首页 > 最新文献

2009 13th International Workshop on Computational Electronics最新文献

英文 中文
Simulation on Low Energy Ion Implantation into Ge and SiGe With Molecular Dynamics Method 低能离子注入Ge和SiGe的分子动力学模拟
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091152
M. Yu, Qiang Li, Jie Yang, Yingxin Qiao, Jinyan Wang, Ru Huang, Xing Zhang
Using binomial distribution, we have created a structure to describe Si 1-x Ge x substrate, so ion implantation into Ge and Si 1-x Ge x can be simulated based on Molecular dynamics method. ZBL potential is applied to describe interaction between implanted ion and target atoms. David Cai's electronic stopping power model is applied to calculate collision between implanted ion and electronics. The results of boron implantation into pure Ge and Si 1-x Ge x are compared with SIMS data. The phenomenon of fluence loss due to surface sputtering and backscattering is investigated. Factors affecting range profile and fluence loss including Ge fraction and implant tilt is also presented in this paper.This electronic document is a "live" template. The various components of your paper [title, text, heads, etc.] are already defined on the style sheet, as illustrated by the portions given in this document.
我们利用二项分布建立了描述Si 1-x Ge x衬底的结构,从而可以基于分子动力学方法模拟离子注入Ge和Si 1-x Ge x的过程。ZBL势用于描述注入离子与靶原子之间的相互作用。采用David Cai的电子停止功率模型计算注入离子与电子之间的碰撞。硼注入纯Ge和Si 1-x Ge x的结果与SIMS数据进行了比较。研究了表面溅射和后向散射导致的通量损失现象。本文还介绍了影响范围轮廓和通量损失的因素,包括Ge分数和种植体倾斜。这个电子文档是一个“实时”模板。论文的各个组成部分[标题,正文,标题等]已经在样式表中定义,如本文档中给出的部分所示。
{"title":"Simulation on Low Energy Ion Implantation into Ge and SiGe With Molecular Dynamics Method","authors":"M. Yu, Qiang Li, Jie Yang, Yingxin Qiao, Jinyan Wang, Ru Huang, Xing Zhang","doi":"10.1109/IWCE.2009.5091152","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091152","url":null,"abstract":"Using binomial distribution, we have created a structure to describe Si 1-x Ge x substrate, so ion implantation into Ge and Si 1-x Ge x can be simulated based on Molecular dynamics method. ZBL potential is applied to describe interaction between implanted ion and target atoms. David Cai's electronic stopping power model is applied to calculate collision between implanted ion and electronics. The results of boron implantation into pure Ge and Si 1-x Ge x are compared with SIMS data. The phenomenon of fluence loss due to surface sputtering and backscattering is investigated. Factors affecting range profile and fluence loss including Ge fraction and implant tilt is also presented in this paper.This electronic document is a \"live\" template. The various components of your paper [title, text, heads, etc.] are already defined on the style sheet, as illustrated by the portions given in this document.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115148559","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Correlation Effects in Silicon Nanowire MOSFETs 硅纳米线mosfet的相关效应
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091100
Changsheng Li, M. Bescond, M. Lannoo
We report a numerical study of the self-energy correction due to correlation effects from dynamic screening of the moving electron in silicon nanowire transistors. This many-body effect, which is not included in the usual Hartree approximation, is then incorporated self-consistently into a non-equilibrium Green's function (NEGF) code. The results pinpoint the importance of dielectric confinement whose magnitude can not be neglected compared to its quantum counterpart in ultimate nanowire transistors.
本文报道了硅纳米线晶体管中动态筛选运动电子所引起的自能量校正的数值研究。这种多体效应不包括在通常的哈特里近似中,然后自洽地合并到非平衡格林函数(NEGF)代码中。结果指出了介电约束的重要性,其大小与最终纳米线晶体管的量子对应物相比是不可忽视的。
{"title":"Correlation Effects in Silicon Nanowire MOSFETs","authors":"Changsheng Li, M. Bescond, M. Lannoo","doi":"10.1109/IWCE.2009.5091100","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091100","url":null,"abstract":"We report a numerical study of the self-energy correction due to correlation effects from dynamic screening of the moving electron in silicon nanowire transistors. This many-body effect, which is not included in the usual Hartree approximation, is then incorporated self-consistently into a non-equilibrium Green's function (NEGF) code. The results pinpoint the importance of dielectric confinement whose magnitude can not be neglected compared to its quantum counterpart in ultimate nanowire transistors.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"74 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114013172","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Full-3D Real-Space Simulation of Surface-Roughness Effects in Double-Gate MOSFETs 双栅mosfet表面粗糙度效应的全三维实空间模拟
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091115
C. Buran, M. Pala, M. Mouis, S. Poli
We present numerical simulations of double-gate (DG)-MOSFETs based on a full-3D self-consistent Poisson-Schrodinger algorithm within the real-space non equilibrium Green's function (NEGF) approach. We include a geometrical description of surface roughness (SR) via an exponential auto-correlation law. In order to simulate rough planar structures we adopt periodic boundary conditions along one of the transverse directions. Transfer characteristics are computed for different realistic values of the root mean square (RMS) of spatial fluctuations whereas SR-limited mobility, which is extracted from effective mobility after subtraction of the ballistic component, presents a non monotonic dependence on the inversion charge density.
本文基于全三维自洽泊松-薛定谔算法在实空间非平衡格林函数(NEGF)方法中对双栅(DG)- mosfet进行了数值模拟。我们通过指数自相关定律包含了表面粗糙度(SR)的几何描述。为了模拟粗糙的平面结构,我们沿其中一个横向方向采用周期边界条件。在空间波动均方根(RMS)的不同实际值下计算了传递特性,而在减去弹道分量后从有效迁移率中提取的sr限制迁移率与反转电荷密度呈非单调依赖关系。
{"title":"Full-3D Real-Space Simulation of Surface-Roughness Effects in Double-Gate MOSFETs","authors":"C. Buran, M. Pala, M. Mouis, S. Poli","doi":"10.1109/IWCE.2009.5091115","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091115","url":null,"abstract":"We present numerical simulations of double-gate (DG)-MOSFETs based on a full-3D self-consistent Poisson-Schrodinger algorithm within the real-space non equilibrium Green's function (NEGF) approach. We include a geometrical description of surface roughness (SR) via an exponential auto-correlation law. In order to simulate rough planar structures we adopt periodic boundary conditions along one of the transverse directions. Transfer characteristics are computed for different realistic values of the root mean square (RMS) of spatial fluctuations whereas SR-limited mobility, which is extracted from effective mobility after subtraction of the ballistic component, presents a non monotonic dependence on the inversion charge density.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"71 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122260604","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Optimization of the FIND Algorithm to Compute the Inverse of a Sparse Matrix 求稀疏矩阵逆的FIND算法的优化
Pub Date : 2009-05-01 DOI: 10.1109/IWCE.2009.5091136
S. Li, Eric F Darve
The FIND algorithm is a fast algorithm designed to calculate entries of the inverse of a sparse matrix. Such calculation is critical in many applications, e.g., quantum transport in nano-devices. For a 2D device discretized as N times N mesh, the best known algorithms have a running time of O(N 4 ), whereas FIND only requires O(N 3 ), although with a larger constant factor. By exploiting the extra sparsity and symmetry, the size of the problem where FIND becomes faster than others may decrease from a 130 times 130 mesh down to a 40 times 40 mesh. This improvement will make the optimized FIND algorithm appealing to small problems as well, thus becoming competitive for most real applications.
FIND算法是一种计算稀疏矩阵逆元素的快速算法。这种计算在许多应用中是至关重要的,例如,纳米器件中的量子输运。对于离散为N × N网格的2D设备,最著名的算法的运行时间为O(N 4),而FIND算法只需要O(N 3),尽管具有更大的常数因子。通过利用额外的稀疏性和对称性,FIND变得比其他问题更快的问题的大小可能会从130 × 130目减少到40 × 40目。这种改进将使优化后的FIND算法对小问题也具有吸引力,从而对大多数实际应用程序具有竞争力。
{"title":"Optimization of the FIND Algorithm to Compute the Inverse of a Sparse Matrix","authors":"S. Li, Eric F Darve","doi":"10.1109/IWCE.2009.5091136","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091136","url":null,"abstract":"The FIND algorithm is a fast algorithm designed to calculate entries of the inverse of a sparse matrix. Such calculation is critical in many applications, e.g., quantum transport in nano-devices. For a 2D device discretized as N times N mesh, the best known algorithms have a running time of O(N 4 ), whereas FIND only requires O(N 3 ), although with a larger constant factor. By exploiting the extra sparsity and symmetry, the size of the problem where FIND becomes faster than others may decrease from a 130 times 130 mesh down to a 40 times 40 mesh. This improvement will make the optimized FIND algorithm appealing to small problems as well, thus becoming competitive for most real applications.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114466511","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
期刊
2009 13th International Workshop on Computational Electronics
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1