Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.75
C. Popescu, G. O'Callaghan, A. McClelland, J. Roth, T. Lada, T. Kudo, R. Dammel, M. Moinpour, Y. Cao, A.P.G. Robinson
by NMP; yet current resist formulations purposely add tertiary amines to prevent dark losses. Recent research has demonstrated that amides can accelerate deprotonation of radical cations [14] that form along the polymer backbone upon exposure to EUV. This feature helps to prevent recombination with other radicals and increases acid generation, thereby enhancing sensitivity [15]. Our goal in these studies was to design peptoids that incorporate chemical moieties adapted to functions such as adhesion to the underlying substrate, etch resistance, and solubility switching. As the peptoids examined are 10-mers, the structure of the side chains is also carefully chosen to avoid crystallization and tune the glass transition temperature. Protecting groups serving as solubility switches were selected with the goal of groups that possessed a high radical cation acidity, a property previously shown to correlate closely with the sensitivity of EUV resists. While these initial results show the potential of peptoids as photoresist materials, the ongoing research is still at an initial stage.
{"title":"Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist","authors":"C. Popescu, G. O'Callaghan, A. McClelland, J. Roth, T. Lada, T. Kudo, R. Dammel, M. Moinpour, Y. Cao, A.P.G. Robinson","doi":"10.2494/photopolymer.34.75","DOIUrl":"https://doi.org/10.2494/photopolymer.34.75","url":null,"abstract":"by NMP; yet current resist formulations purposely add tertiary amines to prevent dark losses. Recent research has demonstrated that amides can accelerate deprotonation of radical cations [14] that form along the polymer backbone upon exposure to EUV. This feature helps to prevent recombination with other radicals and increases acid generation, thereby enhancing sensitivity [15]. Our goal in these studies was to design peptoids that incorporate chemical moieties adapted to functions such as adhesion to the underlying substrate, etch resistance, and solubility switching. As the peptoids examined are 10-mers, the structure of the side chains is also carefully chosen to avoid crystallization and tune the glass transition temperature. Protecting groups serving as solubility switches were selected with the goal of groups that possessed a high radical cation acidity, a property previously shown to correlate closely with the sensitivity of EUV resists. While these initial results show the potential of peptoids as photoresist materials, the ongoing research is still at an initial stage.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"80 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86154672","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.27
T. Horiuchi, Jun Watanabe, J. Iwasaki, Hiroshi Kobayashi
Plastic optical fiber matrices with squared ends were investigated. Such fiber matrices are particularly required for printing two dimensional code marks by using them as new lithography tools combining with light emitting diodes. A large number of fibers with a diameter of 500 µm were packed in an oblong slit of a jig, and fiber ends were simultaneously transformed into square shapes by heating the jig on a hotplate. Next, three linear arrays, each composed of 10 fibers, were simply stacked and bound without coating any adhesives and/or opaque films. It was anticipated that light leaks from neighbored bright fibers degraded the printed pattern qualities. However, checker patterns were normally printed without influenced by neighbored bright fibers when the fiber ends were projected on a wafer through a 1/10 projection lens. Considering the advantages, a regularly arranged 10×10 fiber matrix was fabricated on trial for demonstrating the availability of the matrix required for developing a matrix-exposure lithography system.
{"title":"Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers","authors":"T. Horiuchi, Jun Watanabe, J. Iwasaki, Hiroshi Kobayashi","doi":"10.2494/photopolymer.34.27","DOIUrl":"https://doi.org/10.2494/photopolymer.34.27","url":null,"abstract":"Plastic optical fiber matrices with squared ends were investigated. Such fiber matrices are particularly required for printing two dimensional code marks by using them as new lithography tools combining with light emitting diodes. A large number of fibers with a diameter of 500 µm were packed in an oblong slit of a jig, and fiber ends were simultaneously transformed into square shapes by heating the jig on a hotplate. Next, three linear arrays, each composed of 10 fibers, were simply stacked and bound without coating any adhesives and/or opaque films. It was anticipated that light leaks from neighbored bright fibers degraded the printed pattern qualities. However, checker patterns were normally printed without influenced by neighbored bright fibers when the fiber ends were projected on a wafer through a 1/10 projection lens. Considering the advantages, a regularly arranged 10×10 fiber matrix was fabricated on trial for demonstrating the availability of the matrix required for developing a matrix-exposure lithography system.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"102 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80625316","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.505
Atsuki Hosaka, Tsubasa Miyaki, Y. Mizushima, Satomi Hamada, Ryota Koshino, A. Fukunaga, T. Sanada
This study investigates nodule deformation and contact area during PVA roller-type brush scrubbing to clarify their relationship with cross-contamination. Two high-speed video cameras with collimating LED light sources and an evanescent field on a prism enabled us to observe brush nodule deformation and contact area. Deformation analysis showed that the volume of a roller-type brush changes gradually at the beginning of compression, deforms more when vertically pushed at maximum compression, and then recovers rapidly at the end of compression. The brush contact area changes according to the brush and wafer rotation speed. The contact area can be categorized into three: the front, rear side face in the brush traveling direction, and vertically pushed bottom face on the surface. We analyzed the three types of brush contacts on a 100 mm type wafer and observed that the vertical compression type significantly affected the cross-contamination region.
{"title":"Nodule Deformation on Cleaning of PVA Roller Brushes and its Relation to Cross-contamination","authors":"Atsuki Hosaka, Tsubasa Miyaki, Y. Mizushima, Satomi Hamada, Ryota Koshino, A. Fukunaga, T. Sanada","doi":"10.2494/photopolymer.34.505","DOIUrl":"https://doi.org/10.2494/photopolymer.34.505","url":null,"abstract":"This study investigates nodule deformation and contact area during PVA roller-type brush scrubbing to clarify their relationship with cross-contamination. Two high-speed video cameras with collimating LED light sources and an evanescent field on a prism enabled us to observe brush nodule deformation and contact area. Deformation analysis showed that the volume of a roller-type brush changes gradually at the beginning of compression, deforms more when vertically pushed at maximum compression, and then recovers rapidly at the end of compression. The brush contact area changes according to the brush and wafer rotation speed. The contact area can be categorized into three: the front, rear side face in the brush traveling direction, and vertically pushed bottom face on the surface. We analyzed the three types of brush contacts on a 100 mm type wafer and observed that the vertical compression type significantly affected the cross-contamination region.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"41 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74006296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.219
H. Hayashi, Hideki Tachi, K. Suyama
We prepared a new polyphthalaldehyde (PPA) macromonomer by introducing a polymerizable methacryloyl group at the terminal of PPA main-chain. Resulting macromonomer was copolymerized with butyl acrylate to obtain pressure-sensitive adhesives (PSAs). We also compared the behavior of the copolymers with those of polymer blends of poly(butyl acrylate) and linear PPA polymers to clarify the role of polymerization. Higher peel strengths were observed for copolymers than those of corresponding polymer blends. As an increase in irradiation time, the strength generally decreased, although once increased for the copolymer films at the early stage. These results suggest that the introduction and the depolymerization of PPA side-chains caused drastic changes in adhesive properties.
{"title":"Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation","authors":"H. Hayashi, Hideki Tachi, K. Suyama","doi":"10.2494/photopolymer.34.219","DOIUrl":"https://doi.org/10.2494/photopolymer.34.219","url":null,"abstract":"We prepared a new polyphthalaldehyde (PPA) macromonomer by introducing a polymerizable methacryloyl group at the terminal of PPA main-chain. Resulting macromonomer was copolymerized with butyl acrylate to obtain pressure-sensitive adhesives (PSAs). We also compared the behavior of the copolymers with those of polymer blends of poly(butyl acrylate) and linear PPA polymers to clarify the role of polymerization. Higher peel strengths were observed for copolymers than those of corresponding polymer blends. As an increase in irradiation time, the strength generally decreased, although once increased for the copolymer films at the early stage. These results suggest that the introduction and the depolymerization of PPA side-chains caused drastic changes in adhesive properties.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"144 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74249396","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.439
Hayato Maeda, Y. Nabae, T. Hayakawa
This study aimed to form a perpendicularly orientated lamellar structure with polystyrene-block -poly(methyl methacrylate) (PS- b -PMMA) by its microphase separation on a polyimide substrate. Eight types of polyimides were prepared from different combinations of monomers and tested as the bottom layer for the microphase separation of PS- b -PMMA. The surface free energies of those polyimide substrates were evaluated by the Owens-Wendt method. Thin films of PS- b -PMMA were prepared on the polyimide substrates and the self-assembly was induced by thermal annealing, and the surface architecture was observed by atomic force microscopy. In the tested polyimide substrates, only one from 2,2-bis[4-(3,4-dicarboxyphenoxy) phenyl]propane dianhydride (tetracarboxylic dianhydride) and 1,12-bis (4-aminophenoxy) dodecane (diamine) showed a perpendicularly oriented lamellar structure. This polyimide substrate shows one of the smallest polar components in its surface free energy. Relatively large domain size and long correlation length in the PS- b -PMMA layer were obtained by optimizing the conditions for fabrication of the polyimide substrate, which were prepared by casting the polyimide onto a silicon wafer, followed by thermal annealing. These results suggest that the combination of one monomer with relatively large molecular weight, which will result in a low density of imide groups, and the other monomer with long alkyl chains, which will reduce the polarity of the resulting polyimide, contributes to providing a perpendicular orientation.
本研究旨在利用聚苯乙烯-嵌段聚甲基丙烯酸甲酯(PS- b - pmma)在聚酰亚胺基底上的微相分离形成垂直取向的层状结构。以不同的单体组合制备了8种不同类型的聚酰亚胺，并对其作为微相分离PS- b - pmma的底层进行了测试。用Owens-Wendt法计算了这些聚酰亚胺衬底的表面自由能。在聚酰亚胺基底上制备了PS- b - pmma薄膜，通过热退火诱导其自组装，并用原子力显微镜观察其表面结构。在测试的聚酰亚胺底物中，只有2,2-二[4-(3,4-二氧基苯氧基)苯基]丙烷二酐(四羧基二酐)和1,12-二(4-氨基苯氧基)十二烷(二胺)表现出垂直取向的层状结构。这种聚酰亚胺衬底在其表面自由能中显示出最小的极性组分之一。通过优化聚酰亚胺衬底的制备条件，将聚酰亚胺浇铸在硅片上，然后进行热处理，得到了较大的畴尺寸和较长的相关长度。这些结果表明，一个相对较大分子量的单体的组合将导致亚胺基团的密度低，而另一个具有长烷基链的单体的组合将降低所得聚酰亚胺的极性，有助于提供垂直取向。
{"title":"Orientation Control of the Microphase-separated Nanostructures of Block Copolymers on Polyimide Substrates","authors":"Hayato Maeda, Y. Nabae, T. Hayakawa","doi":"10.2494/photopolymer.34.439","DOIUrl":"https://doi.org/10.2494/photopolymer.34.439","url":null,"abstract":"This study aimed to form a perpendicularly orientated lamellar structure with polystyrene-block -poly(methyl methacrylate) (PS- b -PMMA) by its microphase separation on a polyimide substrate. Eight types of polyimides were prepared from different combinations of monomers and tested as the bottom layer for the microphase separation of PS- b -PMMA. The surface free energies of those polyimide substrates were evaluated by the Owens-Wendt method. Thin films of PS- b -PMMA were prepared on the polyimide substrates and the self-assembly was induced by thermal annealing, and the surface architecture was observed by atomic force microscopy. In the tested polyimide substrates, only one from 2,2-bis[4-(3,4-dicarboxyphenoxy) phenyl]propane dianhydride (tetracarboxylic dianhydride) and 1,12-bis (4-aminophenoxy) dodecane (diamine) showed a perpendicularly oriented lamellar structure. This polyimide substrate shows one of the smallest polar components in its surface free energy. Relatively large domain size and long correlation length in the PS- b -PMMA layer were obtained by optimizing the conditions for fabrication of the polyimide substrate, which were prepared by casting the polyimide onto a silicon wafer, followed by thermal annealing. These results suggest that the combination of one monomer with relatively large molecular weight, which will result in a low density of imide groups, and the other monomer with long alkyl chains, which will reduce the polarity of the resulting polyimide, contributes to providing a perpendicular orientation.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"28 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73034268","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.499
Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe
{"title":"Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H2/O2 Mixtures Activated on a Tungsten Hot-wire Catalyst","authors":"Koki Akita, Shota Sogo, Ryusei Sogame, Masashi Yamamoto, S. Nagaoka, H. Umemoto, H. Horibe","doi":"10.2494/photopolymer.34.499","DOIUrl":"https://doi.org/10.2494/photopolymer.34.499","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"24 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73181321","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.329
Jianuo Zhou, Xuemiao Li, H. Deng
Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)- block -poly(hepatafluorobutyl methacrylate) (PStPOSS- b -PHFBMA) were synthesized via living polymerizations. The flory-huggins parameter ( χ , at 150 ºC) of PStPOSS- b -PHFBMA BCP was 0.060. Highly ordered hexagonal domain with 13.2 nm d spacing was observed by small-angle X-ray scattering (SAXS) after 10 h 160 ºC annealing, exhibiting rough line patterns in scanning electron microscope (SEM). SiO 1.5 residue (13.7 wt%) still remained after 700 ºC sintering in thermal gravimetric analysis (TGA).
采用活聚合法合成了系列含硅特别是多面体低聚硅氧烷(POSS)-含氟嵌段共聚物(bcp)、聚苯乙烯多面体低聚硅氧烷-嵌段聚肝氟甲基丙烯酸丁酯(PStPOSS- b - phfbma)。PStPOSS- b - phfbma BCP的flory-huggins参数(χ，在150ºC时)为0.060。在160℃退火10 h后，通过小角x射线散射(SAXS)观察到高度有序的六方畴，其间距为13.2 nm，在扫描电镜(SEM)下显示出粗糙的线条图案。热重分析(TGA)中，烧结700℃后仍有sio1.5残留(13.7 wt%)。
{"title":"Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers","authors":"Jianuo Zhou, Xuemiao Li, H. Deng","doi":"10.2494/photopolymer.34.329","DOIUrl":"https://doi.org/10.2494/photopolymer.34.329","url":null,"abstract":"Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)-containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)- block -poly(hepatafluorobutyl methacrylate) (PStPOSS- b -PHFBMA) were synthesized via living polymerizations. The flory-huggins parameter ( χ , at 150 ºC) of PStPOSS- b -PHFBMA BCP was 0.060. Highly ordered hexagonal domain with 13.2 nm d spacing was observed by small-angle X-ray scattering (SAXS) after 10 h 160 ºC annealing, exhibiting rough line patterns in scanning electron microscope (SEM). SiO 1.5 residue (13.7 wt%) still remained after 700 ºC sintering in thermal gravimetric analysis (TGA).","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"426 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86848952","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.511
Yunosuke Norisada, M. Kondo, T. Sasaki, M. Sakamoto, H. Ono, N. Kawatsuki
Thermally stimulated photoinduced molecular reorientation with high dichroism ( D >0.6) is explored in liquid crystalline (LC) copolymerthacrylate films comprising of 4-methoxy- N-benzylideneaniline (MNBA) and benzoic acid (BA) side groups. Thermal hydrolysis of MNBA side groups induces free phenyl aldehyde (PA) side groups in the oriented film. Birefringence of the oriented films is adjusted by introducing 2,7-diaminofluorene (FL) to form new imine bonds with free PA side groups. Meanwhile, in situ exchange from MNBA to FL-based imine also controls the birefringence of the oriented film. The initial birefringence of the oriented copolymer film increases up to 0.22 after introducing oriented FL moieties.
研究了以4-甲氧基- n -苄基苯胺(MNBA)和苯甲酸(BA)为侧基的液晶(LC)共聚甲基丙烯酸酯(LC)薄膜的热刺激高二色性(D >0.6)分子重定向。MNBA侧基的热水解在取向膜中产生游离的苯醛(PA)侧基。通过引入2,7-二氨基芴(FL)与游离PA侧基形成新的亚胺键来调节取向膜的双折射。同时，从MNBA到fl基亚胺的原位交换也控制了取向膜的双折射。引入定向FL基团后，取向共聚物膜的初始双折射率提高到0.22。
{"title":"Birefringent Control of Photo-Oriented Polymeric Films by in situ Exchange of Functional Moieties","authors":"Yunosuke Norisada, M. Kondo, T. Sasaki, M. Sakamoto, H. Ono, N. Kawatsuki","doi":"10.2494/photopolymer.34.511","DOIUrl":"https://doi.org/10.2494/photopolymer.34.511","url":null,"abstract":"Thermally stimulated photoinduced molecular reorientation with high dichroism ( D >0.6) is explored in liquid crystalline (LC) copolymerthacrylate films comprising of 4-methoxy- N-benzylideneaniline (MNBA) and benzoic acid (BA) side groups. Thermal hydrolysis of MNBA side groups induces free phenyl aldehyde (PA) side groups in the oriented film. Birefringence of the oriented films is adjusted by introducing 2,7-diaminofluorene (FL) to form new imine bonds with free PA side groups. Meanwhile, in situ exchange from MNBA to FL-based imine also controls the birefringence of the oriented film. The initial birefringence of the oriented copolymer film increases up to 0.22 after introducing oriented FL moieties.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"25 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88445997","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.49
Takeo Watanabe, T. Harada, Shinji Yamakawa
Extreme ultraviolet lithography was started to use for the production of 7-nm node-logic-semiconductor devices in 2019. And it was adapted to use for high volume manufacturing (HVM) of 5-nm logic devices in 2020. EUVL is required to be extended to use in 1.5-nm-node-device fabrications. However, it still has many technical issues. Especially, for EUV resists, simultaneous achievement of high sensitivity and low line edge width are required. To solve the EUV resist issue, the fundamental work using synchrotron in soft X-ray region is necessary. The fundamental evaluation study of EUV resist at NewSUBARU synchrotron light facility is described in this paper.
{"title":"Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility","authors":"Takeo Watanabe, T. Harada, Shinji Yamakawa","doi":"10.2494/photopolymer.34.49","DOIUrl":"https://doi.org/10.2494/photopolymer.34.49","url":null,"abstract":"Extreme ultraviolet lithography was started to use for the production of 7-nm node-logic-semiconductor devices in 2019. And it was adapted to use for high volume manufacturing (HVM) of 5-nm logic devices in 2020. EUVL is required to be extended to use in 1.5-nm-node-device fabrications. However, it still has many technical issues. Especially, for EUV resists, simultaneous achievement of high sensitivity and low line edge width are required. To solve the EUV resist issue, the fundamental work using synchrotron in soft X-ray region is necessary. The fundamental evaluation study of EUV resist at NewSUBARU synchrotron light facility is described in this paper.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"4 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73888209","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2021-06-11DOI: 10.2494/photopolymer.34.127
Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi
{"title":"Impact of Water Treatment Reactor using TiO2-coated Micropillar Made by UV-NIL","authors":"Kazuki Daigo, Ryota Akama, N. Unno, S. Satake, J. Taniguchi","doi":"10.2494/photopolymer.34.127","DOIUrl":"https://doi.org/10.2494/photopolymer.34.127","url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":"34 1","pages":""},"PeriodicalIF":0.8,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74002259","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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