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Optical properties of YSAG : Yb : Er ceramics with Sc3+ cations in the dodecahedral and octahedral positions of the garnet crystal lattice 石榴石晶格十二面体和八面体位置含有 Sc3+ 阳离子的 YSAG : Yb : Er 陶瓷的光学特性
Pub Date : 2023-10-12 DOI: 10.3897/j.moem.9.3.115403
V. Tarala, Alexander A. Kravtsov, S.V. Kuznetsov, F. Malyavin, O. Chapura, E. A. Brazhko, L. Kozhitov
Optical ceramics based on YSAG : Yb : Er with the compositions {Y1.86Yb0.45Er0.09Sc0.6}[Al1.6Sc0.4]Al3O12 and {Y2.26Yb0.45Er0.09Sc0.2}[Al1.0Sc1.0]Al3O12 were fabricated by vacuum sintering from pre-synthesized nanocrystalline powders. A comparative analysis of these samples with optical ceramics of the compositions {Y2.34Yb0.45Er0.09Sc0.12}[Al1.92Sc0.08]Al3O12 and {Y0.96Yb0.45Er0.09Sc1.50}[Al1.8Sc0.2]Al3O12 was carried out. The influence of scandium cations in the dodecahedral and octahedral positions of the garnet crystal lattice on the refractive index of YSAG : Yb : Er, as well as the values of absorption coefficients, integral luminescent intensities, and lifetimes of excited states of Yb3+ (2F7/2 and 2F5/2) and Er3+ (4I15/2, 4I13/2, 4F9/2, and 4S3/2) cations was revealed in the wavelength ranges 520–700 nm and 890–1690 nm. It has been shown that by changing the concentrations of scandium cations in the dodecahedral and octahedral positions of the crystal lattice of YSAG : Yb : Er solid solutions, it is possible to purposefully change the efficiency of energy transfer from ytterbium cations to erbium cations.
利用预合成的纳米结晶粉末,通过真空烧结法制造了基于 YSAG : Yb : Er 的光学陶瓷,其成分为 {Y1.86Yb0.45Er0.09Sc0.6}[Al1.6Sc0.4]Al3O12 和 {Y2.26Yb0.45Er0.09Sc0.2}[Al1.0Sc1.0]Al3O12 。对这些样品与{Y2.34Yb0.45Er0.09Sc0.12}[Al1.92Sc0.08]Al3O12和{Y0.96Yb0.45Er0.09Sc1.50}[Al1.8Sc0.2]Al3O12组成的光学陶瓷进行了比较分析。在石榴石晶格的十二面体和八面体位置上的钪阳离子对 YSAG : Yb :铒的折射率,以及 Yb3+(2F7/2 和 2F5/2)和 Er3+(4I15/2、4I13/2、4F9/2 和 4S3/2)阳离子在 520-700 纳米和 890-1690 纳米波长范围内的吸收系数、积分发光强度和激发态寿命。研究表明,通过改变 YSAG : Yb : Er 固溶体晶格十二面体和八面体位置上钪阳离子的浓度,可以有目的地改变从镱阳离子到铒阳离子的能量转移效率。
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引用次数: 0
Effect of heat treatment on the structure and mechanical properties of zirconia crystals partially stabilized with samarium oxide 热处理对部分用氧化钐稳定的氧化锆晶体的结构和机械性能的影响
Pub Date : 2023-10-11 DOI: 10.3897/j.moem.9.3.115614
M. Borik, Alexey Kulebyakin, E. Lomonova, F. Milovich, V. Myzina, P. Ryabochkina, N. V. Sidorova, N. Tabachkova, A. Chislov
The effect of high-temperature treatment in different media on the phase composition, microhardness and fracture toughness of (ZrO2)1-х(Sm2O3)х crystals with x = 0.02÷0.06 has been studied. The crystals have been grown using direction melt crystallization in a cold skull. The crystals have been heat treated at 1600 °C for 2 h in air and in vacuum. The phase composition of the crystals has been studied using X-ray diffraction and Raman scattering. We show that samarium cations enter the ZrO2 lattice mainly in a trivalent charge state and do not change their charge after air or vacuum annealing. The as-annealed phase composition has changed in all the test crystals except for the (ZrO2)0.94(Sm2O3)0.06 composition. After air or vacuum annealing the (ZrO2)1-x(Sm2O3)x crystals with 0.002 ≤ x ≤ 0.05 contain a monoclinic phase. The (ZrO2)0.94(Sm2O3)0.06 crystals contain two tetragonal phases (t and t´) with different tetragonality degrees. After air or vacuum annealing of the (ZrO2)0.94(Sm2O3)0.06 crystals the lattice parameters of the t and t´ phases change in opposite manners, suggesting that the tetragonality degree of the t phase increases whereas the tetragonality degree of the t´ phase decreases. The microhardness and fracture toughness of the as-annealed crystals depend on the Sm2O3 concentration in the solid solutions. The formation of the monoclinic phase in the (ZrO2)1-х(Sm2O3)х crystals with 0.037 ≤ x ≤ 0.05 significantly reduces the microhardness and fracture toughness of the crystals. Annealing of the (ZrO2)0.94(Sm2O3)0.06 crystals triggers more efficient hardening mechanisms and thus increases the fracture toughness of the crystals. We show that air or vacuum annealing of the (ZrO2)0.94(Sm2O3)0.06 crystals increases the fracture toughness of the crystals by 1.5 times as compared with that of the as-grown crystals.
研究了在不同介质中进行高温处理对 x = 0.02÷0.06 的 (ZrO2)1-х(Sm2O3)х 晶体的相组成、显微硬度和断裂韧性的影响。晶体是在冷头骨中采用定向熔融结晶法生长的。晶体在 1600 °C 的空气和真空环境中热处理 2 小时。利用 X 射线衍射和拉曼散射对晶体的相组成进行了研究。我们发现,钐阳离子主要以三价电荷状态进入 ZrO2 晶格,在空气或真空退火后,它们的电荷不会发生变化。除 (ZrO2)0.94(Sm2O3)0.06 成分外,所有测试晶体的退火相成分都发生了变化。经过空气或真空退火后,0.002 ≤ x ≤ 0.05 的 (ZrO2)1-x(Sm2O3)x 晶体含有单斜相。(ZrO2)0.94(Sm2O3)0.06 晶体含有两个四方相(t 和 t´),其四方度不同。在对(ZrO2)0.94(Sm2O3)0.06 晶体进行空气或真空退火后,t 相和 t´ 相的晶格参数发生了相反的变化,这表明 t 相的四方度增加,而 t´ 相的四方度降低。退火晶体的显微硬度和断裂韧性取决于固溶体中的 Sm2O3 浓度。0.037 ≤ x ≤ 0.05 的 (ZrO2)1-х(Sm2O3)х 晶体中单斜相的形成会显著降低晶体的显微硬度和断裂韧性。(ZrO2)0.94(Sm2O3)0.06 晶体的退火会引发更有效的硬化机制,从而提高晶体的断裂韧性。我们的研究表明,(ZrO2)0.94(Sm2O3)0.06 晶体的空气退火或真空退火可使晶体的断裂韧性比正常生长的晶体提高 1.5 倍。
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引用次数: 0
Estimation of the activation energy in the Ag/SnSe/Ge2Se3/W self-directed channel memristor 估算 Ag/SnSe/Ge2Se3/W 自定向通道忆阻器中的活化能
Pub Date : 2023-10-11 DOI: 10.3897/j.moem.9.3.113245
A. N. Aleshin, O. A. Ruban
In this study, we conducted an investigation into the Ag/SnSe/Ge2Se3/W ionic memristor, focusing on the determination of activation energies associated with its two primary operational processes: the formation of conductive filaments and memristor degradation. To ascertain the electrical conductivity of the memristor in both its basic electronic states, a low resistance state and a high resistance state, we constructed current-voltage characteristics. The estimation of activation energy values was carried out employing the Arrhenius law and the provisions of irreversible thermodynamics, with specific reference to Onsager's second postulate. This fundamental concept posits that the growth rate of irreversible component of entropy can be expressed as the summation of products involving fluxes and thermodynamic forces when a system tends towards its equilibrium state. In the context of this study, the equilibrium state of the memristor is defined as the condition at which the memristor can no longer function as a resistive memory cell. Our experimentation involved the application of a flux of Ag+ ions (electromigration). The calculated activation energy values were found to be 0.24 eV for the initial process and 1.16 eV for the latter. These divergent activation energy values indicate the differentiation between the agglomerative mechanism that governs the formation of conductive channels, prevalent in the Ag/SnSe/Ge2Se3/W memristor, and the "conventional" substance transfer mechanism based on a group of point defects that manifests itself during the memristor's degradation.
在本研究中,我们对 Ag/SnSe/Ge2Se3/W 离子忆阻器进行了研究,重点是确定与其两个主要运行过程(导电丝形成和忆阻器降解)相关的活化能。为了确定忆阻器在低阻态和高阻态两种基本电子状态下的导电性,我们构建了电流-电压特性。活化能值的估算采用了阿伦尼乌斯定律和不可逆热力学的规定,并特别参考了昂萨格第二定理。这一基本概念认为,当一个系统趋于平衡状态时,熵的不可逆成分的增长率可表示为涉及通量和热动力的乘积之和。在本研究中,忆阻器的平衡态被定义为忆阻器不再作为电阻记忆单元发挥作用的条件。我们的实验包括施加 Ag+ 离子流(电迁移)。计算发现,初始过程的活化能值为 0.24 eV,而后一过程的活化能值为 1.16 eV。这些不同的活化能值表明,Ag/SnSe/Ge2Se3/W 记忆晶闸管中普遍存在的形成导电通道的团聚机制与在记忆晶闸管降解过程中出现的基于点缺陷的 "传统 "物质转移机制之间存在差异。
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引用次数: 0
Detection of inhomogeneous magnetic fields using magnetoelectric composites 利用磁电复合材料探测不均匀磁场
Pub Date : 2023-10-11 DOI: 10.3897/j.moem.9.3.114129
V. V. Kuts, A. Turutin, A. Kislyuk, I. Kubasov, E. E. Maksumova, A. A. Temirov, M. D. Malinkovich, N. A. Sobolev, Yuri N. Parkhomenko
Magnetoelectric (ME) composites have a wide range of possible applications, especially as room-temperature sensors of weak magnetic fields in magnetocardiography and magnetoencephalography medical diagnostic equipment. In most works on ME composites, structures are tested in uniform magnetic fields; however, for practical application, detailed knowledge of their behaviour in inhomogeneous magnetic fields (IMFs) is necessary. In this work, we measured IMFs with radial symmetry produced by alternate currents (AC) passing through an individual thin wire upon different placements of an ME sensor. An ME self-biased b-LN/Ni/Metglas structure with a sensitivity to the magnetic field of 120 V/T was created for IMF detection. The necessity of an external biasing magnetic field was avoided by the inclusion of a nickel layer having remanent magnetization. The ME composite shows a non-zero ME coefficient of 0.24 V/(cm · Oe) in the absence of an external DC magnetic field. It is shown that the output voltage amplitude from the ME composite, which is located in an AC IMF, is dependent on the relative position of the investigated sample and magnetic field lines. Maximum ME signal is obtained when the long side of the ME sample is perpendicular to the wire, and the symmetry plane which divides the long side into two similar pieces contains the wire axis. In the frequency range from 400 Hz to 1000 Hz in the absence of vibrational and other noises, the detection limit amounts to (2 ± 0.4) nT/Hz1/2.
磁电(ME)复合材料具有广泛的应用前景,特别是在磁心动图和磁脑电图医疗诊断设备中作为室温弱磁场传感器。在大多数有关 ME 复合材料的研究中,结构都是在均匀磁场中进行测试的;然而,为了实际应用,有必要详细了解它们在不均匀磁场(IMF)中的行为。在这项工作中,我们测量了交变电流(AC)通过单根细线时产生的径向对称的 IMF,该电流通过 ME 传感器的不同位置。我们创建了一个对磁场灵敏度为 120 V/T 的 ME 自偏压 b-LN/Ni/Metglas 结构,用于 IMF 检测。通过加入具有剩磁化的镍层,避免了外部偏置磁场的必要性。在没有外部直流磁场的情况下,ME 复合材料显示出 0.24 V/(cm - Oe)的非零 ME 系数。研究表明,位于交流 IMF 中的 ME 复合材料的输出电压振幅取决于被研究样品和磁场线的相对位置。当 ME 样品的长边垂直于导线,且将长边分成两个相似部分的对称面包含导线轴线时,可获得最大 ME 信号。在没有振动和其他噪音的情况下,频率范围为 400 Hz 至 1000 Hz,探测极限为 (2 ± 0.4) nT/Hz1/2。
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引用次数: 0
Effect of doping on the optical properties of lanthanum-gallium tantalate 掺杂对钽酸镧镓光学特性的影响
Pub Date : 2023-09-30 DOI: 10.3897/j.moem.9.3.113479
E. V. Zabelina, N. Kozlova, Oleg A. Buzanov
Nominally pure lanthanum-gallium tantalate La3Ga5.5Ta0.5O14 crystals doped with aluminum, silicon and gallium oxide to above stoichiometric content have been grown by the Czochralski technique in iridium crucibles in argon and in agron with addition of oxygen atmospheres. The transmittance spectra of the crystals have been measured on a Cary-5000 UV-Vis-NIR spectrophotometer in the 200–800 nm range. Absorption spectra α(λ) have been plotted on the basis of the experimental data. The absorption spectra of the undoped crystals grown in an oxygen-free atmosphere have one weak absorption band at λ ~ 290 nm. The absorption spectra of the crystals grown in an agron with addition of oxygen have absorption bands at λ ~ 290, 360 and 480 nm. We show that for the crystals grown in an oxygen-free atmosphere, gallium doping to above stoichiometric content reduces the intensity of its only λ ~ 290 nm absorption band. Aluminum doping of the La3Ga5.5Ta0.5O14 crystals grown in an oxygen-free atmosphere significantly reduces the intensity of the λ ~ 290 nm absorption band and increases the intensity of the λ ~ 360 and 480 nm bands. Aluminum doping of the La3Ga5.5Ta0.5O14 crystals grown in an oxygen-containing atmosphere reduces the intensity of the λ ~ 360 and 480 nm bands and increases the intensity of the λ ~ 290 nm absorption band. Silicon doping of these crystals significantly reduces the intensity of the λ ~ 480 nm band and also reduces the intensity of the λ ~ 290 and 360 nm bands.
采用 Czochralski 技术,在铱坩埚中,在氩气和添加氧气的氩气环境下,生长出了掺杂了铝、硅和氧化镓的名义上纯净的镧镓钽酸盐 La3Ga5.5Ta0.5O14 晶体,其掺杂量超过了化学计量含量。在 Cary-5000 紫外-可见-近红外分光光度计上测量了晶体在 200-800 纳米范围内的透射光谱。根据实验数据绘制了吸收光谱 α(λ)。在无氧大气中生长的未掺杂晶体的吸收光谱在 λ ~ 290 纳米处有一个弱吸收带。在添加氧气的掺杂气氛中生长的晶体的吸收光谱在 λ ~ 290、360 和 480 纳米处有吸收带。我们发现,对于在无氧环境中生长的晶体,镓掺杂到高于化学计量含量时会降低其唯一的 λ ~ 290 nm 吸收带的强度。在无氧气氛中生长的 La3Ga5.5Ta0.5O14 晶体中掺入铝,可显著降低 λ ~ 290 纳米吸收带的强度,并增加 λ ~ 360 和 480 纳米吸收带的强度。在含氧气氛中生长的 La3Ga5.5Ta0.5O14 晶体中掺入铝会降低 λ ~ 360 和 480 纳米波段的强度,增加 λ ~ 290 纳米吸收波段的强度。在这些晶体中掺入硅会显著降低 λ ~ 480 纳米波段的强度,同时也会降低 λ ~ 290 纳米和 360 纳米波段的强度。
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引用次数: 0
Charge pumping in solar cell structure 太阳能电池结构中的电荷泵
Pub Date : 2023-09-30 DOI: 10.3897/j.moem.9.3.111530
Vitaliy V. Starkov, E. Gosteva
Modern understanding of the material science of semiconductor silicon allowed the authors to propose a new concept of the so-called “charge pumping” in the structures of photovoltaic converters or solar cells. This paper presents theoretical estimates of the rate of separation and collection of light-generated charge carriers in the structures of conventional silicon solar cells and charge-pumped solar cells. Relatively cheaper so-called “solar silicon” of p-type conductivity is typically used in the industrial production of solar cells. This type of silicon is particularly prone to the formation of thermodonor centers. Partial or, at higher temperatures (about 400 °C), even complete overcompensation of the hole type of conductivity in the base region may occur as a result of prolonged heating. This paper presents an original model describing the local formation of n+ regions in the solar cell structure by the so-called “local photon annealing”. These regions were named “charge pumps”. Experimental data on the formation of n+ regions as a result of Li diffusion are reported as an experimental confirmation of the theoretical estimations made in this work. Comparative volt-ampere characteristics of experimental charge-pumped photovoltaic converters and conventional solar cells are presented, showing an up to 30% increase in the short-circuit current Js.c for the experimental structures under standard illumination (AM1.5). The proposed technological aspects of charge-pumped photovoltaic converter fabrication deliver a cheap process and can be implemented in the industrial production of solar cells with little effort.
作者通过对半导体硅材料科学的现代理解,提出了光伏转换器或太阳能电池结构中所谓 "电荷泵 "的新概念。本文对传统硅太阳能电池和电荷泵太阳能电池结构中光产生的电荷载流子的分离和收集率进行了理论估算。在太阳能电池的工业生产中,通常使用相对便宜的所谓 p 型导电 "太阳能硅"。这种硅特别容易形成热电偶中心。由于长时间加热,基底区域的孔型导电性可能会出现部分过补偿,或在较高温度下(约 400 ℃)甚至完全过补偿。本文提出了一个原创模型,描述了通过所谓的 "局部光子退火 "在太阳能电池结构中局部形成 n+ 区域的过程。这些区域被命名为 "电荷泵"。报告了因锂离子扩散而形成 n+ 区域的实验数据,作为对本研究中理论估算的实验证实。实验结果显示,在标准光照(AM1.5)下,实验结构的短路电流 Js.c 增加了 30%。所提出的电荷泵浦式光电转换器制造技术提供了一种廉价的工艺,可在太阳能电池的工业生产中轻松实现。
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引用次数: 0
Inorganic Semiconductors in Electronic Applications 无机半导体在电子应用中的应用
Pub Date : 2023-09-21 DOI: 10.3390/electronicmat4030011
Wojciech Pisula
Inorganic semiconductors have a wide range of applications in various fields, including electronics, optoelectronics, photovoltaics, and even catalysis [...]
无机半导体在各个领域都有广泛的应用,包括电子、光电子、光伏,甚至催化[…]
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引用次数: 0
Enhancing Light Harvesting in Dye-Sensitized Solar Cells through Mesoporous Silica Nanoparticle-Mediated Diffuse Scattering Back Reflectors 通过介孔二氧化硅纳米颗粒介导的漫射后反射器增强染料敏化太阳能电池的光收集
Pub Date : 2023-08-30 DOI: 10.3390/electronicmat4030010
Jeffrie Fina, Navdeep Kaur, Chen-Yu Chang, Cheng-Yu Lai, D. Radu
Dye-sensitized solar cells (DSSCs) hold unique promise in solar photovoltaics owing to their low-cost fabrication and high efficiency in ambient conditions. However, to improve their commercial viability, effective, and low-cost methods must be employed to enhance their light harvesting capabilities, and hence photovoltaic (PV) performance. Improving the absorption of incoming light is a critical strategy for maximizing solar cell efficiency while overcoming material limitations. Mesoporous silica nanoparticles (MSNs) were employed herein as a reflective layer on the back of transparent counter electrodes. Chemically synthesized MSNs were applied to DSSCs via bar coating as a facile fabrication step compatible with roll-to-roll manufacturing. The MSNs diffusely scatter the unused incident light transmitted through the DSSCs back into the photoactive layers, increasing the absorption of light by N719 dye molecules. This resulted in a 20% increase in power conversion efficiency (PCE), from 5.57% in a standard cell to 6.68% with the addition of MSNs. The improved performance is attributed to an increase in photon absorption which led to the generation of a higher number of charge carriers, thus increasing the current density in DSSCs. These results were corroborated with electrochemical impedance spectroscopy (EIS), which showed improved charge transport kinetics. The use of MSNs as reflectors proved to be an effective practical method for enhancing the performance of thin film solar cells. Due to silica’s abundance and biocompatibility, MSNs are an attractive material for meeting the low-cost and non-toxic requirements for commercially viable integrated PVs.
染料敏化太阳能电池(DSSCs)由于其低成本的制造和在环境条件下的高效率,在太阳能光伏发电中具有独特的前景。然而,为了提高其商业可行性,必须采用有效和低成本的方法来提高其光收集能力,从而提高光伏(PV)性能。提高入射光的吸收是最大限度地提高太阳能电池效率,同时克服材料限制的关键策略。本文采用介孔二氧化硅纳米颗粒(MSNs)作为透明对电极背面的反射层。通过棒状涂层将化学合成的msn应用于DSSCs,这是一种简便的制造步骤,与卷对卷制造相兼容。msn将通过DSSCs传输的未使用的入射光扩散散射回光活性层,增加了N719染料分子对光的吸收。这使得功率转换效率(PCE)提高了20%,从标准电池的5.57%提高到添加msn后的6.68%。改进的性能归因于光子吸收的增加,导致产生更多的电荷载流子,从而增加DSSCs中的电流密度。电化学阻抗谱(EIS)证实了这些结果,表明电荷输运动力学得到了改善。利用微晶硅微球作为反射器是提高薄膜太阳能电池性能的一种有效的实用方法。由于二氧化硅的丰度和生物相容性,msn是一种有吸引力的材料,可以满足商业上可行的集成光伏的低成本和无毒要求。
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引用次数: 0
Recent progress and development prospects of mobile current sources 移动电流源的最新进展及发展前景
Pub Date : 2023-07-06 DOI: 10.3897/j.moem.9.2.109923
V. Sleptsov, L. Kozhitov, A. Diteleva, D. Kukushkin, A. Popkova
Physicochemical fundamentals have been developed for the basic design solutions and fabrication technologies of prospective electrolytic power cells with a reusable cell capacity of 350–500 W·h/kg at the first stage and 1000 W·h/kg at the second stage. Along with conventional chemical current sources and ionistors, there are emerging high-performance supercapacitor structures with thin dielectric in the double electric layer and hybrid capacitors in which energy is accumulated in the double electric layer and due to electrochemical processes. This approach reduces the internal resistance of the electrolytic cells thus decreasing the heat emission during operation and therefore providing for a higher specific energy capacity and operation safety, shorter charging time and an increase in specific power. Prospective anode is a nanostructured electrode material in the form of a carbon matrix filled with a nanostructured chemically active material. Promising carbon matrix fillers are Li and its alloys, Si, Al, Na, Sn, Mg, Zn, Ni, Co, Ag, as well as a range of other materials and their compounds. The effect of carbon material specific surface area, dielectric permeability and chemically active material addition on the specific energy capacity has been studied. Theoretical specific energy capacity of metal/air hybrid capacitors has been calculated. Thin-film technological system has been designed for new generation electrode materials in the form of carbon matrices with highly developed surface containing thin tunneling dielectrics and chemically active materials on dielectric surface.
物理化学基础已经发展为具有前景的电解动力电池的基本设计解决方案和制造技术,第一阶段可重复使用的电池容量为350-500 W·h/kg,第二阶段为1000 W·h/kg。除了传统的化学电流源和离子电阻器外,还出现了双电层薄介质的高性能超级电容器结构,以及在双电层和电化学过程中积累能量的混合电容器。这种方法降低了电解电池的内阻,从而减少了运行过程中的热辐射,从而提供了更高的比能量容量和操作安全性,更短的充电时间和比功率的增加。未来阳极是一种纳米结构电极材料,其形式为碳基体,填充有纳米结构的化学活性材料。有前途的碳基体填料是Li及其合金、Si、Al、Na、Sn、Mg、Zn、Ni、Co、Ag,以及一系列其他材料及其化合物。研究了碳材料比表面积、介电渗透率和化学活性物质添加量对比能容量的影响。计算了金属/空气混合电容器的理论比能容量。为新一代电极材料设计了薄膜技术体系,以碳基体为形式,其表面高度发达,含有薄的隧道介质和介电表面的化学活性材料。
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引用次数: 0
Electron and hole injection barriers between silicon substrate and RF magnetron sputtered In2O3 : Er films 硅衬底与射频磁控溅射In2O3: Er薄膜之间的电子和空穴注入势垒
Pub Date : 2023-07-05 DOI: 10.3897/j.moem.9.109980
K. Feklistov, A. Lemzyakov, A. Shklyaev, D. Protasov, A. Deryabin, E. V. Spesivsev, D. Gulyaev, A. Pugachev, D. G. Esaev
In2O3 : Er films have been synthesized on silicon substrates by RF magnetron sputter deposition. The currents through the synthesized metal/oxide/semiconductor (MOS) structures (Si/In2O3 : Er/In-contact) have been measured for n and p type conductivity silicon substrates and described within the model of majority carrier thermoemission through the barrier, with bias voltage correction to the silicon potential drop. The electron and hole injection barriers between the silicon substrate and the film have been found to be 0.14 and 0.3 eV, respectively, by measuring the temperature dependence of the forward current at a low sub-barrier bias. The resulting low hole injection barrier is accounted for by the presence of defect state density spreading from the valence band edge into the In2O3 : Er band gap to form a hole conduction channel. The presence of defect state density in the In2O3 : Er band gap is confirmed by photoluminescence data in the respective energy range 1.55–3.0 eV. The band structure of the Si/In2O3 : Er heterojunction has been analyzed. The energy gap between the In2O3 : Er conduction band electrons and the band gap conduction channel holes has been estimated to be 1.56 eV.
采用射频磁控溅射沉积方法在硅衬底上制备了In2O3: Er薄膜。通过合成金属/氧化物/半导体(MOS)结构(Si/In2O3: Er/In-contact)对n型和p型导电性硅衬底的电流进行了测量,并在通过势垒的多数载流子热发射模型中进行了描述,并对硅电位下降进行了偏置电压校正。通过测量低亚势垒偏压下正向电流的温度依赖性,发现硅衬底和薄膜之间的电子和空穴注入势垒分别为0.14和0.3 eV。导致低空穴注入势垒的原因是缺陷态密度从价带边缘扩散到In2O3: Er带隙中,形成空穴传导通道。在1.55 ~ 3.0 eV范围内的光致发光数据证实了In2O3: Er禁带中存在缺陷态密度。分析了Si/In2O3: Er异质结的能带结构。In2O3: Er导带电子与带隙导通道空穴之间的能隙估计为1.56 eV。
{"title":"Electron and hole injection barriers between silicon substrate and RF magnetron sputtered In2O3 : Er films","authors":"K. Feklistov, A. Lemzyakov, A. Shklyaev, D. Protasov, A. Deryabin, E. V. Spesivsev, D. Gulyaev, A. Pugachev, D. G. Esaev","doi":"10.3897/j.moem.9.109980","DOIUrl":"https://doi.org/10.3897/j.moem.9.109980","url":null,"abstract":"In2O3 : Er films have been synthesized on silicon substrates by RF magnetron sputter deposition. The currents through the synthesized metal/oxide/semiconductor (MOS) structures (Si/In2O3 : Er/In-contact) have been measured for n and p type conductivity silicon substrates and described within the model of majority carrier thermoemission through the barrier, with bias voltage correction to the silicon potential drop. The electron and hole injection barriers between the silicon substrate and the film have been found to be 0.14 and 0.3 eV, respectively, by measuring the temperature dependence of the forward current at a low sub-barrier bias. The resulting low hole injection barrier is accounted for by the presence of defect state density spreading from the valence band edge into the In2O3 : Er band gap to form a hole conduction channel. The presence of defect state density in the In2O3 : Er band gap is confirmed by photoluminescence data in the respective energy range 1.55–3.0 eV. The band structure of the Si/In2O3 : Er heterojunction has been analyzed. The energy gap between the In2O3 : Er conduction band electrons and the band gap conduction channel holes has been estimated to be 1.56 eV.","PeriodicalId":18610,"journal":{"name":"Modern Electronic Materials","volume":"83 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2023-07-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83252554","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
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Modern Electronic Materials
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