Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.499
Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe
{"title":"Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst","authors":"Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe","doi":"10.2494/photopolymer.34.499","DOIUrl":"https://doi.org/10.2494/photopolymer.34.499","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73181321","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.381
D. Sato, F. Tsumori
We propose a new method to fabricate complicated 3-dimensional glass microchannels. We employed mycelium for this purpose. Mycelium possesses a complicated, fine and three-dimensional network structure. We cultivated mycelium in silica compounds, and subsequently silica compounds were heated to be sintered. During this heating process, all the mycelium was burned off and remained a fine network channel structure in a transparent glass chip. We also tried to control of the growth of this mycelium. The growth could be changed by growth conditions. In this work, we used cyclic mechanical stimuli for this purpose. We set cyclic tensile strain to the sample under growing mycelium. This cyclic strain caused anisotropic growth of the mycelium in some condition.
{"title":"Glass Microchannel Formation by Mycelium","authors":"D. Sato, F. Tsumori","doi":"10.2494/photopolymer.34.381","DOIUrl":"https://doi.org/10.2494/photopolymer.34.381","url":null,"abstract":"We propose a new method to fabricate complicated 3-dimensional glass microchannels. We employed mycelium for this purpose. Mycelium possesses a complicated, fine and three-dimensional network structure. We cultivated mycelium in silica compounds, and subsequently silica compounds were heated to be sintered. During this heating process, all the mycelium was burned off and remained a fine network channel structure in a transparent glass chip. We also tried to control of the growth of this mycelium. The growth could be changed by growth conditions. In this work, we used cyclic mechanical stimuli for this purpose. We set cyclic tensile strain to the sample under growing mycelium. This cyclic strain caused anisotropic growth of the mycelium in some condition.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76239773","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.423
Marina Doi, Koichiro Muto, Mayuko Nara, Naiqiang Liang, K. Sano, Hiroaki Mori, R. Ishige, S. Ando
The photoluminescence (PL) properties of semi-aromatic polyimide (PI) films and their model compounds (MCs) prepared from dianhydrides having a rigid naphthalene core were analyzed. The PMMA-dispersed MC and copolymerized PI (CoPI) films derived from 2,3,6,7-naphthalenetetracarboxylic dianhydride (NTDA) exhibited long-lived phosphorescence owing to the suppression of molecular motion by the rigidity of a naphthalene core. Additionally, the PMMA-dispersed MC and the CoPI films derived from 1,5-dibromo derivative of NTDA (DBrNT) exhibited room-temperature phosphorescence due to the enhancement of spin-orbit coupling by bromine atoms. The photophysical processes of the CoPI films prepared from NTDA/DBrNT and 4,4'-oxydiphtalic dianhydride (ODPA) in which the latter absorption band is located at a shorter wavelength than the former were analyzed. After UV irradiation, efficient excitation energy transfer occurs from the ODPA to NTDA/DBrNT moieties, and only the emission from the latter moieties was observed. These results demonstrate that the CoPI films derived from two dianhydrides absorbing different UV wavelengths can be used as spectral conversion films that convert a wide range of UV-light into longer wavelength visible
{"title":"Photoluminescence Properties of Copolyimides Containing Naphthalene Core and Analysis of Excitation Energy Transfer between the Dianhydride Moieties","authors":"Marina Doi, Koichiro Muto, Mayuko Nara, Naiqiang Liang, K. Sano, Hiroaki Mori, R. Ishige, S. Ando","doi":"10.2494/photopolymer.34.423","DOIUrl":"https://doi.org/10.2494/photopolymer.34.423","url":null,"abstract":"The photoluminescence (PL) properties of semi-aromatic polyimide (PI) films and their model compounds (MCs) prepared from dianhydrides having a rigid naphthalene core were analyzed. The PMMA-dispersed MC and copolymerized PI (CoPI) films derived from 2,3,6,7-naphthalenetetracarboxylic dianhydride (NTDA) exhibited long-lived phosphorescence owing to the suppression of molecular motion by the rigidity of a naphthalene core. Additionally, the PMMA-dispersed MC and the CoPI films derived from 1,5-dibromo derivative of NTDA (DBrNT) exhibited room-temperature phosphorescence due to the enhancement of spin-orbit coupling by bromine atoms. The photophysical processes of the CoPI films prepared from NTDA/DBrNT and 4,4'-oxydiphtalic dianhydride (ODPA) in which the latter absorption band is located at a shorter wavelength than the former were analyzed. After UV irradiation, efficient excitation energy transfer occurs from the ODPA to NTDA/DBrNT moieties, and only the emission from the latter moieties was observed. These results demonstrate that the CoPI films derived from two dianhydrides absorbing different UV wavelengths can be used as spectral conversion films that convert a wide range of UV-light into longer wavelength visible","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87514520","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.75
C. Popescu, G. O'Callaghan, A. McClelland, J. Roth, T. Lada, T. Kudo, R. Dammel, M. Moinpour, Y. Cao, A.P.G. Robinson
by NMP; yet current resist formulations purposely add tertiary amines to prevent dark losses. Recent research has demonstrated that amides can accelerate deprotonation of radical cations [14] that form along the polymer backbone upon exposure to EUV. This feature helps to prevent recombination with other radicals and increases acid generation, thereby enhancing sensitivity [15]. Our goal in these studies was to design peptoids that incorporate chemical moieties adapted to functions such as adhesion to the underlying substrate, etch resistance, and solubility switching. As the peptoids examined are 10-mers, the structure of the side chains is also carefully chosen to avoid crystallization and tune the glass transition temperature. Protecting groups serving as solubility switches were selected with the goal of groups that possessed a high radical cation acidity, a property previously shown to correlate closely with the sensitivity of EUV resists. While these initial results show the potential of peptoids as photoresist materials, the ongoing research is still at an initial stage.
{"title":"Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist","authors":"C. Popescu, G. O'Callaghan, A. McClelland, J. Roth, T. Lada, T. Kudo, R. Dammel, M. Moinpour, Y. Cao, A.P.G. Robinson","doi":"10.2494/photopolymer.34.75","DOIUrl":"https://doi.org/10.2494/photopolymer.34.75","url":null,"abstract":"by NMP; yet current resist formulations purposely add tertiary amines to prevent dark losses. Recent research has demonstrated that amides can accelerate deprotonation of radical cations [14] that form along the polymer backbone upon exposure to EUV. This feature helps to prevent recombination with other radicals and increases acid generation, thereby enhancing sensitivity [15]. Our goal in these studies was to design peptoids that incorporate chemical moieties adapted to functions such as adhesion to the underlying substrate, etch resistance, and solubility switching. As the peptoids examined are 10-mers, the structure of the side chains is also carefully chosen to avoid crystallization and tune the glass transition temperature. Protecting groups serving as solubility switches were selected with the goal of groups that possessed a high radical cation acidity, a property previously shown to correlate closely with the sensitivity of EUV resists. While these initial results show the potential of peptoids as photoresist materials, the ongoing research is still at an initial stage.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86154672","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.285
Seihou Jinnai, Y. Ie
Fine-tuning physical properties by structural modification is important for developing organic semiconducting materials. In this work, we designed and synthesized new electron-accepting compounds containing or naphtho[1,2- c :5,6- c' ]bis[1,2,5]thiadiazole (NTz) groups as electron-accepting units; these units are structural isomers. The vNTz-based compounds have an arch-shaped molecular backbone with C 2v symmetry, whereas the NTz-based compound forms an S-shaped molecular backbone with C 2h symmetry. Property measurements showed unique behavior originating from the vNTz core. An organic solar cell comprising the vNTz-based compound and poly(3-hexylthiopehene) showed a power conversion efficiency of 2.06%. This result demonstrates the potential of vNTz as an electron-accepting unit in organic semiconducting materials.
{"title":"Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors","authors":"Seihou Jinnai, Y. Ie","doi":"10.2494/photopolymer.34.285","DOIUrl":"https://doi.org/10.2494/photopolymer.34.285","url":null,"abstract":"Fine-tuning physical properties by structural modification is important for developing organic semiconducting materials. In this work, we designed and synthesized new electron-accepting compounds containing or naphtho[1,2- c :5,6- c' ]bis[1,2,5]thiadiazole (NTz) groups as electron-accepting units; these units are structural isomers. The vNTz-based compounds have an arch-shaped molecular backbone with C 2v symmetry, whereas the NTz-based compound forms an S-shaped molecular backbone with C 2h symmetry. Property measurements showed unique behavior originating from the vNTz core. An organic solar cell comprising the vNTz-based compound and poly(3-hexylthiopehene) showed a power conversion efficiency of 2.06%. This result demonstrates the potential of vNTz as an electron-accepting unit in organic semiconducting materials.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89286889","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.27
T. Horiuchi, Jun Watanabe, J. Iwasaki, Hiroshi Kobayashi
Plastic optical fiber matrices with squared ends were investigated. Such fiber matrices are particularly required for printing two dimensional code marks by using them as new lithography tools combining with light emitting diodes. A large number of fibers with a diameter of 500 µm were packed in an oblong slit of a jig, and fiber ends were simultaneously transformed into square shapes by heating the jig on a hotplate. Next, three linear arrays, each composed of 10 fibers, were simply stacked and bound without coating any adhesives and/or opaque films. It was anticipated that light leaks from neighbored bright fibers degraded the printed pattern qualities. However, checker patterns were normally printed without influenced by neighbored bright fibers when the fiber ends were projected on a wafer through a 1/10 projection lens. Considering the advantages, a regularly arranged 10×10 fiber matrix was fabricated on trial for demonstrating the availability of the matrix required for developing a matrix-exposure lithography system.
{"title":"Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers","authors":"T. Horiuchi, Jun Watanabe, J. Iwasaki, Hiroshi Kobayashi","doi":"10.2494/photopolymer.34.27","DOIUrl":"https://doi.org/10.2494/photopolymer.34.27","url":null,"abstract":"Plastic optical fiber matrices with squared ends were investigated. Such fiber matrices are particularly required for printing two dimensional code marks by using them as new lithography tools combining with light emitting diodes. A large number of fibers with a diameter of 500 µm were packed in an oblong slit of a jig, and fiber ends were simultaneously transformed into square shapes by heating the jig on a hotplate. Next, three linear arrays, each composed of 10 fibers, were simply stacked and bound without coating any adhesives and/or opaque films. It was anticipated that light leaks from neighbored bright fibers degraded the printed pattern qualities. However, checker patterns were normally printed without influenced by neighbored bright fibers when the fiber ends were projected on a wafer through a 1/10 projection lens. Considering the advantages, a regularly arranged 10×10 fiber matrix was fabricated on trial for demonstrating the availability of the matrix required for developing a matrix-exposure lithography system.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80625316","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.225
H. Nakamura, Y. Kobayashi, Me Ota, M. Aizawa, S. Kubo, A. Shishido
16. S. Yamaguchi, S. Tabuchi, S. Kawahara, and H. Murakami, Chem. Lett., 45 (2016) 463. 17. S. Yamaguchi, R. Nakanishi, M. Nanchi, S. Kawahara, and H. Murakami, Chem. Lett., 47 (2018) 344. 18. Y. Wang, F. Weng, J. Li, L. Lai, W. Yu, S. J. Severtson, and W.-J. Wang, ACS Omega, 3 (2018) 6945. 19. C. Fang and Z. Lin, Int. J. Adhes. Adhes., 61 (2015) 1. 20. C. Fang, Y. Jing, Y. Zong, and Z. Lin, J. Adhes. Sci. Technol., 31 (2017) 858. 21. Y. Wang, K. Jia, C. Xiang, J. Yang, X. Yao, and Z. Suo, ACS Appl. Mater. Interfaces, 11 (2019) 40749. 22. E. S. Kim, D. B. Song, K. H. Choi, J. H. Lee, D. H. Suh, and W. J. Choi, J. Polym. Sci., 58 (2020) 3358. 23. R. Vendamme, N. Schüwer, and W. Eevers, J. Appl. Polym. Sci., 131 (2014) 40669. 24. Q. Chen, Q. Yang, P. Gao, B. Chi, J. Nie, and Y. He, Ind. Eng. Chem. Res., 58 (2019) 2970. 25. P. Hao, T. Zhao, L. Wang, S. Liu, E. Tang, and X. Xu, Prog. Org. Coat., 137 (2019) 105281. 26. M. Koike, M. Aizawa, N. Akamatsu, A. Shishido, Y. Matsuzawa, and T. Yamamoto, Bull. Chem. Soc. Jpn., 93 (2020) 1588. 27. G.-S. Shim, J.-S. Kim, J.-H. Back, S.-W. Jang, J.-W. Park, H.-J. Kim, J.-S. Choi, and J.-S. Yeom, Int. J. Adhes. Adhes., 96 (2020) 102445. 28. P. Bednarczyk, K. Mozelewska, and Z. Czech, Int. J. Adhes. Adhes., 102 (2020) 102652. 29. K. Suyama and H. Tachi, J. Photopolym. Sci. Technol., 28 (2015) 45. Fabrication of Diffractive Waveplates by Scanning Wave Photopolymerization with Digital Light Processor
{"title":"Fabrication of Diffractive Waveplates by Scanning Wave Photopolymerization with Digital Light Processor","authors":"H. Nakamura, Y. Kobayashi, Me Ota, M. Aizawa, S. Kubo, A. Shishido","doi":"10.2494/photopolymer.34.225","DOIUrl":"https://doi.org/10.2494/photopolymer.34.225","url":null,"abstract":"16. S. Yamaguchi, S. Tabuchi, S. Kawahara, and H. Murakami, Chem. Lett., 45 (2016) 463. 17. S. Yamaguchi, R. Nakanishi, M. Nanchi, S. Kawahara, and H. Murakami, Chem. Lett., 47 (2018) 344. 18. Y. Wang, F. Weng, J. Li, L. Lai, W. Yu, S. J. Severtson, and W.-J. Wang, ACS Omega, 3 (2018) 6945. 19. C. Fang and Z. Lin, Int. J. Adhes. Adhes., 61 (2015) 1. 20. C. Fang, Y. Jing, Y. Zong, and Z. Lin, J. Adhes. Sci. Technol., 31 (2017) 858. 21. Y. Wang, K. Jia, C. Xiang, J. Yang, X. Yao, and Z. Suo, ACS Appl. Mater. Interfaces, 11 (2019) 40749. 22. E. S. Kim, D. B. Song, K. H. Choi, J. H. Lee, D. H. Suh, and W. J. Choi, J. Polym. Sci., 58 (2020) 3358. 23. R. Vendamme, N. Schüwer, and W. Eevers, J. Appl. Polym. Sci., 131 (2014) 40669. 24. Q. Chen, Q. Yang, P. Gao, B. Chi, J. Nie, and Y. He, Ind. Eng. Chem. Res., 58 (2019) 2970. 25. P. Hao, T. Zhao, L. Wang, S. Liu, E. Tang, and X. Xu, Prog. Org. Coat., 137 (2019) 105281. 26. M. Koike, M. Aizawa, N. Akamatsu, A. Shishido, Y. Matsuzawa, and T. Yamamoto, Bull. Chem. Soc. Jpn., 93 (2020) 1588. 27. G.-S. Shim, J.-S. Kim, J.-H. Back, S.-W. Jang, J.-W. Park, H.-J. Kim, J.-S. Choi, and J.-S. Yeom, Int. J. Adhes. Adhes., 96 (2020) 102445. 28. P. Bednarczyk, K. Mozelewska, and Z. Czech, Int. J. Adhes. Adhes., 102 (2020) 102652. 29. K. Suyama and H. Tachi, J. Photopolym. Sci. Technol., 28 (2015) 45. Fabrication of Diffractive Waveplates by Scanning Wave Photopolymerization with Digital Light Processor","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78358851","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.49
Takeo Watanabe, T. Harada, Shinji Yamakawa
Extreme ultraviolet lithography was started to use for the production of 7-nm node-logic-semiconductor devices in 2019. And it was adapted to use for high volume manufacturing (HVM) of 5-nm logic devices in 2020. EUVL is required to be extended to use in 1.5-nm-node-device fabrications. However, it still has many technical issues. Especially, for EUV resists, simultaneous achievement of high sensitivity and low line edge width are required. To solve the EUV resist issue, the fundamental work using synchrotron in soft X-ray region is necessary. The fundamental evaluation study of EUV resist at NewSUBARU synchrotron light facility is described in this paper.
{"title":"Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility","authors":"Takeo Watanabe, T. Harada, Shinji Yamakawa","doi":"10.2494/photopolymer.34.49","DOIUrl":"https://doi.org/10.2494/photopolymer.34.49","url":null,"abstract":"Extreme ultraviolet lithography was started to use for the production of 7-nm node-logic-semiconductor devices in 2019. And it was adapted to use for high volume manufacturing (HVM) of 5-nm logic devices in 2020. EUVL is required to be extended to use in 1.5-nm-node-device fabrications. However, it still has many technical issues. Especially, for EUV resists, simultaneous achievement of high sensitivity and low line edge width are required. To solve the EUV resist issue, the fundamental work using synchrotron in soft X-ray region is necessary. The fundamental evaluation study of EUV resist at NewSUBARU synchrotron light facility is described in this paper.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73888209","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.127
Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi
{"title":"Impact of Water Treatment Reactor using TiO2-coated Micropillar Made by UV-NIL","authors":"Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi","doi":"10.2494/photopolymer.34.127","DOIUrl":"https://doi.org/10.2494/photopolymer.34.127","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74002259","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.401
A. Sekiguchi, Masashi Yamamoto, T. Kumagai, Youichirou Mori, H. Minami, M. Aikawa, H. Horibe
Biomimetics (or biomimicry) is a field of technologies based on imitating various functions and properties of organisms. examined structure structures the scale nanoholes, the thin water is costly and unsuitable for mass production. To overcome these issues, we sought to develop elemental technologies for providing antifouling properties to biliary stents, which are made of polyethylenes (PEs), by forming nanostructures directly on the inner surface, using atmospheric pressure low-temperature plasma. We formed nanostructures on the inner walls of PE tubes of varying diameters under varying plasma conditions. We then examined the resulting structures and effects of the antifouling properties thus imparted.
{"title":"Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma","authors":"A. Sekiguchi, Masashi Yamamoto, T. Kumagai, Youichirou Mori, H. Minami, M. Aikawa, H. Horibe","doi":"10.2494/photopolymer.34.401","DOIUrl":"https://doi.org/10.2494/photopolymer.34.401","url":null,"abstract":"Biomimetics (or biomimicry) is a field of technologies based on imitating various functions and properties of organisms. examined structure structures the scale nanoholes, the thin water is costly and unsuitable for mass production. To overcome these issues, we sought to develop elemental technologies for providing antifouling properties to biliary stents, which are made of polyethylenes (PEs), by forming nanostructures directly on the inner surface, using atmospheric pressure low-temperature plasma. We formed nanostructures on the inner walls of PE tubes of varying diameters under varying plasma conditions. We then examined the resulting structures and effects of the antifouling properties thus imparted.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84989692","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
京公网安备 11010802042870号
京ICP备2023020795号-1
扫码关注我们
求助内容：
应助结果提醒方式：