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Pulse electrodeposited zinc sulfide as an eco-friendly buffer layer for the cadmium-free thin-film solar cells 脉冲电沉积硫化锌作为无镉薄膜太阳能电池的环保缓冲层
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107060
Divya Boosagulla , Sreekanth Mandati , Prashant Misra , Ramachandraiah Allikayala , Bulusu V. Sarada

Zinc sulfide (ZnS) is an emerging alternate n-type buffer layer for the cadmium-free thin-film solar cells. The present research adopts a unique mixture of glycerol and tartaric acid for the emergence of phase-pure ZnS during pulse electrodeposition. Besides, proper optimization of pulse parameters aid in producing crystalline ZnS films with no post-deposition heat treatment. The as-deposited films exhibit cubic ZnS as confirmed from X-Ray Diffraction (XRD) and micro-Raman analyses. The optical study reveals an average transmittance of 71% in the wavelength spread of 300–900 nm with a band gap of 3.8 eV. The n-type semiconducting behavior of ZnS is affirmed from the Mott-Schottky analysis and the flat band potential is inferred to be −1.0 V vs SCE. The crystalline ZnS films produced from the economic pulse electrodeposition method devoid of heat treatment step, with their demonstration as photoanode in photoelectrochemical cells are suitable for the relevant applications.

硫化锌(ZnS)是一种新兴的用于无镉薄膜太阳能电池的交替n型缓冲层。本研究采用一种独特的甘油和酒石酸混合物,在脉冲电沉积过程中产生相纯ZnS。此外,适当优化脉冲参数有助于在不进行沉积后热处理的情况下制备结晶ZnS薄膜。通过x射线衍射(XRD)和微拉曼分析证实,沉积膜表现出立方ZnS。光学研究表明,在300 ~ 900 nm波长范围内,平均透过率为71%,带隙为3.8 eV。Mott-Schottky分析证实了ZnS的n型半导体行为,推断其平带电位为- 1.0 V vs SCE。采用经济的脉冲电沉积方法制备的结晶ZnS薄膜无需热处理步骤,并在光电化学电池中作为光阳极进行了演示,适合于相关应用。
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引用次数: 6
Analytical modeling of subband quantization and quantum transport in very Low-dimensional dual metal double gate TFET 极低维双金属双栅TFET中子带量子化和量子输运的分析建模
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107063
Sharmistha Shee Kanrar, Subir Kumar Sarkar

We present a novel and comprehensive quantum analytical modeling of a sub-20 nm Dual Metal Double Gate (DMDG) Tunnel Field Effect Transistor (TFET) for the first time in literature. Owing to structural confinement at sub-20 nm regime, the energy states at channel are quantized and carrier propagation is regulated by quantum transport. We address such quantization aspects (viz. subband quantization, bandgap shifting, tunneling through barrier etc.) and incorporate them in analytical modeling using self-consistent solution of Schrödinger-Poisson's equation. As a result of work function difference at gate, we observe creation of quantum well, followed by a tunneling barrier, along the channel. Energy states in the quantum well are derived from Schrodinger equation, whereas, transmission coefficients are derived for each tunneling barrier. Finally, current density is obtained using ‘Landauer formula for quantum transport’. We methodically study the effects of structural confinement on device performances and observe significant shift from classical counterpart. Moreover, we note that quantization in DMDG TFET can be optimized that will lead to superior device performance. The results are verified with simulation data in each occasion to substantiate analytical models.

本文在文献中首次对亚20 nm双金属双栅(DMDG)隧道场效应晶体管(ttfet)进行了新颖而全面的量子分析建模。由于在亚20nm处的结构约束,通道处的能量态被量子化,载流子的传播受到量子输运的调控。我们解决了这些量化方面(即子带量化、带隙移动、穿过势垒的隧道等),并使用Schrödinger-Poisson方程的自一致解将它们纳入分析建模中。由于闸处的功函数差,我们观察到沿通道产生量子阱,然后是隧穿势垒。量子阱中的能量态由薛定谔方程导出,而透射系数则由每个隧穿势垒导出。最后,利用“量子输运的朗道尔公式”得到电流密度。我们系统地研究了结构约束对器件性能的影响,并观察到与经典对偶的显著变化。此外,我们注意到DMDG TFET中的量化可以优化,这将导致优越的器件性能。用各种情况下的模拟数据对结果进行了验证,以证实分析模型。
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引用次数: 1
On the role of crystal defects on the lattice thermal conductivity of monolayer WSe2 (P63/mmc) thermoelectric materials by DFT calculation 用DFT计算晶体缺陷对单层WSe2 (P63/mmc)热电材料晶格导热系数的影响
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107057
Yingtao Wang, Xian Zhang

As the energy problem becomes more prominent, research on thermoelectric (TE) materials has deepened over the past few decades. Low thermal conductivity enables thermoelectric materials better thermal conversion performance. In this study, based on the first principles and phonon Boltzmann transport equation, we studied the thermal conductivities of single-layer WSe2 under several defect conditions using density functional theory (DFT) as implemented in the Vienna Ab-initio Simulation Package (VASP). The lattice thermal conductivities of WSe2 under six kinds of defect states, i.e., PS, SS-c, DS-s, SW-c, SS-e, and DS-d, are 66.1, 41.2, 39.4, 8.8, 42.1, and 38.4 W/(m·K), respectively at 300 K. Defect structures can reduce thermal conductivity up to 86.7% (SW-c) compared with perfect structure. The influences of defect content, type, location factors on thermal properties have been discussed in this research. By introducing atom defects, we can reduce and regulate the thermal property of WSe2, which should provide an interesting idea for other thermoelectric materials to gain a lower thermal conductivity.

在过去的几十年里,随着能源问题的日益突出,对热电材料的研究不断深入。低导热系数使热电材料具有更好的热转换性能。在本研究中,我们基于第一性原理和声子玻尔兹曼输运方程,利用密度泛函理论(DFT)研究了几种缺陷条件下单层WSe2的热导率。300 K时,WSe2在PS、SS-c、DS-s、SW-c、SS-e和DS-d 6种缺陷状态下的晶格热导率分别为66.1、41.2、39.4、8.8、42.1和38.4 W/(m·K)。与完美结构相比,缺陷结构可降低导热系数达86.7% (SW-c)。研究了缺陷含量、缺陷类型、缺陷位置等因素对材料热性能的影响。通过引入原子缺陷,我们可以降低和调节WSe2的热性能,这应该为其他热电材料获得更低的导热系数提供一个有趣的想法。
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引用次数: 2
The impact of precursor thickness and surface roughness on the power factor of Cu2ZnSnS4 (CZTS) at near room temperature: Spin-coating deposition 前驱体厚度和表面粗糙度对近室温Cu2ZnSnS4 (CZTS)功率因数的影响:旋涂沉积
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107091
Hassan Ahmoum , Guojian Li , Mohd Sukor Su'ait , Mourad Boughrara , Puvaneswaran Chelvanathan , Yassine Khaaissa , Mohamed Kerouad , Qiang Wang

This work investigated the thermoelectric properties of Cu2ZnSnS4 (CZTS) thin films deposited on the soda-lime glass using spin-coating techniques with different layers. X-ray diffraction (XRD) pattern confirms the increase of the layer number leads to improve the crystallite size and all the films exhibit tetragonal structure with the presence of secondary phases. EDX shows a reduction of Cu and Zn contents while an increase in Sn contents is observed when the thickness increases. Surface topography is also carried out to study the surface roughness and it is found to be minimum when we deposit 4 layers. The absorption spectra show that CZTS exhibit a bandgap varied between 1.33 and 1.9 eV, the resistivity and the Seebeck coefficient have been found to increase with the increase of surface roughness. This investigation indicates that Cu2ZnSnS4 thin films can be a suitable material for thermoelectric application at near room temperature range.

采用不同层数的自旋镀膜技术,研究了在钠石灰玻璃上沉积Cu2ZnSnS4 (CZTS)薄膜的热电性能。x射线衍射(XRD)图证实了层数的增加导致晶粒尺寸的增大,所有薄膜都呈现出二次相存在的四方结构。EDX显示,随着厚度的增加,Cu和Zn含量降低,Sn含量增加。表面形貌也进行了研究,发现当我们沉积4层时,表面粗糙度最小。吸收光谱表明,CZTS的带隙在1.33 ~ 1.9 eV之间,电阻率和塞贝克系数随表面粗糙度的增大而增大。研究表明,Cu2ZnSnS4薄膜是一种适合于近室温范围热电应用的材料。
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引用次数: 6
3-D analytical model of the high-voltage interconnection effect for SOI LDMOS SOI LDMOS高压互连效应的三维解析模型
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107056
Ling Du , Yu-Feng Guo , Jun Zhang , Jia-Fei Yao , Jian-Hua Liu , Chen-Yang Huang , Man Li

The high-voltage interconnection (HVI) effect induces electric field crowding at the drift region near the source side of power lateral double diffusion MOS (LDMOS). Thus, the electric field profile is deteriorated, and the breakdown characteristic is weakened. This increases the difficulty of device optimization and affects the reliability of the device significantly. Since conventional models based 2-D method can only treat the HVI as a metal layer, therefore, no quantitative analysis can be provided. In order to quantify the impact of the HVI and provide a design scheme for preventing the deterioration in the device's breakdown characteristic, a novel three-dimensional analytical model of the HVI effect for the SOI LDMOS is proposed. By solving the 3-D Poisson's equation, the potential and electric field distribution of the drift region surface are investigated, and the breakdown mechanism is explored quantitatively. The analytical solutions are matched well with the simulation results, which verify the validity of the model. Based on the model, a simple and effective criterion is derived to optimize the structure geometry parameters. The largest width of the HVI metal line is given to prevent the breakdown voltage deterioration.

高压互连效应在功率侧双扩散MOS (LDMOS)源侧附近的漂移区引起电场拥挤。因此,电场分布恶化,击穿特性减弱。这增加了设备优化的难度,并显著影响设备的可靠性。由于传统的基于二维模型的方法只能将HVI视为金属层,因此无法进行定量分析。为了量化HVI的影响,并提供防止器件击穿特性恶化的设计方案,提出了一种新的SOI LDMOS HVI效应的三维解析模型。通过求解三维泊松方程,研究了漂移区表面的电位和电场分布,定量探讨了击穿机理。解析解与仿真结果吻合较好,验证了模型的有效性。在此基础上,推导出一种简单有效的结构几何参数优化准则。为防止击穿电压劣化,给出了HVI金属线的最大宽度。
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引用次数: 0
Optimal identification of Be-doped Al0.29Ga0.71As Schottky diode parameters using Dragonfly Algorithm: A thermal effect study 利用蜻蜓算法优化be掺杂Al0.29Ga0.71As肖特基二极管参数的识别:热效应研究
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107085
Walid Filali , Rachid Amrani , Elyes Garoudja , Slimane Oussalah , Fouaz Lekoui , Zineb Oukerimi , Nouredine Sengouga , Mohamed Henini

In this work, a recent heuristic method called Dragonfly Algorithm (DA) has been employed for the first time to investigate the temperature effect on the Schottky diode electrical parameters. Beryllium-doped Al0.29Ga0.71As Schottky diodes grown by molecular beam epitaxy (MBE) have been used to validate the suggested method. The proposed approach is based on the analysis of current-voltage-temperature (I–V-T) and capacitance-voltage (C–V) characteristics. Furthermore, the interface state density (Nss) as function of the difference between the surface state energy and valence band energy (EssEV) was determined. The obtained results demonstrate the high efficiency of this strategy to accurately determine the electrical parameters and investigate their temperature dependency. This efficiency can be clearly remarked from the well fit between both predicted and measured current characteristics.

本文首次采用蜻蜓算法(Dragonfly Algorithm, DA)来研究温度对肖特基二极管电学参数的影响。用分子束外延(MBE)生长的掺铍Al0.29Ga0.71As肖特基二极管对所提方法进行了验证。该方法基于对电流-电压-温度(I-V-T)和电容-电压(C-V)特性的分析。此外,还确定了界面态密度(Nss)作为表面态能与价带能(Ess−EV)之差的函数。实验结果表明,该方法可以准确地确定电参数并研究它们的温度依赖性。这种效率可以从预测和测量电流特性之间的良好拟合中清楚地看出。
{"title":"Optimal identification of Be-doped Al0.29Ga0.71As Schottky diode parameters using Dragonfly Algorithm: A thermal effect study","authors":"Walid Filali ,&nbsp;Rachid Amrani ,&nbsp;Elyes Garoudja ,&nbsp;Slimane Oussalah ,&nbsp;Fouaz Lekoui ,&nbsp;Zineb Oukerimi ,&nbsp;Nouredine Sengouga ,&nbsp;Mohamed Henini","doi":"10.1016/j.spmi.2021.107085","DOIUrl":"10.1016/j.spmi.2021.107085","url":null,"abstract":"<div><p><span>In this work, a recent heuristic method called Dragonfly Algorithm (DA) has been employed for the first time to investigate the temperature effect on the Schottky diode electrical parameters. Beryllium-doped Al</span><sub>0.29</sub>Ga<sub>0.71</sub><span>As Schottky diodes grown by molecular beam epitaxy (MBE) have been used to validate the suggested method. The proposed approach is based on the analysis of current-voltage-temperature (I–V-T) and capacitance-voltage (C–V) characteristics. Furthermore, the interface state density </span><span><math><mrow><mo>(</mo><msub><mi>N</mi><mrow><mi>s</mi><mi>s</mi></mrow></msub><mo>)</mo></mrow></math></span><span> as function of the difference between the surface state energy and valence band energy </span><span><math><mrow><mo>(</mo><msub><mi>E</mi><mrow><mi>s</mi><mi>s</mi></mrow></msub><mo>−</mo><msub><mi>E</mi><mi>V</mi></msub><mo>)</mo></mrow></math></span> was determined. The obtained results demonstrate the high efficiency of this strategy to accurately determine the electrical parameters and investigate their temperature dependency. This efficiency can be clearly remarked from the well fit between both predicted and measured current characteristics.</p></div>","PeriodicalId":22044,"journal":{"name":"Superlattices and Microstructures","volume":"160 ","pages":"Article 107085"},"PeriodicalIF":3.1,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"49472637","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Investigation of AlGaN/GaN HEMT for pH sensing applications and sensitivity optimization AlGaN/GaN HEMT在pH传感中的应用及灵敏度优化研究
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107067
Aasif Mohammad Bhat, Nawaz shafi, C. Periasamy

In this work, AlGaN/GaN HEMT pH sensitive response has been presented through extensive simulations demonstrating the effect of pH variation on channel conductance, potential and conduction band profile. The pH solution is defined by an intrinsic semiconductor material whose properties are modified to mimic electrolyte solution and the effect of variation in charged adsorbates is accommodated by adjusting the interface charges density at oxide-semiconductor interface. The effect of AlGaN barrier layer composition (thickness and Aluminum mole fraction) on the sensitivity was analyzed by simulating different device configurations using ATLAS Silvaco device simulation tool. The devices render improved voltage sensitivity (SV = ΔVr/pH) and high output current sensitivity (SI = (ΔIds/pH) = 15 mA/mm-pH). The simulations predict a thinner barrier layer along with smaller mole fraction device is most sensitive to pH changes at the surface for an open gate operation.

在这项工作中,通过广泛的模拟,展示了pH变化对通道电导、电位和导带剖面的影响,提出了AlGaN/GaN HEMT pH敏感响应。pH溶液由一种本征半导体材料定义,其性质被修改为模拟电解质溶液,并且通过调整氧化物-半导体界面上的界面电荷密度来调节带电吸附剂变化的影响。利用ATLAS Silvaco器件仿真工具模拟不同器件配置,分析AlGaN势垒层组成(厚度和铝摩尔分数)对灵敏度的影响。该器件具有改进的电压灵敏度(SV = ΔVr/pH)和高输出电流灵敏度(SI = (ΔIds/pH) = 15 mA/mm-pH)。模拟结果表明,对于开栅操作,较薄的阻挡层和较小的摩尔分数器件对表面pH变化最为敏感。
{"title":"Investigation of AlGaN/GaN HEMT for pH sensing applications and sensitivity optimization","authors":"Aasif Mohammad Bhat,&nbsp;Nawaz shafi,&nbsp;C. Periasamy","doi":"10.1016/j.spmi.2021.107067","DOIUrl":"10.1016/j.spmi.2021.107067","url":null,"abstract":"<div><p><span><span>In this work, AlGaN/GaN HEMT pH sensitive response has been presented through extensive simulations demonstrating the effect of pH variation on channel conductance, potential and </span>conduction band<span><span> profile. The pH solution is defined by an intrinsic semiconductor material whose properties are modified to mimic electrolyte solution and the effect of variation in charged adsorbates is accommodated by adjusting the interface charges density at oxide-semiconductor interface. The effect of AlGaN barrier layer composition (thickness and </span>Aluminum mole fraction) on the sensitivity was analyzed by simulating different device configurations using ATLAS Silvaco device simulation tool. The devices render improved voltage sensitivity (S</span></span><sub>V</sub> = ΔV<sub>r</sub>/pH) and high output current sensitivity (S<sub>I</sub> = (ΔI<sub>ds</sub>/pH) = 15 mA/mm-pH). The simulations predict a thinner barrier layer along with smaller mole fraction device is most sensitive to pH changes at the surface for an open gate operation.</p></div>","PeriodicalId":22044,"journal":{"name":"Superlattices and Microstructures","volume":"160 ","pages":"Article 107067"},"PeriodicalIF":3.1,"publicationDate":"2021-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"55434297","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Optical amplification by surface-plasmon-resonant Au grating substrates: Monolayer MoS2 with 170-fold second harmonic generation and 3-fold (off-resonance) Raman scattering 表面等离子体谐振金光栅基底的光学放大:具有170倍二次谐波产生和3倍(非共振)拉曼散射的单层MoS2
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107077
Joonas T. Holmi , Ramesh Raju , Jonas Ylönen , Nagarajan Subramaniyam , Harri Lipsanen

Nanoplasmonics is a potential game-changer in the development of next-generation on-chip photonic devices and computers, owing to the geometrically controlled and amplified linear and nonlinear optical processes. For instance, it resolves the limited light-matter interaction of the unique two-dimensional (2D) crystalline materials like semiconducting monolayer molybdenum disulfide (1L-MoS2). Metal grating (MG) substrates excel at this because their surface plasmons (SPs) can lead to stark field confinement near the surface. This work studies optical amplification of 1L-MoS2 on the gold (Au) MG substrate, which was designed to operate in a glycerol environment with SP resonance (SPR) at 850 nm excitation wavelength. Its design was verified by simulated and experimental reflectances, and topographically inspected by atomic force microscopy (AFM). Two advanced imaging modalities, second harmonic generation (SHG) and confocal Raman microscopy (CRM) were used to evaluate its 170-fold SHG on- and 3-fold CRM off-resonance optical amplifications, respectively. Some MoS2-to-grating adhesion issues due to trapped liquid showed as image nonuniformities. Possible improvements to limitations like surface roughness were also discussed. These Au MG substrates can boost conventional linear and nonlinear backscattering microscopies because they are tunable in the visible and near-infrared range by selecting geometry, metal, and environment.

纳米等离子体是下一代片上光子器件和计算机发展的潜在改变者,由于其几何控制和放大的线性和非线性光学过程。例如,它解决了独特的二维(2D)晶体材料(如半导体单层二硫化钼(1L-MoS2))的有限光物质相互作用。金属光栅(MG)衬底在这方面表现优异,因为它们的表面等离子体(SPs)可以导致表面附近的stark场约束。本文研究了1L-MoS2在金(Au) MG衬底上的光学放大,该衬底设计为在850 nm激发波长下在甘油环境下以SP共振(SPR)工作。通过模拟反射率和实验反射率验证了其设计,并通过原子力显微镜(AFM)进行了形貌检测。两种先进的成像方式,二次谐波产生(SHG)和共聚焦拉曼显微镜(CRM)分别用于评估其170倍的SHG和3倍的CRM非共振光学放大。由于被困液体导致的mos2与光栅的粘附问题表现为图像不均匀。还讨论了对表面粗糙度等限制的可能改进。这些金镁基板可以增强传统的线性和非线性后向散射显微镜,因为它们可以通过选择几何形状、金属和环境在可见光和近红外范围内进行调谐。
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引用次数: 2
Shifting LED emission from blue to the green gap spectral range using In0.12Ga0.88N relaxed templates 使用In0.12Ga0.88N放松模板将LED发射从蓝色到绿色间隙光谱范围
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107065
Mostafa Abdelhamid , Evyn L. Routh , Ahmed Shaker , S.M. Bedair

InyGa1-yN templates are grown with y ≤ 13.5% and a few nm surface roughness. These templates are used successfully to address two of the main issues facing long wavelength emitting LEDs, mainly the low growth temperature and high values of strain in the quantum wells (QWs). In this work, three LED structures are investigated: the first is a blue LED grown on GaN, the second and third are green LEDs grown on relaxed InyGa1-yN templates with y of about 10% and 12%, respectively. The same multiple quantum wells (MQWs) were used in the three LED structures, with the same well width, barrier width, and growth temperature. The reduced strain in the QWs due to the use of InGaN templates enhances the indium incorporation rate in the QWs. Red shift in emission wavelength of about 100 nm, from 470 nm to 570 nm, was achieved, at low injection current. Optical output power and external quantum efficiency (EQE) measurements showed that at high level of current injection, performance of the blue LED is about twice of the green emitting LEDs on InGaN templates. The current results indicate the potential of the InGaN template approach, with high values of y, in addressing problems facing long wavelength InGaN LEDs.

InyGa1-yN模板的生长条件为y≤13.5%,表面粗糙度为nm。这些模板成功地解决了长波发光led面临的两个主要问题,主要是低生长温度和量子阱(qw)中的高应变值。在这项工作中,研究了三种LED结构:第一种是在GaN上生长的蓝色LED,第二种和第三种是在y约为10%和12%的松弛InyGa1-yN模板上生长的绿色LED。在三种LED结构中使用相同的多量子阱(mqw),具有相同的阱宽度、势垒宽度和生长温度。由于使用InGaN模板,qw中的应变降低,从而提高了qw中的铟掺入率。在低注入电流下,在发射波长约100 nm处实现了从470 nm到570 nm的红移。光输出功率和外部量子效率(EQE)测量表明,在高电流注入水平下,蓝色LED的性能约为InGaN模板上绿色发光LED的两倍。目前的结果表明,具有高y值的InGaN模板方法在解决长波InGaN led面临的问题方面具有潜力。
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引用次数: 3
Applicability of double Channel Technique in AlGaN/GaN HEMT for future biosensing applications 双通道技术在AlGaN/GaN HEMT中对未来生物传感应用的适用性
IF 3.1 3区 物理与天体物理 Q2 PHYSICS, CONDENSED MATTER Pub Date : 2021-12-01 DOI: 10.1016/j.spmi.2021.107086
L. Arivazhagan , D. Nirmal , Anwar Jarndal , Hasina F. Huq , Subhash Chander , S. Bhagyalakshmi , Pavan Kumar Reddy , J. Ajayan , Arathy Varghese

Sensing COVID-19, GOx (glucose oxidase enzyme) in exhaled breath condensate/saliva, bio-molecules like KIM (Kidney Injury Molecule) in human body and pH value in human body fluids have gained huge attention in the present scenario as well as in the past decade. Hence, for the first time, double channel technique in AlGaN/GaN High Electron Mobility Transistor (HEMT) is proposed and its applicability is demonstrated by biosensing application. Simulation using SILVACO Technology Computer Aided Design (TCAD) based on numerical solid state models has been extensively used for investigation and analysis. The sensitivity of double channel device is compared with single channel device and its performance is evaluated in terms of the transconductance. Unlike the single channel device, double channel device exhibited wide range of transconductance with respect to gate bias. The device recorded a sensitivity of 136%, which is 74% higher than the sensitivity of single channel device. Hence, it is inferred that the sensitivity enhances with the use of multiple channels and could be increased by increasing the number of channels. The results of this research show that the proposed sensor stands a promising candidate for future biosensing applications that demand high detection limits.

感知COVID-19,呼气冷凝水/唾液中的GOx(葡萄糖氧化酶),人体中的KIM(肾损伤分子)等生物分子以及体液中的pH值在当前情境以及过去十年中受到了极大的关注。因此,首次提出了AlGaN/GaN高电子迁移率晶体管(HEMT)的双通道技术,并通过生物传感应用证明了其适用性。基于SILVACO技术的基于数值固体模型的计算机辅助设计(TCAD)仿真已广泛用于研究和分析。比较了双通道器件与单通道器件的灵敏度,并从跨导的角度评价了双通道器件的性能。与单通道器件不同,双通道器件在栅极偏置方面表现出广泛的跨导范围。该器件记录的灵敏度为136%,比单通道器件的灵敏度高74%。因此,可以推断,灵敏度随着多通道的使用而增强,并且可以通过增加通道数量来提高灵敏度。这项研究的结果表明,所提出的传感器是未来生物传感应用的一个有希望的候选者,需要高检测限。
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引用次数: 5
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