Polishing diamond with transition metal can significantly improve the processing efficiency and surface quality, but the lack of in-depth analysis from micro aspect limits the application and promotion of diamond. Different from the conventional approach of determining metal atom adsorption sites by calculating adsorption energy, this study employs a multi-scale simulation method combining first-principles calculations and classical molecular dynamics, integrated with the Monte Carlo annealing algorithm, to systematically investigate the adsorption configurations, adsorption behaviors, and etching mechanisms of six transition metal atoms (Fe, Co, Cu, Ni, Ti, Cr) on the diamond (111) surface. The results show that the six transition metal atoms are first spontaneously physically adsorbed to the hollow site directly above the six-membered carbon ring under the synergistic effects of van der Waals forces and electrostatic forces, which is followed by chemical adsorption. The chemisorption energy for the six atoms on the diamond (111) surface is −7.23 eV (Ti), −6.21 eV (Cr), −3.92 eV (Fe), −3.76 eV (Co), −3.65 eV (Ni) and −2.47 eV (Cu). During this process, the atoms undergo electron transfer with surrounding carbon atoms and form stable new chemical bonds, resulting in a significant decrease in the bond strength and breakage energy barrier of some interlayer C
C bonds in the first bilayer-structure, which are further weakened by high temperature until the interlayer C
C bonds are completely cleaved. Carbon atoms and carbon clusters in the free-state will be generated during continuous etching, and finally graphitization occurs. The findings would further elucidate the interface reaction mechanism between diamond and transition metals, which has important guiding significance for realizing high-quality and high-efficient machining of diamond materials.
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