells","authors":"Xinliang Chen*, Xiaofeng Wang, Bingquan Liang, Aixin Sun, Diannan Li, Zheng Wang, Liyuan Hu, Dekun Zhang, Huizhi Ren, Guofu Hou, Ying Zhao, Xiaodan Zhang, Minghao Qu, Shi Yin, Xiaoning Ru, Miao Yang and Xixiang Xu, ","doi":"10.1021/acsaelm.4c0171610.1021/acsaelm.4c01716","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01716https://doi.org/10.1021/acsaelm.4c01716","url":null,"abstract":"<p >The consumption of indium (In) is an obstacle for terawatt-scale silicon heterojunction (SHJ) solar cells. To reduce the use of In and achieve sustainable development, the development of economical and environmentally friendly transparent electrodes has become a critical issue. Here, we report crystalline silicon heterojunction solar cells with reactive plasma deposition (RPD) grown ZnO:Ga<sub>2</sub>O<sub>3</sub> (GZO) at room temperature as a transparent conductive oxide (TCO) layer. Meanwhile, SHJ solar cells with magnetron sputtered indium tin oxide (ITO) transparent conductive layers are compared as reference. GZO thin films exhibit good crystallinity with (002) preferred orientation. The optical and electrical properties of GZO thin films with different doping concentrations have been systematically studied. Under the condition of 3.0 wt % doping concentration and 545 nm thickness, the carrier concentration and electron mobility of GZO film reach 2.95 × 10<sup>20</sup>/cm<sup>3</sup> and 32.56 cm<sup>2</sup>/V·s, respectively; thus, a resistivity of 7.46 × 10<sup>–4</sup> Ω cm is obtained. The average transmittance of the glass/GZO film is 83.3% in the wavelength range of 400–1200 nm. The contact resistance for GZO/n-a-Si:H is calculated to be 48.0 mΩ cm<sup>2</sup>. GZO-SHJ solar cell exhibits a higher minority carrier lifetime and thus higher <i>Voc</i> due to less interface damage during thin film deposition. The GZO-TCO film is used in a SHJ solar cell, achieving a device efficiency of 21.48%. The results shows that gallium doping of GZO increases electrical conductivity and regulates oxygen vacancies. In-free TCO grown by a low-bombardment RPD technique will contribute to boosting the development of the SHJ solar cell photovoltaic industry.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8488–8496 8488–8496"},"PeriodicalIF":4.3,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719283","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
The high theoretical capacity and low electrochemical potential make lithium metal the most promising material to replace the graphite anode. However, lithium dendrite growth is the key problem that limits the development of lithium metal batteries. As a solid electrolyte, the gel polymer electrolyte (GPE) possesses a certain ability to inhibit the growth of lithium dendrites compared with a liquid electrolyte, but the inhibition mechanism is not very clear. In this work, through the regulation of GPE cross-linking density, we verify that the cross-linked GPE network has a certain influence on the solvation structure of lithium ions. The increased cross-linking density of GPE induces the Li+ solvated sheath dominated by contact ion pairs/solvent-separated ion pairs and Li+ aggregates, which is conducive to the formation of stable LiF-rich SEIs to resist lithium dendrites. The high cross-linked GPE-based LiFePO4 full battery also exhibits a high capacity retention rate of 81.9% even after 220 cycles at a rate of 0.2C and 90.1% after 140 cycles at a rate of 0.5C. The inhibiting mechanism of lithium dendrites by the cross-linked GPE is described for the first time, which provides a better idea for the design of GPE.
{"title":"The Modulation of Cross-Linking Density in Gel Polymer Electrolyte for the Inhibition of Lithium Dendrite","authors":"Huashuo Jin, Wei Hao, Cancan Zhang*, Feng Yu* and Yong Chen*, ","doi":"10.1021/acsaelm.4c0157310.1021/acsaelm.4c01573","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01573https://doi.org/10.1021/acsaelm.4c01573","url":null,"abstract":"<p >The high theoretical capacity and low electrochemical potential make lithium metal the most promising material to replace the graphite anode. However, lithium dendrite growth is the key problem that limits the development of lithium metal batteries. As a solid electrolyte, the gel polymer electrolyte (GPE) possesses a certain ability to inhibit the growth of lithium dendrites compared with a liquid electrolyte, but the inhibition mechanism is not very clear. In this work, through the regulation of GPE cross-linking density, we verify that the cross-linked GPE network has a certain influence on the solvation structure of lithium ions. The increased cross-linking density of GPE induces the Li<sup>+</sup> solvated sheath dominated by contact ion pairs/solvent-separated ion pairs and Li<sup>+</sup> aggregates, which is conducive to the formation of stable LiF-rich SEIs to resist lithium dendrites. The high cross-linked GPE-based LiFePO<sub>4</sub> full battery also exhibits a high capacity retention rate of 81.9% even after 220 cycles at a rate of 0.2C and 90.1% after 140 cycles at a rate of 0.5C. The inhibiting mechanism of lithium dendrites by the cross-linked GPE is described for the first time, which provides a better idea for the design of GPE.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8309–8318 8309–8318"},"PeriodicalIF":4.3,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142713458","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Defects in the sidewall interfaces are critical to light-emitting efficiency of micro-light emitting diodes (μLEDs) for display applications. The efficiency decreases sharply when the LED chip size is smaller than 10 × 10 μm2 because the sidewall defect-induced nonradiative recombination process prevails. In this work, we demonstrate the efficiency improvement of GaN-based μLEDs with sizes as small as 4 × 4 μm2. Using N2 plasmon treatment at 250 °C to repair sidewall damage, the light output power of an LED with a mesa size of 4 × 4 μm2 is improved by 97.29% compared to the reference device without treatment at an injection current density of 25 A/cm2. Additionally, compared to a reference device with a mesa area of 100 × 100 μm2, the optical output power density of the 4 × 4 μm2 device shows only a 27.11% drop. To understand the effect of nitrogen plasmon treatment on the interfaces, we conducted EDX (energy-dispersive X-ray spectroscopy) and TRPL (time-resolved photoluminescence) analysis on the sidewalls of p-type GaN and the quantum well active region. We concluded that incorporating nitrogen atoms to repair the dangling bonds and, thus, a more balanced Ga/N ratio helps reduce defects and thus improve sidewall radiative efficiency.
{"title":"Sidewall Interface Nitrogen Treatment for Improving GaN-Based Micron-Scale Light-Emitting Diode Efficiency","authors":"Szu-An Chen, Xiang Li, Kuan-Heng Lin, Yi-Hong Chen and Jian-Jang Huang*, ","doi":"10.1021/acsaelm.4c0154010.1021/acsaelm.4c01540","DOIUrl":"https://doi.org/10.1021/acsaelm.4c01540https://doi.org/10.1021/acsaelm.4c01540","url":null,"abstract":"<p >Defects in the sidewall interfaces are critical to light-emitting efficiency of micro-light emitting diodes (μLEDs) for display applications. The efficiency decreases sharply when the LED chip size is smaller than 10 × 10 μm<sup>2</sup> because the sidewall defect-induced nonradiative recombination process prevails. In this work, we demonstrate the efficiency improvement of GaN-based μLEDs with sizes as small as 4 × 4 μm<sup>2</sup>. Using N<sub>2</sub> plasmon treatment at 250 °C to repair sidewall damage, the light output power of an LED with a mesa size of 4 × 4 μm<sup>2</sup> is improved by 97.29% compared to the reference device without treatment at an injection current density of 25 A/cm<sup>2</sup>. Additionally, compared to a reference device with a mesa area of 100 × 100 μm<sup>2</sup>, the optical output power density of the 4 × 4 μm<sup>2</sup> device shows only a 27.11% drop. To understand the effect of nitrogen plasmon treatment on the interfaces, we conducted EDX (energy-dispersive X-ray spectroscopy) and TRPL (time-resolved photoluminescence) analysis on the sidewalls of p-type GaN and the quantum well active region. We concluded that incorporating nitrogen atoms to repair the dangling bonds and, thus, a more balanced Ga/N ratio helps reduce defects and thus improve sidewall radiative efficiency.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"6 11","pages":"8277–8285 8277–8285"},"PeriodicalIF":4.3,"publicationDate":"2024-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://pubs.acs.org/doi/epdf/10.1021/acsaelm.4c01540","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719282","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}