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2017 IEEE International Conference on Plasma Science (ICOPS)最新文献

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Shock Wave Generation by Ultraviolet Nanosecond Laser Pulses at Reduced Pressure 紫外纳秒激光脉冲在减压条件下产生激波
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496105
C. Limbach, C. Dumitrache, A. Yalin
This study describes the pressure dependence of laser plasma formation (breakdown) due to focused, ultraviolet (UV) nanosecond laser pulses, as manifested by gas heating (temperature increase) and the strength of resultant shock waves. These effects were explored over a range of pressure from 1 – 100 Torr in pure gases of nitrogen, oxygen, methane, carbon dioxide, argon and neon at 293 Kelvin. In all cases, experiments were conducted using 8 ns pulses at the 4thharmonic of Nd:YAG (266 nm) as a plasma source, with a constant pulse energy of 55 mJ. As a consequence of the laser wavelength and low pressure conditions, it is expected that plasma formation occurs predominantly through the multi-photon ionization process (rather than electron - impact / cascade ionization) and gas heating through subsequent electron thermalization (as opposed to inverse bremsstrahlung or electron-neutral collisions).
本研究描述了聚焦的紫外纳秒激光脉冲对激光等离子体形成(击穿)的压力依赖性,表现为气体加热(温度升高)和由此产生的冲击波强度。这些效应是在由氮气、氧气、甲烷、二氧化碳、氩气和氖气组成的纯气体在293开尔文的压力范围内从1 - 100托进行研究的。在所有情况下,实验都使用Nd:YAG (266 nm)四次谐波的8 ns脉冲作为等离子体源,恒定脉冲能量为55 mJ。由于激光波长和低压条件,预计等离子体的形成主要是通过多光子电离过程(而不是电子撞击/级联电离)和通过随后的电子热化(而不是逆轫致辐射或电子中性碰撞)而发生的气体加热。
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引用次数: 0
Pulsed Discharges in Liquids: Generation and Applications* 液体中的脉冲放电:产生和应用*
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496343
J. Kolb, Camelia Miron, R. Rataj, Jana Kredl, Tilo Schulz, P. Lukeš
Plasmas that are generated submerged in a liquid offer different possibilities for material processing, material synthesis and decontamination. Moreover fundamentals on generation and plasma properties are of great scientific interest for almost a century. In particular the mechanisms for the generation of discharges with pulsed high voltages is discussed controversial. The possibility for a breakdown development that is not mediated by an initial gaseous phase is disputed especially for the application of very short high voltage pulses of only a few nanoseconds or less. Associated with this specific excitation scheme are differences in plasma development, plasma parameters and reaction mechanisms. We have compared discharges in a point-to-plane geometry that were generated with 50-us, 100-ns, 10-ns or 1-ns high voltage pulses. Time-resolved shadowgraphy and spectroscopy were performed to evaluate discharge structures, plasma parameter and reactive species that were formed in water (in some cases ethanol). Different propagation modes, with velocities from 50 m/s to 6.7 km/s were observed. Optical emission spectroscopy has shown the formation of molecular bands of nitrogen, as well as strongly broadened atomic hydrogen and oxygen lines. Although for the very short pulses an initial bubble might not be observed, further studies are underway to verify this conclusion.
浸泡在液体中产生的等离子体为材料加工、材料合成和去污提供了不同的可能性。此外,关于产生和等离子体性质的基本原理是近一个世纪以来的重大科学兴趣。特别是对脉冲高压产生放电的机理进行了有争议的讨论。非初始气相介导的击穿发展的可能性是有争议的,特别是对于只有几纳秒或更短的非常短的高压脉冲的应用。与这种特殊激励方案相关的是等离子体发育、等离子体参数和反应机制的差异。我们比较了50秒、100纳秒、10纳秒或1纳秒高压脉冲产生的点对平面几何放电。采用时间分辨阴影成像和光谱学来评估放电结构、等离子体参数和在水中(某些情况下为乙醇)形成的反应物质。观测到不同的传播模式,速度从50米/秒到6.7公里/秒不等。光学发射光谱显示了氮的分子谱带的形成,以及氢原子和氧原子谱带的强烈展宽。虽然对于非常短的脉冲,可能没有观察到初始气泡,但进一步的研究正在进行中以验证这一结论。
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引用次数: 0
Influence Of Duty Cycle On Pulse Modulated Rf Capacitively-Coupled Argon Discharge 占空比对脉冲调制射频电容耦合氩放电的影响
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496297
Lijie Chang, Xinpei Lu, Shali Yang, Xiang-mei Liu, Wei Jiang
Pulsed rf capactively-coupled discharge has attracted a lot of attention recently due to its widely applications in industrial film processes. In order to further optimize the plasma properties, a Particle-in-Cell simulation with Monte Carlo collisions was developed to explore the influence of pulsemodulated duty cycle on the sustaining of discharge and the fundamental plasma characteristics in the afterglow of pulse modulated RF capactively-coupled argon discharge at high pressure (0.3–1 Torr). It is found that, compared with the continuous wave rf plasma, the pulsed-modulated rf discharge can be sustained at a more broad driving frequency range, moreover, it can achieve higher electron density with lower electron energy for low driving frequency. At the pressure of 0.3 Torr, the electron density first decreases and then increases with the increasing duty ratio, with critical point around 2.5 MHz, while the electron temperature is inverse to that behavior. At the pressure of 1 Torr, the electron density shows the same pattern, with critical point around 6 MHz, while the electron temperature is always lower for the lower duty cycle.
脉冲射频电容耦合放电由于在工业薄膜工艺中的广泛应用,近年来引起了人们的广泛关注。为了进一步优化等离子体的性能,采用Monte Carlo碰撞模拟方法,研究了脉冲调制占空比对高压(0.3-1 Torr)脉冲调制射频电容耦合氩放电余烬中等离子体的基本特性和放电持续时间的影响。研究发现,与连续波射频等离子体相比,脉冲调制射频放电可以在更宽的驱动频率范围内持续,并且在低驱动频率下可以以更低的电子能量获得更高的电子密度。在0.3 Torr压力下,随着占空比的增加,电子密度先减小后增大,临界点在2.5 MHz左右,而电子温度与此相反。在1 Torr压力下,电子密度表现出相同的规律,临界点在6 MHz左右,而电子温度在较低的占空比下始终较低。
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引用次数: 0
New Data For Modeling Hypersonic Re-entry Into Earth’s Atmosphere: Electron-impact Ionization Of Atomic Nitrogen 模拟高超声速再入地球大气层的新数据:原子氮的电子撞击电离
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496188
C. Ciccarino, D. Savin
Space vehicles returning to Earth from beyond orbit enter the atmosphere at hypersonic velocities (greater than Mach 5). The resulting shock front generates a high temperature reactive plasma around the vehicle (with temperatures greater than 10,000 K). This intense heat is transferred to the capsule by radiative and convective processes. Designing vehicles to withstand these conditions requires an accurate understanding of the underlying non-equilibrium high temperature chemistry. Nitrogen chemistry is particularly important given the abundance of nitrogen in the atmosphere. Line emission by atomic nitrogen is a major source of radiative heating during reentry. Our ability to accurately calculate this heating is hindered by uncertainties in the electron-impact ionization (EII) rate coefficient for atomic nitrogen. 1
从轨道外返回地球的太空飞行器以高超音速(大于5马赫)进入大气层。由此产生的激波锋在飞行器周围产生高温反应性等离子体(温度大于10,000 K)。这种强烈的热量通过辐射和对流过程传递到太空舱。设计能够承受这些条件的车辆需要对潜在的非平衡高温化学有准确的了解。考虑到大气中丰富的氮元素,氮化学尤为重要。原子氮的线发射是再入时辐射加热的主要来源。我们精确计算这种加热的能力受到原子氮的电子冲击电离(EII)速率系数不确定性的阻碍。1
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引用次数: 0
Microwave Plasma Multi-point Ignition Process in Methane-air Mixtures 甲烷-空气混合物中的微波等离子体多点点火过程
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8495994
Cheng Liu, Guixin Zhang, Hong Xie, Lei Deng
Application of microwave plasma offers a potential method to produce faster combustion in internal combustion engine 1. In this paper, microwave multi-point ignition and spatial ignition had been confirmed via high-speed Schlieren imaging technique. The experiment was implemented with the microwave resonant ignition system and the Schlieren optical system. 2ms-3000W-2.45GHz microwave pulse was employed as the ignition energy source to produce initial flame kernel in the combustion chamber. The Schlieren imaging of reflected style was used to illustrate the flame development process with a high speed camera. A quartz glass coated with indium tin oxide (ITO), which ensured the sufficient microwave reflection characteristics and light transmission respectively 2, was used as the bottom of the microwave resonant chamber. Ignition experiments were conducted at high pressure of 2 bars of stoichiometric methane-air mixtures. It could be observed in Schlieren images that flame kernels were generated at more than one location simultaneously and flame propagated with different speeds in the combustion chamber. However, the number and the location of flame kernels seemed to be arbitrary.
微波等离子体的应用为内燃机加速燃烧提供了一种可能的方法。本文利用高速纹影成像技术对微波多点点火和空间点火进行了验证。实验采用微波共振点火系统和纹影光学系统进行。采用2ms-3000W-2.45GHz微波脉冲作为点火能量源,在燃烧室内产生初始火焰核。采用反射式纹影成像技术,说明了高速相机的火焰发展过程。微波谐振腔底部采用涂覆铟锡氧化物(ITO)的石英玻璃,分别保证了足够的微波反射特性和透光性2。在2 bar的化学计量甲烷-空气混合物的高压下进行了点火实验。在纹影图像中可以观察到火焰核在多个位置同时产生,火焰在燃烧室中以不同的速度传播。然而,火焰核的数量和位置似乎是任意的。
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引用次数: 0
New Staged Z-Pinch Experiments on the Mega-Ampere Current Driver Zebra* 兆安培电流驱动斑马的新阶段z夹紧实验*
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496068
F. Wessel, E. Ruskov, H. Rahman, P. Ney, J. Valenzuela, F. Conti, M. Ross, N. Aybar, J. Narkis, F. Beg, T. Darling
We report results from the latest staged Z-pinch experiments conducted on the 1MA Z-pinch Zebra facility at the University of Nevada, Reno. In these experiments a hollow shell of Krypton gas liner is injected through a supersonic nozzle (ID=2.0 cm), with a throat gap of 240 microns. The width of the anodecathode gap is 1 cm. The liner compresses a deuterium target plasma injected through a plasma gun with copper-tungsten walls. Axial magnetic field in the 1–2kG range, applied across the pinch region, stabilizes the Rayleigh-Taylor instabilities.
我们报告了在内华达大学里诺分校的1MA Z-pinch Zebra设施上进行的最新阶段Z-pinch实验的结果。在这些实验中,氪气衬垫的空心壳通过一个超音速喷嘴(ID=2.0 cm)注入,喉道间隙为240微米。正极间隙的宽度为1cm。内衬压缩通过铜钨壁等离子枪注入的氘靶等离子体。轴向磁场在1-2kG范围内,应用在整个捏区,稳定瑞利-泰勒不稳定性。
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引用次数: 0
Reactive Molecular Dynamics Simulation on Plasma-induced Destruction of Fungal Cell Wall Components 血浆诱导真菌细胞壁组分破坏的反应性分子动力学模拟
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496155
Lei Shi, T. Zhao, Yuantao Zhang, L. Zou, Li Zhang
Low-temperature atmospheric pressure plasmas are causing great attention for biomedical applications, the reactive species of which have been proven to be of great importance. However, there is very little basic research on the interaction mechanisms between the reactive species and biological components up to now. Simulating at the atomic level may be effective for acquiring a better insight in these processes. In this paper, reactive molecular dynamics simulations method is introduced to model the interaction of important reactive oxygen species, such as OH, O2 and O, with fungal chitin for a better understanding of plasma sterilization. It is found that among the reactive oxygen species mentioned above, OH radical and O atom can fracture important bonds of chitin (i.e., C-O, C-N, C-C), which subsequently results in the destruction of the fungal cell wall. All bond cleavages detected in the processes are initiated by a hydrogen-abstraction reaction from the chitin. Moreover, the OH radicals can react with each other and reduce the damage efficiency to the structure. It should also be mentioned that there is no bond cleavage events observed in the case of O2 molecules, which have only weak attractive non-bond interactions with the chitin. The simulation results are in good agreement with relevant experimental conclusions. This study can provide an important reference value for nonreversible destruction of the fungal chitin structure at the atomic level.
低温大气压等离子体在生物医学上的应用备受关注,其中的活性物质已被证明具有重要意义。然而,迄今为止,对活性物质与生物组分相互作用机理的基础研究还很少。在原子级别上进行模拟对于更好地了解这些过程可能是有效的。本文引入反应分子动力学模拟方法,模拟重要的活性氧OH、O2和O与真菌甲壳素的相互作用,以便更好地了解等离子体灭菌。发现在上述活性氧中,OH自由基和O原子可以破坏几丁质的重要键(即C-O, C-N, C-C),从而导致真菌细胞壁的破坏。在该过程中检测到的所有键裂解都是由甲壳素的吸氢反应引起的。此外,OH自由基可以相互反应,降低对结构的破坏效率。还应该提到的是,在O2分子的情况下没有观察到键断裂事件,O2分子与甲壳素只有弱的吸引非键相互作用。仿真结果与相关实验结论吻合较好。本研究可为在原子水平上对真菌几丁质结构进行不可逆破坏提供重要参考价值。
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引用次数: 0
Retarding Field Energy Analyzer Optimization And Space Charge Effects 减速场能量分析仪优化及空间电荷效应
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496310
M. Talley, S. Shannon, Lee Chen, J. Verboncoeur
In industrial plasma processing for semiconductor fabrication, it is important to understand the characteristic properties of the plasma. The ion energy distribution function (IEDf) is one such property. The IEDf has a direct impact on process outcomes. Retarding field energy analyzers (RFEAs) have been used extensively to obtain IV curves for typical process conditions. These IV curves are often analyzed using an ideal RFEA model when calculating IEDfs. However, several factors can cause a measured IV curve to deviate from an ideal one, especially for higher grid voltages and plasma densities. Three factors to consider are voltage dip within the grid holes 1, electric field non-uniformity due to the probe geometry, and space charge build up between the grids 2. This last factor is a result of high ion flux or larger grid separation caused by high grid voltages. In this study, electrostatic simulations (EM Works) and particle-in-cell (PIC) simulations (XPDP1) were used to parametrize the impact of these factors on IV curves. Electrostatic simulation results led to a RFEA geometric design that minimized vertical electric field variations. The field uniformity was improved by 25x across the sensor area after optimization. In addition, the overestimation of the IEDf due to voltage dip within the grid holes was quantified. A shift of 2–2.5 eV was observed. Computed IEDfs were reconstructed from PIC generated IV curves using regularization methods. These simulations demonstrate how IV curves vary due to space charge build up. Space charge only affected lower energy ions. The specific energy is dependent on the grid separation distance. In this case, the IV curve begins to fall off at a lower voltage with a more gradual slope causing a larger low energy tail. This non-ideality in the curve can be corrected by limiting the flux of ions into the probe or through corrections during the regularization reconstruction. By taking these factors into account, it is possible to optimize a RFEA and modify measured IV curves to better represent an ideal curve.
在半导体制造的工业等离子体加工中,了解等离子体的特性是非常重要的。离子能量分布函数(IEDf)就是这样一种性质。IEDf对过程结果有直接的影响。减速场能量分析仪(RFEAs)已被广泛用于获得典型工艺条件下的IV曲线。在计算iedf时,通常使用理想的RFEA模型来分析这些IV曲线。然而,有几个因素会导致测量的IV曲线偏离理想曲线,特别是在电网电压和等离子体密度较高的情况下。需要考虑的三个因素是:栅格孔内的电压下降1、探针几何形状导致的电场不均匀性以及栅格之间的空间电荷积累2。最后一个因素是高离子通量或高电网电压引起的较大电网分离的结果。本研究采用静电模拟(EM Works)和细胞内颗粒(PIC)模拟(XPDP1)来参数化这些因素对IV曲线的影响。静电模拟结果导致RFEA几何设计,使垂直电场变化最小。优化后,整个传感器区域的场均匀性提高了25倍。此外,还量化了由于电网孔内电压下降而导致的IEDf的高估。观察到2-2.5 eV的位移。利用正则化方法对PIC生成的IV曲线重建计算出的iedf。这些模拟演示了IV曲线是如何随着空间电荷的积累而变化的。空间电荷只影响低能离子。比能取决于网格分离距离。在这种情况下,IV曲线在较低的电压下开始下降,斜率更平缓,导致较大的低能量尾部。曲线中的这种非理想性可以通过限制进入探针的离子通量或通过正则化重建期间的修正来纠正。通过考虑这些因素,可以优化RFEA和修改测量的IV曲线,以更好地代表理想曲线。
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引用次数: 0
Is the Sheath Potential Positive or Negative at Strongly Emitting Surfaces? 在强发射表面鞘电位是正的还是负的?
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496075
M. Campanell, M. Umansky
In the recent literature, two distinct sheath solutions under strong electron emission have been reported in theoretical models, simulations, and in experiments [1], a “space-charge limited” (SCL) sheath and an “inverse” sheath. It is important to determine which sheath occurs under what conditions because they lead to sharply different particle and energy fluxes. Our current study [2] offers a unifying analysis of the strong emission problem, addressing both the presheath and sheath. We confirm from first principles that two equilibria, one with SCL sheaths and Bohm presheaths, and one with inverted sheaths/presheaths, are indeed possible whenever the emission coefficient exceeds unity, regardless of the plasma’s upstream properties (e.g., N and Te). However, we also show [3] that if cold ions are born in the potential dip of a SCL sheath, the accumulating ion space charge forces a transition to an inverse sheath. This explains why stable SCL sheaths were only observed in simulation studies without collisions in the plasma domain [4]. Assuming some ionization or CX collisions are always present in real sheaths, we predict only a monotonic inverse sheath should exist at any surface under strong emission conditions, whether a divertor plate, emissive probe, dust grain, Hall thruster channel wall, or sunlit object in space. Our new 1D simulations [2] illustrate that SCL and inverse equilibria have major differences of ion flow velocities and density gradients over presheath length scales. This will enable future experimental studies to identify the sheath state without having to probe inside the sheath itself.
在最近的文献中,在理论模型、模拟和实验[1]中报道了两种不同的鞘层在强电子发射下的解,即“空间电荷有限”(SCL)鞘层和“逆”鞘层。确定在什么条件下发生哪种鞘层是很重要的,因为它们会导致截然不同的粒子和能量通量。我们目前的研究[2]提供了对强排放问题的统一分析,涉及鞘前和鞘。我们从第一性原理证实,无论等离子体的上游性质(如N和Te)如何,只要发射系数超过1,就确实可能存在两个平衡,一个是具有SCL鞘和Bohm预鞘的平衡,另一个是具有反向鞘/预鞘的平衡。然而,我们也表明[3],如果冷离子诞生在SCL鞘层的电位倾角中,则积累的离子空间电荷迫使过渡到逆鞘层。这解释了为什么稳定的SCL鞘层只在模拟研究中观察到,在等离子体域中没有碰撞[4]。假设在真实的鞘层中总是存在一些电离或CX碰撞,我们预测在强发射条件下,无论是导流板,发射探针,尘埃颗粒,霍尔推进器通道壁还是空间中的阳光照射物体,在任何表面都应该存在单调的逆鞘层。我们新的一维模拟[2]表明,SCL和逆平衡在鞘鞘长度尺度上的离子流速度和密度梯度有很大差异。这将使未来的实验研究能够识别鞘态,而不必探测鞘本身的内部。
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引用次数: 0
Characteristics of DC Microdischarge Under Low Pressure 低压下直流微放电特性研究
Pub Date : 2017-05-01 DOI: 10.1109/PLASMA.2017.8496025
Qing Xiong, S. Ji, Lingyu Zhu, Weifeng Lu, Shiying Chen
DC microdischarge sometimes occurs in aeronautic or space equipment, which put serious threat to the safety of the devices because it has no zero current point. Aeronautic and space equipment is subjected to low pressure or even vacuum. Therefore, it is of great significance to investigate the characteristics of DC microdischarge under low pressure. A test platform of DC microdischarge was built. The DC microdischarge generation setup was put in a vacuum chamber, and the pressure varied from 0.6 kPa to 96 kPa. The current and electromagnetic radiation signals when DC microdischarge occurred were measured by Hall current sensor and Hilbert curve fractal antenna, respectively. The influences of materials, shape and moving velocity of electrode, and pressure were investigated. FFT was applied to analyze the characteristic frequency of the electromagnetic radiation signals. And the characteristic parameters were extracted. When microdischarge generates, the current has high frequency pulses superimposed on the DC current. The fast change of current results in the electromagnetic radiation. The experimental results indicate that the amplitude of the electromagnetic radiation generated by microdischarge varies with the influential parameters. With the decrease of pressure, the amplitude of electromagnetic radiation pulse of DC microdischarge generated by brass, copper and aluminum shows a descending trend, while the change of stainless steel is not obvious. However, the electromagnetic radiation pulse of DC microdischarge has a characteristic frequency range (36–41 MHz), and is independent from pressure, electrode materials, shape and moving velocity.
航空航天设备中有时会出现直流微放电现象,由于直流微放电没有零电流点,对设备的安全构成严重威胁。航空和航天设备处于低压甚至真空状态。因此,研究低压下直流微放电特性具有重要意义。搭建了直流微放电试验平台。将直流微放电产生装置置于真空室中,压力在0.6 ~ 96 kPa之间变化。采用霍尔电流传感器和希尔伯特曲线分形天线分别测量直流微放电时的电流和电磁辐射信号。考察了电极材料、电极形状、电极运动速度、压力等因素的影响。利用FFT对电磁辐射信号的特征频率进行分析。并提取了特征参数。当微放电产生时,电流在直流电流上叠加高频脉冲。电流的快速变化导致了电磁辐射。实验结果表明,微放电产生的电磁辐射幅值随影响参数的变化而变化。随着压力的降低,黄铜、铜和铝产生的直流微放电电磁辐射脉冲幅值呈下降趋势,而不锈钢的变化不明显。而直流微放电电磁辐射脉冲的特征频率范围为36-41 MHz,且与压力、电极材料、形状和移动速度无关。
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引用次数: 0
期刊
2017 IEEE International Conference on Plasma Science (ICOPS)
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