Pub Date : 2024-11-21DOI: 10.1088/1361-6528/ad91bd
Holger Fiedler, Jake Hardy, Jonathan E Halpert, Nathaniel J L K Davis, John Kennedy
Ion implantation is widely utilised for the modification of inorganic semiconductors; however, the technique has not been extensively applied to lead halide perovskites. In this report, we demonstrate the modification of the optical properties of caesium lead bromide (CsPbBr3) thin films via noble gas ion implantation. We observed that the photoluminescence (PL) lifetimes of CsPbBr3thin films can be doubled by low fluences (<1 × 1014at·cm-2) of ion implantation with an acceleration voltage of 20 keV. We attribute this phenomenon to ion beam induced shallow minority charge carrier trapping induced by nuclear stopping, dominant by heavy noble gases (Ar, Xe). Simultaneously, the PL quantum yield (PLQY) is altered during noble gas ion implantation inversely correlates with the electronic stopping power of the implanted element, hence Ar implantation reduces the PLQY, while Ne even causes a PLQY enhancement. These results thus provide a guide to separate the effect of nuclear and electronic damage during ion implantation into halide perovskites.
{"title":"Shallow defects and optical properties of CsPbBr<sub>3</sub>thin films through noble gas ion beam defect engineering.","authors":"Holger Fiedler, Jake Hardy, Jonathan E Halpert, Nathaniel J L K Davis, John Kennedy","doi":"10.1088/1361-6528/ad91bd","DOIUrl":"https://doi.org/10.1088/1361-6528/ad91bd","url":null,"abstract":"<p><p>Ion implantation is widely utilised for the modification of inorganic semiconductors; however, the technique has not been extensively applied to lead halide perovskites. In this report, we demonstrate the modification of the optical properties of caesium lead bromide (CsPbBr<sub>3</sub>) thin films via noble gas ion implantation. We observed that the photoluminescence (PL) lifetimes of CsPbBr<sub>3</sub>thin films can be doubled by low fluences (<1 × 10<sup>14</sup>at·cm<sup>-2</sup>) of ion implantation with an acceleration voltage of 20 keV. We attribute this phenomenon to ion beam induced shallow minority charge carrier trapping induced by nuclear stopping, dominant by heavy noble gases (Ar, Xe). Simultaneously, the PL quantum yield (PLQY) is altered during noble gas ion implantation inversely correlates with the electronic stopping power of the implanted element, hence Ar implantation reduces the PLQY, while Ne even causes a PLQY enhancement. These results thus provide a guide to separate the effect of nuclear and electronic damage during ion implantation into halide perovskites.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":"36 6","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142682450","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-21DOI: 10.1088/1361-6528/ad902d
Munsu Choi, Chulkyun Park, Juhee Hong
In the extreme ultraviolet lithography (EUVL) process, extreme ultraviolet (EUV) pellicles serve as thin, transparent membranes that shield the photomask (reticle) from particle contamination, thereby preserving photomask pattern integrity, reducing chip failure risks, and enhancing production yields. The production of EUV pellicles is highly challenging due to their mechanical fragility at nanometer-scale thicknesses and the need to endure the rigorous conditions of the EUVL environment, which include high temperatures and hydrogen radicals. Consequently, extensive research has been conducted on a variety of materials, such as carbon-based and silicon-based substances, for the development of EUV pellicles. This study explores the feasibility of implementing metal silicide (MeSix) pellicles for high-power EUVL applications. We successfully fabricated MeSixpellicles in two dimensions: a 10 mm × 10 mm sample and a full-size 110 mm × 144 mm pellicle. We then evaluated their optical, mechanical, thermal, and chemical properties, as well as their lifespan. The pellicles demonstrated over 90% transmittance and less than 0.04% reflectance. The films exhibited a deflection of 300μm under a 2 Pa differential pressure and an ultimate tensile strength exceeding 2 GPa. The thermal emissivity was measured at 0.3. Additionally, the durability of the pellicles was validated through exposure to 20,000 wafers using a 400 W EUV power (offline test: 20 W cm-2). The transmittance variations of the pellicles were evaluated by comparing the measurements obtained before and after exposure to 400 W EUV power.
{"title":"Development and optimization of metal silicide EUV pellicle for 400W EUV lithography.","authors":"Munsu Choi, Chulkyun Park, Juhee Hong","doi":"10.1088/1361-6528/ad902d","DOIUrl":"10.1088/1361-6528/ad902d","url":null,"abstract":"<p><p>In the extreme ultraviolet lithography (EUVL) process, extreme ultraviolet (EUV) pellicles serve as thin, transparent membranes that shield the photomask (reticle) from particle contamination, thereby preserving photomask pattern integrity, reducing chip failure risks, and enhancing production yields. The production of EUV pellicles is highly challenging due to their mechanical fragility at nanometer-scale thicknesses and the need to endure the rigorous conditions of the EUVL environment, which include high temperatures and hydrogen radicals. Consequently, extensive research has been conducted on a variety of materials, such as carbon-based and silicon-based substances, for the development of EUV pellicles. This study explores the feasibility of implementing metal silicide (MeSi<i><sub>x</sub></i>) pellicles for high-power EUVL applications. We successfully fabricated MeSi<i><sub>x</sub></i>pellicles in two dimensions: a 10 mm × 10 mm sample and a full-size 110 mm × 144 mm pellicle. We then evaluated their optical, mechanical, thermal, and chemical properties, as well as their lifespan. The pellicles demonstrated over 90% transmittance and less than 0.04% reflectance. The films exhibited a deflection of 300<i>μ</i>m under a 2 Pa differential pressure and an ultimate tensile strength exceeding 2 GPa. The thermal emissivity was measured at 0.3. Additionally, the durability of the pellicles was validated through exposure to 20,000 wafers using a 400 W EUV power (offline test: 20 W cm<sup>-2</sup>). The transmittance variations of the pellicles were evaluated by comparing the measurements obtained before and after exposure to 400 W EUV power.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142605192","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Tribological printing is emerging as a promising technique for micro/nano manufacturing. A significant challenge is enhancing efficiency and minimizing the need for thousands of sliding cycles to create nano- or microstructures (ACS Appl. Mater. Inter. 2018;10:40335-47, Nanotechnology 2019;30:95302). This study presents a rapid approach for forming Cu microwires on Si wafers through a friction method during the evaporation of an ethanol-based lubricant containing Cu nanoparticles. The preparation time is influenced by the volume of the lubricant added, with optimal conditions reducing the time to 300 seconds (600 sliding cycles) for producing Cu microwires with a thickness of 200 nm. Key aspects include the lubricating effect of ethanol on the friction pairs and the role of ethanol evaporation in the growth of Cu microwires. Successful formation requires a careful balance between microwire thickening and wear removal. The resulting Cu microwires demonstrate mechanical and electrical properties that make them suitable as micro conductors. This work provides a novel approach for fabricating conductive microstructures on Si surfaces and other curved surfaces, offering potential applications in microelectronics and sensor technologies.
{"title":"Friction-enhanced formation of Cu microwire on Si wafer.","authors":"Chenxu Liu, Yang Song, Zhimin Chai, Hongbo Zeng, Yu Tian, Yonggang Meng","doi":"10.1088/1361-6528/ad958d","DOIUrl":"https://doi.org/10.1088/1361-6528/ad958d","url":null,"abstract":"<p><p>Tribological printing is emerging as a promising technique for micro/nano manufacturing. A significant challenge is enhancing efficiency and minimizing the need for thousands of sliding cycles to create nano- or microstructures (ACS Appl. Mater. Inter. 2018;10:40335-47, Nanotechnology 2019;30:95302). This study presents a rapid approach for forming Cu microwires on Si wafers through a friction method during the evaporation of an ethanol-based lubricant containing Cu nanoparticles. The preparation time is influenced by the volume of the lubricant added, with optimal conditions reducing the time to 300 seconds (600 sliding cycles) for producing Cu microwires with a thickness of 200 nm. Key aspects include the lubricating effect of ethanol on the friction pairs and the role of ethanol evaporation in the growth of Cu microwires. Successful formation requires a careful balance between microwire thickening and wear removal. The resulting Cu microwires demonstrate mechanical and electrical properties that make them suitable as micro conductors. This work provides a novel approach for fabricating conductive microstructures on Si surfaces and other curved surfaces, offering potential applications in microelectronics and sensor technologies.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142687644","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-21DOI: 10.1088/1361-6528/ad958c
Giorgos Boras, Haotian Zeng, Jae-Seong Park, Huiwen Deng, Mingchu Tang, Huiyun Liu
The positioning of quantum dots (QDs) in nanowires (NWs) on-axis has emerged as a controllable method of QD fabrication that has given rise to structures with exciting potential in novel applications in the field of Si photonics. In particular, III-V NWQDs attract a great deal of interest owing to their vibrant optical properties, high carrier mobility, facilitation in integration with Si and bandgap tunability, which render them highly versatile. Moreover, unlike Stranski-Krastanov or self-assembled QDs, this configuration allows for deterministic position and size of the dots, enhancing the sample uniformity and enabling beneficial functions. Among these functions, single photon emission has presented significant interest due to its key role in quantum information processing. This has led to efforts for the integration of ternary III-V NWQD non-classical light emitters on-chip, which is promising for the commercial expansion of quantum photonic circuits. In the current review, we will describe the recent progress in the synthesis of ternary III-V NWQDs, including the growth methods and the material platforms in the available literature. Furthermore, we will present the results related to single photon emission and the integration of III-V NWQDs as single photon sources in quantum photonic circuits, highlighting their promising potential in quantum information processing. Our work demonstrates the up-to-date landscape in this field of research and pronounces the importance of ternary III-V NWQDs in quantum information and optoelectronic applications.
.
{"title":"Quantum dots synthesis within ternary III-V nanowire towards light emitters in quantum photonic circuits: a review.","authors":"Giorgos Boras, Haotian Zeng, Jae-Seong Park, Huiwen Deng, Mingchu Tang, Huiyun Liu","doi":"10.1088/1361-6528/ad958c","DOIUrl":"https://doi.org/10.1088/1361-6528/ad958c","url":null,"abstract":"<p><p>The positioning of quantum dots (QDs) in nanowires (NWs) on-axis has emerged as a controllable method of QD fabrication that has given rise to structures with exciting potential in novel applications in the field of Si photonics. In particular, III-V NWQDs attract a great deal of interest owing to their vibrant optical properties, high carrier mobility, facilitation in integration with Si and bandgap tunability, which render them highly versatile. Moreover, unlike Stranski-Krastanov or self-assembled QDs, this configuration allows for deterministic position and size of the dots, enhancing the sample uniformity and enabling beneficial functions. Among these functions, single photon emission has presented significant interest due to its key role in quantum information processing. This has led to efforts for the integration of ternary III-V NWQD non-classical light emitters on-chip, which is promising for the commercial expansion of quantum photonic circuits. In the current review, we will describe the recent progress in the synthesis of ternary III-V NWQDs, including the growth methods and the material platforms in the available literature. Furthermore, we will present the results related to single photon emission and the integration of III-V NWQDs as single photon sources in quantum photonic circuits, highlighting their promising potential in quantum information processing. Our work demonstrates the up-to-date landscape in this field of research and pronounces the importance of ternary III-V NWQDs in quantum information and optoelectronic applications.
.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142687701","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-20DOI: 10.1088/1361-6528/ad8e6c
Antun Lovro Brkić, Antonio Supina, Davor Čapeta, Lucija Dončević, Lucija Ptiček, Šimun Mandić, Livio Racané, Ida Delač
We investigated the stability of monolayer MoS2samples synthesized using chemical vapor deposition and subsequently modified with organic molecules under ambient conditions. By analyzing the optical signatures of the samples using photoluminescence spectroscopy, Raman spectroscopy, and surface quality using atomic force microscopy, we observed that this modification of monolayer MoS2with organic molecules is stable and retains its optical signature over time under ambient conditions. Furthermore, we show the reversibility of the effects induced by the organic molecules, as heating the modified samples restores their original optical signatures, indicating the re-establishment of the optical properties of the pristine monolayer MoS2.
{"title":"Stability and reversibility of organic molecule modifications of CVD-synthesized monolayer MoS<sub>2</sub>.","authors":"Antun Lovro Brkić, Antonio Supina, Davor Čapeta, Lucija Dončević, Lucija Ptiček, Šimun Mandić, Livio Racané, Ida Delač","doi":"10.1088/1361-6528/ad8e6c","DOIUrl":"10.1088/1361-6528/ad8e6c","url":null,"abstract":"<p><p>We investigated the stability of monolayer MoS<sub>2</sub>samples synthesized using chemical vapor deposition and subsequently modified with organic molecules under ambient conditions. By analyzing the optical signatures of the samples using photoluminescence spectroscopy, Raman spectroscopy, and surface quality using atomic force microscopy, we observed that this modification of monolayer MoS<sub>2</sub>with organic molecules is stable and retains its optical signature over time under ambient conditions. Furthermore, we show the reversibility of the effects induced by the organic molecules, as heating the modified samples restores their original optical signatures, indicating the re-establishment of the optical properties of the pristine monolayer MoS<sub>2</sub>.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142576399","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
This study investigates the effect of silicon carbon nitride (SiCN) as an interlayer for ZnO-based resistive random access memory (RRAM). SiCN was deposited using plasma-enhanced chemical vapor deposition with controlled carbon content, achieved by varying the partial pressure of tetramethylsilane (4MS). Our results indicate that increasing the carbon concentration enhances the endurance of RRAM devices but reduces the on/off ratio. Devices with SiCN exhibited lower operating voltages and more uniform resistive switching behavior. Oxygen migration from ZnO to SiCN is examined by x-ray diffraction and x-ray photoelectron spectroscopy analyses, promoting the formation of conductive filaments and lowering set voltages. Additionally, we examined the impact of top electrode oxidation on RRAM performance. The oxidation of the Ti top electrode was found to reduce endurance and increase low resistive state resistance, potentially leading to device failure through the formation of an insulating layer between the electrode and resistive switching material. The oxygen storage capability of SiCN was further confirmed through high-temperature stress tests, demonstrating its potential as an oxygen reservoir. Devices with a 20 nm SiCN interlayer showed significantly improved endurance, with over 500 switching cycles, compared to 62 cycles in those with a 5 nm SiCN layer. However, the thicker SiCN layer resulted in a notably lower on/off ratio due to reduced capacitance. These findings suggest that SiCN interlayers can effectively enhance the performance and endurance of ZnO-based RRAM devices by acting as an oxygen reservoir and mitigating the top electrode oxidation effect.
{"title":"Effect of SiCN thin film interlayer for ZnO-based RRAM.","authors":"Woon-San Ko, Myeong-Ho Song, Jun-Ho Byun, Do-Yeon Lee, So-Yeon Kwon, Jong-Sin Hyun, Dong-Hyeuk Choi, Ga-Won Lee","doi":"10.1088/1361-6528/ad83d9","DOIUrl":"10.1088/1361-6528/ad83d9","url":null,"abstract":"<p><p>This study investigates the effect of silicon carbon nitride (SiCN) as an interlayer for ZnO-based resistive random access memory (RRAM). SiCN was deposited using plasma-enhanced chemical vapor deposition with controlled carbon content, achieved by varying the partial pressure of tetramethylsilane (4MS). Our results indicate that increasing the carbon concentration enhances the endurance of RRAM devices but reduces the on/off ratio. Devices with SiCN exhibited lower operating voltages and more uniform resistive switching behavior. Oxygen migration from ZnO to SiCN is examined by x-ray diffraction and x-ray photoelectron spectroscopy analyses, promoting the formation of conductive filaments and lowering set voltages. Additionally, we examined the impact of top electrode oxidation on RRAM performance. The oxidation of the Ti top electrode was found to reduce endurance and increase low resistive state resistance, potentially leading to device failure through the formation of an insulating layer between the electrode and resistive switching material. The oxygen storage capability of SiCN was further confirmed through high-temperature stress tests, demonstrating its potential as an oxygen reservoir. Devices with a 20 nm SiCN interlayer showed significantly improved endurance, with over 500 switching cycles, compared to 62 cycles in those with a 5 nm SiCN layer. However, the thicker SiCN layer resulted in a notably lower on/off ratio due to reduced capacitance. These findings suggest that SiCN interlayers can effectively enhance the performance and endurance of ZnO-based RRAM devices by acting as an oxygen reservoir and mitigating the top electrode oxidation effect.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142391985","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-20DOI: 10.1088/1361-6528/ad902b
Xu Chen, Jian Yue, Xiongjun Xu, Jiajun Chen, Xuechan Huang, Yukai Huang, Yang Yang, Feng Li, Tianwang Li
Selenium-based nanoparticles exhibit antiviral activity by directly modulating immune function. Despite recent promising developments in utilizing selenium nanoparticles (Se NPs) against viral infections, the impact of surface ligand charge on the conformation and interaction with viral proteins, as well as the effectiveness of Se NPs in anti-Herpes simplex virus 1 (HSV-1) infection remains unexplored. In this study, three types of selenium nanoparticles (CTAB-Se, PVP-Se, SDS-Se) with distinct surface charges were synthesized by modifying the surface ligands. We found that apart from differences in surface charge, the size, morphology, and crystal structure of the three types of Se NPs were similar. Notably, although the lipophilicity and cellular uptake of SDS-Se with a negative charge were lower compared to positively charged CTAB-Se and neutrally charged PVP-Se, SDS-Se exhibited the strongest protein binding force during interaction with HSV-1. Consequently, SDS-Se demonstrated the most potent anti-HSV-1 activity and safeguarded normal cells from damage. The mechanistic investigation further revealed that SDS-Se NPs effectively inhibited the proliferation and assembly of HSV-1 by powerfully suppressing the key genes and proteins of HSV-1 at various stages of viral development. Hence, this study highlights the significant role of surface ligand engineering in the antiviral activity of Se NPs, presenting a viable approach for synthesizing Se NPs with tailored antiviral properties by modulating surface charge. This method holds promise for advancing research on the antiviral capabilities of Se NPs.
硒基纳米粒子(Se NPs)通过直接调节免疫功能表现出抗病毒活性。尽管最近在利用硒纳米粒子抗病毒感染方面取得了可喜的进展,但表面配体电荷对硒纳米粒子的构象和与病毒蛋白相互作用的影响,以及硒纳米粒子在抗单纯疱疹病毒 1(HSV-1)感染方面的有效性仍有待探索。本研究通过改变表面配体合成了三种不同表面电荷的硒纳米粒子(CTAB-Se、PVP-Se、SDS-Se)。我们发现,除了表面电荷不同外,三种硒纳米粒子的大小、形态和晶体结构都很相似。值得注意的是,虽然与带正电荷的 CTAB-Se 和带中性电荷的 PVP-Se 相比,带负电荷的 SDS-Se 的亲脂性和细胞吸收率较低,但在与 HSV-1 的相互作用中,SDS-Se 表现出最强的蛋白质结合力。因此,SDS-Se 具有最强的抗 HSV-1 活性,能保护正常细胞免受损伤。机理研究进一步发现,SDS-Se NPs 能在病毒发展的不同阶段强力抑制 HSV-1 的关键基因和蛋白,从而有效抑制 HSV-1 的增殖和组装。因此,本研究强调了表面配体工程在 Se NPs 抗病毒活性中的重要作用,为通过调节表面电荷合成具有定制抗病毒特性的 Se NPs 提供了一种可行的方法。这种方法有望推动 Se NPs 抗病毒能力的研究。
{"title":"Surface different charge ligands for modulating selenium nanoparticles formation and activating the interaction with proteins for effective anti-Herpes simplex virus l infection.","authors":"Xu Chen, Jian Yue, Xiongjun Xu, Jiajun Chen, Xuechan Huang, Yukai Huang, Yang Yang, Feng Li, Tianwang Li","doi":"10.1088/1361-6528/ad902b","DOIUrl":"10.1088/1361-6528/ad902b","url":null,"abstract":"<p><p>Selenium-based nanoparticles exhibit antiviral activity by directly modulating immune function. Despite recent promising developments in utilizing selenium nanoparticles (Se NPs) against viral infections, the impact of surface ligand charge on the conformation and interaction with viral proteins, as well as the effectiveness of Se NPs in anti-Herpes simplex virus 1 (HSV-1) infection remains unexplored. In this study, three types of selenium nanoparticles (CTAB-Se, PVP-Se, SDS-Se) with distinct surface charges were synthesized by modifying the surface ligands. We found that apart from differences in surface charge, the size, morphology, and crystal structure of the three types of Se NPs were similar. Notably, although the lipophilicity and cellular uptake of SDS-Se with a negative charge were lower compared to positively charged CTAB-Se and neutrally charged PVP-Se, SDS-Se exhibited the strongest protein binding force during interaction with HSV-1. Consequently, SDS-Se demonstrated the most potent anti-HSV-1 activity and safeguarded normal cells from damage. The mechanistic investigation further revealed that SDS-Se NPs effectively inhibited the proliferation and assembly of HSV-1 by powerfully suppressing the key genes and proteins of HSV-1 at various stages of viral development. Hence, this study highlights the significant role of surface ligand engineering in the antiviral activity of Se NPs, presenting a viable approach for synthesizing Se NPs with tailored antiviral properties by modulating surface charge. This method holds promise for advancing research on the antiviral capabilities of Se NPs.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142605313","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-20DOI: 10.1088/1361-6528/ad8bc9
Zhenfei Hou, Gang Niu, Jie Li, Shengli Wu
In this paper, we obtained n-type top-gate carbon nanotube (CNT) thin film field effect transistors (FET) with source/drain extensions structure through dielectrics optimization strategy, combining the yttrium layer with HfO2dielectric argon annealing process, and metal contacts. The mechanism for enhanced n-type conduction was explained as being due to the vertical diffusion of yttrium to the HfO2dielectric during argon annealing. This diffusion causes a bending of the energy band, which results in more positive fixed charges, and a reduction in the electron injection barrier between the low work function source/drain Cr electrode and CNT thin film. The optimized technology has great prospects for the low cost, large scale and high performance n-type CNT thin film FET to be used in integrated electronic devices.
本文通过电介质优化策略,将钇层与 HfO2 电介质氩退火工艺和金属触点相结合,获得了具有源极/漏极扩展结构的 n 型顶栅碳纳米管薄膜场效应晶体管(CNTFET)。n 型传导增强的机制被解释为氩退火过程中钇向 HfO2 介电层的垂直扩散。这种扩散导致能带弯曲,从而产生更多的正固定电荷,并降低了低功函数源-漏Cr电极和碳纳米管之间的电子注入势垒。优化后的技术对于低成本、大规模、高性能的 n 型 CNTFET 在集成电子设备中的应用具有广阔的前景。
{"title":"Improvement of N-type carbon nanotube field effect transistor performance using the combination of yttrium diffusion layer in HfO<sub>2</sub>dielectrics and metal contacts.","authors":"Zhenfei Hou, Gang Niu, Jie Li, Shengli Wu","doi":"10.1088/1361-6528/ad8bc9","DOIUrl":"10.1088/1361-6528/ad8bc9","url":null,"abstract":"<p><p>In this paper, we obtained n-type top-gate carbon nanotube (CNT) thin film field effect transistors (FET) with source/drain extensions structure through dielectrics optimization strategy, combining the yttrium layer with HfO<sub>2</sub>dielectric argon annealing process, and metal contacts. The mechanism for enhanced n-type conduction was explained as being due to the vertical diffusion of yttrium to the HfO<sub>2</sub>dielectric during argon annealing. This diffusion causes a bending of the energy band, which results in more positive fixed charges, and a reduction in the electron injection barrier between the low work function source/drain Cr electrode and CNT thin film. The optimized technology has great prospects for the low cost, large scale and high performance n-type CNT thin film FET to be used in integrated electronic devices.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142522500","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-19DOI: 10.1088/1361-6528/ad947f
Ahmed Nashaat, Abdulaziz Abu El-Fadl, Hiroyuki Nakamura, Mohamed Abdelkareem Kassem
Single-phase NiCo2O4 (NCO) nanoparticles (NPs) with an average particle size of 12 (± 3.5) nm were successfully synthesized as aggregates in urchin-like nanofibers via a hydrothermal route. Magnetization data measured as functions of temperature and magnetic field suggest a superparamagnetic-like behavior at room temperature, a ferrimagnetic transition around a Curie temperature TC ~200 K, and a spin blocking transition at a blocking temperature TB ~90 K, as observed at a field of 100 Oe. The spin blocking nature has been investigated by analyses of the field-dependence of TB in the static magnetization and its frequency-dependence in the ac susceptibility data measured in zero-field cooling regime, both indicate a low-temperature spin glass-like state. Below TB, the coercivity increases monotonically up to 1.7 kOe with decreasing temperature down to 5 K. Our results indicate that the magnetic behavior of NCO NPs, which is mainly determined by the cations' ratio, oxidation states, and site-occupancy, can be controlled by a synthesis in appropriate particle size and morphology.
{"title":"Synthesis and magnetic properties of NiCo<sub>2</sub>O<sub>4</sub>urchin-like nanofibers.","authors":"Ahmed Nashaat, Abdulaziz Abu El-Fadl, Hiroyuki Nakamura, Mohamed Abdelkareem Kassem","doi":"10.1088/1361-6528/ad947f","DOIUrl":"https://doi.org/10.1088/1361-6528/ad947f","url":null,"abstract":"<p><p>Single-phase NiCo2O4 (NCO) nanoparticles (NPs) with an average particle size of 12 (± 3.5) nm were successfully synthesized as aggregates in urchin-like nanofibers via a hydrothermal route. Magnetization data measured as functions of temperature and magnetic field suggest a superparamagnetic-like behavior at room temperature, a ferrimagnetic transition around a Curie temperature TC ~200 K, and a spin blocking transition at a blocking temperature TB ~90 K, as observed at a field of 100 Oe. The spin blocking nature has been investigated by analyses of the field-dependence of TB in the static magnetization and its frequency-dependence in the ac susceptibility data measured in zero-field cooling regime, both indicate a low-temperature spin glass-like state. Below TB, the coercivity increases monotonically up to 1.7 kOe with decreasing temperature down to 5 K. Our results indicate that the magnetic behavior of NCO NPs, which is mainly determined by the cations' ratio, oxidation states, and site-occupancy, can be controlled by a synthesis in appropriate particle size and morphology.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142682443","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2024-11-19DOI: 10.1088/1361-6528/ad9480
Farman Ullah, Sina Kazemian, Giovanni Fanchini
The competing growth of two-dimensional (2D) and three-dimensional (3D) crystals of layered transition metal dichalcogenides (TMDCs) has been reproducibly observed in a large variety of chemical vapor deposition (CVD) reactors and demands a comprehensive understanding in terms of involved energetics. 2D and 3D growth is fundamentally different due to the large difference in the in-plane and out-of-plane binding energies in TMDC materials. Here, an analytical model describing TMDC growth via CVD is developed. The two most common TMDC structures produced via CVD growth (2D triangular flakes and 3D tetrahedra) are considered, and their formation energies are determined as a function of their growth parameters. By calculating the associated energies of 2D triangular or 3D tetrahedral flakes, we predict the minimum sizes of the critical nuclei of 2D triangular and 3D morphologies, and thereby determine the minimum realizable dimensions of TMDC, in the form of quantum dots. Analysis of growth rates shows that CVD favors 2D growth of MoS2 between 820 K and 900 K and 3D growth over 900 K. Our model also suggests that the flow rates of TMDC precursors (metal oxide and sulfur) in a long, cylindrical CVD reactor are important parameters for attaining uniform growth. Our model provides a compressive analysis of TMDC growth via CVD. Therefore, it is a critical tool for helping to achieve reproducible growth of 2D and 3D TMDCs for a variety of applications.
.
{"title":"Understanding the competing growth of 2D and 3D transition metal dichalcogenides in a chemical vapor deposition (CVD) reactor.","authors":"Farman Ullah, Sina Kazemian, Giovanni Fanchini","doi":"10.1088/1361-6528/ad9480","DOIUrl":"https://doi.org/10.1088/1361-6528/ad9480","url":null,"abstract":"<p><p>The competing growth of two-dimensional (2D) and three-dimensional (3D) crystals of layered transition metal dichalcogenides (TMDCs) has been reproducibly observed in a large variety of chemical vapor deposition (CVD) reactors and demands a comprehensive understanding in terms of involved energetics. 2D and 3D growth is fundamentally different due to the large difference in the in-plane and out-of-plane binding energies in TMDC materials. Here, an analytical model describing TMDC growth via CVD is developed. The two most common TMDC structures produced via CVD growth (2D triangular flakes and 3D tetrahedra) are considered, and their formation energies are determined as a function of their growth parameters. By calculating the associated energies of 2D triangular or 3D tetrahedral flakes, we predict the minimum sizes of the critical nuclei of 2D triangular and 3D morphologies, and thereby determine the minimum realizable dimensions of TMDC, in the form of quantum dots. Analysis of growth rates shows that CVD favors 2D growth of MoS2 between 820 K and 900 K and 3D growth over 900 K. Our model also suggests that the flow rates of TMDC precursors (metal oxide and sulfur) in a long, cylindrical CVD reactor are important parameters for attaining uniform growth. Our model provides a compressive analysis of TMDC growth via CVD. Therefore, it is a critical tool for helping to achieve reproducible growth of 2D and 3D TMDCs for a variety of applications.
.</p>","PeriodicalId":19035,"journal":{"name":"Nanotechnology","volume":" ","pages":""},"PeriodicalIF":2.9,"publicationDate":"2024-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142682446","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}