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Shallow defects and optical properties of CsPbBr3thin films through noble gas ion beam defect engineering. 通过惰性气体离子束缺陷工程实现 CsPbBr3thin 薄膜的浅缺陷和光学特性。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-21 DOI: 10.1088/1361-6528/ad91bd
Holger Fiedler, Jake Hardy, Jonathan E Halpert, Nathaniel J L K Davis, John Kennedy

Ion implantation is widely utilised for the modification of inorganic semiconductors; however, the technique has not been extensively applied to lead halide perovskites. In this report, we demonstrate the modification of the optical properties of caesium lead bromide (CsPbBr3) thin films via noble gas ion implantation. We observed that the photoluminescence (PL) lifetimes of CsPbBr3thin films can be doubled by low fluences (<1 × 1014at·cm-2) of ion implantation with an acceleration voltage of 20 keV. We attribute this phenomenon to ion beam induced shallow minority charge carrier trapping induced by nuclear stopping, dominant by heavy noble gases (Ar, Xe). Simultaneously, the PL quantum yield (PLQY) is altered during noble gas ion implantation inversely correlates with the electronic stopping power of the implanted element, hence Ar implantation reduces the PLQY, while Ne even causes a PLQY enhancement. These results thus provide a guide to separate the effect of nuclear and electronic damage during ion implantation into halide perovskites.

离子注入法被广泛应用于无机半导体的改性,但该技术尚未广泛应用于卤化铅包晶石。在本报告中,我们展示了通过惰性气体离子注入对溴化铯铅(CsPbBr3)薄膜光学特性的改性。我们观察到,在 20 keV 的加速电压下,通过低通量(14at-cm-2)离子注入,CsPbBr3 薄膜的光致发光(PL)寿命可以延长一倍。我们将这一现象归因于离子束在重惰性气体(氩气、氙气)的作用下,由核停止诱发的浅层少数电荷载流子捕获。同时,在惰性气体离子植入过程中,聚光量子产率(PLQY)的变化与被植入元素的电子阻挡能力成反比关系,因此氩元素的植入会降低聚光量子产率,而氖元素甚至会导致聚光量子产率的提高。因此,这些结果为区分卤化物包晶石离子植入过程中的核损伤和电子损伤效应提供了指导。
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引用次数: 0
Development and optimization of metal silicide EUV pellicle for 400W EUV lithography. 开发和优化用于 400W 超紫外光刻的金属硅化物超紫外粒子。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-21 DOI: 10.1088/1361-6528/ad902d
Munsu Choi, Chulkyun Park, Juhee Hong

In the extreme ultraviolet lithography (EUVL) process, extreme ultraviolet (EUV) pellicles serve as thin, transparent membranes that shield the photomask (reticle) from particle contamination, thereby preserving photomask pattern integrity, reducing chip failure risks, and enhancing production yields. The production of EUV pellicles is highly challenging due to their mechanical fragility at nanometer-scale thicknesses and the need to endure the rigorous conditions of the EUVL environment, which include high temperatures and hydrogen radicals. Consequently, extensive research has been conducted on a variety of materials, such as carbon-based and silicon-based substances, for the development of EUV pellicles. This study explores the feasibility of implementing metal silicide (MeSix) pellicles for high-power EUVL applications. We successfully fabricated MeSixpellicles in two dimensions: a 10 mm × 10 mm sample and a full-size 110 mm × 144 mm pellicle. We then evaluated their optical, mechanical, thermal, and chemical properties, as well as their lifespan. The pellicles demonstrated over 90% transmittance and less than 0.04% reflectance. The films exhibited a deflection of 300μm under a 2 Pa differential pressure and an ultimate tensile strength exceeding 2 GPa. The thermal emissivity was measured at 0.3. Additionally, the durability of the pellicles was validated through exposure to 20,000 wafers using a 400 W EUV power (offline test: 20 W cm-2). The transmittance variations of the pellicles were evaluated by comparing the measurements obtained before and after exposure to 400 W EUV power.

在极紫外光刻(EUVL)工艺中,极紫外(EUV)微粒可作为薄而透明的膜,保护光掩膜(网罩)免受微粒污染,从而保持光掩膜图案的完整性,降低芯片故障风险,提高产量。由于超紫外粒子在纳米级厚度时的机械脆弱性,以及需要承受超紫外光环境的苛刻条件(包括高温和氢自由基),超紫外粒子的生产极具挑战性。因此,人们对各种材料(如碳基和硅基物质)进行了广泛的研究,以开发 EUV 粒子。本研究探讨了将硅化钼(MoSix)微球应用于高功率超紫外辐射的可行性。我们成功制作了两个尺寸的 MoSix 粒子:10 毫米 x 10 毫米的样品和 110 毫米 x 144 毫米的全尺寸粒子。然后,我们评估了它们的光学、机械、热和化学特性以及使用寿命。颗粒的透射率超过 90%,反射率低于 0.02%。薄膜在 2 Pa 压差下的变形量为 300 μm,极限拉伸强度 (UTS) 超过 2 GPa。热发射率测量值为 0.3。此外,通过使用 400W EUV 功率(离线测试:20W/cm²)对 20,000 个晶圆进行曝光,验证了微球的耐用性。通过比较暴露于 400 瓦 EUV 功率前后的测量值,对微孔的透射率变化进行了评估。
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引用次数: 0
Friction-enhanced formation of Cu microwire on Si wafer. 在硅晶片上摩擦增强形成铜微线。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-21 DOI: 10.1088/1361-6528/ad958d
Chenxu Liu, Yang Song, Zhimin Chai, Hongbo Zeng, Yu Tian, Yonggang Meng

Tribological printing is emerging as a promising technique for micro/nano manufacturing. A significant challenge is enhancing efficiency and minimizing the need for thousands of sliding cycles to create nano- or microstructures (ACS Appl. Mater. Inter. 2018;10:40335-47, Nanotechnology 2019;30:95302). This study presents a rapid approach for forming Cu microwires on Si wafers through a friction method during the evaporation of an ethanol-based lubricant containing Cu nanoparticles. The preparation time is influenced by the volume of the lubricant added, with optimal conditions reducing the time to 300 seconds (600 sliding cycles) for producing Cu microwires with a thickness of 200 nm. Key aspects include the lubricating effect of ethanol on the friction pairs and the role of ethanol evaporation in the growth of Cu microwires. Successful formation requires a careful balance between microwire thickening and wear removal. The resulting Cu microwires demonstrate mechanical and electrical properties that make them suitable as micro conductors. This work provides a novel approach for fabricating conductive microstructures on Si surfaces and other curved surfaces, offering potential applications in microelectronics and sensor technologies.

摩擦学打印正在成为一种前景广阔的微/纳米制造技术。一项重大挑战是提高效率,尽量减少数千次滑动循环以创建纳米或微结构的需要(ACS Appl. Mater. Inter. 2018;10:40335-47,Nanotechnology 2019;30:95302)。本研究提出了一种在含有铜纳米颗粒的乙醇基润滑剂蒸发过程中通过摩擦法在硅晶片上形成铜微线的快速方法。制备时间受润滑剂添加量的影响,在最佳条件下,生产厚度为 200 纳米的铜微线的时间可缩短至 300 秒(600 次滑动循环)。关键方面包括乙醇对摩擦对的润滑作用以及乙醇蒸发在铜微线生长过程中的作用。微丝的成功形成需要在微丝增粗和消除磨损之间取得谨慎的平衡。由此产生的铜微线具有机械和电气特性,适合用作微型导体。这项工作为在硅表面和其他曲面上制造导电微结构提供了一种新方法,为微电子学和传感器技术提供了潜在应用。
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引用次数: 0
Quantum dots synthesis within ternary III-V nanowire towards light emitters in quantum photonic circuits: a review. 在三元 III-V 纳米线中合成量子点,用于量子光子电路中的光发射器:综述。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-21 DOI: 10.1088/1361-6528/ad958c
Giorgos Boras, Haotian Zeng, Jae-Seong Park, Huiwen Deng, Mingchu Tang, Huiyun Liu

The positioning of quantum dots (QDs) in nanowires (NWs) on-axis has emerged as a controllable method of QD fabrication that has given rise to structures with exciting potential in novel applications in the field of Si photonics. In particular, III-V NWQDs attract a great deal of interest owing to their vibrant optical properties, high carrier mobility, facilitation in integration with Si and bandgap tunability, which render them highly versatile. Moreover, unlike Stranski-Krastanov or self-assembled QDs, this configuration allows for deterministic position and size of the dots, enhancing the sample uniformity and enabling beneficial functions. Among these functions, single photon emission has presented significant interest due to its key role in quantum information processing. This has led to efforts for the integration of ternary III-V NWQD non-classical light emitters on-chip, which is promising for the commercial expansion of quantum photonic circuits. In the current review, we will describe the recent progress in the synthesis of ternary III-V NWQDs, including the growth methods and the material platforms in the available literature. Furthermore, we will present the results related to single photon emission and the integration of III-V NWQDs as single photon sources in quantum photonic circuits, highlighting their promising potential in quantum information processing. Our work demonstrates the up-to-date landscape in this field of research and pronounces the importance of ternary III-V NWQDs in quantum information and optoelectronic applications. .

量子点(QDs)在纳米线(NWs)中的轴向定位已成为一种可控的量子点制造方法,它所产生的结构在硅光子学领域的新型应用中具有令人兴奋的潜力。其中,III-V 族 NWQDs 因其生动的光学特性、高载流子迁移率、与硅的集成便利性和带隙可调谐性而备受关注,这些特性使其具有高度的通用性。此外,与斯特兰斯基-克拉斯塔诺夫或自组装 QDs 不同,这种结构允许确定点的位置和大小,从而提高了样品的均匀性并实现了有益的功能。在这些功能中,单光子发射因其在量子信息处理中的关键作用而备受关注。这促使人们努力将三元 III-V NWQD 非经典光发射器集成到芯片上,这对量子光子电路的商业拓展大有可为。在本综述中,我们将介绍合成三元 III-V NWQD 的最新进展,包括现有文献中的生长方法和材料平台。此外,我们还将介绍与单光子发射有关的成果,以及在量子光子电路中将 III-V NWQDs 集成为单光子源的情况,从而突显其在量子信息处理方面的巨大潜力。我们的工作展示了这一研究领域的最新进展,并宣告了三元 III-V NWQDs 在量子信息和光电应用中的重要性。
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引用次数: 0
Stability and reversibility of organic molecule modifications of CVD-synthesized monolayer MoS2. CVD 合成单层 MoS2 有机分子修饰的稳定性和可逆性。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-20 DOI: 10.1088/1361-6528/ad8e6c
Antun Lovro Brkić, Antonio Supina, Davor Čapeta, Lucija Dončević, Lucija Ptiček, Šimun Mandić, Livio Racané, Ida Delač

We investigated the stability of monolayer MoS2samples synthesized using chemical vapor deposition and subsequently modified with organic molecules under ambient conditions. By analyzing the optical signatures of the samples using photoluminescence spectroscopy, Raman spectroscopy, and surface quality using atomic force microscopy, we observed that this modification of monolayer MoS2with organic molecules is stable and retains its optical signature over time under ambient conditions. Furthermore, we show the reversibility of the effects induced by the organic molecules, as heating the modified samples restores their original optical signatures, indicating the re-establishment of the optical properties of the pristine monolayer MoS2.

我们研究了利用化学气相沉积(CVD)合成的单层 MoS2 样品的稳定性,随后在环境条件下对其进行了有机分子修饰。通过使用光致发光光谱 (PL)、拉曼光谱和原子力显微镜 (AFM) 分析样品的光学特征和表面质量,我们观察到用有机分子修饰单层 MoS2 是稳定的,并能在环境条件下长期保持其光学特征。此外,我们还展示了有机分子诱导效应的可逆性,因为加热改性样品可恢复其原始光学特征,这表明原始单层 MoS2 的光学特性得以重建。
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引用次数: 0
Effect of SiCN thin film interlayer for ZnO-based RRAM. SiCN 薄膜中间层对氧化锌基 RRAM 的影响。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-20 DOI: 10.1088/1361-6528/ad83d9
Woon-San Ko, Myeong-Ho Song, Jun-Ho Byun, Do-Yeon Lee, So-Yeon Kwon, Jong-Sin Hyun, Dong-Hyeuk Choi, Ga-Won Lee

This study investigates the effect of silicon carbon nitride (SiCN) as an interlayer for ZnO-based resistive random access memory (RRAM). SiCN was deposited using plasma-enhanced chemical vapor deposition with controlled carbon content, achieved by varying the partial pressure of tetramethylsilane (4MS). Our results indicate that increasing the carbon concentration enhances the endurance of RRAM devices but reduces the on/off ratio. Devices with SiCN exhibited lower operating voltages and more uniform resistive switching behavior. Oxygen migration from ZnO to SiCN is examined by x-ray diffraction and x-ray photoelectron spectroscopy analyses, promoting the formation of conductive filaments and lowering set voltages. Additionally, we examined the impact of top electrode oxidation on RRAM performance. The oxidation of the Ti top electrode was found to reduce endurance and increase low resistive state resistance, potentially leading to device failure through the formation of an insulating layer between the electrode and resistive switching material. The oxygen storage capability of SiCN was further confirmed through high-temperature stress tests, demonstrating its potential as an oxygen reservoir. Devices with a 20 nm SiCN interlayer showed significantly improved endurance, with over 500 switching cycles, compared to 62 cycles in those with a 5 nm SiCN layer. However, the thicker SiCN layer resulted in a notably lower on/off ratio due to reduced capacitance. These findings suggest that SiCN interlayers can effectively enhance the performance and endurance of ZnO-based RRAM devices by acting as an oxygen reservoir and mitigating the top electrode oxidation effect.

本研究探讨了氮化硅(SiCN)作为氧化锌基电阻式随机存取存储器(RRAM)中间层的效果。SiCN 采用等离子体增强化学气相沉积 (PECVD) 技术沉积,并通过改变四甲基硅烷 (4MS) 的分压来控制碳含量。我们的研究结果表明,增加碳浓度可提高 RRAM 器件的耐用性,但会降低开/关比率。使用 SiCN 的器件工作电压更低,电阻开关行为更均匀。通过 X 射线衍射 (XRD) 和 X 射线光电子能谱 (XPS) 分析,研究了氧从 ZnO 向 SiCN 的迁移,这促进了导电丝 (CF) 的形成并降低了设定电压。此外,我们还研究了顶电极氧化对 RRAM 性能的影响。研究发现,钛顶电极的氧化会降低耐久性并增加低电阻状态(LRS)电阻,有可能通过在电极和电阻开关材料之间形成绝缘层而导致器件失效。通过高温应力测试,进一步证实了 SiCN 的储氧能力,证明了其作为储氧层的潜力。带有 20 纳米 SiCN 中间层的器件的耐久性明显提高,开关周期超过 500 次,而带有 5 纳米 SiCN 层的器件只有 62 次。不过,由于电容降低,较厚的 SiCN 层导致开关比明显降低。这些研究结果表明,SiCN 夹层可以作为储氧层,减轻顶电极氧化效应,从而有效提高基于氧化锌的 RRAM 器件的性能和耐用性。
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引用次数: 0
Surface different charge ligands for modulating selenium nanoparticles formation and activating the interaction with proteins for effective anti-Herpes simplex virus l infection. 表面不同电荷配体用于调节硒纳米粒子的形成并激活与蛋白质的相互作用,从而有效抗单纯疱疹病毒感染。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-20 DOI: 10.1088/1361-6528/ad902b
Xu Chen, Jian Yue, Xiongjun Xu, Jiajun Chen, Xuechan Huang, Yukai Huang, Yang Yang, Feng Li, Tianwang Li

Selenium-based nanoparticles exhibit antiviral activity by directly modulating immune function. Despite recent promising developments in utilizing selenium nanoparticles (Se NPs) against viral infections, the impact of surface ligand charge on the conformation and interaction with viral proteins, as well as the effectiveness of Se NPs in anti-Herpes simplex virus 1 (HSV-1) infection remains unexplored. In this study, three types of selenium nanoparticles (CTAB-Se, PVP-Se, SDS-Se) with distinct surface charges were synthesized by modifying the surface ligands. We found that apart from differences in surface charge, the size, morphology, and crystal structure of the three types of Se NPs were similar. Notably, although the lipophilicity and cellular uptake of SDS-Se with a negative charge were lower compared to positively charged CTAB-Se and neutrally charged PVP-Se, SDS-Se exhibited the strongest protein binding force during interaction with HSV-1. Consequently, SDS-Se demonstrated the most potent anti-HSV-1 activity and safeguarded normal cells from damage. The mechanistic investigation further revealed that SDS-Se NPs effectively inhibited the proliferation and assembly of HSV-1 by powerfully suppressing the key genes and proteins of HSV-1 at various stages of viral development. Hence, this study highlights the significant role of surface ligand engineering in the antiviral activity of Se NPs, presenting a viable approach for synthesizing Se NPs with tailored antiviral properties by modulating surface charge. This method holds promise for advancing research on the antiviral capabilities of Se NPs.

硒基纳米粒子(Se NPs)通过直接调节免疫功能表现出抗病毒活性。尽管最近在利用硒纳米粒子抗病毒感染方面取得了可喜的进展,但表面配体电荷对硒纳米粒子的构象和与病毒蛋白相互作用的影响,以及硒纳米粒子在抗单纯疱疹病毒 1(HSV-1)感染方面的有效性仍有待探索。本研究通过改变表面配体合成了三种不同表面电荷的硒纳米粒子(CTAB-Se、PVP-Se、SDS-Se)。我们发现,除了表面电荷不同外,三种硒纳米粒子的大小、形态和晶体结构都很相似。值得注意的是,虽然与带正电荷的 CTAB-Se 和带中性电荷的 PVP-Se 相比,带负电荷的 SDS-Se 的亲脂性和细胞吸收率较低,但在与 HSV-1 的相互作用中,SDS-Se 表现出最强的蛋白质结合力。因此,SDS-Se 具有最强的抗 HSV-1 活性,能保护正常细胞免受损伤。机理研究进一步发现,SDS-Se NPs 能在病毒发展的不同阶段强力抑制 HSV-1 的关键基因和蛋白,从而有效抑制 HSV-1 的增殖和组装。因此,本研究强调了表面配体工程在 Se NPs 抗病毒活性中的重要作用,为通过调节表面电荷合成具有定制抗病毒特性的 Se NPs 提供了一种可行的方法。这种方法有望推动 Se NPs 抗病毒能力的研究。
{"title":"Surface different charge ligands for modulating selenium nanoparticles formation and activating the interaction with proteins for effective anti-Herpes simplex virus l infection.","authors":"Xu Chen, Jian Yue, Xiongjun Xu, Jiajun Chen, Xuechan Huang, Yukai Huang, Yang Yang, Feng Li, Tianwang Li","doi":"10.1088/1361-6528/ad902b","DOIUrl":"10.1088/1361-6528/ad902b","url":null,"abstract":"<p><p>Selenium-based nanoparticles exhibit antiviral activity by directly modulating immune function. Despite recent promising developments in utilizing selenium nanoparticles (Se NPs) against viral infections, the impact of surface ligand charge on the conformation and interaction with viral proteins, as well as the effectiveness of Se NPs in anti-Herpes simplex virus 1 (HSV-1) infection remains unexplored. In this study, three types of selenium nanoparticles (CTAB-Se, PVP-Se, SDS-Se) with distinct surface charges were synthesized by modifying the surface ligands. We found that apart from differences in surface charge, the size, morphology, and crystal structure of the three types of Se NPs were similar. Notably, although the lipophilicity and cellular uptake of SDS-Se with a negative charge were lower compared to positively charged CTAB-Se and neutrally charged PVP-Se, SDS-Se exhibited the strongest protein binding force during interaction with HSV-1. Consequently, SDS-Se demonstrated the most potent anti-HSV-1 activity and safeguarded normal cells from damage. The mechanistic investigation further revealed that SDS-Se NPs effectively inhibited the proliferation and assembly of HSV-1 by powerfully suppressing the key genes and proteins of HSV-1 at various stages of viral development. Hence, this study highlights the significant role of surface ligand engineering in the antiviral activity of Se NPs, presenting a viable approach for synthesizing Se NPs with tailored antiviral properties by modulating surface charge. This method holds promise for advancing research on the antiviral capabilities of Se NPs.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142605313","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improvement of N-type carbon nanotube field effect transistor performance using the combination of yttrium diffusion layer in HfO2dielectrics and metal contacts. 利用 HfO2 电介质中的钇扩散层与金属触点的结合提高 N 型碳纳米管场效应晶体管的性能。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-20 DOI: 10.1088/1361-6528/ad8bc9
Zhenfei Hou, Gang Niu, Jie Li, Shengli Wu

In this paper, we obtained n-type top-gate carbon nanotube (CNT) thin film field effect transistors (FET) with source/drain extensions structure through dielectrics optimization strategy, combining the yttrium layer with HfO2dielectric argon annealing process, and metal contacts. The mechanism for enhanced n-type conduction was explained as being due to the vertical diffusion of yttrium to the HfO2dielectric during argon annealing. This diffusion causes a bending of the energy band, which results in more positive fixed charges, and a reduction in the electron injection barrier between the low work function source/drain Cr electrode and CNT thin film. The optimized technology has great prospects for the low cost, large scale and high performance n-type CNT thin film FET to be used in integrated electronic devices.

本文通过电介质优化策略,将钇层与 HfO2 电介质氩退火工艺和金属触点相结合,获得了具有源极/漏极扩展结构的 n 型顶栅碳纳米管薄膜场效应晶体管(CNTFET)。n 型传导增强的机制被解释为氩退火过程中钇向 HfO2 介电层的垂直扩散。这种扩散导致能带弯曲,从而产生更多的正固定电荷,并降低了低功函数源-漏Cr电极和碳纳米管之间的电子注入势垒。优化后的技术对于低成本、大规模、高性能的 n 型 CNTFET 在集成电子设备中的应用具有广阔的前景。
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引用次数: 0
Synthesis and magnetic properties of NiCo2O4urchin-like nanofibers. NiCo2O4urchin-like 纳米纤维的合成与磁性能。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-19 DOI: 10.1088/1361-6528/ad947f
Ahmed Nashaat, Abdulaziz Abu El-Fadl, Hiroyuki Nakamura, Mohamed Abdelkareem Kassem

Single-phase NiCo2O4 (NCO) nanoparticles (NPs) with an average particle size of 12 (± 3.5) nm were successfully synthesized as aggregates in urchin-like nanofibers via a hydrothermal route. Magnetization data measured as functions of temperature and magnetic field suggest a superparamagnetic-like behavior at room temperature, a ferrimagnetic transition around a Curie temperature TC ~200 K, and a spin blocking transition at a blocking temperature TB ~90 K, as observed at a field of 100 Oe. The spin blocking nature has been investigated by analyses of the field-dependence of TB in the static magnetization and its frequency-dependence in the ac susceptibility data measured in zero-field cooling regime, both indicate a low-temperature spin glass-like state. Below TB, the coercivity increases monotonically up to 1.7 kOe with decreasing temperature down to 5 K. Our results indicate that the magnetic behavior of NCO NPs, which is mainly determined by the cations' ratio, oxidation states, and site-occupancy, can be controlled by a synthesis in appropriate particle size and morphology.

通过水热法成功合成了平均粒径为 12 (± 3.5) nm 的单相镍钴氧化物(NCO)纳米粒子(NPs),并将其聚集在海胆状纳米纤维中。根据温度和磁场函数测量的磁化数据表明,在室温下具有类似超顺磁性的行为,在居里温度 TC ~200 K 附近具有铁磁性转变,在阻塞温度 TB ~90 K 处具有自旋阻塞转变,这是在 100 Oe 磁场下观察到的。通过分析 TB 在静态磁化中的磁场依赖性以及在零磁场冷却条件下测量的交流电感数据中的频率依赖性,研究了自旋阻滞性质。我们的研究结果表明,NCO NPs 的磁性行为主要由阳离子比例、氧化态和位点占有率决定,可以通过合成适当粒度和形态的 NCO NPs 来控制。
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引用次数: 0
Understanding the competing growth of 2D and 3D transition metal dichalcogenides in a chemical vapor deposition (CVD) reactor. 了解化学气相沉积(CVD)反应器中二维和三维过渡金属二钙化物的竞争生长。
IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Pub Date : 2024-11-19 DOI: 10.1088/1361-6528/ad9480
Farman Ullah, Sina Kazemian, Giovanni Fanchini

The competing growth of two-dimensional (2D) and three-dimensional (3D) crystals of layered transition metal dichalcogenides (TMDCs) has been reproducibly observed in a large variety of chemical vapor deposition (CVD) reactors and demands a comprehensive understanding in terms of involved energetics. 2D and 3D growth is fundamentally different due to the large difference in the in-plane and out-of-plane binding energies in TMDC materials. Here, an analytical model describing TMDC growth via CVD is developed. The two most common TMDC structures produced via CVD growth (2D triangular flakes and 3D tetrahedra) are considered, and their formation energies are determined as a function of their growth parameters. By calculating the associated energies of 2D triangular or 3D tetrahedral flakes, we predict the minimum sizes of the critical nuclei of 2D triangular and 3D morphologies, and thereby determine the minimum realizable dimensions of TMDC, in the form of quantum dots. Analysis of growth rates shows that CVD favors 2D growth of MoS2 between 820 K and 900 K and 3D growth over 900 K. Our model also suggests that the flow rates of TMDC precursors (metal oxide and sulfur) in a long, cylindrical CVD reactor are important parameters for attaining uniform growth. Our model provides a compressive analysis of TMDC growth via CVD. Therefore, it is a critical tool for helping to achieve reproducible growth of 2D and 3D TMDCs for a variety of applications. .

在各种化学气相沉积(CVD)反应器中都能重复观察到层状过渡金属二钙化物(TMDCs)的二维(2D)和三维(3D)晶体竞相生长的现象,因此需要全面了解其中的能量学原理。由于 TMDC 材料面内和面外结合能的巨大差异,二维和三维生长有着本质的不同。在此,我们建立了一个描述通过 CVD 生长 TMDC 的分析模型。考虑了通过 CVD 生长产生的两种最常见的 TMDC 结构(二维三角形薄片和三维四面体),并确定了它们的形成能与生长参数之间的函数关系。通过计算二维三角形薄片或三维四面体薄片的相关能量,我们预测了二维三角形和三维形态临界核的最小尺寸,从而确定了量子点形式的 TMDC 的最小可实现尺寸。我们的模型还表明,TMDC 前体(金属氧化物和硫)在长圆柱形 CVD 反应器中的流速是实现均匀生长的重要参数。我们的模型提供了通过 CVD 生长 TMDC 的压缩分析。因此,它是帮助实现二维和三维 TMDC 可重现生长的重要工具,适用于各种应用。
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引用次数: 0
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