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2009 13th International Workshop on Computational Electronics最新文献

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Non-Equilibrium Green's Function Calculation of Optical Absorption in Nano Optoelectronic Devices 纳米光电器件光吸收的非平衡格林函数计算
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091128
O. Kurniawan, P. Bai, E. Li
The high speed of optical devices motivates the integration between electronics and photonics. One of the most common optoelectronic devices used for such integration is a photodetector. This paper describes the formulation of an optical absorption inside a photodetector using the non-equilibrium Green's function (NEGF) framework. To illustrate the use of the formulation, optical properties of a double barrier quantum well photodetector are simulated. The photocurrent and the spectral response of the photodetector are calculated and presented. We also study the effect of varying various bias voltage and introducing non-uniformity in the effective mass. It is found that the peak locations do not change significantly under these variations.
光学器件的高速发展促进了电子学与光子学的融合。用于这种集成的最常见的光电器件之一是光电探测器。本文用非平衡格林函数(NEGF)框架描述了光电探测器内部光吸收的公式。为了说明该公式的应用,模拟了双势垒量子阱光电探测器的光学性质。计算并给出了光电探测器的光电流和光谱响应。我们还研究了改变各种偏置电压和引入非均匀性对有效质量的影响。结果表明,在这些变化下,峰的位置变化不大。
{"title":"Non-Equilibrium Green's Function Calculation of Optical Absorption in Nano Optoelectronic Devices","authors":"O. Kurniawan, P. Bai, E. Li","doi":"10.1109/IWCE.2009.5091128","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091128","url":null,"abstract":"The high speed of optical devices motivates the integration between electronics and photonics. One of the most common optoelectronic devices used for such integration is a photodetector. This paper describes the formulation of an optical absorption inside a photodetector using the non-equilibrium Green's function (NEGF) framework. To illustrate the use of the formulation, optical properties of a double barrier quantum well photodetector are simulated. The photocurrent and the spectral response of the photodetector are calculated and presented. We also study the effect of varying various bias voltage and introducing non-uniformity in the effective mass. It is found that the peak locations do not change significantly under these variations.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126475272","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Dissipative Quantum Transport using the Pauli Master Equation 利用泡利主方程的耗散量子输运
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091106
Bo Fu, M. Fischetti
On the way to develop a complete full-band quantum transport simulation using the Pauli Master Equation, we show our present results on ID n-i-n resistors, ID double barrier resonant tunneling diodes (DBRTD), and 2D double-gate field effect transistors (DGFETs) using a simplified parabolic, spherical effective-mass band-structure model accounting for nonpolar scattering with acoustic (elastic) and optical (inelastic) silicon-like phonons. We also consider the effect of point-like dopants on the access resistance of thin-body double gate devices.
在使用泡利主方程开发完整的全波段量子输运模拟的过程中,我们使用简化的抛物,球形有效质量带结构模型,说明声学(弹性)和光学(非弹性)类硅声子的非极性散射,展示了我们目前在ID n-i-n电阻器,ID双势垒共振隧道二极管(DBRTD)和2D双栅极场效应晶体管(dgfet)上的结果。我们还考虑了点状掺杂剂对薄体双栅器件接入电阻的影响。
{"title":"Dissipative Quantum Transport using the Pauli Master Equation","authors":"Bo Fu, M. Fischetti","doi":"10.1109/IWCE.2009.5091106","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091106","url":null,"abstract":"On the way to develop a complete full-band quantum transport simulation using the Pauli Master Equation, we show our present results on ID n-i-n resistors, ID double barrier resonant tunneling diodes (DBRTD), and 2D double-gate field effect transistors (DGFETs) using a simplified parabolic, spherical effective-mass band-structure model accounting for nonpolar scattering with acoustic (elastic) and optical (inelastic) silicon-like phonons. We also consider the effect of point-like dopants on the access resistance of thin-body double gate devices.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116542041","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Bias Induced Strain Effects, Short-Range Electron - Electron Interactions and Quantum Effects in AlGaN/GaN HEMTs 偏置诱导应变效应,近程电子-电子相互作用和量子效应在AlGaN/GaN hemt
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091087
A. Ashok, D. Vasileska, S. Goodnick, O. Hartin
In this paper we present state of the art modeling of GaN HEMTs, which includes for the first time simultaneous consideration of the electromechanical coupling, short-range Coulomb and quantum mechanical size quantization effects.
在本文中,我们介绍了GaN hemt的最先进的建模,其中包括首次同时考虑机电耦合,短程库仑和量子力学尺寸量子化效应。
{"title":"Bias Induced Strain Effects, Short-Range Electron - Electron Interactions and Quantum Effects in AlGaN/GaN HEMTs","authors":"A. Ashok, D. Vasileska, S. Goodnick, O. Hartin","doi":"10.1109/IWCE.2009.5091087","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091087","url":null,"abstract":"In this paper we present state of the art modeling of GaN HEMTs, which includes for the first time simultaneous consideration of the electromechanical coupling, short-range Coulomb and quantum mechanical size quantization effects.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"141 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123070384","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Device Simulation for Future Technologies 未来技术的设备仿真
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091105
M. Stettler, R. Kotlyar, T. Rakshit, T. Linton
Simulation approaches used in Intel to evaluate the applicability of new devices and materials for future microprocessor technologies are reviewed. Examples discussed include the evaluation of highly stressed materials, III -V HEMT devices, and carbon nanoribbons. The techniques employed are similar to those used in the research community, but focused on efficient evaluation within a versatile infrastructure that works for both development and research.
本文回顾了英特尔用于评估未来微处理器技术的新器件和材料的适用性的模拟方法。讨论的例子包括对高应力材料、III -V HEMT器件和碳纳米带的评估。所采用的技术与研究界使用的技术类似,但是侧重于在一个既适用于开发又适用于研究的多功能基础设施内进行有效的评估。
{"title":"Device Simulation for Future Technologies","authors":"M. Stettler, R. Kotlyar, T. Rakshit, T. Linton","doi":"10.1109/IWCE.2009.5091105","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091105","url":null,"abstract":"Simulation approaches used in Intel to evaluate the applicability of new devices and materials for future microprocessor technologies are reviewed. Examples discussed include the evaluation of highly stressed materials, III -V HEMT devices, and carbon nanoribbons. The techniques employed are similar to those used in the research community, but focused on efficient evaluation within a versatile infrastructure that works for both development and research.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"109 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123110100","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Sequential Transport in a Two-Dot Device 两点器件中的顺序传输
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091148
A. Valentin, S. Galdin-Retailleau, P. Dollfus
A physical model of sequential transport through a device containing two semiconductor nanocrystals has been developed. It is based on (i) the calculation of the nanocrystal phonon modes, (ii) the self consistent calculation of the nanocrystal electronic structure including collisional broadening, (iii) the calculation of tunnelling rates and (iv) the Monte Carlo computation of sequential tunnel transfers. The obtained I-V curve takes the form of a narrow peak whose width decreases with decreasing temperature. Lateral peaks due to phonon-assisted tunnelling appear to be strongly influenced by the temperature and by the surface phonon modes in the dots.
建立了一个包含两个半导体纳米晶体的器件的顺序输运的物理模型。它基于(i)纳米晶体声子模式的计算,(ii)包括碰撞展宽在内的纳米晶体电子结构的自一致计算,(iii)隧道速率的计算和(iv)顺序隧道传输的蒙特卡罗计算。得到的I-V曲线呈窄峰形式,其宽度随温度的降低而减小。声子辅助隧穿引起的侧峰似乎受到温度和点表面声子模式的强烈影响。
{"title":"Sequential Transport in a Two-Dot Device","authors":"A. Valentin, S. Galdin-Retailleau, P. Dollfus","doi":"10.1109/IWCE.2009.5091148","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091148","url":null,"abstract":"A physical model of sequential transport through a device containing two semiconductor nanocrystals has been developed. It is based on (i) the calculation of the nanocrystal phonon modes, (ii) the self consistent calculation of the nanocrystal electronic structure including collisional broadening, (iii) the calculation of tunnelling rates and (iv) the Monte Carlo computation of sequential tunnel transfers. The obtained I-V curve takes the form of a narrow peak whose width decreases with decreasing temperature. Lateral peaks due to phonon-assisted tunnelling appear to be strongly influenced by the temperature and by the surface phonon modes in the dots.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130017273","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Mobility Study of Polycrystalline MgZnO/ZnO Thin Film Layers with Monte Carlo Method 蒙特卡罗法研究多晶MgZnO/ZnO薄膜层的迁移率
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091118
Chih-I Huang, Yuh‐Renn Wu, I. Cheng, J. Z. Chen, Kuo‐Chuang Chiu, Tzer-Shen Lin
The study of transparent conducting oxide (TCO) has become an important area due to the applications of lighting and display technology. Therefore, high mobility and conductivity TCO materials would be a key issue to the industry. In this paper, we have applied the Monte Carlo method to analyze the mobility of single and poly-crystalline MgZnO/ZnO thin film layer. The effects of grain boundary scattering, ionized impurity scattering as well as phonon scattering have been included in our program. The grain boundary potential size and carrier screening effect has been analyzed with our developed 2D Poisson and drift-diffusion solver. With a careful design of modulation doping and including the effect of spontaneous and piezoelectric polarization, the grain boundary potential can be suppressed and thus the mobility of the ZnO layer can be improved.
由于照明和显示技术的应用,透明导电氧化物(TCO)的研究已成为一个重要的领域。因此,高迁移率和导电性的TCO材料将成为行业的关键问题。本文采用蒙特卡罗方法分析了单晶和多晶MgZnO/ZnO薄膜层的迁移率。我们的程序包括了晶界散射、离子杂质散射和声子散射的影响。利用自制的二维泊松和漂移扩散求解器对晶界电位大小和载流子筛选效应进行了分析。通过精心设计调制掺杂,并考虑自发极化和压电极化效应,可以抑制晶界势,从而提高ZnO层的迁移率。
{"title":"Mobility Study of Polycrystalline MgZnO/ZnO Thin Film Layers with Monte Carlo Method","authors":"Chih-I Huang, Yuh‐Renn Wu, I. Cheng, J. Z. Chen, Kuo‐Chuang Chiu, Tzer-Shen Lin","doi":"10.1109/IWCE.2009.5091118","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091118","url":null,"abstract":"The study of transparent conducting oxide (TCO) has become an important area due to the applications of lighting and display technology. Therefore, high mobility and conductivity TCO materials would be a key issue to the industry. In this paper, we have applied the Monte Carlo method to analyze the mobility of single and poly-crystalline MgZnO/ZnO thin film layer. The effects of grain boundary scattering, ionized impurity scattering as well as phonon scattering have been included in our program. The grain boundary potential size and carrier screening effect has been analyzed with our developed 2D Poisson and drift-diffusion solver. With a careful design of modulation doping and including the effect of spontaneous and piezoelectric polarization, the grain boundary potential can be suppressed and thus the mobility of the ZnO layer can be improved.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"75 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128698256","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Computational Study of Graphene Nanoribbon Resonant Tunneling Diodes 石墨烯纳米带共振隧道二极管的计算研究
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091097
G. Liang, H. Teong, K. Lam
The structural effects of different graphene nanoribbon resonant tunneling diodes (GNR-RTDs) are investigated under different temperatures. Although the W-shape structure outperforms the H-shape structure in term of the peak current, the peak-to-valley ratio of the H-shape is higher than the W-shape due to the smaller peak currents of the former. Furthermore, the effects of the channel length and the contact's bandgap of the W-shape GNR RTDs on device performance are studied and their detailed device physics is also provided in this work.
研究了不同石墨烯纳米带共振隧道二极管在不同温度下的结构效应。虽然w型结构在峰值电流方面优于h型结构,但由于峰值电流较小,h型结构的峰谷比高于w型结构。此外,本文还研究了w型GNR rtd的通道长度和接触面带隙对器件性能的影响,并提供了详细的器件物理特性。
{"title":"Computational Study of Graphene Nanoribbon Resonant Tunneling Diodes","authors":"G. Liang, H. Teong, K. Lam","doi":"10.1109/IWCE.2009.5091097","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091097","url":null,"abstract":"The structural effects of different graphene nanoribbon resonant tunneling diodes (GNR-RTDs) are investigated under different temperatures. Although the W-shape structure outperforms the H-shape structure in term of the peak current, the peak-to-valley ratio of the H-shape is higher than the W-shape due to the smaller peak currents of the former. Furthermore, the effects of the channel length and the contact's bandgap of the W-shape GNR RTDs on device performance are studied and their detailed device physics is also provided in this work.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"59 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130213611","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Clocking Schemes for Field Coupled Devices from Magnetic Multilayers 磁多层场耦合器件的时钟方案
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091093
Nikolaos Rizos, Murad Omar, P. Lugli, G. Csaba, M. Becherer, D. Schmitt-Landsiedel
This paper introduces a clocking scheme that can be applied in magnetic field-coupled computing devices made from Co/Pt multilayers. The clocking wires are buried under the magnetic computing layer. Oscillating currents running through these wires generate an easy-axis field in the plane of the magnets. We show that this field can propagate signals between the magnetic dots and prevents frustration and splitting of the dots into multiple domains. We demonstrate our concept on a full micromagnetic simulation of an XOR gate. We argue that largescale logic devices could be built based on this architecture.
本文介绍了一种适用于钴/铂多层磁场耦合计算器件的时钟方案。时钟线埋在磁性计算层下面。通过这些导线的振荡电流在磁体平面上产生一个易轴磁场。我们证明了这个磁场可以在磁点之间传播信号,并防止磁点分裂成多个域。我们在异或门的全微磁模拟上演示了我们的概念。我们认为,大规模的逻辑器件可以建立在这种架构的基础上。
{"title":"Clocking Schemes for Field Coupled Devices from Magnetic Multilayers","authors":"Nikolaos Rizos, Murad Omar, P. Lugli, G. Csaba, M. Becherer, D. Schmitt-Landsiedel","doi":"10.1109/IWCE.2009.5091093","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091093","url":null,"abstract":"This paper introduces a clocking scheme that can be applied in magnetic field-coupled computing devices made from Co/Pt multilayers. The clocking wires are buried under the magnetic computing layer. Oscillating currents running through these wires generate an easy-axis field in the plane of the magnets. We show that this field can propagate signals between the magnetic dots and prevents frustration and splitting of the dots into multiple domains. We demonstrate our concept on a full micromagnetic simulation of an XOR gate. We argue that largescale logic devices could be built based on this architecture.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"517 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116237812","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 21
Correction to the Schenk Model of Band-to-Band Tunneling in Silicon Applied to the Simulation of Nanowire Tunneling Transistors 应用于纳米线隧道晶体管模拟的Schenk模型的修正
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091099
A. Heigl, A. Schenk, G. Wachutka
We found out that the standard form of Schenk's model of band-to-band tunneling in silicon involves a poor approximation of the Airy-Integral and, therefore, overestimates the channel currents of realistic tunneling devices. In this paper we propose a better approximation resulting in a corrected form of the model, and we demonstrate its impact on the device characteristics of a tunneling transistor. Additionally, we investigated the influence of the corrected model on the local density correction and quantum confinement.
我们发现,Schenk的硅中带对带隧道模型的标准形式涉及到airy积分的较差近似值,因此,高估了实际隧道装置的通道电流。在本文中,我们提出了一个更好的近似,从而得到模型的更正形式,并演示了它对隧道晶体管器件特性的影响。此外,我们还研究了修正模型对局域密度修正和量子约束的影响。
{"title":"Correction to the Schenk Model of Band-to-Band Tunneling in Silicon Applied to the Simulation of Nanowire Tunneling Transistors","authors":"A. Heigl, A. Schenk, G. Wachutka","doi":"10.1109/IWCE.2009.5091099","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091099","url":null,"abstract":"We found out that the standard form of Schenk's model of band-to-band tunneling in silicon involves a poor approximation of the Airy-Integral and, therefore, overestimates the channel currents of realistic tunneling devices. In this paper we propose a better approximation resulting in a corrected form of the model, and we demonstrate its impact on the device characteristics of a tunneling transistor. Additionally, we investigated the influence of the corrected model on the local density correction and quantum confinement.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125702267","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Anatomy of Carrier Backscattering in Silicon Nanowire Transistors 硅纳米线晶体管载流子后向散射的解剖
Pub Date : 2009-05-27 DOI: 10.1109/IWCE.2009.5091085
Seonghoon Jin, T. Tang, M. Fischetti
We study the physics of carrier backscattering in silicon nanowire transistors by using the numerical solution of the multisubband Boltzmann transport equation, where relevant scattering mechanisms by acoustic and intervalley phonons, surface roughness, and ionized impurities are included, accounting for intrasubband and intersubband, and elastic and inelastic transitions. The validity of several assumptions in the virtual source model is checked against the numerical solution. We have found that scattering processes make it difficult to model the macroscopic quantities at the virtual source without self-consistent simulations.
我们利用多子带玻尔兹曼输运方程的数值解研究了硅纳米线晶体管中载流子后向散射的物理特性,其中包括声子和谷间声子、表面粗糙度和电离杂质的相关散射机制,考虑了子带内和子带间以及弹性和非弹性跃迁。通过数值解验证了虚源模型中若干假设的有效性。我们发现散射过程使得在没有自洽模拟的情况下难以模拟虚拟源处的宏观量。
{"title":"Anatomy of Carrier Backscattering in Silicon Nanowire Transistors","authors":"Seonghoon Jin, T. Tang, M. Fischetti","doi":"10.1109/IWCE.2009.5091085","DOIUrl":"https://doi.org/10.1109/IWCE.2009.5091085","url":null,"abstract":"We study the physics of carrier backscattering in silicon nanowire transistors by using the numerical solution of the multisubband Boltzmann transport equation, where relevant scattering mechanisms by acoustic and intervalley phonons, surface roughness, and ionized impurities are included, accounting for intrasubband and intersubband, and elastic and inelastic transitions. The validity of several assumptions in the virtual source model is checked against the numerical solution. We have found that scattering processes make it difficult to model the macroscopic quantities at the virtual source without self-consistent simulations.","PeriodicalId":443119,"journal":{"name":"2009 13th International Workshop on Computational Electronics","volume":"70 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2009-05-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125114527","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 8
期刊
2009 13th International Workshop on Computational Electronics
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